Sawataishi
Masayuki Sawataishi, Kofu-City, Yamanashi JP
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20100206841 | Method for etching metal nitride with high selectivity to other materials - A method and system of etching a metal nitride, such as titanium nitride is described. The etching process comprises introducing a process composition having a halogen containing gas, such as Cl | 08-19-2010 |
Masayuki Sawataishi, Kofu-City JP
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20090032495 | Method for etching metal nitride with high selectivity to other materials - A method and system of etching a metal nitride, such as titanium nitride, is described. The etching process comprises introducing a process composition having a halogen containing gas, such as Cl | 02-05-2009 |
Masayuki Sawataishi, Miyagi JP
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20140299571 | PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS - Disclosed are a plasma processing method and a plasma processing apparatus which collectively perform etching under the same etching conditions while suppressing a shape abnormality. The multilayer film material has a polysilicon layer, a first metal layer formed on the polysilicon layer, and a hard mask layer which contains a tungsten layer formed on the first metal layer. In the method, plasma is generated by a mixed gas of a chloride-containing gas which contains a compound containing chlorine and silicon, a compound containing chlorine and boron, or a compound containing chlorine and hydrogen, a chlorine-containing gas which contains chlorine, and a processing gas which contains carbon and fluorine, and the hard mask layer is used as an etching mask so as to perform the etching from a top surface of the first metal layer to a bottom surface of the polysilicon layer. | 10-09-2014 |
Tokio Sawataishi, Kanagawa JP
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20080197890 | Light receiving circuit - A light receiving circuit according to the present invention includes a current control voltage generation circuit | 08-21-2008 |
Tomoyuki Sawataishi, Miyagi-Ken JP
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20110221399 | CAPACITANCE DETECTOR - A capacitance detector includes: a first capacitor with fixed base capacitance and variable capacitance; a second capacitor charged with base charge corresponding to the base capacitance; third and fourth capacitors which receive capacitance distribution from the first or second capacitor; a first switching means for charging the first and second capacitors to a first fixed voltage and charging the third and fourth capacitors to a second fixed voltage in a first section and for charging the first and second capacitors to the second fixed voltage and charging the third and fourth capacitors to the first fixed voltage in a second section; a second switching means for separating the first and second capacitors from the third and fourth capacitors and for connecting the first and second capacitors to the third and fourth capacitors; and a differential amplifier to which first and second voltages corresponding to equalized charge are differentially input. | 09-15-2011 |
20140002936 | PROTECTION CIRCUIT | 01-02-2014 |