Patent application number | Description | Published |
20080212051 | Lithographic apparatus and device manufacturing method - A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations. | 09-04-2008 |
20080273182 | Lithographic apparatus and device manufacturing method - A protrusion is provided on a barrier member which at least partly confines a liquid between a projection system and a substrate. The protrusion is closer to the projection system than other parts of the barrier member to promote a meniscus of liquid to adhere between the protrusion and the projection system. | 11-06-2008 |
20110273695 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A protrusion is provided on a barrier member which at least partly confines a liquid between a projection system and a substrate. The protrusion is closer to the projection system than other parts of the barrier member to promote a meniscus of liquid to adhere between the protrusion and the projection system. | 11-10-2011 |
20120008116 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations. | 01-12-2012 |
20120008118 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations. | 01-12-2012 |
20150309420 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations. | 10-29-2015 |