Patent application number | Description | Published |
20110104395 | FILM DEPOSITION APPARATUS, FILM DEPOSITION METHOD, AND STORAGE MEDIUM - In a film deposition apparatus where bis (tertiary-butylamino) silane (BTBAS) gas is adsorbed on a wafer and then O | 05-05-2011 |
20110139074 | FILM DEPOSITION APPARATUS - A film deposition apparatus includes a turntable provided in the chamber and having on a first surface a substrate receiving area in which a substrate is placed; first and second reaction gas supplying portions supplying first and second reaction gases to the first surface, respectively; a separation gas supplying portion provided between the first reaction gas supplying portion and the second reaction gas supplying portion and supplying a separation gas that separates the first reaction gas and the second reaction gas; an evacuation port that evacuates the chamber; a space defining member provided for at least one of the first and second reaction gas supplying portions and defining a first space between the at least one of the first and second reaction gas supplying portions and the turntable and a second space so that the separation gas is likely to flow through the second space rather than the first space. | 06-16-2011 |
20110155056 | FILM DEPOSITION APPARATUS - A film deposition apparatus has a vacuum chamber in which a turntable placing plural substrates is rotated, the plural substrates come into contact with plural reaction gases supplied to plural process areas and thin films are deposited on surfaces of the plural substrates, and has plural reaction gas supplying portions for supplying the plural processing gases, a separation gas supplying portion for supplying a separation gas and an evacuation mechanism for ejecting the plural processing gases and the separation gas, wherein the plural process areas includes a first process area for causing a first reaction gas to adsorb on the surfaces of the plural substrates, and a second process area, having an area larger than the first process area, for causing the first reaction gas having adsorbed the surfaces of the plural substrates and a second reaction gas to react, and depositing the films on the surfaces of the plural substrates. | 06-30-2011 |
20110155062 | FILM DEPOSITION APPARATUS - A film deposition apparatus includes a turntable including a substrate placement region at its surface; first and second reaction gas supply parts disposed in first and second supply regions in a chamber and supplying first and second reaction gases onto the surface, respectively; a separation region disposed between the first and second supply regions, the separation region including a separation gas supply part ejecting a separation gas separating the first and second reaction gases and a ceiling surface forming a separation space to supply the separation gas to the first and second supply regions; and first and second evacuation ports provided for the first and second supply regions. At least one of the first and second evacuation ports is disposed so as to guide the separation gas, supplied to the corresponding supply region, toward and along a direction in which the corresponding reaction gas supply part extends. | 06-30-2011 |
20110159187 | FILM DEPOSITION APPARATUS AND FILM DEPOSITION METHOD - A film deposition apparatus includes a separation member that extends to cover a rotation center of the turntable and two different points on a circumference of the turntable above the turntable, thereby separating the inside of the chamber into a first area and a second area; a first reaction gas supplying portion that supplies a first reaction gas toward the turntable in the first area; a second reaction gas supplying portion that supplies a second reaction gas toward the turntable in the second area; a first evacuation port that evacuates the first reaction gas and the first separation gas that converges with the first reaction gas; and a second evacuation port that evacuates the second reaction gas and the first separation gas that converges with the second reaction gas. | 06-30-2011 |
20110214611 | FILM DEPOSITION APPARATUS - A film deposition apparatus is provided with a gas nozzle in which ejection holes that eject a reaction gas are formed along a longitudinal direction of the gas nozzle, and a flow regulation member that protrudes from the gas nozzle in either one of upstream and downstream directions of a rotation direction of a turntable. In such a configuration, a separation gas flowing from an upstream side of the rotation direction to the gas nozzle is restricted from flowing between the gas nozzle and the turntable on which a substrate is placed, and the reaction gas flowing upward from the turntable is restricted by the separation gas, thereby impeding a reaction gas concentration in a process area from being lowered. | 09-08-2011 |
20120076937 | FILM DEPOSITION DEVICE AND FILM DEPOSITION METHOD - A film deposition device includes a chamber, a turntable, a first reactive gas supplying portion, a second reactive gas supplying portion, and a separation gas supplying portion. A convex part includes a ceiling surface to cover both sides of the separation gas supplying portion, form a first space between the ceiling surface and the turntable where a separation gas flows, and form a separation area between a first area and a second area, to maintain a pressure in the first space to be higher than pressures in the first area and the second area so that a first reactive gas and a second reactive gas are separated by the separation gas in the separation area. A block member is arranged to form a second space between the turntable and an internal surface of the chamber at an upstream part of the separation area along a rotation direction of the turntable. | 03-29-2012 |
20120088030 | FILM FORMING APPARATUS, FILM FORMING METHOD, AND RECORDING MEDIUM - A film forming apparatus that produces a thin film by repeating cycles of sequentially supplying reaction gases including a loading table in a vacuum vessel having substrate mounting areas; reaction gas supplying units arranged in a peripheral direction with intervals to supply the reaction gases onto substrates; separating areas separating atmospheres of the processing areas; separation gas supplying units supplying separation gases to render a supply amount to outer peripheral side separation areas greater than a supply amount to center side separation areas; a ceiling face surrounding narrow areas together with the loading table to enable the separation gases flow from the separating areas to the processing areas along the center side separation areas and the outer peripheral side separation areas a vacuum ejecting mechanism; and a rotary mechanism rotating the loading table relative to the reaction gas supplying units and the separating areas. | 04-12-2012 |
20120222615 | FILM DEPOSITION APPARATUS - A film deposition apparatus includes a first turntable including at least ten substrate receiving areas that receive corresponding 300 mm substrates; a first reaction gas supplying portion arranged in a first area inside the chamber to supply a first reaction gas; a second reaction gas supplying portion arranged in a second area away from the first reaction gas supplying portion along the rotation direction of the first turntable to supply a second reaction gas; and a separation area arranged between the first and the second areas. The separation area includes a separation gas supplying portion that supplies a separation gas that separates the first reaction and the second reaction gases, and a ceiling surface having a height so that a pressure in a space between the ceiling surface and the first turntable is higher with the separation gas than pressures in the first and the second areas. | 09-06-2012 |
20120230805 | SUBSTRATE CONVEYING METHOD, RECORDING MEDIUM IN WHICH PROGRAM IS RECORDED FOR CAUSING SUBSTRATE CONVEYING METHOD TO BE EXECUTED, AND SUBSTRATE CONVEYOR - A substrate conveying method conveying a layered body having first and second substrates stacked with a spacer member provided between their respective bottom surfaces facing each other includes receiving the first substrate by holding the first substrate from below its bottom surface using a first holding mechanism provided on a side of a first fork provided above a second fork, and turning the first fork upside down and placing the received first substrate on the second fork; receiving the spacer member held in a substrate holding part by holding the spacer member from above using a second holding mechanism provided on the same side of the first fork as the first holding mechanism, and placing the received spacer member on the first substrate; and holding the second substrate from above its top surface using the first holding mechanism, and placing the received second substrate on the spacer member. | 09-13-2012 |
20120230808 | SUBSTRATE TRANSPORT APPARATUS, SUBSTRATE TRANSPORT METHOD, AND RECORDING MEDIUM - A substrate transport apparatus includes a first fork which is disposed to be movable in a forward/backward direction to a substrate holding part to transport a stacked member to or receive the stacked member from the substrate holding part. A second fork is arranged to be reversible and disposed above the first fork to be movable in a forward/backward direction to an accommodating part that accommodates substrates and spacer members to transport a substrate or a spacer member between the accommodating part and the first fork. A first grip module is disposed on a first surface of the second fork to hold and support the substrate from an upward direction. A second grip module is disposed on the first surface of the second fork on the same side as the first grip module to hold and support the spacer member from an upward direction. | 09-13-2012 |
20140064885 | COVER OPENING/CLOSING APPARATUS, THERMAL PROCESSING APPARATUS USING THE SAME, AND COVER OPENING/CLOSING METHOD - Provided is a cover opening/closing apparatus which includes: a wafer conveyance port having an opening edge and configured to be opened/closed by an opening/closing door; and a cover removal apparatus installed on the opening/closing door and configured to remove a cover of a FOUP which is formed with a substrate outlet having a opening edge. When the cover removal apparatus removes the cover of the FOUP, the opening edge of the substrate outlet is closely contacted with the opening edge of the wafer conveyance port. The cover removal apparatus includes: a latch key which is engaged with the cover of the FOUP, a driving unit configured to drive the latch key, and an accommodation unit configured to accommodate the driving unit. The cover opening/closing apparatus further includes an exhaust system configured to exhaust a space within the accommodation unit. | 03-06-2014 |
20140086712 | TRANSPORTNG APPARATUS AND PROCESSING APPARATUS - Provided is a transporting apparatus which suppresses wafers accommodated therein from being contaminated by particles existing inside the transporting apparatus even when wafers charged with electricity are accommodated in the accommodating apparatus. The transporting apparatus includes: a holding table including a first positioning pin that positions an article to be transported and configured to transfer an object to be processed which is accommodated in the article; an arm unit configured to grasp the article so as to dispose the article on the holding table; and a support unit configured to fix the article disposed on the holding table. In particular, at least one of the first positioning pin, the arm unit, and the support unit includes a ground element. | 03-27-2014 |
20140213068 | FILM DEPOSITION APPARATUS AND FILM DEPOSITION METHOD - A film deposition apparatus includes a separation member that extends to cover a rotation center of the turntable and two different points on a circumference of the turntable above the turntable, thereby separating the inside of the chamber into a first area and a second area; a first reaction gas supplying portion that supplies a first reaction gas toward the turntable in the first area; a second reaction gas supplying portion that supplies a second reaction gas toward the turntable in the second area; a first evacuation port that evacuates the first reaction gas and the first separation gas that converges with the first reaction gas; and a second evacuation port that evacuates the second reaction gas and the first separation gas that converges with the second reaction gas. The separation member has a bent portion that substantially fills in a gap between the turntable and the chamber. | 07-31-2014 |
20140284321 | MAGNETIC ANNEALING APPARATUS - Disclosed is a magnetic annealing apparatus which performs a magnetic annealing on workpieces held in a workpiece boat by using a horizontal superconducting magnet as a magnetic field generating unit. The magnetic annealing apparatus includes a carrier configured to accommodate the workpieces before the magnetic annealing process; and a workpiece conveyance mechanism configured to convey the workpieces held in the carrier to the workpiece boat. The workpiece conveyance mechanism is capable of holding the workpieces in either a horizontal state or in a horizontal state. | 09-25-2014 |
20140287926 | MAGNETIC ANNEALING APPARATUS - Disclosed is a magnetic annealing apparatus including a carrier conveyance region and a workpiece conveyance region. The carrier conveyance region includes: a first mounting table where a carrier is disposed; second mounting tables where carriers are disposed to convey workpieces from the carrier conveyance region to the workpiece conveyance region; a storage unit that stores carriers; and a carrier conveyance mechanism that performs carrying-out/carrying-in of the carriers. The workpiece conveyance region includes: an aligner device that aligns workpieces; a workpiece boat that holds plural groups of workpieces; a workpiece conveyance mechanism that conveys the workpieces from the carriers disposed on the second mounting tables to the workpiece boat via the aligner device; a heating unit that heats the workpieces; a magnetic field generating unit that applies a magnetic field to the workpieces; and a transfer mechanism that transfers the workpieces held by the workpiece boat into the magnetic field generating unit. | 09-25-2014 |
20140305540 | METHOD FOR MANAGING ATMOSPHERE IN STORAGE CONTAINER - A method for managing an atmosphere in a storage container in a processing apparatus including a substrate transfer region and a container transfer region which are partitioned by a partition wall; a load port; a container keeping rack; and a cover opening/closing mechanism, includes substituting the internal atmosphere of the storage container that stores non-processed substrates with the inert gas for using the cover opening/closing mechanism; transferring the storage container of which the internal atmosphere has been substituted with the inert gas, to the container keeping rack and placing and keeping the storage container on the container keeping rack; and putting the storage container on standby on the container keeping rack while maintaining the atmosphere substituted with the inert gas. | 10-16-2014 |
Patent application number | Description | Published |
20090267714 | SWITCH-STATE MONITORING DEVICE - Provision is made for a switch-state monitoring device that not only monitors the state of a switch but also prevents a motor burnout. A switch-state monitoring device for a switch that opens and closes a main circuit by use of a motor is provided with an operating time measuring unit for detecting an operating time for the motor when the switch is opened or closed; a first determination unit for comparing an operating time for the motor detected by the operating time measuring unit with an continuous-operating-capable setting time for the motor and determining whether or not the operating time for the motor has exceeded the continuous-operating-capable setting time; a protection device for halting energization of the motor in the case where, based on an output of the first determination unit, it is determined that the operating time for the motor has exceeded the continuous-operating-capable setting time. | 10-29-2009 |
20090275172 | STACKING SEMICONDUCTOR DEVICE AND PRODUCTION METHOD THEREOF - In a stacking semiconductor device in which a first-layer and a second-layer semiconductor devices are stacked and bonded with a solder, warpage occurs due to a difference in thermal expansion coefficient of constituent members or a difference in elastic modulus of individual members. Therefore, between the first-layer and the second-layer semiconductor devices are provided an external connection terminal of solder and a thermosetting resin, and the stacking semiconductor device is heated at 150 to 180° C., which are the temperatures of preheating for reflow of the solder, for 30 to 90 seconds. Thereby the warpage of the first-layer semiconductor device is reduced and the thermosetting resin is cured completely in this state. Then, the temperature is raised to a reflow temperature of the solder and solder bonding using the external connection terminal is performed. Thereby, the bonding reliability of a solder-bonded portion of the stacking semiconductor device is considerably improved. | 11-05-2009 |
20110084405 | STACKING SEMICONDUCTOR DEVICE AND PRODUCTION METHOD THEREOF - In a stacking semiconductor device in which a first-layer and a second-layer semiconductor devices are stacked and bonded with a solder, warpage occurs due to a difference in thermal expansion coefficient of constituent members or a difference in elastic modulus of individual members. Therefore, between the first-layer and the second-layer semiconductor devices are provided an external connection terminal of solder and a thermosetting resin, and the stacking semiconductor device is heated at 150 to 180° C., which are the temperatures of preheating for reflow of the solder, for 30 to 90 seconds. Thereby the warpage of the first-layer semiconductor device is reduced and the thermosetting resin is cured completely in this state. Then, the temperature is raised to a reflow temperature of the solder and solder bonding using the external connection terminal is performed. Thereby, the bonding reliability of a solder-bonded portion of the stacking semiconductor device is considerably improved. | 04-14-2011 |
20110267734 | SWITCHGEAR OPERATING APPARATUS AND THREE-PHASE SWITCHGEAR - A switchgear operating apparatus provided with an electronic switching device ( | 11-03-2011 |
20120138581 | GAS-TURBINE-STATOR-VANE INSERT REMOVING DEVICE AND METHOD OF REMOVING GAS-TURBINE-STATOR-VANE INSERT - In a gas-turbine-stator-vane insert removing device with which welding metal that connects an insert collar, which protrudes outward from an outer circumferential surface of an insert, and a stator-vane-outer-shroud non-gas path surface, which surrounds the periphery of the insert collar, is removed by means of an arc discharge repeated at a short cycle between an electrode and a gas-turbine stator vane, a bottom surface of the electrode has the same plan-view shape as a plan-view shape of the welding metal. | 06-07-2012 |
20120320489 | SURGE ABSORBING CIRCUIT AND ELECTRIC DEVICE USING THE SAME - A surge absorbing circuit capable of absorbing surge stably without affecting a signal on a signal line even in the case of a high frequency signal, and an electronic device using the surge absorbing circuit. The surge absorbing circuit includes at least one surge suppression circuit, the at least one surge suppression circuit including, with respect to the same signal line at least: a power supply; a diode connected between the signal line and the power supply; and a power supply line for connecting the diode and the power supply to each other. In each of the at least one surge suppression circuit, a direction of the diode and a voltage of the power supply with respect to the signal line are determined so that the diode is reversely biased. | 12-20-2012 |
Patent application number | Description | Published |
20090081887 | Heat treatment method and heat treatment apparatus - The number of substrates held by a substrate holder is increased compared with conventional techniques while uniformity of a heat treatment is ensured. The substrate holder holds a plurality of substrates at predetermined vertical intervals. The substrate holder is carried into a heat treating furnace. A predetermined heat treatment is performed on the substrates. The substrate holder has two holder constituting bodies. Each of the holder constituting bodies has a plurality of columns and substrate holding sections. The columns are arranged on the circumference of the same imaginary circle. The substrate holding sections hold circumferential portions of the respective substrates. One of the holder constituting bodies holds the substrates under the condition that front surfaces of the substrates face upward, while the other of the holder constituting bodies holds the substrates under the condition that back surfaces of the substrates face upward. The substrate with the front surface facing upward and the substrate with the back surface facing upward are alternately arranged in a vertical direction. At least one of the holder constituting bodies moves in the vertical direction to change the positions of the holder constituting bodies relative to each other. A distance between one of a first pair of substrates that are vertically adjacent to each other and have the respective front surfaces facing each other and the other of the first pair of substrates is set to ensure uniformity of the treatment and larger than a distance between one of a second pair of substrates that are vertically adjacent to each other and have the respective back surfaces facing each other and the other of the second pair of substrates. | 03-26-2009 |
20090092468 | Inlet port mechanism for introducing object and treatment system - An inlet port mechanism for an object to be treated is provided to quickly and smoothly replace an atmosphere in a storage container body with an inert gas without shifting of the position of the object to be treated. The inlet port mechanism has a partition wall, a stage, an opening/closing door mechanism, a lid opening/closing mechanism, a gas injection unit, and an exhaust unit. The partition wall partitions a space into a container transfer area and an object transfer area and has an opening gate. The storage container body storing the object is placed on the stage. The opening/closing door mechanism has an opening/closing door that serves to open and close the opening gate. The lid opening/closing mechanism is provided with the opening gate and serves to open and close an opening/closing lid of the storage container body. The gas injection unit extends along an inner periphery of the opening gate to inject an inert gas into the storage container body and has a porous gas injection tube made of a porous material and having a cylindrical shape. The exhaust unit has an exhaust port for exhausting an atmosphere that is present in the storage container body and purged by the inert gas. | 04-09-2009 |
20100055347 | ACTIVATED GAS INJECTOR, FILM DEPOSITION APPARATUS, AND FILM DEPOSITION METHOD - An activated gas injector includes a flow passage defining member partitioned into a gas activation passage and a gas introduction passage by a partition wall; a gas introduction port through which a process gas is introduced into the gas introduction passage; a pair of electrodes to be supplied with electrical power to activate the process gas, wherein the electrodes extend along the partition wall in the gas activation passage; through-holes formed in the partition wall and arranged along a longitudinal direction of the electrodes, wherein the through-holes allow the process gas to flow from the gas introduction passage to the gas activation passage; and gas ejection holes provided in the gas activation passage along the longitudinal direction of the electrodes, wherein the gas ejection holes allow the process gas activated in the gas activation passage to be ejected therefrom. | 03-04-2010 |
20100068383 | FILM DEPOSITION APPARATUS, FILM DEPOSITION METHOD, AND COMPUTER READABLE STORAGE MEDIUM - A deposition apparatus includes plural first plate members arranged within a hermetically-sealable cylindrical chamber, wherein the plural first plate members each having an opening are arranged in a first direction along a center axis of the chamber with a first clearance therebetween; and plural second plate members arranged in the first direction with the first clearance therebetween, the plural second plate members being reciprocally movable through the openings of the plural first plate members. A first pair of first plate members among the plural first plate members provides a first passage for a first gas flowing in a second direction toward an inner circumferential surface of the chamber. A second pair of first plate members among the plural first plate members provides a second passage for a second gas flowing in the second direction. A pair of second plate members among the plural second plate members supports a wafer. | 03-18-2010 |
20100116210 | GAS INJECTOR AND FILM DEPOSITION APPARATUS - An injector body of a gas injector has a gas inlet and a gas passage; plural gas outflow openings disposed on a wall part of the injector body along a longitudinal direction of the injector body; and a guide member that provides a slit-shaped gas discharge opening extending in the longitudinal direction of the injector body on an outer surface of the injector body, and guides gas flowing from the gas outflow openings to the gas discharge opening. | 05-13-2010 |
20110162633 | HEAT TREATMENT METHOD AND HEAT TREATMENT APPARATUS - A heat treatment apparatus has a substrate holder with two holder constituting bodies that each have a plurality of columns and substrate holding sections. One of the holder constituting bodies holds substrates so that their front surfaces face upward, while the other holds the substrates so that their back surfaces face upward. At least one of the holder constituting bodies moves vertically to change the positions of the holder constituting bodies relative to each other. A distance between one of a first pair of vertically-adjacent substrates with respective front surfaces facing each other and the other of the first pair of substrates is set to ensure treatment uniformity and to be larger than a distance between one of a second pair of vertically-adjacent substrates with their respective back surfaces facing each other and the other of the second pair of substrates. | 07-07-2011 |
20120315114 | SUBSTRATE CONVEYING CONTAINER OPENING/CLOSING DEVICE, LID OPENING/CLOSING DEVICE AND SEMICONDUCTOR MANUFACTURING APPARATUS - A substrate conveying container opening/closing device includes an elevator carriage provided in a substrate transfer area and configured to be moved up and down by an elevator mechanism, a cover member for opening and closing an opening of a wall, a seal member for sealing a gap between the cover member and the periphery of the opening, a lid detaching/attaching mechanism provided in the cover member and configured to detach and attach the lid, a guide unit provided in the elevator carriage and configured to guide the cover member upward so that the cover member can advance from a retracting position toward the wall, a guideway provided in the wall to extend in a direction perpendicular to a seal surface of the opening, and a rotating body provided in the cover member and configured to roll downward along the guideway as the elevator carriage is moved downward. | 12-13-2012 |
20120329291 | HEAT TREATMENT METHOD AND HEAT TREATMENT APPARATUS - A substrate holder has two holder constituting bodies, each having a plurality of columns arranged on an imaginary circle, and substrate holding sections that hold circumferential portions of respective substrates. The holder constituting bodies hold the substrates so that either their front surfaces or their back surfaces face upward with a substrate having an upward facing front and a substrate having an upward facing rear being alternately arranged in a vertical direction. At least one of the holder constituting bodies moves in the vertical direction to change the positions of the holder constituting bodies relative to each other. A distance between a first pair of vertically adjacent substrates with their respective front surfaces facing each other is set to ensure treatment uniformity, and to be larger than a distance between a second pair of vertically adjacent substrates with their respective back surfaces facing each other. | 12-27-2012 |
20140079526 | SPACER, SPACER TRANSFERRING METHOD, PROCESSING METHOD AND PROCESSING APPARATUS - According to an embodiment of present disclosure, a spacer is provided. The spacer includes at least a protrusion formed to protrude from an outer periphery of the spacer. The protrusion serves to locate the spacer in place in a transfer mechanism configured to transfer the spacer when the spacer is fixed by the transfer mechanism in such a way that the protrusion comes in contact with the transfer mechanism, and configured to allow the spacer to rotate or move in case the spacer is deviated from a predetermined transfer position when the spacer is engaged with the transfer mechanism. | 03-20-2014 |
20140220503 | HEAT TREATMENT METHOD AND HEAT TREATMENT APPARATUS - A substrate holder has two holder constituting bodies, each having a plurality of columns arranged on an imaginary circle, and substrate holding sections that hold circumferential portions of respective substrates. The holder constituting bodies hold the substrates so that either their front surfaces or their back surfaces face upward with a substrate having an upward facing front and a substrate having an upward facing rear being alternately arranged in a vertical direction. At least one of the holder constituting bodies moves in the vertical direction to change the positions of the holder constituting bodies relative to each other. A distance between a first pair of vertically adjacent substrates with their respective front surfaces facing each other is set to ensure treatment uniformity, and to be larger than a distance between a second pair of vertically adjacent substrates with their respective back surfaces facing each other. | 08-07-2014 |
20140251209 | SUPPORT MEMBER AND SEMICONDUCTOR MANUFACTURING APPARATUS - A support member includes: a mounting unit having a first main surface and a second main surface, the first main surface being configured to mount a first object to be processed thereon and the second main surface being configured to mount a second object to be processed thereon; and a wall installed in a part of the outer peripheral portion along the outer periphery of the mounting unit, the wall having a first portion protruding in a vertical direction than the first object to be processed mounted on the first main surface of the mounting unit. The inner peripheral surface of the first portion of the wall is formed in a first shape that allows the first object to be processed to be held by the first portion of the wall. | 09-11-2014 |
Patent application number | Description | Published |
20090010668 | IMAGE FORMING APPARATUS - An image forming apparatus includes a black image forming unit that can be used in a black monochrome mode to form supply toner images corresponding to color patches and cause the supply toner images to be carried by an intermediate transfer belt. During the black monochrome mode, a fur brush comes into contact with the supply toner images, so that discharge products are removed from the fur brush. Thus, when the black monochrome mode ends and a full-color mode is returned, the color patches transferred to a secondary transfer roller can be sufficiently removed by single passage and no backside contamination of a recording material occurs. | 01-08-2009 |
20100080591 | IMAGE FORMING APPARATUS - An image forming apparatus includes a rotatable image bearing member on which a toner image is to be formed; a transferring device for transferring the toner image onto a transfer material at a transfer position; a separating member, disposed downstream of the transfer position with respect to a rotational direction of the image bearing member so as to contact the image bearing member, for separating the transfer material from the image bearing member; a density detecting device, disposed downstream of the transfer position with respect to the rotational direction of the image bearing member, for detecting a density of an image for density detection formed on the image bearing member; and an air moving device for moving air in the image forming apparatus in a direction of a rotation shaft of the image bearing member; wherein the density detecting device is disposed upstream of the separating member with respect to a direction of air movement by the air moving device. | 04-01-2010 |
20110182630 | IMAGE FORMING APPARATUS - An outer diameter of a transfer counter roller is made larger than that of a transfer roller to reduce an electrical discharge phenomenon and influence on a toner image. | 07-28-2011 |
20120282001 | IMAGE FORMING APPARATUS - A first transfer inner roller and a first transfer outer roller are arranged such that the leading edge of a recording material is pressed against an intermediate transfer member on the downstream side of an upstream side transfer portion to change a traveling direction of the recording material. | 11-08-2012 |
20130149013 | IMAGE FORMING APPARATUS - In an image forming apparatus, a voltage applied to a pre-transfer charger is set to the highest voltage, and is then reduced at a position corresponding to a predetermined range from a leading edge of a recording material, to suppress a phenomenon of backward scattering of toner formed just before entering a transfer nip, when a burr formed on the leading edge of the recording material exits the transfer nip. | 06-13-2013 |
20130322901 | IMAGE FORMING APPARATUS - A toner image for measurement of an area coverage modulation of 90% or more is formed on a photosensitive drum in a non-image formation, and a setting condition for defining a developability of a toner image in an image formation is set so that a detection result of an optical sensor detecting the toner image for measurement becomes a preset target value. The target value is set to be lower as a value of the setting condition increases from a lower side to a higher side of the developability. The target value is set so that a color difference ΔE of an image having half the maximum image density obtained after the setting condition is set with respect to an image having half the maximum image density obtained after the setting condition is set in a setting mode with use of unused developer is 6.5 or less. | 12-05-2013 |
20130336681 | IMAGE FORMING APPARATUS - An image forming apparatus comprising an image carrying member for carrying a toner image; a intermediary member for carrying the toner image transferred from said image carrying member; a first transfer member for transferring the toner image from said intermediary member onto a sheet, said first transfer member having first resistance and being contacted to said intermediary member; a second transfer member for transferring the toner image from said intermediary member onto the sheet, said second transfer member having second resistance higher than the first resistance and being contacted to said intermediary member at a position downstream of said first transfer member; and voltage applying means, connected to both of said first transfer member and said second transfer member, for applying the same voltage to said first transfer member and to said second transfer member to transfer the toner image onto the sheet. | 12-19-2013 |
Patent application number | Description | Published |
20090263660 | SURFACE-TREATED POWDER AND COSMETICS CONTAINING SAME - By coating the surface of a powder comprising a silicone resin and/or an organic powder with a specific hydrophilizing agent, such powder is hydrophilized. The hydrophilizing agent includes water-soluble polyoxyalkylene glycol derivatives. The organic powder is at least one selected from PMMA, nylon, polyester, polystyrene, cellulose, silicone elastomer powder, silicone rubber powder, benzoguanamine, styrenedivinylbenzene pinhole polymer, ethylene tetrafluoride, polyethylene powder, polypropylene powder, polyurethane powder, silk powder, metal soap powder, starch powder, N-acylated lysine, an organic pigment, and a composite of at least one of these organic powders described above with a metal oxide and/or a metal hydroxide. Such coated (treated) powder has extremely great dispersibility (ease of dispersion) and very good dispersion stability (long-term dispersion stability with lapse of time) in aqueous dispersion media, particularly under acidic and alkaline conditions, specifically at pH 3 through 13. Using the surface-treated powder, additionally, a dispersion with good dispersibility (ease of dispersion) and great dispersion stability, preferably for cosmetics can be provided. The use of the surface-treated powder, or the use of the dispersion can provide further a cosmetic excellent in dispersibility and dispersion stability and further in re-dispersibility and dispersion stability with lapse of time and smooth feeling as compared to the related art when selecting aqueous cosmetic as an agent form. | 10-22-2009 |
20110110995 | SURFACE-TREATED POWDER AND COSMETIC COMPRISING THE SAME - Provided is a surface-treated powder having excellent usability and adhesion to skin. The powder is coated with a surface-treating agent including (a) a fluorine-containing monomer of a general formula (I) and (b) an alkoxy group-containing monomer of a general formula (II). The powder is used for various cosmetics. | 05-12-2011 |