Ouattara
Sofïane Ouattara, Courbevoie FR
Patent application number | Description | Published |
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20140057991 | Cosmetic composition comprising 4-(3-ethoxy-4-hydroxyphenyl)-2-butanone - The invention relates to a composition comprising, in a physiologically acceptable aqueous medium, 4-(3-ethoxy-4-hydroxyphenyl)-2-butanone and a solvent with solubility parameters in the Hansen solubility space such that 4.5<δ, <30 and 15<δ | 02-27-2014 |
20140057997 | COSMETIC COMPOSITION COMPRISING 4-(3-ETHOXY-4-HYDROXYPHENYL)-2-BUTANONE AND A LIPOPHILIC SOLVENT - The invention relates to a composition comprising, in a physiologically acceptable oily medium, 4-(3-ethoxy-4-hydroxyphenyl)-2-butanone and a solvent with solubility parameters in the Hansen solubility space such that 4.5<δ | 02-27-2014 |
Tantiboro Ouattara, Eureka, MO US
Patent application number | Description | Published |
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20120308835 | FLUORINATED POLYIMIDES WITH FLUORENE CARDO STRUCTURE AS OPTICAL MATERIALS THAT HAVE LOW ABSOLUTE THERMO-OPTIC COEFFICIENTS - The present invention provides new polyimide materials suitable for use in optically transparent fiber composites, ribbon composites, and optical communications applications. The polyimide compounds include monomeric repeat units comprising a fluorinated moiety and a fluorene cardo structure. The polyimides exhibit good optical transparency and have a low absolute thermo-optic coefficient (|dn/dT|). | 12-06-2012 |
20130011630 | METAL-OXIDE FILMS FROM SMALL MOLECULES FOR LITHOGRAPHIC APPLICATIONS - Metal-oxide films for lithographic applications are provided. The films are formed from compositions comprising metal-oxide precursor compounds including metals and metalloids other than silicon. These films are easily produced and can be modified with a variety of ligands, including alkoxides, phenoxides, carboxylates, beta-diketones, and beta-ketoesters. | 01-10-2013 |
20130129995 | ASSIST LAYERS FOR EUV LITHOGRAPHY - The present invention provides novel methods of fabricating microelectronics structures, and the resulting structures formed thereby, using EUV lithographic processes. The method involves utilizing an assist layer immediately below the photoresist layer. The assist layer can either be directly applied to the substrate, or it can be applied to any intermediate layer(s) that may be applied to the substrate. The preferred assist layers are formed from spin-coatable, polymeric compositions. The inventive method allows reduced critical dimensions to be achieved with improved dose-to-size ratios, while improving adhesion and reducing or eliminating pattern collapse issues. | 05-23-2013 |
Tantiboro S. Ouattara, Racine, WI US
Patent application number | Description | Published |
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20090048143 | Hard surface cleaner with extended residual cleaning benefit - A cleaning composition for a hard surface is disclosed which provides for initial cleaning of the hard surface and provision of a hydrophilic coating or barrier layer on the surface which provides residual cleaning to the hard surface for an extended number of rinsings. The composition includes a hydrophilic polymer, at least one nonionic surfactant, at least one solvent, an acid and water, wherein the acid provides the composition with a pH of about 2 to 3.5 and the composition is provided in the absence of any anionic, cationic or amphoteric surfactant. | 02-19-2009 |
20100234268 | Hard surface cleaner with extended residual cleaning benefit - A cleaning composition for a hard surface is disclosed which provides for initial cleaning of the hard surface and provision of a hydrophilic coating or barrier layer on the surface which provides residual cleaning to the hard surface for an extended number of rinsings. The composition includes a hydrophilic polymer, at least one nonionic surfactant, at least one solvent, an acid and water, wherein the acid provides the composition with a pH of about 2 to 3.5 and the composition is provided in the absence of any anionic, cationic or amphoteric surfactant. | 09-16-2010 |