Patent application number | Description | Published |
20140016111 | EXPOSURE APPARATUS, CALIBRATION METHOD, AND METHOD OF MANUFACTURING ARTICLE - The present invention provides an exposure apparatus which exposes a substrate to light, the apparatus comprising a substrate stage, a position measurement unit configured to measure a position of the substrate stage, a structure configured to support the position measurement unit, a force measurement unit configured to measure a force that acts on the structure, a correction unit configured to correct a command for controlling the position of the substrate stage, based on the measurement value obtained by the force measurement unit, and a correction coefficient, and a calculation unit configured to calculate the correction coefficient based on position deviation information between adjacent shot regions in an evaluation substrate including a plurality of shot regions exposed without correction by the correction unit, and the measurement value obtained by the force measurement unit in exposing each shot region. | 01-16-2014 |
20140104590 | EXPOSURE APPARATUS AND METHOD OF MANUFACTURING DEVICE - The present invention provides an exposure apparatus including a stage control system configured to control a stage for holding a substrate in accordance with a command value, a specifying unit configured to specify an exposure start time at which exposure on the substrate starts upon detecting exposure light illuminated on the substrate, and a main control system configured to calculate positions of the stage at a plurality of times in an exposure period for the substrate based on position information of the stage at an exposure start time specified by the specifying unit, obtain an average position of the stage in at least a partial period in the exposure period from the calculated positions of the stage at the plurality of times, and give a command value for matching the average position of the stage with a target position to the stage control system. | 04-17-2014 |
Patent application number | Description | Published |
20090040482 | EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD - An exposure apparatus projects a pattern of an original onto a substrate through a projection optical system and a liquid. The exposure apparatus includes a supply unit adapted to supply liquid to a space between the projection optical system and a substrate, a suction unit adapted to suck a fluid in the space, and a fluid sensor that detects a change in the kind of fluid being sucked by the suction unit, and a controller configured to control the operating state of the suction unit in response to the detection by the fluid sensor of the change in kind of the fluid being sucked by the suction unit. | 02-12-2009 |
20090153812 | POSITIONING APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD - A positioning apparatus includes a movable member, a support member which supports the movable member, a driving mechanism which moves the movable member supported by the support member, a first temperature regulating unit which regulates the temperature of the driving mechanism, and a second temperature regulating unit which regulates the temperature of the support member on the basis of the information provided from the first temperature regulating unit. | 06-18-2009 |
20100004796 | TEMPERATURE REGULATING APPARATUS, EXPOSURE SYSTEM, AND DEVICE MANUFACTURING METHOD - A temperature regulating apparatus which regulates temperature includes a heater, a temperature detector configured to detect temperature, a calculator configured to calculate a manipulated value based on an error between a target temperature and the temperature detected by the temperature detector, and a power controller configured to supply power, having one of a voltage and current controlled in accordance with the manipulated value, to the heater. The calculator includes a first calculator having at least a proportional element of the proportional element, an integral element, and a derivative element, and a second calculator configured to calculate a square root. The first calculator and the second calculator are coupled in series with each other. | 01-07-2010 |
20100099050 | LIQUID RECOVERY APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD - A liquid recovery apparatus of the present invention is a liquid recovery apparatus | 04-22-2010 |
20100273114 | DEVICE MANUFACTURING APPARATUS AND METHOD OF MANUFACTURING DEVICE - A device manufacturing apparatus includes a driving unit configured to perform driving for processing an object, a conduit through which a coolant that recovers heat generated by the driving unit flows, a cooler configure to cool the coolant that flows through the conduit, a heater configured to heat the coolant cooled by the cooler so that the driving unit cooled by the heated coolant has a target temperature, and a controller configured to heighten a target temperature of the coolant cooled by the cooler, if it is determined, based on control information to control the driving unit, that a heat amount to be generated by the driving unit decreases. | 10-28-2010 |
20110059621 | DEVICE MANUFACTURING APPARATUS AND DEVICE MANUFACTURING METHOD - An apparatus for manufacturing a device comprises a temperature regulator configured to regulate a temperature of a component associated with manufacture of the device, a controller configured to control the temperature regulator, and a console configured to send command information to the controller upon receiving an input regarding an operation of the temperature regulator, the command information including a command for causing the temperature regulator to operate in an electric power saving mode, and a parameter which specifies a detail of the electric power saving mode. | 03-10-2011 |