Patent application number | Description | Published |
20120146307 | MULTIPLE RIDE HEIGHT CONTROL APPARATUS FOR AIR SUSPENSION - A multiple ride height control apparatus for an air suspension system having an air spring to be installed between a frame/body and a suspension arm in order to adjust the ride height, by filling and exhausting a compressed air, said apparatus comprises a mechanical leveling valve for controlling a filling and exhausting said compressed air by adjusting its mounting angle, being rotated clockwise and counterclockwise; and a valve driver for rotating said mechanical leveling valve to the direction of filling and exhausting said compressed air; and a controller for controlling the operation of said valve driver. | 06-14-2012 |
20140009461 | Method and Device for Movement of Objects in a Stereoscopic Display - Disclosed is a method of manipulating viewable objects that includes providing a touch screen display capable of stereoscopic displaying of object images, wherein a zero-plane reference is positioned substantially coincident with the physical surface of the display, displaying on the touch screen a first object image and one or more second object images, wherein the object images are displayed to appear at least one of in front of, at, or behind the zero-plane, receiving a first input at the touch screen at a location substantially corresponding to an apparent position of the first object image, and modifying the displaying on the touch screen so that at least one of the first object image and the one or more second object images appear to move towards one of outward in front of the touch screen or inward behind the touch screen in a stereoscopic manner. | 01-09-2014 |
20140121530 | APPARATUS AND METHOD FOR MEASURING GANGLION CELLS - An apparatus for measuring ganglion cells may include: a light generation unit configured to irradiate a first light signal polarized in a first direction and a second light signal polarized in a second direction perpendicular to the first direction to a subject; a reflected light processing unit configured to generate an amplification signal corresponding to an image of the subject using a first reflection signal, which is the first light signal reflected from the subject, and a second reflection signal, which is the second light signal reflected from the subject; and an image processing unit configured to measure ganglion cells in the subject using the amplification signal. The apparatus may be used to count the number of normal ganglion cells in the retina by measuring a phase difference of two lights polarized in different directions. The apparatus may also be used to monitor the progress of glaucoma. | 05-01-2014 |
Patent application number | Description | Published |
20080269375 | POLYAMIDE RESIN COMPOSITION AND METHOD OF PREPARING SAME - The present invention relates to a polyamide resin composition and, more particularly, to a polyamide resin composition for an automobile radiator, prepared by mixing a polyamide resin, prepared by mixing a polyamide 66 resin having excellent mechanical strength and heat resistance with a polyamide 612 resin having excellent chemical resistance, a glycidyl reactive compatibilizer, glass fiber coated with a silane-based coupling agent, amine and silane-based crosslinking agents, phenol- and phosphate-based antioxidants, an imide hydrolysis resistance agent, and a montan-based lubricant in a predetermined ratio, thus improving heat resistance and chemical resistance simultaneously and maintaining equivalent properties to those of conventional polyamide resin compositions. | 10-30-2008 |
20140120905 | METHOD FOR MOBILE-KEY SERVICE - Disclosed is a method for mobile-key service, in which user authentication is performed through NFC between an SE and a door lock. Herein, a mobile phone periodically checks a call service areas of a mobile radio communication network, and the mobile phone enables the NFC function based on a result of the call service area checking operation, and if the mobile phone approaches the door lock, the mobile-key is transmitted to the door lock through the NFC function, and thus the user authentication can be performed. | 05-01-2014 |
Patent application number | Description | Published |
20130259755 | EXHAUST GAS PURIFICATION SYSTEM - The present invention relates to a technology of reducing nitrogen oxide (NOx) which is harmful discharge gas discharged from an internal combustion engine or a combustor, and to an exhaust gas purification system which inputs solid ammonium salt such as ammonium carbamate or ammonium carbonate into a reactor, thermally decomposes and converts the solid ammonium salt into the ammonia by using engine cooling water, exhaust gas, or an electric heater, which are installed in the reactor, and reduces the nitrogen oxide included in the exhaust pipe on a selective catalytic reduction into nitrogen by injecting the ammonia by using a pressure regulator and a dosing valve. | 10-03-2013 |
20150035481 | NON-CONTACT POWER TRANSMISSION DEVICE, MAGNETIC INDUCTION-TYPE POWER SUPPLY DEVICE, MAGNETIC INDUCTION-TYPE POWER COLLECTOR, AND MOVING OBJECT USING SAME - Embodiments of the present invention relate to a non-contact power transmission device, a magnetic induction-type power supply device, a magnetic induction-type power collector, and a moving object using same. Embodiments of the present invention provide a non-contact power transmission device, a magnetic induction-type power supply device, a magnetic induction-type power collector, and a moving object using same, the non-contact power transmission device comprising: a power collector having a power collector core, and a boob power collector cable that winds around the power collector core; and a power supply unit comprising a power supply core having a holder section and protrusions on the center portion of the holder section and around the perimeter of the holder section, and a power supply cable wound in such a manner that electric currents flow in two different directions with respect to the protruding center portion, wherein the power collector is located in the opposite direction from the protruding portion. | 02-05-2015 |
Patent application number | Description | Published |
20090026169 | Printed circuit board manufacturing system and manufacturing method thereof - A printed circuit board manufacturing system and a manufacturing method thereof are disclosed. A method of manufacturing printed circuit board, comprising: providing a substrate that comprises a pad and an insulation layer covering the pad; acquiring an image of the substrate; acquiring location information of the pad by analyzing the image of the substrate; forming a via hole by removing a part of the insulation layer that corresponds the location information of the pad; and forming a via by filling the via hole with a conductive material, provides improved process conformity, even if the substrate has partial or nonlinear deformation, by considering the location information of the pad in the via hole forming. The improved conformity may allow more flexibility to substrate design and more integrity for circuitries on printed circuit board. | 01-29-2009 |
20090087950 | Wafer packaging method - A wafer packaging method is disclosed. | 04-02-2009 |
20100006446 | Method for manufacturing package on package with cavity - A method for manufacturing a printed circuit board with an inner via hole, the method including applying a first current to both surfaces of a core layer having the inner via hole, so that a first plating layer grows centerwardly in an equal rate from all the directions of an inner wall of the inner via hole to close one entrance of the inner via hole, leaving a remaining space the inner via hole unfilled; and applying a second current to fill the remaining space of the inner via hole. Also, the manufacturing method does not require filling an inner via hole with an insulating ink, and forming a conductive layer on the insulating ink. Therefore, the method increases productive capacity and reduces manufacturing cost by simplifying the manufacturing process and reducing the lead time. | 01-14-2010 |
20100270067 | PRINTED CIRCUIT BOARD AND METHOD OF MANUFACTURING THE SAME - A printed circuit board and a method of manufacturing the printed circuit board are disclosed. In accordance with an embodiment of the present invention, the method includes providing a substrate having a pad formed thereon, forming a resist on the substrate, in which the resist has an opening formed therein such that the pad is exposed, forming a metal post inside the opening such that the metal post is electrically connected to the pad, forming a through-hole in the resist by removing a portion of the resist such that the through-hole surrounds the metal post, and forming a solder layer inside the through-hole and on an upper surface of the metal post so as to cover an exposed surface of the metal post. | 10-28-2010 |
20110138616 | Printed circuit board manufacturing system - A printed circuit board manufacturing system that uses a substrate that includes a pad and an insulation layer covering the pad. The system includes an image sensor part acquiring an image of the substrate, a control part generating a control signal to form a via hole, and a laser applying part applying a laser, considering the control signal, to the part of the insulation layer that corresponds to the location information of the pad. | 06-16-2011 |
Patent application number | Description | Published |
20110006281 | SEMICONDUCTOR NANOCRYSTAL AND PREPARATION METHOD THEREOF - A semiconductor nanocrystal and a preparation method thereof, where the semiconductor nanocrystal include a bare semiconductor nanocrystal and a water molecule directly bound to the bare semiconductor nanocrystal. | 01-13-2011 |
20110006321 | COMPOSITION FOR LIGHT EMITTING BODY-POLYMER COMPOSITE, LIGHT EMITTING BODY-POLYMER COMPOSITE, AND LIGHT EMITTING DEVICE INCLUDING THE LIGHT EMITTING BODY-POLYMER COMPOSITE - A composition for a light emitting body-polymer composite, the composition including a light emitting body; and a cross-linkable composition including a monomer represented by Chemical Formula 1. | 01-13-2011 |
20110084250 | NANOPARTICLE COMPLEX, METHOD OF MANUFACTURING THE SAME, AND DEVICE INCLUDING THE NANOPARTICLE COMPLEX - A nanoparticle complex, including a semiconductor nanocrystal; and a metal complex ligand on the surface of the semiconductor nanocrystal. The nanoparticle complex may further include a polymer shell contacting the metal complex ligand. | 04-14-2011 |
20110240931 | NANOPARTICLE-RESIN COMPOSITION, NANOPARTICLE-RESIN COMPOSITE, AND METHOD OF MAKING NANOPARTICLE-RESIN COMPOSITE - A nanoparticle-resin composition includes a nanoparticle, a silicone resin having a reactive functional group at its terminal end, and a compound selected from a silane group-containing compound, a silazane compound, or a combination including at least one of the foregoing. In addition, a nanoparticle-resin composite includes a silicone resin matrix including the cure product of a silicone resin having a reactive functional group at its terminal end, a plurality of nanoparticle clusters dispersed in the silicone resin matrix, and a buffer layer encapsulating the nanoparticle cluster. The buffer layer includes a compound selected from a silane group-containing compound, a silazane compound, or a combination including at least one of the foregoing compounds. | 10-06-2011 |
20110241044 | LIQUID CRYSTAL DISPLAY DEVICE INCLUDING WHITE LIGHT EMITTING DIODE - A white light emitting diode and a liquid crystal display device that realizes images using the white light are provided. The white light emitting diode includes a blue light emitting diode (“LED”) light source, and a light conversion layer which converts incident light from the LED light source into white light. The light conversion layer includes green light emitting semiconductor nanocrystal and red light emitting semiconductor nanocrystal. A light emitting peak wavelength of the green light emitting semiconductor nanocrystal is about 520 nanometer (nm) or more, a light emitting peak wavelength of the red semiconductor nanocrystal is about 610 nanometer (nm) or more, and full width at half maximums (FWHMs) of light emitting peaks of the green and red light emitting semiconductor nanocrystals are about 45 nanometer (nm) or less. | 10-06-2011 |
Patent application number | Description | Published |
20090102017 | SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SEMICONDUCTOR DEVICE - A semiconductor device and a method of fabricating a semiconductor device provide high quality cylindrical capacitors. The semiconductor device includes a substrate defining a cell region and a peripheral circuit region, a plurality of capacitors in the cell region, and supports for supporting lower electrodes of the capacitors. The lower electrodes are disposed in a plurality of rows each extending in a first direction. A dielectric layer is disposed on the lower electrodes, and an upper electrode is disposed on the dielectric layer. The supports are in the form of stripes extending longitudinally in the first direction and spaced from each other along a second direction. Each of the supports engages the lower electrodes of a respective plurality of adjacent rows of the lower electrodes. Each one of the supports is also disposed at a different level in the device from the support that is adjacent thereto in the second direction. | 04-23-2009 |
20090147225 | Apparatus and method for manufacturing semiconductor device - An apparatus for manufacturing a semiconductor device and a method for manufacturing a semiconductor device using the apparatus may be provided. The manufacturing apparatus may include a liquid supplying portion for forming a liquid film, and a gas supplying unit that may rotate to discharge gas at a wide range of angles. The manufacturing method may include forming a shape and size of a liquid film common to the shape and size of an exposure region through adjusting the direction and pressure in which gas may be discharged to the substrate. Thus, the speed at which a substrate may be moved may be increased, and morphology differences of a substrate may be reduced. | 06-11-2009 |
20090258473 | Nonvolatile memory device and method of manufacturing the same - Example embodiments provide a nonvolatile memory device and a method of manufacturing the same. A floating gate electrode of the nonvolatile memory device may have a cross-shaped section as taken along a direction extending along a control gate electrode. The floating gate electrode may have an inverse T-shaped section as taken along a direction extending along an active region perpendicular to the control gate electrode. The floating gate electrode may include a lower gate pattern, a middle gate pattern and an upper gate pattern sequentially disposed on a gate insulation layer, in which the middle gate pattern is larger in width than the lower gate pattern and the upper gate pattern. A boundary between the middle gate pattern and the upper gate pattern may have a rounded corner. | 10-15-2009 |
20100167214 | Method of forming fine pattern using block copolymer - A method of forming a fine pattern includes forming an organic guide layer on a substrate, forming a photoresist pattern on the organic guide layer, the photoresist pattern including a plurality of openings exposing portions of the organic guide layer, forming a material layer on the exposed portions of the organic guide layer and on the photoresist pattern, the material layer including block copolymers, and rearranging the material layer through phase separation of the block copolymers into a fine pattern layer, such that the fine pattern layer includes a plurality of first blocks and a plurality of second blocks arranged in an alternating pattern, the plurality of first blocks and the plurality of the second blocks having different repeating units of the block copolymers. | 07-01-2010 |
20100248492 | Method of forming patterns of semiconductor device - A method of forming fine patterns of a semiconductor device by using carbon (C)-containing films includes forming an etching target film on a substrate including first and second regions; forming a plurality of first C-containing film patterns on the etching target film in the first region; forming a buffer layer which covers top and side surfaces of the plurality of first C-containing film patterns; forming a second C-containing film; removing the second C-containing film in the second region; exposing the plurality of first C-containing film patterns by removing a portion of the buffer layer in the first and second regions; and etching the etching target film by using the plurality of first C-containing film patterns, and portions of the second C-containing film which remain in the first region, as an etching mask. | 09-30-2010 |
Patent application number | Description | Published |
20110053362 | METHOD OF FORMING A MASK PATTERN, METHOD OF FORMING A MINUTE PATTERN, AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE USING THE SAME - A method of forming a mask pattern, a method of forming a minute pattern, and a method of manufacturing a semiconductor device using the same, the method of forming the mask pattern including forming first mask patterns on a substrate; forming first preliminary capping layers on the first mask patterns; irradiating energy to the first preliminary capping patterns to form second preliminary capping layers ionically bonded with the first mask patterns; applying an acid to the second preliminary capping layers to form capping layers; forming a second mask layer between the capping layers, the second mask layer having a solubility lower than that of the capping layers; and removing the capping layers to form second mask patterns. | 03-03-2011 |
20110244689 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE - A method of manufacturing a semiconductor device includes forming a first mask pattern on a substrate by using a material including a polymer having a protection group de-protectable by an acid, the first mask pattern having a plurality of holes; forming a capping layer on an exposed surface of the first mask pattern, the capping layer including an acid source; diffusing the acid source into the first mask pattern so that the protection group becomes de-protectable from the polymer in the first mask pattern; forming a second mask layer on the capping layer, the second mask layer separate from the first mask pattern and filling the plurality of holes in the first mask pattern; and forming a plurality of second mask patterns in the plurality of holes by removing the capping layer and the first mask pattern. | 10-06-2011 |
20110275020 | Methods Of Forming Photoresist Patterns - Methods of forming photoresist patterns may include forming a photoresist layer on a substrate, exposing the photoresist layer using an exposure mask, forming a preliminary pattern by developing the exposed photoresist layer and treating a surface of the preliminary pattern using a treatment agent that includes a coating polymer. | 11-10-2011 |
20110320025 | METHOD OF MEASURING AN OVERLAY OF AN OBJECT - A method of measuring an overlay of an object is provided. In the method, first information of a first structure may be obtained. A preliminary structure may be formed on the first structure. Second information of the preliminary structure may be obtained. The first information and the second information may be processed to obtain virtual information of a second structure that would be formed on the first structure if a process is performed on the preliminary structure. A virtual overlay between the first structure and the second structure may be measured using the virtual information. | 12-29-2011 |
20120244476 | PHOTOLITHOGRAPHY METHOD INCLUDING TECHNIQUE OF DETERMINING DISTRIBUTION OF ENERGY OF EXPOSURE LIGHT PASSING THROUGH SLIT OF EXPOSURE APPARATUS - The energy distribution of exposure light directed passing through the slit of an exposure apparatus is determined. A photoresist layer on a substrate is exposed over a plurality of shots while changing the intensity of the exposure light for each shot. Then the photoresist layer is developed to form a sample photoresist layer. An image of the developed sample photoresist layer is analyzed for color intensity. Values of the color intensity across a selected one of the shots are correlated with values of the intensity of the exposure light to produce an energy distribution of the exposure light along the length of the slit. The energy distribution is used to change the slit so that a more desirable energy distribution may be realized when the slit is used in a process of manufacturing a semiconductor device. | 09-27-2012 |
20120257185 | APPARATUS FOR MANUFACTURING A MASK - A method of manufacturing a mask includes dividing an upper surface of a template having a design pattern into a plurality of regions, the template being arranged over a polymer layer on a mask substrate, correcting a distorted region among the regions, pressing the polymer layer with the template to form a mask pattern corresponding to the design pattern on the polymer layer; and curing the mask pattern. | 10-11-2012 |
20130101928 | PHOTOLITHOGRAPHY METHOD INCLUDING TECHNIQUE OF DETERMINING DISTRIBUTION OF ENERGY OF EXPOSURE LIGHT PASSING THROUGH SLIT OF EXPOSURE APPARATUS - The energy distribution of exposure light directed passing through the slit of an exposure apparatus is determined. A photoresist layer on a substrate is exposed over a plurality of shots while changing the intensity of the exposure light for each shot. Then the photoresist layer is developed to form a sample photoresist layer. An image of the developed sample photoresist layer is analyzed for color intensity. Values of the color intensity across a selected one of the shots are correlated with values of the intensity of the exposure light to produce an energy distribution of the exposure light along the length of the slit. The energy distribution is used to change the slit so that a more desirable energy distribution may be realized when the slit is used in a process of manufacturing a semiconductor device. | 04-25-2013 |