Kitabata
Atsushi Kitabata, Suzuka-City JP
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20090266185 | MOVABLE BODY DRIVING APPARATUS - A door driving apparatus having a motor, a sleeve formed at a drive end of a rotor of the motor, a pinion integrally fixed to a rotation shaft integrated with a spline shaft detachably fitted to the sleeve, and left and right racks disposed opposite to each other with respect to the pinion and engaged with the pinion so that the left and right racks can move in directions substantially parallel and opposite to each other. When the motor is individually removed from a rack and pinion casing, the pinion is left in the pinion and rack casing while upper and lower sides of the pinion are engaged with the right and left racks, respectively. Accordingly, the relative positions of the left and right racks are unchanged. | 10-29-2009 |
20110308164 | Side sliding door apparatus for vehicle - A side sliding door apparatus for a vehicle includes one of two sliding doors driven by an actuator, and the other moves in conjunction with the one sliding door via a direction converting mechanism. When the sliding door is in a closed condition, a latch rod is inserted into a lock hole to lock the sliding doors in the closed condition. A roller is pushed up on a cam surface when the sliding doors are opened, which releases the locking. An upper level surface of the cam surface forms an inclined surface with a downward gradient, which prevents the roller from unexpectedly going beyond the starting end of the upper level surface and dropping due to vibration or the like being applied to the slider in the unlocked condition, and prevents the locking with the locking mechanism in response to the next sliding door closing command. | 12-22-2011 |
Atsushi Kitabata, Suzuka-Shi JP
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20100212229 | Movable body driving device - A movable body driving device includes upper and lower racks movable in a lengthwise direction; a motor which can rotate forward and backward; a drive pinion fixed to a rotary shaft of the motor; and a driven pinion engaging the upper and lower racks to move linearly by the drive pinion. The driven pinion is driven to rotate by the upper or lower rack to thereby drive the lower or upper rack linearly in a direction reverse to the other rack. A sliding door is connected to the upper or lower rack and is opened or closed in accordance with forward or backward rotation of the motor. The drive pinion transmits its driving force while the rack to which the driving force is transmitted is changed from the upper rack to the lower rack or from the lower rack to the upper rack. | 08-26-2010 |
Goh Kitabata, Kanagawa JP
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20130016447 | ELECTROSTATIC DISCHARGE (ESD) PROTECTION DEVICE - An electrostatic discharge (ESD) protection device that protects a power amplifier from ESD. The ESD protection device includes a filter circuit connected to an antenna line of a wireless communication apparatus and that passes an ESD component having a predetermined frequency or less, a detection circuit that converts an output of the filter circuit into an analog DC output, a level determination circuit that detects that the analog DC output of the detection circuit is a predetermined threshold value or more, and a control interrupt circuit that controls a state of the power amplifier in accordance with an output of the level determination circuit. | 01-17-2013 |
Masakai Kitabata, Toyama JP
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20090229985 | SEMICONDUCTOR DEVICE PRODUCTION METHOD AND SEMICONDUCTOR PRODUCTION APPARATUS - A semiconductor device production method of the present invention first collects data including an initial volume of plating solution, volume of replenished solution, number of wafers processed, value of current applied and volume of waste solution in a step of filling a metal plating film in a via hole or a trench formed in an insulating film on a semiconductor substrate. Then, a cumulative charge during the plating is calculated based on the obtained current value. Also, a total volume of plating solution is calculated. Furthermore, an amount of decomposition products of suppressors contained in the plating solution based on the calculated total volume of plating solution, the volume of waste solution and the calculated cumulative charge. The semiconductor substrate is plated only when the amount of decomposition products is equal to or smaller than a predetermined threshold. | 09-17-2009 |
Masaki Kitabata, Toyama JP
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20080314316 | MONITORING SYSTEM AND MONITORING METHOD FOR SUBSTRATE PRODUCTION APPARATUS - The substrate production apparatus monitoring system of the present invention comprises a data collection unit, a data storage unit, a control state identification unit, and a data evaluation unit. The data collection unit collects control parameter data from the substrate production apparatus including a subsidiary equipment. The control parameter data collected by the data collection unit are stored in the data storage unit. The control state identification unit identifies the control state of the substrate production apparatus based on the data in the data storage unit. The data evaluation unit evaluates the identified, individual control state as to whether it is abnormal/normal. In this way, any abnormal event in the apparatus even in the idle mode can be detected prior to the substrate processing, preventing reduction in the production yield. | 12-25-2008 |
20090026172 | DRY ETCHING METHOD AND DRY ETCHING APPARATUS - In the dry etching method and dry etching apparatus relating to the present invention, high frequency electric power is applied to upper and lower electrodes from high frequency power sources to generate plasma and etch an object on the electrode in a vacuum chamber into which a process gas is introduced via a gas inlet and the interior of which is maintained for a specific pressure by an exhaust unit. An etching rate estimation equation is created using apparatus parameters including an emission intensity ratio obtained by dividing an emission intensity of a plasma emission wavelength by an emission intensity of an inert gas. An estimated etching rate is calculated using the etching rate estimation equation. An estimated etching time to achieve a proper etching quantity is calculated based on the estimated etching rate and used for the control, reducing the production variation of fine devices. | 01-29-2009 |
20100078043 | CLEANING DEVICE AND CLEANING METHOD - An initial resistivity value of pure water is measured. A lifter is cleaned in a state where the pure water is continuously supplied to the rinsing tank to replenish the rising tank while the pure water is being drained from the rinsing tank. A resistivity value of the pure water in process of cleaning the lifter is measured at predetermined time intervals. A difference value between each of the resistivity values and the initial resistivity value is calculated, and the calculated difference values are integrated. An amount of residual chemical solution of the lifter in process of being cleaned is calculated based on an integration result thus obtained. A period of cleaning time necessary for the lifter to become clean in a state where a flow rate of the drained/replenishing pure water per unit time is maintained is calculated based on the amount of residual chemical solution. The lifter is continuously cleaned in the state where the flow rate of the drained/replenishing pure water per unit time is maintained until the period of cleaning time elapses. | 04-01-2010 |
Miki Kitabata, Musashino-Shi, Tokyo JP
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20160142466 | OUTPUT FUNCTION DIVIDING SYSTEM - A Web browser capable of providing an equivalent quality of user experience to a user even with respect to access of devices differing in processing performance. The web browsing system comprises a Web browser function which is divided between a browsing client unit and a browsing server unit, wherein the browsing client unit notifies a content input to the user terminal to the browsing server unit and displays a Web page on a user terminal by using information supplied from the browsing server unit, and wherein the browsing server unit supplies information necessary for displaying the Web page to the user terminal to the browsing client unit according to the content input to the user terminal notified from the browsing client unit. | 05-19-2016 |
Toshinori Kitabata, Miyagi JP
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20150114564 | SUBSTRATE PROCESSING APPARATUS AND SHUTTER MEMBER - In a substrate processing apparatus of the present disclosure, a bearing member includes a decaying mechanism provided with a connecting shaft inserted therein and configured to decay radicals or ions; a first member configured to cover the decaying mechanism; and a second member disposed at the connecting shaft and provided with the connecting shaft inserted therein while being in contact with a sealing member. Further, an end of the first member and an end of the second member are connected to be engaged with each other, an invasion path is formed to allow the radicals to invade from the connected portion of the end of the first member and the end of the second member, and the invasion path is formed to be folded back in an extending direction of the connecting shaft. The sealing member is made of a material having a tensile strength larger than 12.1 MPa. | 04-30-2015 |
Toshinori Kitabata, Kurokawa-Gun JP
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20150162170 | PLASMA PROCESSING APPARATUS AND FOCUS RING - A degree of tilting caused by consumption of a focus ring can be suppressed. A plasma processing apparatus includes a chamber configured to perform a plasma process on a target object; a mounting table which is provided within the chamber and has a mounting surface on which the target object is mounted; and the focus ring, provided on the mounting table to surround the target object mounted on the mounting surface, having a first flat portion lower than the mounting surface, a second flat portion higher than the first flat portion and not higher than a target surface of the target object, and a third flat portion higher than the second flat portion and the target surface of the target object in sequence from an inner peripheral side thereof to an outer peripheral side thereof. | 06-11-2015 |