Patent application number | Description | Published |
20100173252 | APPLIANCE CONTROL WITH AUTOMATIC DAMPER DETECTION - Methods and systems for operating a fuel fired appliance that may include an optional hardware component such as a damper are disclosed. In some cases, the presence of the optional hardware component is detected, and it is determined whether the optional hardware component is required for future operation of the fuel fired appliance. The fuel fired appliance may be operated normally if the optional hardware component is present and required, or, in some cases, if the optional hardware component is determined to be not required. If the optional hardware component is absent but required, normal operation of the fuel fired appliance may be stopped. | 07-08-2010 |
20110247604 | SPARK DETECTION IN A FUEL FIRED APPLIANCE - A control system for a fuel-fired appliance and methods of operating are disclosed. In an illustrative embodiment, when an electrical characteristic of an optical detector, such as a resistance, does not change by at least a predetermined amount during an ignition trial, and/or when a level of EMI or electrical noise detected by an antenna in a burner assembly of the fuel-fired appliance does not increase during the ignition trial, the control system may determine that the ignition assembly is not sparking properly. In some instances, the control system may also be programmed to activate an indicator that would indicate to a user or technician a potential problem with the ignition assembly (e.g. not sparking properly to ignite fuel). | 10-13-2011 |
Patent application number | Description | Published |
20080224251 | Optimal Rasterization for Maskless Lithography - A lithographic system is provided in which an extent of overlap between pattern sections is adjusted in order to match a size of a pattern section to a size of a repeating portion of the pattern to be formed. | 09-18-2008 |
20080266538 | Lithographic processing cell, lithographic apparatus, track and device manufacturing method - A rework station and a metrology device(s) are incorporated into a lithographic processing cell so that a faulty substrate can be reworked directly and reprocessed without, for example, an overhead involved in changing masks, etc. | 10-30-2008 |
20080297747 | Lithographic Apparatus and Device Manufacturing Method - One or more patterning arrays are mounted to a mounting plate via height adjustment structures that enable the flatness of the active surfaces of the patterning arrays to be controlled. The height adjustment structures may comprise an array of piezoelectric actuators or screws. Alternatively, the backside of the patterning means may be polished to optical flatness and bonded by crystal bonding to an optically flat surface of a rigid mounting body. | 12-04-2008 |
20120133914 | METHOD OF OPERATING A PATTERNING DEVICE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic reticle is illuminated to transfer a pattern to a substrate, inducing distortions due to heating. The distortions are calculated using reference marks in a peripheral portion of the reticle and measuring changes in their relative positions over time. A plurality of cells are defined for which a system of equations can be solved to calculate a dilation of each cell. In an embodiment, each equation relates positions of pairs of marks to dilations of the cells along a line (s, s | 05-31-2012 |
20140176929 | Lithographic Apparatus and Device Manufacturing Method Using Dose Control - A system and method are used to manufacture a device using at least one exposure step. Each exposure step projects a patterned beam of radiation onto a substrate. The patterned beam includes a plurality of pixels. Each pixel delivers a radiation dose no greater than a predetermined normal maximum dose to the target portion in the exposure step and/or at least one selected pixel delivers an increased radiation dose, greater than the normal maximum dose. The increased dose may be delivered to compensate for the effect of a defective element at a known position in the array on a pixel adjacent a selected pixel or compensate for underexposure of the target portion at the location of a selected pixel resulting from exposure of that location to a pixel affected by a known defective element in another exposure step. | 06-26-2014 |
20150029481 | METHOD OF OPERATING A PATTERNING DEVICE AND LITHOGRAPHIC APPARATUS - A lithographic reticle is illuminated to transfer a pattern to a substrate, inducing distortions due to heating. The distortions are calculated using reference marks in a peripheral portion of the reticle and measuring changes in their relative positions over time. A plurality of cells are defined for which a system of equations can be solved to calculate a dilation of each cell. In an embodiment, each equation relates positions of pairs of marks to dilations of the cells along a line (s, s1, s2) connecting each pair. Local positional deviations can be calculated for a position by combining calculated dilations for cells between at least one measured peripheral mark and the position. Corrections can be applied in accordance with the result of the calculation. Energy may be applied to the patterning device (for example by thermal input or mechanical actuators) to modify a distribution of the local positional deviations. | 01-29-2015 |