Franken, NL
Astrid Franken, Echt NL
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20140105957 | BIS-(ALPHA-AMINO-DIOL-DIESTER) CONTAINING POLYESTERAMIDE FOR OPHTAMOLOGY - The present invention relates to an ocular polymer delivery composition comprising at least one ophthalmologic agent dispersed in at least one biodegradable polymer, wherein the polymer comprises at least one of a poly (ester amide) (PEA) having a chemical formula described by structural formula (I). | 04-17-2014 |
20140179802 | FIBER COMPRISING A BIODEGRADABLE POLYMER - The present invention relates to a fiber comprising a biodegradable polymer which undergoes dimensional change upon injection in the human or animal body wherein the dimensional change is a reduction of the surface area to volume ratio of a factor 2 to 10. The fiber is sized for injection via a pharmaceutical syringe needle having a bore of at least 25 Gauge. The biodegradable polymer is an amorphous biodegradable polymer selected from the group of poly-hexamethylene carbonates or polyesteramides. The amorphous biodegradable polymer is a preferably a polyesteramide comprising alpha-amino acids, diols and dicarboxylic acids as building blocks. The invention further relates to the use of the fiber for the manufacturing of a medicament for the treatment of ophthalmic diseases. The invention also relates to a process for the manufacturing of the fiber comprising the following process steps; a. extruding a biodegradable polymer into a fiber fitting in a needle of at least 25 Gauge b. which while under tension is cooled below its glass transition temperature such that the resultant fiber is amorphous. | 06-26-2014 |
Cornelus Leonardus Maria Coleta Franken, Leiden NL
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20080311159 | Methods and Means for Diagnostics, Prevention and Treatment of Mycobacterium Infections and Tuberculosis Disease - The invention identifies a narrow subset of | 12-18-2008 |
Dominicus Jacobus Petrus Adrianus Franken, Veldhoven NL
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20080218722 | Lithographic apparatus and device manufacturing method - A lithographic apparatus is disclosed having a deformable lens element through which a patterned radiation beam is arranged to pass before reaching a substrate and having a deformable lens actuator configured to transmit a combination of a force substantially parallel to the optical axis of the projection system and a localized torque about an axis substantially perpendicular to the optical axis independently at a plurality of sub-regions on the deformable lens element. | 09-11-2008 |
20080297747 | Lithographic Apparatus and Device Manufacturing Method - One or more patterning arrays are mounted to a mounting plate via height adjustment structures that enable the flatness of the active surfaces of the patterning arrays to be controlled. The height adjustment structures may comprise an array of piezoelectric actuators or screws. Alternatively, the backside of the patterning means may be polished to optical flatness and bonded by crystal bonding to an optically flat surface of a rigid mounting body. | 12-04-2008 |
20090061361 | Integrated Circuit Manufacturing Methods with Patterning Device Position Determination - Methods of manufacturing an integrated circuit by a lithographic apparatus are disclosed. The methods include patterning a radiation beam with a patterning device, projecting the patterned beam onto a substrate using a projection system, and determining the position of the patterning device. In one example, the patterning device's position relative to the projection system is determined by measuring the position of the patterning device's support structure. In another example, the position can be determined by measuring a position of the patterning device relative to its support and by measuring a position of the support. In another example, a Z-position of the patterning device is determined by directing at least one beam of radiation onto a part of the patterning device located outside a pattern area. This can be done by directing a pair of laser beams from sensors on the projection system to reflecting strips on the patterning device. | 03-05-2009 |
Erik Michiel Franken, Nuenen NL
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20140145077 | METHOD OF PERFORMING TOMOGRAPHIC IMAGING OF A SAMPLE IN A CHARGED-PARTICLE MICROSCOPE - The invention relates to a method of performing tomographic imaging of a sample comprising providing a beam of charged particles; providing the sample on a sample holder that can be tilted; in an imaging step, directing the beam through the sample to image the sample; repeating this procedure at each of a series of sample tilts to acquire a set of images; in a reconstruction step, mathematically processing images from said set to construct a composite image, whereby in said imaging step, for a given sample tilt, a sequence of component images is captured at a corresponding sequence of focus settings; and in said reconstruction step, for at least one member of said series of sample tilts, multiple members of said sequence of component images are used in said mathematical image processing. This renders a 3D imaging cube rather than a 2D imaging sheet at a given sample tilt. | 05-29-2014 |
Johannes Baptist Martinus Franken, Zoetermeer NL
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20130227795 | GLASS BREAKING TOOL, METHOD FOR BREAKING GLASS - A glass breaking tool for breaking a glass pane comprising a head arranged for contact with the glass pane, a handle movable with respect to the head and a pin crusher arranged in the head and handle wherein the tool is adjustable between a rest position in which the pin crusher is locked inside the head, a releasing position in which the pin crusher is released inside the head and a breaking position in which a tip of the pin crusher is at least partially outside the head. | 09-05-2013 |
20150059529 | SAFETY HAMMER FOR BREAKING GLASS, METHOD FOR ASSEMBLY OF A SAFETY HAMMER, SAFETY TOOL HOLDER, SYSTEM FOR HOLDING A SAFETY TOOL AND KIT OF PARTS - A safety hammer ( | 03-05-2015 |
Johannes Christiaan Franken, Knegsel NL
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20100259733 | Apparatus comprising a rotating contaminant trap - A contaminant trap apparatus arranged in a path of a radiation beam to trap contaminants emanating from a radiation source configured to produce the radiation beam is disclosed. The contaminant trap apparatus includes a rotor having a plurality of channel forming elements defining channels which are arranged substantially parallel to the direction of propagation of the radiation beam, the rotor including electrically chargeable material and arranged to be electrically charged as a result of the operation of the radiation source; and a bearing configured to rotatably hold the rotor with respect to a rotor carrying structure, wherein the apparatus is configured to (i) control or redirect an electrical discharge of the rotor, or (ii) suppress an electrical discharge of the rotor, or (iii) both (i) and (ii). | 10-14-2010 |
Johannes Christiaan Leonardu Franken, Knegsel NL
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20090309048 | Radiation System and Lithographic Apparatus Comprising the Same - An optical sensor apparatus for use in an extreme ultraviolet lithographic system is disclosed. The apparatus includes an optical sensor comprising a sensor surface and a removal mechanism configured to remove debris from the sensor surface. Accordingly, dose and/or contamination measurements may be carried out conveniently for the lithographic system. | 12-17-2009 |
Johannes Christiaan Leonardus Franken, Knegsel NL
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20080273188 | Device arranged to measure a quantity relating to radiation and lithographic apparatus - A device is arranged to measure a quantity relating to radiation. The device includes a sensor configured to measure the quantity, a screen arranged to protect the sensor from incoming particles emitted from a source configured to emit extreme ultraviolet radiation, and a mirror configured to redirect extreme ultraviolet radiation emitted by the source, past the screen, to the sensor. | 11-06-2008 |
20090066924 | Lithographic apparatus, device manufacturing method, and use of a radiation collector - A lithographic apparatus, comprising a collector being constructed to receive radiation from a radiation source and transmit radiation to an illumination system, wherein the collector is provided with at least one fluid duct, the apparatus including a temperature conditioner to thermally condition the collector utilizing the fluid duct of the collector, the temperature conditioner being configured to feed a first fluid to the fluid duct during a first period, and to feed a second fluid to the fluid duct during at least a second period. | 03-12-2009 |
20110032497 | CONDUIT SYSTEM FOR A LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATUS, PUMP, AND METHOD FOR SUBSTANTIALLY REDUCING VIBRATIONS IN A CONDUIT SYSTEM - A conduit system for a lithographic apparatus is disclosed, the conduit system including a conduit configured to guide a liquid or liquid-gas mixture, and a gas injection nozzle configured to introduce a gas in the liquid or liquid-gas mixture to at least partially absorb pressure peaks or waves in the liquid or liquid-gas mixture. In an embodiment, the gas injection nozzle may be arranged in a pump of the conduit system. The pump further includes a pump inlet, a pump outlet and a pump chamber between the pump inlet and the pump outlet arranged for compression of the liquid or liquid-gas mixture. | 02-10-2011 |
20110096308 | APPARATUS COMPRISING A ROTATING CONTAMINANT TRAP - A contaminant trap apparatus arranged in a path of a radiation beam to trap contaminants emanating from a radiation source configured to produce the radiation beam is disclosed. The contaminant trap apparatus includes a rotor having a plurality of channel forming elements defining channels which are arranged substantially parallel to the direction of propagation of the radiation beam, the rotor including electrically chargeable material and arranged to be electrically charged as a result of the operation of the radiation source; and a bearing configured to rotatably hold the rotor with respect to a rotor carrying structure, wherein the apparatus is configured to (i) control or redirect an electrical discharge of the rotor, or (ii) suppress an electrical discharge of the rotor, or (iii) both (i) and (ii). | 04-28-2011 |
20110242516 | Lithographic Apparatus, a Radiation System, a Device Manufacturing Method and a Radiation Generating Method - A lithographic apparatus includes a radiation system for providing a beam of radiation from radiation emitted by a radiation source. The radiation system includes a contaminant trap for trapping material emanating from the radiation source. The rotation contaminant trap includes a multiple number of elements extending in a radial direction from a common rotation trap axis and being arranged for allowing contaminant material emanating from the radiation source to deposit during propagation of the radiation beam in the radiation system. The radiation system further includes a contaminant catch for receiving contaminant material particles from the rotation trap elements, the contaminant catch having a constitution, during operation of the radiation, for retaining said contaminant material particles. | 10-06-2011 |
Robert Franken, Deurne NL
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20090021708 | Inspection method and apparatus lithographic apparatus, lithographic processing cell, device manufacturing method and distance measuring system - A scatterometer has a focus sensor arranged to detect whether the target being measured is in a correct focal plane. A modulation is applied to a component of the focus sensor or the scatterometer such that a defocus as measured by the focus sensor varies according to a certain function. From knowledge of the modulation, the gain of the sensor can be calibrated. | 01-22-2009 |
20090201473 | Method for Determining Exposure Settings, Lithographic Exposure Apparatus, Computer Program and Data Carrier - Embodiments of the invention relate to a method for determining exposure settings for a target field on a substrate in a lithographic exposure process, including providing calibration data by determining the position of a calibration field in a first direction at a plurality of calibration positions in a second and third direction relative to the position of the calibration field. The method also includes providing production data by establishing the position on the substrate of the target field in the second and third direction and by measuring the position of the exposure field in the first direction at least one measurement position relative to the position of the exposure field in the second and third direction. | 08-13-2009 |
Sander Alexander Christiaan Franken, Eindhoven NL
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20110149259 | LITHOGRAPHIC APPARATUS - A container is provided for use within a lithographic apparatus. The container is configured to house at least one component of the lithographic apparatus within an internal space which is at least partially filled with a packing material that includes a plurality of gas cells. | 06-23-2011 |