La Fontaine
Bruno La Fontaine, Pleasanton, CA US
Patent application number | Description | Published |
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20090017628 | SPACER LITHOGRAPHY - Ultrafine dimensions are accurately and efficiently formed in a target layer using a spacer lithographic technique comprising forming a first mask pattern, forming a cross-linkable layer over the first mask pattern, forming a cross-linked spacer between the first mask pattern and cross-linkable layer, removing the cross-linkable layer, cross-linked spacer from the upper surface of the first mask pattern and the first mask pattern to form a second mask pattern comprising remaining portions of the cross-linked spacer, and etching using the second mask pattern to form an ultrafine pattern in the underlying target layer. Embodiments include forming the first mask pattern from a photoresist material capable of generating an acid, depositing a cross-linkable material comprising a material capable of undergoing a cross-linking reaction in the presence of an acid, and removing portions of the non-cross-linked layer and cross-linked spacer from the upper surface of the first mask pattern before removing the remaining portions of the first mask pattern and remaining noncross-linked layer. | 01-15-2009 |
20090033892 | DOUBLE EXPOSURE OF A PHOTORESIST LAYER USING A SINGLE RETICLE - A composite exposure image is formed on a photoresist layer by applying a light beam through a reticle to form a first exposure image thereon, and thereafter, while maintaining the position of the reticle with respect to the photoresist layer, again applying a light beam through the reticle to form a second exposure image thereon. By adjusting the light beam differently in focus and intensity for each exposure, the combination of first and second exposure images form a pattern on the photoresist of lesser pitch than can be produced from a single exposure. The formation of a single pattern in the single resist layer from the two exposures avoids misalignment problems and eliminates the need for double exposure of a plurality of resist layers. | 02-05-2009 |
20090135390 | LITHOGRAPHIC ALIGNMENT MARKS - Precise and repeatable alignment performance using asymmetric illumination is achieved by properly structuring, as by segmenting, an alignment mark on a reticle of a photolithographic exposure apparatus as a function of the type of asymmetric illumination, thereby improving resolution and repeatability of an alignment mark formed on a target substrate. Embodiments include double exposure techniques using dipole illumination with an angularly segmented alignment mark, e.g., at 45°, such that the first-order diffracted light is sent at 45° from the initial position of the dipole illumination. | 05-28-2009 |
Helmut La Fontaine, Marbella ES
Patent application number | Description | Published |
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20150025561 | NEEDLE MODULE AND DEVICE FOR PIERCING THE SKIN - The present invention relates to a needle module, which comprises a piercing means on a mounting, which can be releasably coupled to the drive unit so that, as a result of a driving force exerted by the drive unit on the mounting, a repeated pushing movement moving the piercing means in and out is transmitted, wherein, according to the invention, the mounting has a safety device which mechanically irreversibly blocks the piercing means after the needle module has been released from the drive unit so that it can no longer be moved out of the needle module. The invention also relates to a device, in particular a hand device, for piercing the skin, comprising a drive unit and the needle module according to the invention. | 01-22-2015 |
Rene La Fontaine, Herxheim DE
Patent application number | Description | Published |
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20150025561 | NEEDLE MODULE AND DEVICE FOR PIERCING THE SKIN - The present invention relates to a needle module, which comprises a piercing means on a mounting, which can be releasably coupled to the drive unit so that, as a result of a driving force exerted by the drive unit on the mounting, a repeated pushing movement moving the piercing means in and out is transmitted, wherein, according to the invention, the mounting has a safety device which mechanically irreversibly blocks the piercing means after the needle module has been released from the drive unit so that it can no longer be moved out of the needle module. The invention also relates to a device, in particular a hand device, for piercing the skin, comprising a drive unit and the needle module according to the invention. | 01-22-2015 |
Semer Geoffrey Thomas La Fontaine, Worcestershire GB
Patent application number | Description | Published |
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20150067479 | Representation of Multiple Markup Language Files that Differ in Structure and Content in One File for the Production of New Markup Language Files - A method and apparatus for representing two or more related markup language source files in a single delta file is provided. The markup language source files are represented in such a way that the delta file is easily processed to produce one or more merged combinations of the source files. The method and apparatus ensure that any one of the original files can be extracted from the delta file and the delta file remains a valid delta file for any remaining source files. The method and apparatus is adapted to enable the sources files to be aligned with respect to structurally significant elements and textual content so as to reduce repetitions in the delta file of common content. The method and apparatus are suited for use, but not exclusively, with XML documents and files. | 03-05-2015 |