Patent application number | Description | Published |
20080311527 | Method of forming protection layer on photoresist pattern and method of forming fine pattern using the same - A method of forming a protection layer on a photoresist pattern and a method of forming a fine pattern using the same are provided. A photoresist layer may be formed on a substrate. Exposure regions and non-exposure regions may be defined in the photoresist layer by an exposure process. A reactive material layer may be formed on the photoresist layer having the exposure regions. A protection layer may be formed on the exposure regions by the reactive material layer reacting via a chemical attachment process. The non-exposure regions and the reactive material layer that remains after the reaction may be removed by a development process to form photoresist patterns. The substrate may be etched using the protection layer and the photoresist patterns as etching masks. | 12-18-2008 |
20090017592 | Siloxane polymer composition, method of forming a pattern using the same, and method of manufacturing a semiconductor using the same - A siloxane polymer composition includes an organic solvent in an amount of about 93 percent by weight to about 98 percent by weight, based on a total weight of the siloxane polymer composition, and a siloxane complex in an amount of about 2 percent by weight to about 7 percent by weight, based on the total weight of the siloxane polymer composition, the siloxane complex including a siloxane polymer with an introduced carboxylic acid and being represented by Formula 1 below, | 01-15-2009 |
20090092931 | Methods of forming a blocking pattern using a photosensitive composition and methods of manufacturing a semiconductor device - A method of forming a blocking pattern includes forming a preliminary blocking layer on first and second regions of a substrate, the preliminary blocking layer being formed of a photosensitive composition including a siloxane polymer, a cross-linking agent, a photoacid generator, and a thermal acid generator, selectively exposing to light a first portion of the preliminary blocking layer, the first portion of the preliminary blocking layer being formed on the first region of the substrate, such that a cross-linked pattern is formed on the first region of the substrate, and removing a second portion of the preliminary blocking layer, the second portion of the preliminary blocking layer being formed on the second region of the substrate. | 04-09-2009 |
20090162796 | METHODS OF FORMING A PATTERN OF A SEMICONDUCTOR DEVICE - In polymers for an anti-reflective coating, compositions for an anti-reflective coating and methods of forming a pattern of a semiconductor device using the same, the compositions for an anti-reflective coating include a polymer that includes a first repeating unit having a basic side group, a second repeating unit having a light-absorbing group, and a third repeating unit having a cross-linkable group; a photoacid generator; a cross-linking agent; and a solvent. The polymer for the anti-reflective coating, which may have a basic side group chemically bound to a backbone of the polymer, may properly adjust diffusion of an acid in an anti-reflective coating layer to improve the profile of a pattern. | 06-25-2009 |
20090162986 | Copolymers, polymer resin composition for buffer layer method of forming a pattern using the same and method of manufacturing a capacitor using the same - The invention is directed to particular polymer compositions that may be generally characterized by the formula: | 06-25-2009 |
20100248134 | Methods of forming a pattern using negative-type photoresist compositions - A method of forming a pattern and a negative-type photoresist composition, the method including forming a photoresist film on a substrate by coating a photoresist composition thereon, the photoresist composition including a polymer, a photoacid generator, and a solvent, wherein the polymer includes an alkoxysilyl group as a side chain and is cross-linkable by an acid to be insoluble in a developer; curing a first portion of the photoresist film by exposing the first portion to light, the exposed first portion being cured by a cross-linking reaction of the alkoxysilyl groups therein; and providing a developer to the photoresist film to remove a second portion of the photoresist film that is not exposed to light, thereby forming a photoresist pattern on the substrate. | 09-30-2010 |
20100266966 | Methods of forming a pattern using photoresist compositions - A method of forming a pattern and a photoresist composition, the method including forming a photoresist film on a substrate by coating a photoresist composition thereon, the photoresist composition including a polymerized photoresist additive, a polymer including an acid-labile protective group at a side chain, a photoacid generator, and a solvent; exposing the photoresist film; and forming a photoresist pattern by developing the photoresist film using an aqueous alkali developer, wherein the polymerized photoresist additive includes a hydrophilic repeating unit having an aliphatic hydrocarbon backbone and a side chain containing an oxygen heteroatom in a heterocyclic ring substituted with at least three hydroxyl groups, and a hydrophobic repeating unit having an aliphatic hydrocarbon backbone and a side chain containing a fluorinated aliphatic hydrocarbon group. | 10-21-2010 |
20100305266 | SILOXANE POLYMER COMPOSITION - A siloxane polymer composition includes an organic solvent in an amount of about 93 percent by weight to about 98 percent by weight, based on a total weight of the siloxane polymer composition, and a siloxane complex in an amount of about 2 percent by weight to about 7 percent by weight, based on the total weight of the siloxane polymer composition, the siloxane complex including a siloxane polymer with an introduced carboxylic acid and being represented by Formula 1 below, | 12-02-2010 |
20110086243 | BATTERY PACK - A battery pack is disclosed. An embodiment of the battery pack includes a bare cell, wherein the bare cell comprises a terminal; a circuit module coupled with the bare cell, wherein the circuit module comprises a protective device; and a cover disposed over the circuit module and coupled with the bare cell; wherein the circuit module comprises a through-hole, the cover comprises a protrusion, the protrusion engages with the through-hole, and the through-hole enables welding of the protective device of the circuit module to the terminal of the bare cell through the through-hole. | 04-14-2011 |
20110129781 | Methods of forming a pattern using photoresist compositions - In a photoresist composition, methods of forming a pattern using the same, and methods of manufacturing a semiconductor device using the same A photoresist film may be formed on a substrate by coating a photoresist composition including a polymer and a solvent. The polymer includes a first repeating unit and a second repeating unit. The first repeating unit has a diazoketo group and a second repeating unit has a group containing silicon. A photoresist pattern is formed by partially exposing the photoresist film and developing the photoresist film. A pattern having an improved etching resistance and uniformity of critical dimension is formed. | 06-02-2011 |
20110151730 | Lead plate and protection circuit module having the same - A lead plate for connecting a printed circuit board (PCB) of a secondary battery to an bare cell includes a mounting portion connected to the PCB, a joint portion connected to the bare cell, a surface area of the joint portion facing the bare cell being smaller than a surface area of the mounting portion facing the PCB, and a step portion connecting the mounting portion and the joint portion to each other. | 06-23-2011 |
20110189608 | PHOTORESIST COMPOSITION FOR FABRICATING PROBE ARRAY, METHOD OF FABRICATING PROBE ARRAY USING THE PHOTORESIST COMPOSITION, COMPOSITION FOR PHOTOSENSITIVE TYPE DEVELOPED BOTTOM ANTI-REFLECTIVE COATING, FABRICATING METHOD OF PATTERNS USING THE SAME AND FABRICATING METHOD OF SEMICONDUCTOR DEVICE USING THE SAME - A photoresist composition for fabricating a probe array is provided. The photoresist composition includes a photoacid generator having an onium salt and an i-line reactive sensitizer. | 08-04-2011 |
20110244397 | Methods of Fabricating a Microarray - A method of fabricating a microarray is provided, which includes providing a substrate having a surface that is protected by an acid labile protective group that includes an acetal group represented by formula (1) and has a functional group that can be coupled with a monomer of a probe; applying a photoresist including a photo acid generator to the substrate; selectively exposing the photoresist to deprotect the acid labile protective group that corresponds to an exposed region; removing the photoresist; and coupling the monomer that is combined with the acid labile protective group with the deprotected functional group. Formula (1) has the following structure: | 10-06-2011 |
20110248983 | METHOD AND APPARATUS FOR OPERATING PROJECTION MODE IN PROJECTION DEVICE - A projection device capable of automatically controlling on/off of a projection module for projecting display data onto an exterior surface according to an open/closed state of a cover of the projection module, and an operation method thereof are provided. The method for operating a projection module in a projection device includes turning-on the projection module when a first detection signal is detected, wherein the first detection signal is generated when a cover of the projection module is open, and after the projection module is turned on, turning-off the projection module when a second detection signal is detected, wherein the second detection signal is generated when a cover of the projection module is closed. | 10-13-2011 |
20110281141 | BATTERY PACK - A battery pack includes a bare cell including an electrode assembly arranged within a can having an opening that is sealed by a cap plate, a protective circuit module (PCM) arranged on the cap plate, a lead member connecting the PCM to the cap plate; a coupling member inserted into the cap plate and coupled to the lead member. The coupling member is made out of a different material than that of the cap plate, each of the coupling member and the lead member include nickel. By including such a coupling member, the strength and durability of the weld connecting the cap plate to the PCM is improved and the contact resistance is lowered. | 11-17-2011 |
20110294072 | METHODS OF MANUFACTURING SEMICONDUCTOR DEVICES USING PHOTOLITHOGRAPHY - A method of manufacturing a semiconductor device using a photolithography process may include forming an anti-reflective layer and a first photoresist film on a lower surface. The first photoresist film may be exposed to light and a first photoresist pattern having a first opening may be formed by developing the first photoresist film. A plasma treatment can be performed on the first photoresist pattern and a second photoresist film may be formed on the first photoresist pattern, which may be exposed to light. A second photoresist pattern may be formed to have a second opening by developing the second photoresist film. Here, the second opening may be substantially narrower than the first opening. | 12-01-2011 |
20110300712 | Methods of Forming a Photoresist Pattern Using Plasma Treatment of Photoresist Patterns - Methods of forming a photoresist pattern include forming a first photoresist pattern on a substrate and treating the first photoresist pattern with plasma that modifies etching characteristics of the first photoresist pattern. This modification may include making the first photoresist pattern more susceptible to removal during subsequent processing. The plasma-treated first photoresist pattern is covered with a second photoresist layer, which is patterned into a second photoresist pattern that contacts sidewalls of the plasma-treated first photoresist pattern. The plasma-treated first photoresist pattern is selectively removed from the substrate to reveal the remaining second photoresist pattern. The second photoresist pattern is used as an etching mask during the selective etching of a portion of the substrate (e.g., target layer). The use of the second photoresist pattern as an etching mask may yield narrower linewidths in the etched portion of the substrate than are achievable using the first photoresist pattern alone. | 12-08-2011 |
20120107648 | LEAD PLATE WITH A MOUNTING PORTION BEING HEAVIER THAN ITS JOINT PORTION - A lead plate for connecting a printed circuit board (PCB) of a secondary battery to an bare cell includes a mounting portion connected to the PCB, a joint portion connected to the bare cell, a surface area of the joint portion facing the bare cell being smaller than a surface area of the mounting portion facing the PCB, and a step portion connecting the mounting portion and the joint portion to each other. | 05-03-2012 |
20120156614 | Novel Phenol Compounds and Positive Photosensitive Resin Composition Including the Same - Disclosed are a novel phenol compound comprising a compound represented by Chemical Formula 1, a compound represented by Chemical Formula 2, or a combination thereof, and a positive photosensitive resin composition including the same. | 06-21-2012 |
20120156616 | Positive Photosensitive Resin Composition - Disclosed is a positive photosensitive resin composition that includes (A) a polybenzoxazole precursor including a repeating unit represented by the following Chemical Formula 1; (B) a photosensitive diazoquinone compound; (C) a silane compound; (D) a phenol compound; and (E) a solvent. | 06-21-2012 |
20120156622 | Ortho-Nitrobenzyl Ester Compound and Positive Type Photosensitive Resin Composition Including the Same - An ortho-nitrobenzyl ester compound including a compound represented by Chemical Formula 1, and a positive photosensitive resin composition including the same are provided. | 06-21-2012 |
20120169289 | BATTERY MODULE - A battery module is disclosed. According to one aspect, the battery module includes: a plurality of batteries, and at least one thermistor inserted and fixed into a gap region between the plurality of batteries. The thermistor may be configured to have a variable width along an inserted direction where a size of the gap region changes. According to another aspect, a controller electrically connected to the at least one thermistor is disclosed. The controller is configured to control a charging and discharging operation of the plurality of batteries by receiving an output signal of the at least one thermistor. Accordingly, a temperature sensor is prevented from deviating its location, stability of the temperature sensor is improved, and installation of the temperature sensor is simplified. | 07-05-2012 |
20130106355 | BATTERY PACK AND METHOD OF CONTROLLING THE SAME | 05-02-2013 |
20140360663 | METHOD OF MANUFACTURING FINGERPRINT RECOGNITION HOME KEY - Disclosed is a method of manufacturing a fingerprint recognition home key. In this method, an external member having a high dielectric constant is bonded to a film of a fingerprint recognition sensor, thereby increasing a fingerprint recognition rate, reducing manufacturing time, and providing a pleasant outer appearance. The method includes preparing an injection molded product having a shape of a home key and provided with a fingerprint recognition sensor, applying a bonding material or an adhesive to an upper side of a film of the fingerprint recognition sensor, and bonding an external member to the upper side of the film of the fingerprint recognition sensor to which the bonding material or the adhesive is applied. | 12-11-2014 |