Patent application number | Description | Published |
20090014667 | EXTERNAL CATHODE ION SOURCE - An ion source is disclosed for use in fabrication of semiconductors. The ion source includes an electron emitter that includes a cathode mounted external to the ionization chamber for use in fabrication of semiconductors. In accordance with an important aspect of the invention, the electron emitter is employed without a corresponding anode or electron optics. As such, the distance between the cathode and the ionization chamber can be shortened to enable the ion source to be operated in an arc discharge mode or generate a plasma. Alternatively, the ion source can be operated in a dual mode with a single electron emitter by selectively varying the distance between the cathode and the ionization chamber. | 01-15-2009 |
20090183679 | ION SOURCE GAS REACTOR - An ion source is disclosed which includes a gas reaction chamber. The invention also includes a method of converting a gaseous feed material into a tetramer, dimer, other molecule or atomic species by supplying the feed material to the gas reaction chamber wherein the feed material is converted to the appropriate gas species to be supplied to the ion source and ionized. More particularly, the gas reaction chamber is configured to receive hydride and other feed materials in gaseous form, such as, AsH | 07-23-2009 |
20100306033 | ELECTRICAL POWER METERING AND BILLING NETWORK - A method and system for facilitating the purchase of electricity between static provider (e.g, an Outlet Owner (OO)) and dynamic/mobile customer (e.g., a Plug Holder (PH)). The system can create open-market, real-time rate and cost determinations based on the conditions of a Charging Instance (CI) and other electricity transfers. In an embodiment, the invention can provide a Transaction Center configured to receive Charging Instance information over communications links. The Transaction Center can include computers and storage devices configured to process Charging Instance data and reconcile accounts of Plug Holders and Outlet Owners. The Transaction Center can be configured to determine the cost of electricity for a particular outlet and a particular plug. Promotional and market data can be used to calculate the cost. Clusters of outlets and groups of Plug Holders can be established. The Transaction Center can perform heuristic analysis of the data associated with a collection of Charging Instances. Users can receive predictive data for their vehicle configuration and current state based on accumulated data. The Transaction Center can communicate with Enabling Devices, Outlets, Connected Devices, and Vehicles. | 12-02-2010 |
20100320395 | EXTERNAL CATHODE ION SOURCE - An ion source is disclosed for use in fabrication of semiconductors. The ion source includes an electron emitter that includes a cathode mounted external to the ionization chamber for use in fabrication of semiconductors. In accordance with an important aspect of the invention, the electron emitter is employed without a corresponding anode or electron optics. As such, the distance between the cathode and the ionization chamber can be shortened to enable the ion source to be operated in an arc discharge mode or generate a plasma. Alternatively, the ion source can be operated in a dual mode with a single electron emitter by selectively varying the distance between the cathode and the ionization chamber. | 12-23-2010 |
Patent application number | Description | Published |
20090081874 | METHOD FOR EXTENDING EQUIPMENT UPTIME IN ION IMPLANTATION - The invention features in-situ cleaning process for an ion source and associated extraction electrodes and similar components of the ion-beam producing system, which chemically removes carbon deposits, increasing service lifetime and performance, without the need to disassemble the system. In particular, an aspect of the invention is directed to an activating, catalytic, or reaction promoting species added to the reactive species to effectively convert the non-volatile molecular residue into a volatile species which can be removed by conventional means. | 03-26-2009 |
20140188416 | CHARGE INTEGRATION BASED ELECTROSTATIC CLAMP HEALTH MONITOR - An electrostatic clamp monitoring system is provided having an electrostatic clamp configured to selectively electrostatically clamp a workpiece to a clamping surface associated therewith via one or more electrodes. A power supply is electrically coupled to the electrostatic clamp, wherein the power supply is configured to selectively supply a clamping voltage to the one or more electrodes of the electrostatic clamp. A data acquisition system is coupled to the power supply and configured to measure a current supplied to the one or more electrodes, therein defining a measured current. A controller integrates the measured current over time, therein determining a charge value associated a clamping force between the workpiece and electrostatic clamp. A memory stores the charge value associated with the clamping force over a plurality of clamping cycles, therein defining a plurality of charge values, and the controller determines a clamping capability of the electrostatic clamp based on a comparison of a currently determined charge value to the plurality of charge values. | 07-03-2014 |
20160087557 | SYSTEM AND METHOD FOR ELECTROSTATIC CLAMPING OF WORKPIECES - A system and method for clamping a workpiece to an electrostatic clamp (ESC) comprises placing a first workpiece on a surface of the ESC and applying a first set of clamping parameters to the ESC, therein clamping the first workpiece to the surface of the ESC with a first clamping force. A degree of clamping of the workpiece to the ESC is determined and the application of the first set of clamping parameters to the ESC is halted based on a process recipe. A second set of clamping parameters is applied to the ESC after halting the application of the first set of clamping parameters to the ESC, and the workpiece is removed from the surface of the ESC concurrent with the application of the second set of clamping parameters to the ESC when the degree of clamping of the workpiece to the ESC is less than or approximately equal to a threshold clamping value. The second set of clamping parameters to the ESC is further halted after removing the workpiece from the surface of the ESC. | 03-24-2016 |