Patent application number | Description | Published |
20100026821 | OPTICAL APPARATUS AND CAMERA SYSTEM - The optical apparatus includes an image pickup optical system including a focus lens, a controller controlling movement of the focus lens in an optical axis direction of the image pickup optical system, a shake detector detecting a shake amount of the optical apparatus in the optical axis direction, and a memory storing plural shake amounts sequentially detected by the shake detector. The controller calculates, in response to a start instruction of exposure for the image pickup and before start of the exposure, a predictive value of the shake amount for a time point of the exposure based on the plural shake amounts stored in the memory and including at least one shake amount detected after the start instruction of exposure. The controller moves the focus lens to a position corresponding to the predictive value before the start of the exposure. | 02-04-2010 |
20100209097 | INTERCHANGEABLE LENS AND CAMERA SYSTEM - An interchangeable lens which is removably mounted on a camera body including an image sensor includes a tilt unit configured to move a lens unit in a tilt direction with respect to the image sensor, a shift unit configured to move the lens unit in a shift direction with respect to the image sensor, a changing unit configured to change a relative angle between the shift unit and the tilt unit by relatively rotating the shift unit and the tilt unit, a detection unit configured to detect the relative angle, and a control unit configured to transmit to the camera body a detection result of the relative angle detected by the detection unit. | 08-19-2010 |
20110286733 | LENS-INTERCHANGEABLE CAMERA PERFORMING FOCUS CONTROL, LENS BARREL, AND PROGRAM - A lens-interchangeable camera includes a focus detector performing focus detection and a controller performing a drive control of a lens based on a defocus amount. The controller finishes focusing operation without driving the lens when the defocus amount is out a range of a first in-focus determination width, and performs the focusing operation when the defocus amount is out a range of the first in-focus determination width. The controller finishes the focusing operation without performing the focus detection again after completing the drive when the defocus amount is out a range of a second in-focus determination width, and performs the focus detection again after completing the drive when the defocus amount is out a range of the second in-focus determination width. The second in-focus determination width is set to be greater than the first in-focus determination width and be greater than or equal to a drive limit value. | 11-24-2011 |
20110310457 | OPTICAL APPARATUS - The optical apparatus includes plural stop blades, an opening/closing mechanism moving the stop blades in opening and closing directions, an actuator driving the opening/closing mechanism, and a controller controlling drive of the actuator. The controller calculates, when moving the stop blades from a first position to a second position in video capturing, a control driving amount of the actuator that is a sum of a target driving amount corresponding to a moving amount of the stop blades from the first position to the second position and a driving correction amount that varies depending on a position and a moving direction of the aperture blades, the position being at least one of the first and second positions. The controller controls the drive of the actuator based on the control driving amount. | 12-22-2011 |
20120293675 | OPTICAL APPARATUS AND CAMERA SYSTEM HAVING A FUNCTION OF MOVING A FOCUS LENS IN AN OPTICAL AXIS DIRECTION TO REDUCE FOCUS SHAKE GENERATED IN THE OPTICAL AXIS DIRECTION - The optical apparatus includes an image pickup optical system including a focus lens, a controller controlling movement of the focus lens in an optical axis direction of the image pickup optical system, a shake detector detecting a shake amount of the optical apparatus in the optical axis direction, and a memory storing plural shake amounts sequentially detected by the shake detector. The controller calculates, in response to a start instruction of exposure for the image pickup and before start of the exposure, a predictive value of the shake amount for a time point of the exposure based on the plural shake amounts stored in the memory and including at least one shake amount detected after the start instruction of exposure. The controller moves the focus lens to a position corresponding to the predictive value before the start of the exposure. | 11-22-2012 |
20130064534 | OPTICAL APPARATUS PERFORMING POSITION CONTROL OF FOCUS LENS UNIT - An optical apparatus includes a zoom optical system including a focus lens unit, an operation portion configured to manually and mechanically change a focal length of the zoom optical system, and a controller configured to control the focus lens unit so as to move along a track depending on an object distance in an operation of the operation portion. The controller moves the focus lens unit to a second position that is different from a first position that is a position of the focus lens unit in disconnecting a power when a first focal length that is a focal length of the zoom optical system in disconnecting the power is different from a second focal length that is a focal length of the zoom optical system in reconnecting the power. | 03-14-2013 |
20130070144 | OPTICAL APPARATUS - An optical apparatus is configured to execute a manual focus mode in which focusing is performed by an operation of a manual operating unit by moving an image pickup optical system configured to form an optical image of an object. The optical apparatus includes a diaphragm configured to adjust a light quantity, and a controller configured to control a movement of the image pickup optical system in accordance with an operating amount of the manual operating unit so that a unit moving amount that is a moving amount of an in-focus position of the image pickup optical system per unit operation of the manual operating unit corresponds to a product between a diameter of a minimum confusion circle of the image pickup optical system, a diaphragm value of the diaphragm in the manual focus mode, and a coefficient that is a natural number or a reciprocal of the natural number. | 03-21-2013 |
20130201385 | OPTICAL APPARATUS - An optical apparatus includes an image sensor that includes a focus detecting pixel and an image pickup pixel, a first focus detector configured to provide a focus detection based upon a phase difference between the pair of image signals detected by the focus detecting pixel of the image sensor, a second focus detector configured to provide a focus detection based upon a contrast value based upon an output of the image pickup pixel of the image sensor, and a controller configured to provide autofocus utilizing the first focus detector when a focus detection precision of the first focus detector is equal to or higher than a first value and an image magnification variation amount calculated from a wobbling amount of the image pickup optical system used for the second focus detector is equal to or higher than a second value. | 08-08-2013 |
20140375868 | LENS APPARATUS, OPTICAL APPARATUS AND CAMERA - The lens apparatus allows adjustment of lens tilt due to component variation caused by tolerance. The lens barrel includes a straight guiding barrel having a straight groove portion, a cam barrel having a cam groove portion, a straight movable barrel disposed outside the straight guiding and cam barrels, holding a lens and being movable in an optical axis direction by a relative movement of the straight guiding and cam barrels. A cam follower includes first and second cylindrical portions that respectively engage with the straight groove and cam groove portions. The first and second cylindrical portions have central axes decentered from each other. The cam follower includes an operation portion allowing rotational operation of the first and second cylindrical portions from outside of the straight movable barrel. A connecting member connects the cam follower and the straight movable barrel with each other. | 12-25-2014 |
Patent application number | Description | Published |
20090009738 | SURFACE LEVEL DETECTION METHOD, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD - This invention discloses a wafer surface level detection method. The wafer surface level detection method includes a first level measurement step of measuring a level of a surface of a substrate having a plurality of shot regions; a position measurement step of measuring a position along the surface of the substrate; a first movement step of moving the substrate in at least a vertical direction on the basis of the measurement result obtained in the first level measurement step and the measurement result obtained in the position measurement step; and a second level measurement step of measuring the level of the surface of the substrate after the first movement step, wherein each of the plurality of shot regions has a measurement region, wherein in the first movement step, the substrate is moved such that a relative position of the measurement region of each of the plurality of shot regions and each of the plurality of shot regions along the surface is constant, and wherein in the second level measurement step, the measurement region of each of the plurality of shot regions is measured. | 01-08-2009 |
20090091723 | MEASURING APPARATUS, EXPOSURE APPARATUS, AND DEVICE FABRICATION METHOD - The present invention provides a measuring apparatus which measures a shape of a surface of a measurement target object, comprising a light projecting optical system configured to split light from a light source into measurement light and reference light so that the measurement light enters the surface of the measurement target object and the reference light enters a reference mirror, a light receiving optical system configured to guide the measurement light reflected by the surface of the measurement target object and the reference light reflected by the reference mirror to a photoelectric conversion device, and a processing unit configured to calculate the shape of the surface of the measurement target object based on an interference pattern which is detected by the photoelectric conversion device and formed by the measurement light and the reference light. | 04-09-2009 |
20090262323 | MEASUREMENT APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD - A measurement apparatus which measures a surface position of an object comprises a first measurement device configured to make measurement light from the object and reference light from a reference mirror interfere with each other on a light receiving surface of a photo-electric conversion device to form an interference pattern, and photo-electrically convert the interference pattern by the photo-electric conversion device to output an interference signal, a second measurement device configured to measure the surface position of the object, and an arithmetic processing unit configured to detect the surface position of the object based on a peak, of the interference signal, which is ensured to be a peak of a central fringe according to the measurement result obtained using the second measurement device. | 10-22-2009 |
20100125432 | MEASUREMENT APPARATUS, MEASUREMENT METHOD, COMPUTER, PROGRAM, AND EXPOSURE APPARATUS - A measurement apparatus includes an interferometer, and a computer configured to calculate a phase distribution and an amplitude distribution by Fourier-transforming a first interference signal detected by the photoelectric conversion element of the interferometer, to correct the phase distribution using a correction-use phase difference distribution, to calculate a second interference signal by reverse-Fourier-transforming the phase distribution that has been corrected and the amplitude distribution, and to calculate the position of the target surface based on the second interference signal. | 05-20-2010 |
20110032503 | MEASUREMENT APPARATUS, EXPOSURE APPARATUS, AND DEVICE FABRICATION METHOD - The present invention provides a measurement apparatus which measures a height of a test surface, the apparatus including an image sensing device including a plurality of detection units configured to detect interfering light formed by measurement light from the test surface and reference light from a reference surface, and an optical system configured to guide measurement light beams, reflected at a plurality of measurement points on the test surface, and reference light beams, reflected at a plurality of reference points on the reference surface, to the plurality of detection units, respectively, wherein the reference surface generates differences among optical path differences between the measurement light beams and the reference light beams which enter the plurality of detection units, respectively. | 02-10-2011 |
20110032504 | MEASUREMENT APPARATUS, EXPOSURE APPARATUS, AND DEVICE FABRICATION METHOD - The present invention provides a measurement apparatus which measures a height of a test surface, the apparatus including an image sensing device including a plurality of detection units configured to detect interfering light formed by measurement light from the test surface and reference light from a reference surface, and an optical system configured to guide the measurement light and the reference light to the plurality of detection units, wherein the reference surface is placed such that differences are generated among optical path differences between measurement light beams and reference light beams which enter the plurality of detection units, respectively. | 02-10-2011 |
20110176139 | MEASURING APPARATUS AND EXPOSURE DEVICE - An apparatus includes a system configured to split a light emitted from a light source into reference light and subject light, cause the subject light to enter into an object, and combine the subject light reflected by the object with the reference light, a detection unit configured to detect coherent light between the combined subject and reference lights, an element, provided within a light path of the reference light or the subject light, configured to change a path length difference between the reference light and the subject light and a relative position between the reference light and the subject light in a light receiving surface of the detection unit, and a position-variable mechanism configured to cause a position of the optical element to be changeable, wherein, by changing a position of the element, the optical path length difference and the relative position are independently adjusted. | 07-21-2011 |
20110299093 | INTERFEROMETER - An interferometer measures a displacement of an object to be measured by observing a fluctuation in intensity of interfering light generated by dividing light emitted from a light source into two light beams and overlaying the two light beams. The interferometer includes: a light-receiving unit including a light-receiving area including a plurality of partial areas and configured to detect the interfering light in each of the plurality of partial areas; and a processing unit configured to calculate a value of an index indicating uniformity of a phase distribution of the interfering light in the light-receiving area by using a detection result in each of the partial areas. | 12-08-2011 |
20120008122 | EXPOSURE APPARATUS AND DEVICE FABRICATION METHOD - The present invention provides an exposure apparatus including an obtaining unit configured to obtain data of a first imaging position at which light from a first pattern having, as a longitudinal direction thereof, a first direction perpendicular to an optical axis of a projection optical system forms an image via the projection optical system, and data of a second imaging position at which light from a second pattern having, as a longitudinal direction thereof, a second direction which is not parallel to the first direction and is perpendicular to the optical axis forms an image via the projection optical system, when the first pattern and the second pattern are respectively placed on an object plane of the projection optical system, and a control unit configured to control a stage so that a substrate is positioned at a target position of the substrate along the optical axis. | 01-12-2012 |
20140055768 | POSITION DETECTOR, LITHOGRAPHY APPARATUS, AND DEVICE MANUFACTURING METHOD - A position detector configured to detect a position of an object to be detected. The position detector has an optical system configured to detect a mark on the object to be detected that includes a lens that has a positive refractive power, and a reflection member configured to reflect a light flux that passes through the lens in a convergent state or a divergent state. The reflection member is configured from at least one material of a material that exhibits a refractive index of less than 1.0 and an extinction coefficient of greater than 0.0, and a material that exhibits a refractive index of greater than 1.0 and an extinction coefficient of greater than 0.5. | 02-27-2014 |
20140185026 | EXPOSURE APPARATUS AND DEVICE FABRICATION METHOD - The present invention provides an exposure apparatus which expose a substrate, the apparatus including an illumination optical system configured to illuminate a mask using light from a light source, a projection optical system configured to irradiate the substrate with light from a pattern on the mask, an adjustment unit configured to adjust an oxygen concentration in a space between the projection optical system and the substrate, an obtaining unit configured to obtain data of illuminance of light applied to the substrate, and a control unit configured to control the adjustment unit so as to set the oxygen concentration in the space to a predetermined concentration value based on the data of illuminance obtained by the obtaining unit. | 07-03-2014 |
20140186755 | EXPOSURE APPARATUS AND METHOD OF DEVICE FABRICATION - The present invention provides an exposure apparatus which exposes a substrate, the apparatus including an adjustment unit configured to adjust an oxygen concentration in a space between the projection optical system and the substrate, a measuring unit configured to measure an illuminance of light applied to the substrate, and a control unit configured to control the measuring unit so as to measure illuminances of light applied to the substrate a plurality of times during irradiation of the substrate with light from the projection optical system, configured to calculate, based on each of the illuminances measured the plurality of times, an oxygen concentration value corresponding to the measured illuminance on each time and configured to control the adjustment unit so as to set the oxygen concentration in the space to the calculated oxygen concentration value. | 07-03-2014 |
20140218712 | EXPOSURE APPARATUS AND DEVICE FABRICATION METHOD - An exposure apparatus and a fabrication method thereof include an obtaining unit configured to obtain data of a first imaging position at which light from a first pattern having, as a longitudinal direction thereof, a first direction perpendicular to an optical axis of a projection optical system forms an image via the projection optical system, and data of a second imaging position at which light from a second pattern having, as a longitudinal direction thereof, a second direction which is not parallel to the first direction and is perpendicular to the optical axis forms an image via the projection optical system, when the first pattern and the second pattern are respectively placed on an object plane of the projection optical system, and a control unit configured to control a stage so that a substrate is positioned at a target position of the substrate along the optical axis. | 08-07-2014 |