Patent application number | Description | Published |
20090183548 | METHOD AND APPARATUS FOR IN SITU TESTING OF GAS FLOW CONTROLLERS - Methods and apparatus utilize a rate of drop in pressure upstream of a gas flow controller (GFC) to accurately measure a rate of flow through the GFC. Measurement of the gas flow through the many gas flow controllers in production use today is enabled, without requiring any special or sophisticated pressure regulators or other special components. Various provisions ensure that none of the changes in pressure that occur during or after the measurement perturb the constant flow of gas through the GFC under test. | 07-23-2009 |
20090183549 | METHOD AND APPARATUS FOR IN SITU TESTING OF GAS FLOW CONTROLLERS - Methods and apparatus utilize a rate of drop in pressure upstream of a gas flow controller (GFC) to accurately measure a rate of flow through the GFC. Measurement of the gas flow through the many gas flow controllers in production use today is enabled, without requiring any special or sophisticated pressure regulators or other special components. Various provisions ensure that none of the changes in pressure that occur during or after the measurement perturb the constant flow of gas through the GFC under test. | 07-23-2009 |
20110011183 | METHOD AND APPARATUS FOR IN SITU TESTING OF GAS FLOW CONTROLLERS - Methods and apparatus utilize a rate of drop in pressure upstream of a gas flow controller (GFC) to accurately measure a rate of flow through the GFC. Measurement of the gas flow through the many gas flow controllers in production use today is enabled, without requiring any special or sophisticated pressure regulators or other special components. Various provisions ensure that none of the changes in pressure that occur during or after the measurement perturb the constant flow of gas through the GFC under test. | 01-20-2011 |
20110137581 | METHOD AND APPARATUS FOR ENHANCING IN-SITU GAS FLOW MEASUREMENT PERFORMANCE - An in-situ gas flow measurement controller measures the temperature and rate of pressure drop upstream from a flow control device (FCD). The controller samples the pressure and temperature data and applies the equivalent of a decimating filter to the data to produce filtered data at a slower sampling rate. The controller derives timestamps by counting ticks from the sampling clock of the A/D converter that is sampling the pressure at regular intervals to ensure the timestamps associated with the pressure samples are accurate and do not contain jitter that is associated with software clocks. The controller additionally normalizes the temperature reading to account for power supply fluctuations, filters out noise from the pressure and temperature readings, and excludes data during periods of instability. It calculates the gas flow rate accounting for possible non-linearities in the pressure measurements, and provides the computed gas flow measurement via one of many possible interfaces. | 06-09-2011 |
20110137582 | METHOD AND APPARATUS FOR ENHANCING IN-SITU GAS FLOW MEASUREMENT PERFORMANCE - An in-situ gas flow measurement controller measures the temperature and rate of pressure drop upstream from a flow control device (FCD). The controller samples the pressure and temperature data and applies the equivalent of a decimating filter to the data to produce filtered data at a slower sampling rate. The controller derives timestamps by counting ticks from the sampling clock of the A/D converter that is sampling the pressure at regular intervals to ensure the timestamps associated with the pressure samples are accurate and do not contain jitter that is associated with software clocks. The controller additionally normalizes the temperature reading to account for power supply fluctuations, filters out noise from the pressure and temperature readings, and excludes data during periods of instability. It calculates the gas flow rate accounting for possible non-linearities in the pressure measurements, and provides the computed gas flow measurement via one of many possible interfaces. | 06-09-2011 |
20110137583 | METHOD AND APPARATUS FOR ENHANCING IN-SITU GAS FLOW MEASUREMENT PERFORMANCE - An in-situ gas flow measurement controller measures the temperature and rate of pressure drop upstream from a flow control device (FCD). The controller samples the pressure and temperature data and applies the equivalent of a decimating filter to the data to produce filtered data at a slower sampling rate. The controller derives timestamps by counting ticks from the sampling clock of the A/D converter that is sampling the pressure at regular intervals to ensure the timestamps associated with the pressure samples are accurate and do not contain jitter that is associated with software clocks. The controller additionally normalizes the temperature reading to account for power supply fluctuations, filters out noise from the pressure and temperature readings, and excludes data during periods of instability. It calculates the gas flow rate accounting for possible non-linearities in the pressure measurements, and provides the computed gas flow measurement via one of many possible interfaces. | 06-09-2011 |
20120304781 | METHOD AND APPARATUS FOR IN SITU TESTING OF GAS FLOW CONTROLLERS - Methods and apparatus utilize a rate of drop in pressure upstream of a gas flow controller (GFC) to accurately measure a rate of flow through the GFC. Measurement of the gas flow through the many gas flow controllers in production use today is enabled, without requiring any special or sophisticated pressure regulators or other special components. Various provisions ensure that none of the changes in pressure that occur during or after the measurement perturb the constant flow of gas through the GFC under test. A pressure regulator is coupled to a gas source. The GFC is positioned downstream of the pressure regulator. A pressure transducer is measuring pressure in a volume between the pressure regulator and the GFC, wherein means are provided for increasing the pressure in the volume. | 12-06-2012 |
Patent application number | Description | Published |
20090005894 | METHOD AND SYSTEM FOR ENHANCING THE YIELD IN SEMICONDUCTOR MANUFACTURING - Roughly described, a manufacturing process is enhanced by using TCAD and TCAD-derived models. A TCAD simulation model of the process is developed, which predicts, in dependence upon a plurality of process input parameters, a value for a performance parameter of a product to be manufactured using the process. Estimated, predicted or desired values for a calculated subset of the parameters (including either process input parameters or product performance parameters or both), are determined in dependence upon the process model, and further in dependence upon actual, estimated or desired values for a different subset of the parameters (again either process input parameters or product performance parameters or both). The determination is preferably made using a process compact model of the process, itself developed in dependence upon the simulation model. | 01-01-2009 |
20100121474 | Method and System for Enhancing the Yield In Semiconductor Manufacturing - Roughly described, a manufacturing process is enhanced by using TCAD and TCAD-derived models. A TCAD simulation model of the process is developed, which predicts, in dependence upon a plurality of process input parameters, a value for a performance parameter of a product to be manufactured using the process. Estimated, predicted or desired values for a calculated subset of the parameters (including either process input parameters or product performance parameters or both), are determined in dependence upon the process model, and further in dependence upon actual, estimated or desired values for a different subset of the parameters (again either process input parameters or product performance parameters or both). The determination is preferably made using a process compact model of the process, itself developed in dependence upon the simulation model. | 05-13-2010 |
Patent application number | Description | Published |
20110170097 | Fiber-Based Optical Probe With Decreased Sample-Positioning Sensitivity - Reflectance systems and methods are described that under-fill the collection fiber of a host spectrometer both spatially and angularly. The under-filled collection fiber produces a response of fiber-based spectrometers that is relatively insensitive to sample shape and position. | 07-14-2011 |
20120176604 | Combining Normal-Incidence Reflectance and Transmittance with Non-Normal-Incidence Reflectance for Model-Free Characterization of Single-Layer Films - Optical systems and methods are described that provide greater solving power for thin-film measurements in general, and provide a unique model-free solution for single-layer films in particular. | 07-12-2012 |
20130250294 | AUTOMATIC REAL-TIME WAVELENGTH CALIBRATION OF FIBER-OPTIC-BASED SPECTROMETERS - A system comprising a calibration light source is described. The system includes a calibration optical fiber coupled to an output of the calibration light source and to an input slit of a spectrometer. The calibration optical fiber transmits light output of the calibration light source to the spectrometer via the slit. An input optical fiber is coupled to the input slit in addition to the calibration optical fiber. The input optical fiber transmits light-under-test to the spectrometer via the slit. | 09-26-2013 |
20130258333 | CORRECTION OF SECOND-ORDER DIFFRACTION EFFECTS IN FIBER-OPTIC-BASED SPECTROMETERS - Embodiments described herein correct errors in spectrometer outputs due to the presence of second-order light. Embodiments determine a relationship between first-order light and second-order light of the spectrometer output. The relationship is a function of wavelength and an output of the spectrometer due to the first-order light. The relationship is used to determine an estimated contribution of the second-order light to the output. Spectrometer errors introduced by the second-order light are corrected by adjusting the spectrometer output according to the estimated contribution of the second-order light. | 10-03-2013 |
20130265795 | HIGH-LIFETIME BROADBAND LIGHT SOURCE FOR LOW-POWER APPLICATIONS - Embodiments described herein include broadband light source system comprising an optic coupler including a plurality of input branches coupled to an output. The system includes a plurality of light sources coupled to the plurality of input branches. Each light source outputs light having a different wavelength distribution than any other light source of the plurality of light sources. The output emits a broadband light source comprising a combined spectral output of the plurality of light sources. | 10-10-2013 |