Bijkerk
Elise Bijkerk, Rotterdam NL
Patent application number | Description | Published |
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20090004342 | Temporally Meal Menu For Infants - The invention concerns a kit of parts and a method for providing nutrition which provides within a time period of 5 to 10 days a nutritional composition comprising 0.35 to 6 mg iron per 100 g, a nutritional composition comprising 1 to 10 g fibre per 100 g and a nutritional composition comprising 10 to 5000 mg long chain poly unsaturated fatty acids per 100 g to an infant. | 01-01-2009 |
20140335221 | TEMPORALLY MEAL MENU FOR INFANTS - The invention concerns a kit of parts and a method for providing nutrition which provides within a time period of 5 to 10 days a nutritional composition comprising 0.35 to 6 mg iron per 100 g, a nutritional composition comprising 1 to 10 g fibre per 100 g and a nutritional composition comprising 10 to 5000 mg long chain poly unsaturated fatty acids per 100 g to an infant. | 11-13-2014 |
Fred Bijkerk, Bosch En Duin NL
Patent application number | Description | Published |
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20100027107 | REFLECTIVE OPTICAL ELEMENT FOR EUV LITHOGRAPHY DEVICE - A reflective optical element exhibits an increase in the maximum reflectivity at operating wavelengths in the extreme ultraviolet or soft x-ray wavelength range. A first additional intermediate layer ( | 02-04-2010 |
Frederik Bijkerk, Amsterdam NL
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20100171050 | METHOD FOR REGENERATING A SURFACE OF AN OPTICAL ELEMENT IN AN XUV RADIATION SOURCE, AND XUV RADIATION SOURCE - Method for regenerating a surface of an optical element in a radiation source for electromagnetic radiation with a wavelength in the extreme ultraviolet wavelength range, H (EUV, XUV) in particular with a wavelength in the wavelength range between 10 nm and 15 nm, this radiation source comprising at least a chamber for arranging therein a plasma generating XUV or EUV radiation and the optical element, in particular a collector for bundling XUV or EUV radiation generated by the plasma and causing it to exit the chamber, according to which method a first Si, C or metal compound is arranged in the chamber which reacts in an equilibrium reaction with the material of the surface of the collector to form respectively a second Si, C or metal compound bonded to this surface, and XUV or EUV radiation source adapted for such a method. | 07-08-2010 |
Frederik Bijkerk, Bosch En Duin NL
Patent application number | Description | Published |
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20110194087 | REFLECTIVE OPTICAL ELEMENT AND METHOD OF MANUFACTURING THE SAME - A reflective optical element e.g. for use in EUV lithography, configured for an operating wavelength in the soft X-ray or extreme ultraviolet wavelength range, includes a multilayer system ( | 08-11-2011 |
20130188248 | REFLECTIVE OPTICAL ELEMENT AND METHOD OF MANUFACTURING THE SAME - A reflective optical element e.g. for use in EUV lithography, configured for an operating wavelength in the range from 5 nm to 12 nm, includes a multilayer system with respective layers of at least two alternating materials having differing real parts of the refractive index at the operating wavelength. The material having the lower real part of the refractive index is a nitride or a carbide. “Alternatively, the material having the lower real part of the refractive index is thorium, uranium or barium and the material having the higher real part of the refractive index is boron or boron carbide. | 07-25-2013 |
20130220971 | METHOD FOR MANUFACTURING A MULTILAYER STRUCTURE WITH A LATERAL PATTERN FOR APPLICATION IN THE XUV WAVELENGTH RANGE, AND BF AND LMAG STRUCTURES MANUFACTURED ACCORDING TO THIS METHOD - Method for manufacturing a multilayer structure with a lateral pattern, in particular of an optical grating for application in an optical device for electromagnetic radiation with a wavelength in the wavelength range between 0.1 nm and 100 nm, comprising the steps of (i) providing a multilayer structure, and (ii) arranging a lateral three-dimensional pattern in the multilayer structure, wherein step (ii) of arranging the lateral pattern is performed by means of a method for nano-imprint lithography (NIL), and BF and LMAG structures manufactured according to this method. | 08-29-2013 |
20140193591 | METHOD FOR PRODUCING A REFLECTIVE OPTICAL ELEMENT FOR EUV-LITHOGRAPHY - A method aleviating blistering, cracking and chipping in topmost layers of a multilayer system exposed to reactive hydrogen, when producing a reflective optical element ( | 07-10-2014 |
20140285783 | EUV-MIRROR ARRANGEMENT, OPTICAL SYSTEM WITH EUV-MIRROR ARRANGEMENT AND ASSOCIATED OPERATING METHOD - An EUV mirror arrangement ( | 09-25-2014 |