Patent application number | Description | Published |
20130073825 | STORAGE APPARATUS, COMPUTER SYSTEM, AND DATA MIGRATION METHOD - Provided is a method of using a dynamic chunk allocation function to efficiently carry out data volume migration. A storage apparatus according to the present invention includes first and second storage units and divides a storage extent in the second storage unit into chunks to add the chunks to a chunk pool to dynamically allocate the chunks in the chunk pool to a newly created logical data volume (see FIG. | 03-21-2013 |
20130282887 | COMPUTER SYSTEM AND VIRTUAL SERVER MIGRATION CONTROL METHOD FOR COMPUTER SYSTEM - When migrating a virtual server between a plurality of physical servers, a pre-migration connection relationship between the virtual server and a storage area used by the virtual server is maintained after the migration of the virtual server by using a cooperative mechanism between a plurality of storage apparatuses even if the storage area used by the virtual server is migrated between the plurality of storage apparatuses. A computer system and virtual server migration control method for the computer system is described. | 10-24-2013 |
20130311645 | MANAGEMENT SYSTEM AND MANAGEMENT METHOD - A management system outputs catalog data, which has been created based on catalog-source data comprising data showing at least an application of a relevant resource with respect to each of multiple providable resources, and which shows the respective applications of the multiple resources, and receives a selection of a resource to be provided from the multiple resources. The management system provides the selected resource as a provided resource, and determines, based on a performance threshold configured with respect to the application of the provided resource, whether or not a performance measurement value, which relates to the processing performance of a network service using the provided resource and which can be monitored by the management system, is normal. | 11-21-2013 |
20150236977 | MANAGEMENT COMPUTER, COMPUTER SYSTEM, AND INSTANCE MANAGEMENT METHOD - In the case of performance deterioration or performance excess with respect to current resource assignment, both processing capacity and resource use efficiency are optimized by an appropriate configuration change. For that purpose, the present invention proposes an appropriate migration measure to a request for performance improvement. Whether or not the server in which performance deterioration or excess occurs and another server influence each other in performance is identified, and it is determined whether a change of a resource amount in the same device is appropriate or migration to another device is appropriate. Regarding the migration measure, after feasibility is checked, items for improvement are presented together with required time and cost taken for the migration, and merits and demerits of the configuration change work are quantitatively indicated (see FIG. | 08-20-2015 |
Patent application number | Description | Published |
20080231957 | ANTIREFLECTION FILM, OPTICAL ELEMENT AND OPTICAL SYSTEM - An antireflection film includes a multilayer film having six layers, in total, provided between an optical substrate and an adhesion layer. The respective layers of first to sixth layers are laminated in order from one side of the adhesion layer. A refractive index of the antireflection film as a whole is lower than that of the optical substrate and higher than that of the adhesion layer. The first and third layers are low refractive index layers having a refractive index of 1.35 to 1.50 at d line. The second, fourth and sixth layers are middle refractive index layers having a refractive index of 1.55 to 1.85 at the d line. The fifth layer is a high refractive index layer having a refractive index, at the d line, that is in a range of 1.70 to 2.50 and that is higher than that of the middle refractive index layer. | 09-25-2008 |
20080239501 | COLOR-SEPARATION OPTICAL SYSTEM AND IMAGING APPARATUS - A curve representing a characteristic of a blue-light reflecting dichroic film DB and a curve representing a characteristic of a red-light reflecting dichroic film DR are configured to have shapes that track an ideal spectral characteristic of green. Accordingly, it is possible to obtain a characteristic approximated to the ideal spectral characteristic without using a trimming filter having a dichroic film in an exiting surface of a prism. Since it is not necessary to use the trimming filter having the dichroic film, it is possible to prevent ghost and flare from occurring due to the dichroic film of the trimming filter. Accordingly, it is possible to embody an imaging apparatus having the ideal spectral characteristic with ghost and flare being reduced. | 10-02-2008 |
20090290219 | REFLECTION REDUCING FILM, OPTICAL MEMBER AND OPTICAL SYSTEM - A reflection reducing film is provided on a surface of an optical substrate, and is sequentially provided with a buffer layer and a reflection reducing layer. The reflection reducing layer includes first to eighth layers sequentially laminated from the side of the buffer layer. The first and sixth layers are made of a low-refractive index material having a refractive index in the range of 1.35 to 1.50 at the d-line, the third, fifth and seventh layers are made of an intermediate-refractive index material having a refractive index in the range of 1.55 to 1.85 at the d-line, and the second, fourth and eighth layers are made of a high-refractive index material having a refractive index in the range of 1.70 to 2.50 at the d-line. | 11-26-2009 |
20120276350 | REFLECTION REDUCING FILM, OPTICAL MEMBER AND OPTICAL SYSTEM - A reflection reducing film is provided on a surface of an optical substrate, and is sequentially provided with a buffer layer and a reflection reducing layer. The reflection reducing layer includes first to eighth layers sequentially laminated from the side of the buffer layer. The first and sixth layers are made of a low-refractive index material having a refractive index in the range of 1.35 to 1.50 at the d-line, the third, fifth and seventh layers are made of an intermediate-refractive index material having a refractive index in the range of 1.55 to 1.85 at the d-line, and the second, fourth and eighth layers are made of a high-refractive index material having a refractive index in the range of 1.70 to 2.50 at the d-line. | 11-01-2012 |
Patent application number | Description | Published |
20150244181 | POWER SUPPLY UNIT, POWER RECEIVING UNIT, AND POWER SUPPLY SYSTEM - Provided is a power supply system in which an electromagnetic leakage is prevented. A power supply side resonance coil provided to a power supply unit and a power receiving side resonance coil provided to a power receiving unit are housed respectively in a conductive power supply side shield case and power receiving side shield case. The power supply side shield case is formed of a bottom wall covering a side of the power supply side resonance coil spaced apart from the power receiving side resonance coil and a vertical wall erecting from a periphery of the bottom wall, and a ferrite is provided onto surfaces of the bottom wall and the vertical wall. | 08-27-2015 |
20150372507 | COIL UNIT AND POWER SUPPLYING SYSTEM - A power supplying system magnetically resonates between a primary resonant coil that configures a primary core unit and a secondary resonant coil that configures a secondary core unit for contactlessly supplying the power. The primary and secondary resonant coils are wound around the primary and secondary ferrite cores respectively, and face each other in the direction perpendicular to the axial direction of the primary and secondary resonant coils when supplying the power. The primary and secondary ferrite cores are divided into a plurality of portions along the axial direction of the primary and secondary resonant coils such that a width of the both end portions is shorter than a width of the center portion. | 12-24-2015 |
20150380154 | POWER SUPPLYING SIDE COIL AND CONTACTLESS POWER SUPPLYING APPARATUS - A power supplying side resonant coil contactlessly supplies power to a power receiving side resonant coil. The power supplying side resonant coil includes a first power supplying side coil unit and a second power supplying side coil unit disposed side by side on the same axis. The first power supplying side coil unit and the second power supplying side coil unit are opposite to each other in the direction of winding. | 12-31-2015 |
20160005532 | COIL UNIT AND CONTACTLESS POWER SUPPLYING APPARATUS - In a power supplying side core around which a power supplying side resonant coil is wound that contactlessly supplies power to a power receiving side resonant coil, a pair of protrusion portions is provided that protrudes from central axis direction both sides of the power supplying side resonant coil toward the power receiving side resonant coil. Further, in a power receiving side core around which the power receiving side resonant coil is wound that contactlessly receives power from the power supplying side resonant coil, a pair of protrusion portions is provided that protrudes from central axis direction both sides of the power receiving side resonant coil toward the power supplying side resonant coil. | 01-07-2016 |
20160049800 | POWER SUPPLY SYSTEM AND RESONANCE CIRCUIT - Primary and secondary resonance circuits and include primary and secondary resonance coils and primary and secondary capacitors, respectively. Non-contact power supply is conducted by electromagnetic resonance of the primary and secondary resonance circuits and. A changeover circuit changes over connection of the secondary resonance coil and the secondary capacitor to a series connection or a parallel connection. A detection circuit detects impedance on a power receipt side. A changeover control circuit controls changeover conducted by the changeover circuit, depending upon the impedance detected by the detection circuit. | 02-18-2016 |
Patent application number | Description | Published |
20090074395 | IMAGE-TAKING APPARATUS AND FOCUSING METHOD - An image-taking apparatus is disclosed, which is capable of reducing the influence of the one-side blur by the automatic focusing function. The image-taking apparatus comprises a focus detector, which detects the focus state of the plurality of focus detection areas, and a selector, which selects a focus target area from a plurality of focus detection area based on the detection result of the focus detector. In a case where a first object distance to a first object is longer than a first predetermined distance, and a second object distance to a second object, which exists on an outer side of the first object in the image-taking screen, is shorter than the first object distance by a second predetermined distance or more, the selector selects the focus detection area corresponding to the second object as the focus target area. | 03-19-2009 |
20100194916 | IMAGE CAPTURE APPARATUS, METHOD OF CONTROLLING THE SAME, AND PROGRAM - An apparatus includes an image capture unit which includes an image sensor in which pixels for photoelectrically converting an object image are two-dimensionally arrayed in correspondence with color filters of a plurality of colors, and generates an image signal, a reducing unit which reduces the image signal output from the image capture unit to generate a reduced image, an image processing unit which performs development processing for the reduced image to obtain a first developed image containing luminance components and color difference components and performs development for the image signal output from the image capture unit to obtain a second developed image containing luminance and color difference components, an enlargement unit which enlarges the first developed image to the same size as that of the second developed image, and a composition unit which performs composition of the second developed image and an enlarged image. | 08-05-2010 |
20100226636 | FOCUS ADJUSTMENT METHOD, FOCUS ADJUSTMENT APPARATUS, AND CONTROL METHOD THEREOF - An apparatus comprises a face position detection section for detecting at least a position at which is present a person's face inside a frame using an image signal obtained from an image sensor for photoelectrically converting an object image captured by a photographing optical system, a focus control section for controlling the photographing optical system by referencing in-focus positions of the object image obtained inside focus detection areas for detecting focus states of the object image positioned in the frame, and a control section for controlling the focus control section so as to reference at least one or the other of an in-focus position obtained in a first focus detection area in which is present a person's face and an in-focus position obtained in a second focus detection area in which is expected to be present a body of a person determining from the position of the face of the person. | 09-09-2010 |
Patent application number | Description | Published |
20160068429 | PATTERN FORMING METHOD, PHOTOMASK, AND TEMPLATE FOR NANOIMPRINT - A pattern forming method includes forming a first region and a second region on a to-be-processed layer. The first region includes a guide pattern. In the second region, an affinity to one of the first segment and the second segment which are included in a self-assembly material, is higher than the affinity to the other. The self-assembly material is applied onto the first region and the second region. The self-assembly material is phase-separated into a first domain including the first segment, and a second domain including the second segment. Any one of the first domain and the second domain is selectively removed. | 03-10-2016 |
20160068430 | PATTERNING METHOD - A patterning method according to one embodiment includes forming on a glass substrate a guide pattern including a first region at which the glass substrate is exposed, and a second region on which a pattern is formed. A self-assembly material including a first segment pinned to the first region, and a second segment is applied onto the guide pattern. The self-assembly material is phase-separated into a first domain including the first: segment and a second domain including the second segment. One of the first domain and the second domain is selectively removed. The width of the first region is not less than 0.8 times and not more than 1.15 times as large as the width of the first domain. | 03-10-2016 |
20160077436 | PATTERNING METHOD, AND TEMPLATE FOR NANOIMPRINT AND PRODUCING METHOD THEREOF - A patterning method according to one embodiment includes forming a ground layer on a processing target layer. The ground layer has higher affinity for one of a first segment and a second segment contained in a self-assembly material than for the other segment. The neutral layer is patterned on the ground layer. The neutral layer is neutral to the first segment and the second segment. Exposing surfaces of the ground layer and the neutral layer is irradiated with an energy ray. The self-assembly material is applied onto the ground layer and the neutral layer. The self-assembly material is phase-separated into a first domain including the first segment and a second domain including the second segment. One of the first domain and the second domain is selectively removed. | 03-17-2016 |
Patent application number | Description | Published |
20100129737 | DEVELOPMENT METHOD, METHOD OF MANUFACTURING PHOTOMASK, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND DEVELOPMENT DEVICE - A development method according to an embodiment includes exposing a photosensitive film formed on a substrate at a predetermined exposure amount, carrying out a first development process that develops the exposed photosensitive film at a predetermined first development condition so as to leave the photosensitive film, obtaining a sensitivity information of the photosensitive film from a film thickness reduction of the photosensitive film developed by the first development process and the exposure amount, predicting pattern dimensions of multiple types of patterns to be formed when a second development process is carried out following the first development process from the sensitivity information, and determining a first acceptable range of a development condition in the second development process, determining a second acceptable range of the development condition in the second development process from the first acceptable range and a variation amount of the pattern dimension after the development process between the multiple types of patterns and determining a second development condition in the second development process so as to satisfy both of the first and second acceptable ranges. | 05-27-2010 |
20110207031 | SUBSTRATE PROCESSING METHOD, MANUFACTURING METHOD OF EUV MASK, AND EUV MASK - According to the substrate processing method in the embodiments, as a mask substrate used for forming an EUV mask, a mask substrate in which a first film having a first hydrophilicity is formed on one main surface and a resist is applied to another main surface is exposed from a side of the resist. Then, a hydrophilic treatment is performed on a surface of the first film to make the surface of the first film have a second hydrophilicity larger than the first hydrophilicity. Then, a development treatment of the resist is performed with respect to the mask substrate in which the hydrophilic treatment is performed on the surface of the first film to have the second hydrophilicity. | 08-25-2011 |
20110293305 | Development method, method of manufacturing photomask, method of manufacturing semiconductor device and development device - A development method according to an embodiment includes exposing a photosensitive film formed on a substrate at a predetermined exposure amount, carrying out a first development process that develops the exposed photosensitive film at a predetermined first development condition so as to leave the photosensitive film, obtaining a sensitivity information of the photosensitive film from a film thickness reduction of the photosensitive film developed by the first development process and the exposure amount, predicting pattern dimensions of multiple types of patterns to be formed when a second development process is carried out following the first development process from the sensitivity information, and determining a first acceptable range of a development condition in the second development process, determining a second acceptable range of the development condition in the second development process from the first acceptable range and a variation amount of the pattern dimension after the development process between the multiple types of patterns and determining a second development condition in the second development process so as to satisfy both of the first and second acceptable ranges. | 12-01-2011 |
20130141708 | SUBSTRATE PROCESSING METHOD, MANUFACTURING METHOD OF EUV MASK, AND EUV MASK - According to the substrate processing method in the embodiments, as a mask substrate used for forming an EUV mask, a mask substrate in which a first film having a first hydrophilicity is formed on one main surface and a resist is applied to another main surface is exposed from a side of the resist. Then, a hydrophilic treatment is performed on a surface of the first film to make the surface of the first film have a second hydrophilicity larger than the first hydrophilicity. Then, a development treatment of the resist is performed with respect to the mask substrate in which the hydrophilic treatment is performed on the surface of the first film to have the second hydrophilicity. | 06-06-2013 |
Patent application number | Description | Published |
20120258765 | USER INFORMATION ADMINISTRATION SYSTEM AND USER INFORMATION ADMINISTRATION METHOD - A base station outputs annunciation information which corresponds to a plurality of radio cells established by a 3G public base station and an LTE public base station and which is different from annunciation information output from the 3G public base station and the LTE public base station into a target region X and forms a radio cell. A mobile station that enters the radio cell receives the annunciation information of the radio cell and executes a position registration process. An information administration device can thereby find the mobile station based on the position registration process even in the environment where a plurality of radio cells to which different frequencies are assigned are established geographically overlapping with one another. | 10-11-2012 |
20130045768 | MOBILE COMMUNICATION SYSTEM, NETWORK APPARATUS, AND MOBILE COMMUNICATION METHOD - A mobile communication system | 02-21-2013 |
20130130696 | MOBILE COMMUNICATION SYSTEM, BASE STATION, AND MOBILE COMMUNICATION METHOD - A radio controller | 05-23-2013 |
20130142171 | MOBILE COMMUNICATION SYSTEM, RADIO NETWORK CONTROLLER, AND MOBILE COMMUNICATION METHOD - A radio network controller | 06-06-2013 |
20130143567 | MOBILE COMMUNICATION SYSTEM, RADIO CONTROLLER, BASE STATION, AND MOBILITY CONTROL METHOD - A radio controller | 06-06-2013 |
20130150069 | MOBILE COMMUNICATION SYSTEM, BASE STATION, AND MOBILE COMMUNICATION METHOD - A radio network controller includes an acquisition unit configured to acquire a radio communication state of a neighboring cell located around a cell formed by a base station which the mobile station camps on among base stations, and a level determination unit configured to determine the in-out reception level based on an acquisition result of the radio communication state by the acquisition unit. The level determination unit calculates an estimated reception level of the radio channel in a reception level tie point P in which the reception level of the radio channel transmitted by a base station | 06-13-2013 |
Patent application number | Description | Published |
20120034947 | TRANSMISSION POWER CONTROL SYSTEM, BASE STATION, AND TRANSMISSION POWER CONTROL METHOD - A transmission power determination system configured to control a transmission power of a radio signal transmitted by a small base station in a mobile communication network including a general base station forming a predetermined cell and the small base station forming a small cell smaller in size than the predetermined cell, the transmission power determination system comprising: a reception power acquisition unit configured to acquire a reception power of a radio signal from one of a different small base station or the general base station, which can be received by the small base station; a determination unit configured to determine one of the different small base station and the general base station which transmits the radio signal acquired by the reception power acquisition unit; a pathloss value calculation unit configured to calculate, when it is determined by the determination unit that the radio signal is transmitted from the different small base station, pathloss value between the different small base station and the small base station based on a difference between a transmission power of the radio signal from the different small base station and the reception power of the radio signal from the different small base station acquired by the reception power acquisition unit; and a transmission power determination unit configured to determine the transmission power of the radio signal transmitted by the small base station, based on the pathloss value calculated by the pathloss value calculation unit. | 02-09-2012 |
20120294175 | CONTROL DEVICE AND MOBILE COMMUNICATION METHOD - A control device | 11-22-2012 |
20120329504 | MOBILE COMMUNICATION SYSTEM, NETWORK APPARATUS, MOBILE COMMUNICATION METHOD - A network apparatus | 12-27-2012 |
20130023270 | MOBILE COMMUNICATION SYSTEM, RADIO BASE STATION FOR SPECIFIC CELL, AND MOBILE COMMUNICATION METHOD - A mobile communication system 100 includes a radio base station 20 for a specific cell configured to manage a specific cell to which any one of a plurality of frequencies allocated to a public cell is allocated. The radio base station 20 for a specific cell notifies guidance notification leading cell reselection from the public cell to the specific cell by using the remaining frequencies other than the frequency allocated to the specific cell. | 01-24-2013 |
20130029610 | DETERMINATION PROGRAM, DETERMINATION DEVICE, AND DETERMINATION METHOD - A determination device | 01-31-2013 |
20130045746 | MOBILE COMMUNICATION SYSTEM, NETWORK APPARATUS, AND MOBILE COMMUNICATION METHOD - A specific network apparatus | 02-21-2013 |
Patent application number | Description | Published |
20080222588 | Method and program for designing semiconductor device - A method of designing a semiconductor device is provided. According to the method, a group of cells that is a target of clock distribution is placed. After the group of cells is placed, a plurality of clock driver cells for driving the clock are placed such that each clock driver cell is prohibited from overlapping with a prohibited region of a predetermined size surrounding another clock driver cell. | 09-11-2008 |
20090243119 | Semiconductor integrated circuit - Power wiring comprises a first-layer power wiring cluster in which VDD wiring trace and VSS wiring trace of different potentials at single trace width are arranged alternatingly; a second-layer power wiring cluster, disposed in a layer overlying the first-layer power wiring cluster, in which a VDD wiring trace and a VSS wiring trace of different potentials at single trace width are arranged alternatingly; and vias, placed in areas where the first-layer power wiring cluster and second-layer power wiring clusters intersect three-dimensionally, for electrically connecting wiring traces of the same potential in the first-layer power wiring cluster and wiring traces of the same potential in the second-layer power wiring cluster. A signal-wiring formation area is provided between mutually adjacent first-layer power wiring clusters and between mutually adjacent second-layer power wiring clusters. Design rule violation regarding via density is avoided without decline in integration or an increase in chip area. | 10-01-2009 |
20110057710 | Semiconductor integrated circuit - A semiconductor integrated circuit | 03-10-2011 |
20140047402 | LSI DESIGN METHOD AND LSI DESIGN DEVICE - In an LSI design method of designing a clock tree that supplies a clock signal to a plurality of leaves from a clock supply point, when a high level clock tree is constituted by H-tree and a low level clock tree is formed by CTS, the number of stages of a high level clock tree is optimized without giving any constraint on the placement of a low level clock tree. The leaves are divided into a plurality of groups to form a low level local tree. A clock-supplied region including all leaves to be supplied with a clock is uniformly divided and for each divided region, a skew when a clock signal is supplied from an end of an H-tree to start points of a plurality of local trees included in that region is estimated. The clock-supplied region is more finely equally-divided to increase the number of stages of H-tree. | 02-13-2014 |
Patent application number | Description | Published |
20080253761 | DETECTING ABNORMALITY IN AN OPTICAL RECEIVER - An optical apparatus comprising: a branching unit branching an input light modulated by DQSPK format and thereby outputting a first branched light and a second branched light; a first branch and a second branch inputting the first branched light and the second branched light, respectively, the first branch and the second branch having an interferometer, a photo detector, and discriminator and demodulating I-signal and Q-signal, respectively; and an abnormality detection unit detecting an abnormality of the input light based on a synchronized detection of a first demodulated signal output from the photo detector in the first branch and a first recovered signal output from the discriminator in the first branch, and a synchronized detection of a second demodulated signal output from the photo detector in the second branch and a second recovered signal output from the discriminator in the second branch. | 10-16-2008 |
20090214226 | OPTICAL DQPSK RECEIVER AND OPTICAL PHASE MONITOR APPARATUS FOR USE IN OPTICAL DQPSK RECEIVER - First and second delay interferometers respectively have a phase-shift element. First and second photo detectors respectively detect optical signals output from the first and second delay interferometers. First and second data recovery circuits recover data from signals detected by the first and second photo detectors, respectively. A common adjustment unit adjusts the phase-shift elements of both first and second delay interferometers in accordance with an output signal from the first photo detector and an output signal from the second data recovery circuit. An individual adjustment unit adjusts the phase-shift element of the second delay interferometer in accordance with the output signal from the first photo detector and an output signal from the second photo detector. | 08-27-2009 |
20120251102 | LIGHT RECEIVING CIRCUIT AND BANDWIDTH CONTROL METHOD - A light receiving circuit includes: a filter, arranged in a downstream of an electric signal amplifier to amplify an electric signal based on a light signal, to adjust a bandwidth of an amplified electric signal; a monitor circuit to monitor a communication quality of the light signal and output a monitored value; and a control circuit to control a bandwidth of the filter based on a control value corresponding to the monitored value. | 10-04-2012 |