Patent application number | Description | Published |
20080309895 | Dynamic fluid control system for immersion lithography - An apparatus includes a stage that supports a substrate, an optical system having a last optical element, that projects an image onto the substrate that is positioned spaced apart from the last optical element by a gap at least partly filled with an immersion liquid, and a pressure control system having an actuator, that controls pressure of the immersion liquid in the gap using the actuator. | 12-18-2008 |
20090021706 | Immersion fluid containment system and method for immersion lithogtraphy - A ferrofluid is provided adjacent to the immersion area between a projection optical system (PL) and substrate and receives a magnetic force so as to form a ferrofluidic seal ( | 01-22-2009 |
20090180096 | Environmental system including vacuum scavenge for an immersion lithography apparatus - A liquid containment system is used for a liquid immersion lithography apparatus in which a substrate is exposed through liquid between an optical member of a projection system and the substrate. The liquid containment system includes a liquid containment member which confines the liquid, the liquid containment member including a removing inlet which removes the liquid from a gap between the liquid confinement member and the substrate. The liquid containment system also includes an actuator by which the liquid containment member is moved. | 07-16-2009 |
20100059657 | System and Method Producing Data For Correcting Autofocus Error in An Imaging Optical System - A new and useful system and method is provided, for correcting autofocus errors in an imaging optical system. In a system or method according to the present invention (a) an optical test assembly with an input portion directs light at a wafer surface under conditions described by ellipsometric input beam conditioning parameters, and an output/detection portion receives reflected light from the wafer under conditions described by ellipsometric output beam conditioning parameters, and produces output based on the received reflected light; and (b) a processing control circuit processes the output of the optical test assembly, and produces autofocus correction data based on ellipsometric analysis of (i) the ellipsometric input and output beam conditioning parameters and (ii) the output of the optical test assembly. | 03-11-2010 |
20100245829 | System and method for compensating instability in an autofocus system - An autofocus system and method designed to account for instabilities in the system, e.g. due to instabilities of system components (e.g. vibrating mirrors, optics, etc) and/or environmental effects such as refractive index changes of air due to temperature, atmospheric pressure, or humidity gradients, is provided. An autofocus beam is split into a reference beam component (the split off reference channel) and a measurement beam component, by a beam splitting optic located a predetermined distance from (and in predetermined orientation relative to) the substrate, to create a first space between the beam splitting optic and the substrate. A reflector is provided that is spaced from the beam splitting optic by the predetermined distance, to create a second space between the reflector and the beam splitting optic. The measurement beam component is directed at the substrate and a reflected measurement beam component through the first space between the substrate and the beam splitting optic, while the reference beam component is directed at the reflector and a reflected reference beam component is directed from the reflector through the second space between the beam splitting optic and the reflector. The reflected reference and measurement beam components are returned to the beam splitting optic, and emerge substantially collinear from the beam splitting optic. The reference and measurement beam components are then detected, and provide information that enables compensation for changes in the z position of the substrate that are due to instabilities in the autofocus system components and/or environmental factors. | 09-30-2010 |
20110037959 | Environmental system including vacuum scavenge for an immersion lithography apparatus - A lithographic projection apparatus includes a liquid confinement structure extending along at least a part of a boundary of a space between a projection system and a substrate table, the space having a cross-sectional area smaller than the area of the substrate. The liquid confinement structure includes a first inlet to supply liquid, through which the patterned beam is projected, to the space, a first outlet to remove liquid after the liquid has passed under the projection system, a second inlet formed in a face of the structure, the face arranged to oppose a surface of the substrate, and located radially outward, with respect to an optical axis of the projection system, of the space to supply gas, and a second outlet formed in the face and located radially outward, with respect to an optical axis of the projection system, of the second inlet to remove gas. | 02-17-2011 |
20110164343 | HYBRID ELECTROSTATIC CHUCK - An electrostatic chuck ( | 07-07-2011 |
20120099089 | APPARATUS AND METHODS FOR MEASURING THERMALLY INDUCED RETICLE DISTORTION - An apparatus and method for measuring thermo-mechanically induced reticle distortion or other distortion in a lithography device enables detecting distortion at the nanometer level in situ. The techniques described use relatively simple optical detectors and data acquisition electronics that are capable of monitoring the distortion in real time, during operation of the lithography equipment. Time-varying anisotropic distortion of a reticle can be measured by directing slit patterns of light having different orientations to the reticle and detecting reflected, transmitted or diffracted light from the reticle. In one example, corresponding segments of successive time measurements of secondary light signals are compared as the reticle scans a substrate at a reticle stage speed of about 1 m/s to detect temporal offsets and other features that correspond to spatial distortion. | 04-26-2012 |
20120262684 | ENVIRONMENTAL SYSTEM INCLUDING VACUUM SCAVENGE FOR AN IMMERSION LITHOGRAPHY APPARATUS - A liquid immersion lithography apparatus exposes a wafer through a liquid in a space under a lens. The apparatus includes a containment member provided such that the containment member surrounds the space under the lens, and a seal member provided between the lens and the containment member. The containment member has a first fluid inlet. The first fluid inlet removes fluid from a gap between the containment member and the wafer during the exposure. | 10-18-2012 |
20130003042 | STROBOSCOPIC LIGHT SOURCE FOR A TRANSMITTER OF A LARGE SCALE METROLOGY SYSTEM - A stroboscopic light source ( | 01-03-2013 |
20130141735 | TARGET FOR LARGE SCALE METROLOGY SYSTEM | 06-06-2013 |
20130148359 | Illumination Device for optimizing polarization in an illumination pupil - A new and useful illumination device, e.g. for a lithographic optical imaging system, is provided, and comprises a mirror array located between a radiation source and an illumination pupil. Each mirror element of the mirror array is individually steerable (controllable), and the polarization state of light from each mirror element of the mirror array can be selectively controlled, so that the illumination pupil can be filled with a distribution of light that is selectively controlled. | 06-13-2013 |
20130211777 | FLUID GAUGES COMPRISING MULTIPLE DIFFERENTIAL PRESSURE SENSORS - The subject fluid gauges measure actual position of a workpiece relative to a target position. A gauge body that is positionable relative to the workpiece and that includes multiple differential-pressure (DP) sensors has a measurement channel and respective reference channels. Each DP sensor measures, over a respective individual dynamic pressure range, a differential pressure established by a respective fluid flow in the measurement channel relative to a fluid flow in a respective reference channel. The dynamic pressure ranges of the DP sensors substantially overlap each other. A controller is connected to and monitors the DP sensors. The controller is configured to select, for obtaining a differential pressure indicative of the position of the workpiece, a DP sensor sensing the smallest magnitude of DP. | 08-15-2013 |
20130293900 | METHODS AND DEVICES FOR REDUCING ERRORS IN GOOS-HANCHEN CORRECTIONS OF DISPLACEMENT DATA - An exemplary method involves, in a system comprising a tool that performs a task on a workpiece, a method for determining displacement of the workpiece relative to the tool. Respective displacements of loci of at least a region of the workpiece are mapped using a Goos-Hänchen-insensitive (GH-insensitive) displacement sensor to produce a first set of physical displacement data for the region. Also mapped are respective displacements, from the tool, of the loci using a GH sensitive sensor to produce a second set of optical displacement data for the region. Goodness of fit (GOF) is determined of the second set of data with the first set. According to the GOF, respective GH-correction (GHC) coefficients are determined for at least one locus of the region. When measuring displacement of the at least one locus in the region relative to the tool, the respective GHC coefficient is applied to the measured displacement to reduce an error that otherwise would be present in the measured displacement due to a GH effect. | 11-07-2013 |
20140036245 | APPARATUS AND METHODS FOR REDUCING AUTOFOCUS ERROR - In a lithography tool used in fabricating microelectronic devices, autofocus (AF) systems provide automatic image focusing before making exposures. To reduce production of erroneous results based on interaction of a beam of AF light with certain regions on lithographic substrates, a subject AF device has a sending unit and a receiving unit. The sending unit directs an AF light beam to the substrate, and the receiving unit receives AF light reflected from the substrate. The receiving unit has a system photodetector and a patterned optical element that receives AF light from the substrate and transmits a selected diffraction order(s) of said light. The system photodetector senses light of the selected diffraction order of reflected AF light while at least one additional photodetector detects divergent reflected AF light. Substrate areas exhibiting unusual amounts of divergent light may indicate a focus-error condition. The AF systems can be configured as fringe-projection or slit-projection AF systems. | 02-06-2014 |
20140233011 | SYSTEM AND METHOD FOR COMPENSATING INSTABILITY IN AN AUTOFOCUS SYSTEM - An autofocus system and method designed to account for instabilities in the system, e.g. due to instabilities of system components (e.g. vibrating mirrors, optics, etc) and/or environmental effects such as refractive index changes of air due to temperature, atmospheric pressure, or humidity gradients, is provided. An autofocus beam is split into a reference beam component (the split off reference channel) and a measurement beam component, by a beam splitting optic located a predetermined distance from (and in predetermined orientation relative to) the substrate, to create a first space between the beam splitting optic and the substrate. A reflector is provided that is spaced from the beam splitting optic by the predetermined distance, to create a second space between the reflector and the beam splitting optic. The measurement beam component is directed at the substrate and a reflected measurement beam component through the first space between the substrate and the beam splitting optic, while the reference beam component is directed at the reflector and a reflected reference beam component is directed from the reflector through the second space between the beam splitting optic and the reflector. The reflected reference and measurement beam components are returned to the beam splitting optic, and emerge substantially collinear from the beam splitting optic. The reference and measurement beam components are then detected, and provide information that enables compensation for changes in the z position of the substrate that are due to instabilities in the autofocus system components and/or environmental factors. | 08-21-2014 |
20140320831 | ENVIRONMENTAL SYSTEM INCLUDING VACUUM SCAVENGE FOR AN IMMERSION LITHOGRAPHY APPARATUS - A liquid immersion exposure apparatus includes an optical assembly having a final optical element, from which exposure light is projected through immersion liquid filling an optical path of the exposure light under the final optical element, a containment member surrounding a tip portion of the optical assembly, and a movable stage to hold a substrate and having an upper surface around the held substrate. An apparatus frame supports the optical assembly and the containment member, and an optical mount isolator, which has an actuator, isolates the optical assembly from vibrations of the apparatus frame. A first inlet of the containment member faces at least one of the substrate and the stage and collects fluid from a gap between the containment member and the at least one of the substrate and the stage. A gas supply outlet of the containment member supplies gas to the gap. | 10-30-2014 |
20140354967 | ENVIRONMENTAL SYSTEM INCLUDING A TRANSPORT REGION FOR AN IMMERSION LITHOGRAPHY APPARATUS - An immersion lithography apparatus includes (i) an optical assembly including an optical element, and configured to project a beam onto a substrate through an immersion liquid; (ii) a containment member that surrounds a path of the beam; and (iii) a stage on which the substrate is held, the substrate on the stage being moved below and spaced from a bottom surface of the containment member. The containment member includes: (1) a nozzle outlet via which water as the immersion liquid is released, (2) a recovery channel via which the immersion liquid is recovered from a gap between the containment member and the substrate and/or the stage, and (3) a fluid channel via which water is released to the gap between the containment member and the substrate and/or the stage, the fluid channel being provided radially inward of the recovery channel. | 12-04-2014 |
20150015896 | METHODS AND DEVICES FOR REDUCING ERRORS IN GOOS-HANCHEN CORRECTIONS OF DISPLACEMENT DATA - An exemplary method involves, in a system comprising a tool that performs a task on a workpiece, a method for determining displacement of the workpiece relative to the tool. Respective displacements of loci of at least a region of the workpiece are mapped using a Goos-Hänchen-insensitive (GH-insensitive) displacement sensor to produce a first set of physical displacement data for the region. Also mapped are respective displacements, from the tool, of the loci using a GH sensitive sensor to produce a second set of optical displacement data for the region. Goodness of fit (GOF) is determined of the second set of data with the first set. According to the GOF, respective GH-correction (GHC) coefficients are determined for at least one locus of the region. When measuring displacement of the at least one locus in the region relative to the tool, the respective GHC coefficient is applied to the measured displacement to reduce an error that otherwise would be present in the measured displacement due to a GH effect. | 01-15-2015 |