Patent application number | Description | Published |
20080309688 | Nanolithography with use of viewports - Two dimensional arrays of cantilevers for use in transferring inks from the cantilever tip to substrates are improved with use of viewports to view the cantilevers from a far side. This improves the leveling behavior when large numbers of cantilevers are present. It also provides for better laser access. Bioarrays and combinatorial applications are particularly important. Massively parallel direct write printing with more than 55,000 cantilever tips can be achieved. | 12-18-2008 |
20090023607 | COMPACT NANOFABRICATION APPARATUS - An apparatus for use in fabricating structures and depositing materials from tips to surfaces for patterning in direct-write mode, providing ability to travel macroscopic distances and yet provide for nanoscale patterning. Useful in small scale fabrication and nanolithography. The instrument can be compact and used on a laboratory bench or desktop. An apparatus comprising: at least one multi-axis assembly comprising a plurality of nanopositioning stages, at least one pen assembly, wherein the pen assembly and the multi-axis assembly are adapted for delivery of material from the pen assembly to a substrate which is positioned by the multi-axis assembly, at least one viewing assembly, at least one controller. Nanopositioning by piezoelectric methods and devices and motors is particularly useful. The apparatus can include integrated environmental chambers and housings, as well as ink reservoirs for materials to be delivered. The viewing assembly can be a microscope with a long working distance. Particularly useful for fabrication of bioarrays or microarrays. The multi-axis assembly can be a five-axis assembly. Software can facilitate efficient usage. | 01-22-2009 |
20100071098 | SCANNING PROBE EPITAXY - A dual tip probe for scanning probe epitaxy is disclosed. The dual tip probe includes first and second tips disposed on a cantilever arm. The first and second tips can be a reader tip and a synthesis tip, respectively. The dual tip probe further includes a rib disposed on the cantilever arm between the first and second tips. The dual tip probe can also include a strain gauge disposed along the length of the cantilever arm. | 03-18-2010 |
20100089869 | NANOMANUFACTURING DEVICES AND METHODS - Devices for performing nanofabrication are provided which provide small volume reaction space and high reaction versatility. A device may include a reaction chamber adapted for nanoscale modification of a substrate and vacuum conditions; a scanning probe tip assembly enclosed within the reaction chamber; a first port coupled to the reaction chamber for delivering a gas; a second port coupled to the reaction chamber for applying a vacuum; and a substrate assembly insertedly mounted to the reaction chamber. The reaction chamber may include a body having one or more flexible walls and one or more supports to prevent the reaction chamber from collapsing under a vacuum. The device may further include an electrical conduit for coupling the tips of the scanning probe tip assembly to electrical components outside the reaction chamber. Also provided are apparatuses incorporating the devices and methods of using the devices and apparatuses. | 04-15-2010 |
20100100989 | PIEZORESISTOR HEIGHT SENSING CANTILEVER - A device comprising at least one cantilever comprising at least one piezoresistor is described, where the cantilevers comprise silicon nitride or silicon carbide and the piezoresistors comprise doped silicon. Methods for making and using such a device are also provided. | 04-22-2010 |
20100147820 | HEATED CANTILEVER - A device is provided comprising at least one cantilever comprising at least one tip and at least one heating element. Methods for making and using such a device are also provided. | 06-17-2010 |
20100235954 | DUAL-TIP CANTILEVER - A device comprising at least one cantilever comprising at least two tips is described, where the tips have substantially the same tip heights. Methods for making and using such a device are also provided. The height of one tip off of the surface can be more easily determined when the two tips have equal height. | 09-16-2010 |
20100242765 | METHODS AND APPARATUS FOR INK DELIVERY TO NANOLITHOGRAPHIC PROBE SYSTEMS - Inkwells adapted for use in direct-write nanolithography and other applications including use of wells, channels, and posts. The wells can possess a geometry which matches the geometry of tips which are dipped into the inkwells. The channels can be open or closed. Hydrophilicity and hydrophobicity can be used to control ink flow. SEM can be used to characterize the inkwells. Ink flow can be monitored with video. Hydrophobic material layers can be used to prevent cross contamination. Microsyringes can be used to fill reservoirs. Satellite reservoirs can be used to prevent bubble formation. | 09-30-2010 |
20100294146 | Stamps with micrometer-and nanometer-scale features and methods of fabrication thereof - Stamps and methods of making stamps for applications in anti-counterfeiting and authentication. The stamps are relatively small in size and feature nanoscale and microscale identification regions and features. High throughput manufacturing and high resolution methods are used to make the stamps including electron beam lithography and optical lithography. Anti-fouling coatings can be applied. | 11-25-2010 |
20100294844 | Identification features - Methods for providing pharmaceutical compositions and objects with identification regions and identification features which are difficult to detect. Microlithography, nanolithography, and stamping methods are used. The identification features can be positive protrusions or negative indentations with respect to the surface. The identification regions can comprise bar codes and holograms. DPN printing or other lithographies such as electron beam lithography, optical lithography, or nanoimprint lithography can be used to prepare stamps, which are then used to prepare the identification features. Redundant patterns can be formed. The invention is useful for counterfeit prevention. An apparatus for stamping the identification features is also described. | 11-25-2010 |
20100297190 | IDENTIFICATION FEATURES - Methods for providing pharmaceutical compositions and objects with identification regions and identification features which are difficult to detect. Microlithography, nanolithography, and stamping methods are used. The identification features can be positive protrusions or negative indentations with respect to the surface. The identification regions can comprise bar codes and holograms. DPN printing or other lithographies such as electron beam lithography, optical lithography, or nanoimprint lithography can be used to prepare stamps, which are then used to prepare the identification features. Redundant patterns can be formed. The invention is useful for counterfeit prevention. An apparatus for stamping the identification features is also described. | 11-25-2010 |
20110014378 | LEVELING DEVICES AND METHODS - Devices for leveling an object for patterning a substrate surface, including an array of scanning probe tips, are provided. A device may include a support structure adapted to mount an object, the object having a plurality of protrusions adapted to form a pattern on a surface of a substrate upon contact of the object to the surface; and at least one flexible joint assembly mounted to the support structure and adapted to allow the object to achieve a parallel orientation with respect to the surface upon contact of the object to the surface. Also provided are apparatuses and kits incorporating the devices and methods of making and using the devices and apparatuses. | 01-20-2011 |
20110195850 | COMPACT NANOFABRICATION APPARATUS - An apparatus for use in fabricating structures and depositing materials from tips to surfaces for patterning in direct-write mode, providing ability to travel macroscopic distances and yet provide for nanoscale patterning. Useful in small scale fabrication and nanolithography. The instrument can be compact and used on a laboratory bench or desktop. An apparatus comprising: at least one multi-axis assembly comprising a plurality of nanopositioning stages, at least one pen assembly, wherein the pen assembly and the multi-axis assembly are adapted for delivery of material from the pen assembly to a substrate which is positioned by the multi-axis assembly, at least one viewing assembly, at least one controller. Nanopositioning by piezoelectric methods and devices and motors is particularly useful. The apparatus can include integrated environmental chambers and housings, as well as ink reservoirs for materials to be delivered. The viewing assembly can be a microscope with a long working distance. Particularly useful for fabrication of bioarrays or microarrays. The multi-axis assembly can be a five-axis assembly. Software can facilitate efficient usage. | 08-11-2011 |
20110274839 | Cantilevers for deposition - Cantilever design for patterning from a cantilever tip can be improved with, for example, a recessed area surrounding the cantilever tip. A device for printing nanoscopic and microscopic patterns includes at least one cantilever having a front surface, a first side edge, a second side edge, and a first end which is a free end and a second end which is a non-free end. The front surface includes at least one first sidewall disposed at the first cantilever side edge and at least one second sidewall disposed at the second cantilever side edge opposing the first cantilever side edge, at least one channel, adapted to hold a fluid, disposed between the first and second sidewalls, wherein the channel, the first sidewall, and the second sidewall extend toward the cantilever free end but do not reach the free end, and a base region having a boundary defined by the first edge, the second edge, and the cantilever free end and also the first sidewall, second sidewall, and the channel, wherein the base region comprises a tip extending away from the cantilever front surface. Improved deposition can result. Fluidic inks comprising biomolecules can be patterned successfully. | 11-10-2011 |
20120164564 | ADVANCED PHOTOMASK REPAIR - Additive repair of advanced photomasks with low temperature or optical curing via direct write lithographic printing with sharp tips and cantilevers. The optical properties of the materials formed from the ink can be tuned (e.g., n and k values). Sol gel inks, including silsesquioxane inks, can be used to form MoSi compositions. The repaired photomasks are resistant to washing under normal photomask washing conditions. AFM instrumentation can be used to perform the additive repair to provide the high resolution and registration. | 06-28-2012 |
20120295030 | HIGH DENSITY, HARD TIP ARRAYS - Improved high density, hard tip arrays for use in patterning are provided. An article comprises a handle chip; and a silicon nitride membrane bonded to at least a portion of the handle chip. The silicon nitride membrane comprises an array of a plurality of silicon nitride tips extending directly from a surface of the silicon nitride membrane. Another article comprises an elastomeric backing member; and an array of tips disposed on the elastomeric backing member. The tips of the array comprise a refractory material. Methods of making such articles are also provided. | 11-22-2012 |
20120297509 | MASSIVELY PARALLEL LITHOGRAPHY WITH TWO-DIMENSIONAL PEN ARRAYS - Massive parallel printing of structures and nanostructures at high speed with high resolution and high quality using two dimensional arrays comprising cantilevers and tip-based transfer of material to a surface. The array is designed so only tips touch the surface. This can be accomplished by long tips and bent cantilevers and alignment. An article comprising: a two-dimensional array of a plurality of cantilevers, wherein the array comprises a plurality of base rows, each base row comprising a plurality of cantilevers, wherein each of the cantilevers comprise tips at the cantilever end away from the base, wherein the number of cantilevers is greater than 250, and wherein the tips have an apex height relative to the cantilever of at least four microns, and a support for the array. Combinatorial arrays and bioarrays can be prepared. The arrays can be manufactured by micromachining methods. | 11-22-2012 |