Su-Bum
Su-Bum Park, Seoul KR
Patent application number | Description | Published |
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20080205873 | REFLECTING UNIT FOR A PORTABLE ELECTRONIC DEVICE - A reflector for a mobile terminal includes a plate having a front and rear side, such that the plate is configured to be located on a mobile terminal. The reflector further includes a recess formed in the rear side of the plate, such that the recess is shaped to form a concave portion, and reflecting material positioned along the concave portion to reflect light incident on the front side of at least a portion of the plate. | 08-28-2008 |
Su-Bum Park, Nam-Gu KR
Patent application number | Description | Published |
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20120189952 | ELECTROPHOTOGRAPHIC TONER AND PROCESS OF PREPARING THE SAME - An electrophotographic toner and a process for preparing the same. The electrophotographic toner includes a binder, a coloring agent, and a release agent. The binder includes two resins having different weight average molecular weights. | 07-26-2012 |
Su-Bum Park, Suwon-Si KR
Patent application number | Description | Published |
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20120202149 | ELECTROPHOTOGRAPHIC TONER AND METHOD OF PREPARING THE SAME - An electrophotographic toner and a method of preparing the same, the electrophotographic toner including a binder that includes two kinds of resin having different weight average molecular weights, a colorant, and a releasing agent. | 08-09-2012 |
Su-Bum Shin, Ichon-Shi KR
Patent application number | Description | Published |
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20090061639 | METHOD FOR FABRICATING SEMICONDUCTOR DEVICE - A method for fabricating a semiconductor device includes stacking a spin on carbon (SOC) layer and an multifunction hard mask (MFHM) layer on a substrate, forming a photoresist pattern over the MFHM layer, first etching the MFHM layer using a first amount of a fluorine-based gas, second etching the MFHM layer using a second amount of a fluorine-based gas, wherein the second amount is less than the first amount, etching the SOC layer using the MFHM layer as an etch barrier, and etching the substrate using the SOC layer and the MFHM layer as an etch barrier. | 03-05-2009 |