Patent application number | Description | Published |
20080260246 | COLOR PROCESSING METHOD AND APPARATUS - A color processing method includes outputting, via an image output device, a chart image in which a plurality of images obtained by applying illuminant corrections corresponding to a plurality of different illuminants to images corresponding to a plurality of representative colors are arranged in a predetermined layout, receiving a user's instruction to select one of the illuminant corrections corresponding to one of the plurality of different illuminants based on the output chart image, and setting the selected illuminant correction to be applied to an original image, wherein the plurality of representative colors are memory colors. | 10-23-2008 |
20080266554 | INFORMATION PROCESSING APPARATUS AND METHOD - An information processing apparatus includes a unit configured to acquire spectral data of ambient light to be estimated, a unit configured to receive spectral data and ambient light type information of a plurality of reference ambient light conditions, a comparison unit configured to compare the spectral data of the ambient light to be estimated with the spectral data of the plurality of reference ambient light conditions, and an estimation unit configured to estimate an ambient light type of the spectral data of the ambient light to be estimated from the ambient light type information of the reference ambient light based on a result of comparison provided by the comparison unit. | 10-30-2008 |
20090051968 | PRINT CONTROL SYSTEM, CONTROL METHOD OF PRINT CONTROL SYSTEM, AND CONTROL PROGRAM OF INFORMATION PROCESSING APPARATUS - When a subsidiary printout is printed from a printer driver, it is an object to enable a subsidiary print job to be formed without destroying a relationship between the master and the servant in a print process. A first print job formed by a first application program is input through an operating system and a printer driver processes the input first print job. A second application program which forms a second print job different from the first print job and sends to the operating system is provided. The printer driver starts the second application program, transfers settings of the printer driver to the second application program, receives the second print job formed by the second application program through the operating system, processes the second print job, and allows a printer to print the second print job. | 02-26-2009 |
20090067739 | COLOR PROCESSING APPARATUS AND METHOD - A color processing apparatus for converting input spectral color data into output color component data corresponding to an output device is provided. A first conversion unit converts the input spectral color data into color component data, and converts the converted color component data into first output color component data corresponding to the output device. A second conversion unit converts the input spectral color data into second output color component data using a calculation unit which calculates spectral color data from output color component data. An evaluation unit evaluates the first output color component data converted by the first conversion unit. A control unit controls to output one of the first and second output color component data in accordance with the evaluation result of the evaluation unit. | 03-12-2009 |
20100231755 | IMAGE PROCESSING APPARATUS, IMAGE PROCESSING METHOD, AND IMAGE SENSOR - An image processing apparatus includes a unit to obtain mosaic image data by shooting a subject with use of a color image sensor in which five or more kinds of color filters are arranged in front of an image pickup device; a first interpolator to perform interpolation to color information of a high-definition color filter, in regard to the obtained mosaic image data; and a second interpolator to perform interpolation to color information of a low-definition color filter of which a peak wavelength in spectral transmittance is adjacent to that of the high-definition color filter, by using a result of the interpolation by the first interpolator, wherein the mosaic image data is image data which has one color information for each pixel, and the five or more kinds of color filters include the plural high-definition color filters and the plural low-definition color filters, thereby performing demosaicing without deteriorating definition. | 09-16-2010 |
20110128542 | CALIBRATION APPARATUS AND CALIBRATION METHOD - A calibration apparatus associates a pixel position and a wavelength of a spectrometer sensor. In calibrating the sensor, the calibration apparatus searches for a first pixel value corresponding to a bright line spectrum of incident light by a first search method based on the pixel value corresponding to the incident light acquired by the sensor and searches for a second pixel value corresponding to the bright line spectrum of the incident light by a second search method based on the pixel value corresponding to the incident light acquired by the sensor. The calibration apparatus associates either one of a first pixel position and a second pixel position with the wavelength of the bright line spectrum of the incident light. The calibration apparatus can appropriately acquire a correspondence relation between a detection position and a wavelength even if the correspondence relation has varied due to aging or changes in the temperature. | 06-02-2011 |
20120002085 | IMAGE PROCESSING APPARATUS AND IMAGE PROCESSING METHOD - A recovery processing unit performs an image quality recovery processing of reducing a blur in an image using a filter to reduce a blur at an image height position for each image height on a line from the center position of the image to an end of the image. | 01-05-2012 |
20120133801 | INFORMATION PROCESSING APPARATUS AND METHOD - An image processing method, for correcting a blur a due to an optical system of an image capturing apparatus, the image processing method including, storing a plurality of representative filters in a memory, selecting a subset of representative filters from the plurality of representative filters based on a pixel position of a pixel of interest in an image, applying each of the selected representative filter to a pixel value of the pixel of interest, and correcting the pixel value of the pixel of interest based on (a) a result of the application of filters, and (b) the pixel position of the pixel of interest. | 05-31-2012 |
20130342737 | INFORMATION PROCESSING APPARATUS AND METHOD - An image processing method, for correcting a blur a due to an optical system of an image capturing apparatus, the image processing method including, storing a plurality of representative filters in a memory, selecting a subset of representative filters from the plurality of representative filters based on a pixel position of a pixel of interest in an image, applying each of the selected representative filter to a pixel value of the pixel of interest, and correcting the pixel value of the pixel of interest based on (a) a result of the application of filters, and (b) the pixel position of the pixel of interest. | 12-26-2013 |
20150146980 | IMAGE PROCESSING APPARATUS, IMAGE PROCESSING METHOD, AND NON-TRANSITORY STORAGE MEDIUM - At least one image processing apparatus, and at least one method, of the present invention(s) generate a corrected image obtained by removing, from a color image whose pixel values contain components derived from scattered light, at least part of the components derived from the scattered light. The at least one image processing apparatus includes a generation unit configured to generate the corrected image by correcting a pixel value of a first color component of each pixel in the color image by using a first reference intensity and a weight value, and by correcting a pixel value of a second color component of each pixel in the color image by using a second reference intensity and a weight value. | 05-28-2015 |
20150271382 | APPARATUS, METHOD, AND MEDIUM - The present invention is a control apparatus for controlling an image capturing sensor, the control apparatus comprising: a generation unit configured to selectively determine an exposure time from at least two or more different exposure times for each pixel constituting image data and to generate exposure time data indicative of an exposure time for each pixel; and a gain adjustment processing unit configured to make a gain adjustment to the image data based on the determined exposure time, wherein the generation unit calculates an output value from acquired image data, determines an exposure time for each pixel based on the calculated output value, calculates an error related to the calculated output value, and diffuses the calculated error to pixels adjacent to a processing-target pixel, thereby turning a pixel switching pattern into a blue noise pattern. | 09-24-2015 |
Patent application number | Description | Published |
20080238930 | TEXTURE PROCESSING APPARATUS, METHOD AND PROGRAM - A texture processing apparatus includes a CG data acquisition unit acquiring calculator graphics (CG) data including CG model data, camera data, light data, texture data items, and a preset emphasis parameter for texture mapping processing, the CG model data, the camera data and the light data composing data for rendering a CG image, the texture data items being acquired or produced under different conditions, a calculation unit calculating, using the CG data, an emphasis texture processing condition corresponding to the preset emphasis parameter, the emphasis texture processing condition being used to perform texture mapping processing on a CG model, an extraction unit extracting a particular texture data item from the acquired texture data items in accordance with the texture processing condition, and a processing unit performing emphasis processing on the particular texture data item in accordance with the preset emphasis parameter to obtain a emphasized texture data item. | 10-02-2008 |
20090016429 | VIDEO RENDERING APPARATUS AND METHOD AND PROGRAM - Apparatus includes unit storing CG data containing data about coordinate transformation, camera, geometry, light source, and texture, unit transforming coordinate system of CG data into camera-coordinate system, unit calculating intersections of object and ray vectors passing through sampled points, unit calculating 3D motion vectors, unit calculating color values at intersections, unit assigning object IDs of intersections at 3D coordinates to intersections, unit projecting intersections and 3D motion vectors onto plane, and calculating 2D coordinates at intersections and 2D motion vectors at intersections, unit storing 2D coordinates, 2D motion vectors, color values, and object IDs together as low-resolution video data, unit calculating intermediate-resolution video data by superimposing low-resolution video data of current frame onto low-resolution video data of frames temporally different from current frame, unit calculating high-resolution video data by filtering intermediate-resolution video data, unit storing high-resolution video data, and unit presenting high-resolution video data. | 01-15-2009 |
Patent application number | Description | Published |
20080263502 | MASK PATTERN DATA GENERATING METHOD, INFORMATION PROCESSING APPARATUS, PHOTOMASK FABRICATION SYSTEM, AND IMAGE SENSING APPARATUS - A method for generating mask pattern data of a photomask used to form microlenses divides a pattern formation surface of a mask pattern to be used for the photomask into a plurality of grid cells, acquires data which represents transmitted light distribution of the mask pattern to be used for the photomask, determines whether to place a shield on each of the plurality of grid cells by binarizing the plurality of grid cells in order of increasing or decreasing distance from a center of the pattern formation surface using an error diffusion method to acquire the transmitted light distribution, and generates mask pattern data which represents an arrangement of the shields based on results from the determining step. | 10-23-2008 |
20100143850 | Method of Manufacturing a Semiconductor Device - A method of manufacturing a semiconductor device by performing divisional exposure on a predetermined area on a wafer, through two or more reticles, on each of which a mask pattern region is formed. The method includes arranging the reticles such that an outer most periphery of a field circle of exposure light incident on the wafer aligns with at least one side of the mask pattern region formed in the reticle, and exposing, to exposure light, the wafer, through the reticles so arranged. | 06-10-2010 |
20110170197 | Method of Fabricating a Photomask Used to Form a Lens - A method of fabricating a photomask used to form a lens. The method includes the steps of generating mask pattern data for each of a plurality of grid cells constituting a mask pattern for the lens, and fabricating the photomask based on the mask pattern data. The step of generating the mask pattern data includes acquiring data which represents a transmitted light distribution required for the photomask to fabricate the lens, in which the transmitted light distribution includes a quantity of transmitted light in each of the plurality of grid cells, and determining whether to place a shield on each of the plurality of grid cells by binarizing the quantity of transmitted light in each of the plurality of grid cells in order of increasing or decreasing distance from a center of the mask pattern using an error diffusion method. | 07-14-2011 |
20110242388 | IMAGE SENSING DEVICE AND CAMERA - An image sensing device comprises a pixel array, and a peripheral circuit, a column selecting circuit, and a readout, wherein each pixel includes a photodiode, a floating diffusion, a transfer PMOS transistor to the floating diffusion, an amplifier PMOS transistor, and a reset PMOS transistor, the amplifier PMOS transistor has a gate which is formed by an n-type conductive pattern, and is isolated by a first element isolation region and an n-type impurity region which covers at least a lower portion of the first element isolation region, and each PMOS transistor included in the column selecting circuit has a gate which is formed by a p-type conductive pattern and is isolated by a second element isolation region, and an n-type impurity concentration in a region adjacent to a lower portion of the second element isolation region is lower than that in the n-type impurity region. | 10-06-2011 |
20120199725 | PHOTOELECTRIC CONVERSION ELEMENT, AND PHOTOELECTRIC CONVERSION APPARATUS AND IMAGING SYSTEM USING THE SAME - A light condensing member focuses light, which is incident upon a first area of the light condensing member corresponding to an opening portion of an insulation film, in an upper portion region of a light path member arranged within the opening portion, the insulation film having an upper face extending from the opening portion, and the light path member having a lower face in a region corresponding to a light receiving face of an photoelectric conversion portion. | 08-09-2012 |
20120200728 | PHOTOELECTRIC CONVERSION APPARATUS AND IMAGE SENSING SYSTEM - A photoelectric conversion apparatus at least includes an insulating film, a plurality of high-refractive-index members provided so as to correspond respectively to individual photoelectric conversion portions, being surrounded by the insulating film and having a refractive index higher than the refractive index of the insulating film, and a high-refractive-index film provided on the insulating film so as to connect the plurality of high-refractive-index members to one another and having a refractive index higher than the refractive index of the insulating film, and lens portions lying next to each other from among a plurality of lens portions border each other. | 08-09-2012 |
20120200751 | PHOTOELECTRIC CONVERSION APPARATUS - A photoelectric conversion apparatus includes a semiconductor substrate having a photoelectric conversion portion. An insulator is provided on the semiconductor substrate. The insulator has a hole corresponding to the photoelectric conversion portion. A waveguide member is provided in the hole. An in-layer lens is provided on a side of the waveguide member farther from the semiconductor substrate. A first intermediate member is provided between the waveguide member and the in-layer lens. The first intermediate member has a lower refractive index than the in-layer lens. | 08-09-2012 |
20130221473 | PHOTOELECTRIC CONVERSION DEVICE, IMAGE PICKUP SYSTEM AND METHOD OF MANUFACTURING PHOTOELECTRIC CONVERSION DEVICE - A photoelectric conversion device includes a first semiconductor substrate including a photoelectric conversion unit for generating a signal charge in accordance with an incident light, and a second semiconductor substrate including a signal processing unit for processing an electrical signal on the basis of the signal charge generated in the photoelectric conversion unit. The signal processing unit is situated in an orthogonal projection area from the photoelectric conversion unit to the second semiconductor substrate. A multilayer film including a plurality of insulator layers is provided between the first semiconductor substrate and the second semiconductor substrate. The thickness of the second semiconductor substrate is smaller than 500 micrometers. The thickness of the second semiconductor substrate is greater than the distance from the second semiconductor substrate and a light-receiving surface of the first semiconductor substrate. | 08-29-2013 |
20140300788 | SOLID-STATE IMAGING SENSOR, METHOD OF MANUFACTURING THE SAME, AND CAMERA - A solid-state imaging sensor which has a first face and a second face, and includes an image sensing region and an electrode region, comprising a first portion including an insulating member and a wiring pattern, a second portion including a plurality of photoelectric conversion portions in the image sensing region, and a third portion including a plurality of microlenses in the image sensing region, wherein an opening is formed on the side of the first face in the electrode region so as to expose the wiring pattern, and the sensor includes a first film covering the plurality of microlenses, and a second film covering a side face of the opening and exposing part of the wiring pattern in the electrode region, with covering the first film in the image sensing region. | 10-09-2014 |
20140306309 | PHOTOELECTRIC CONVERSION APPARATUS - A photoelectric conversion apparatus includes a semiconductor substrate having a photoelectric conversion portion. An insulator is provided on the semiconductor substrate. The insulator has a hole corresponding to the photoelectric conversion portion. A waveguide member is provided in the hole. An in-layer lens is provided on a side of the waveguide member farther from the semiconductor substrate. A first intermediate member is provided between the waveguide member and the in-layer lens. The first intermediate member has a lower refractive index than the in-layer lens. | 10-16-2014 |
20150031162 | PHOTOELECTRIC CONVERSION DEVICE, IMAGE PICKUP SYSTEM AND METHOD OF MANUFACTURING PHOTOELECTRIC CONVERSION DEVICE - A photoelectric conversion device includes a first semiconductor substrate including a photoelectric conversion unit for generating a signal charge in accordance with an incident light, and a second semiconductor substrate including a signal processing unit for processing an electrical signal on the basis of the signal charge generated in the photoelectric conversion unit. The signal processing unit is situated in an orthogonal projection area from the photoelectric conversion unit to the second semiconductor substrate. A multilayer film including a plurality of insulator layers is provided between the first semiconductor substrate and the second semiconductor substrate. The thickness of the second semiconductor substrate is smaller than 500 micrometers. The thickness of the second semiconductor substrate is greater than the distance from the second semiconductor substrate and a light-receiving surface of the first semiconductor substrate. | 01-29-2015 |
20150109501 | SOLID-STATE IMAGING APPARATUS, METHOD FOR MANUFACTURING THE SAME, AND CAMERA - A back-side illumination solid-state imaging apparatus, comprising a light-shielding member including a plurality of openings, and a plurality of pixels corresponding to the plurality of openings, wherein each pixel includes a photoelectric conversion portion, a microlens and an inner lens, the inner lens of a first pixel of an Mth row×an Nth column and the inner lens of a second pixel of an (M+1)th row×an (N+1)th column are separated from each other through a dielectric member, and the dielectric member contacts with part of the light-shielding member between a first opening corresponding to the first pixel and a second opening corresponding to the second pixel. | 04-23-2015 |
20150214270 | MICROLENS FORMING METHOD AND SOLID-STATE IMAGE SENSOR MANUFACTURING METHOD - A microlens forming method, comprising etching a first member and a second member arranged on the first member, the second member including a concavo-convex shape, and forming a microlens from the first member, wherein, the etching of the first and the second members is performed under a condition that an etching rate of the first member is higher than that of the second member, a portion of the first member under the concave portion is exposed during the etching of the second member, and the exposed portion of the first member is removed in the etching of the first member. | 07-30-2015 |
20150221687 | PHOTOELECTRIC CONVERSION DEVICE, IMAGE PICKUP SYSTEM AND METHOD OF MANUFACTURING PHOTOELECTRIC CONVERSION DEVICE - A photoelectric conversion device includes a first semiconductor substrate including a photoelectric conversion unit for generating a signal charge in accordance with an incident light, and a second semiconductor substrate including a signal processing unit for processing an electrical signal on the basis of the signal charge generated in the photoelectric conversion unit. The signal processing unit is situated in an orthogonal projection area from the photoelectric conversion unit to the second semiconductor substrate. A multilayer film including a plurality of insulator layers is provided between the first semiconductor substrate and the second semiconductor substrate. The thickness of the second semiconductor substrate is smaller than 500 micrometers. The thickness of the second semiconductor substrate is greater than the distance from the second semiconductor substrate and a light-receiving surface of the first semiconductor substrate. | 08-06-2015 |
20150346393 | PHOTOMASK, METHOD OF MANUFACTURING OPTICAL ELEMENT ARRAY, OPTICAL ELEMENT ARRAY - A photomask for an optical element array includes first and second optical elements. A light transmission rate distribution includes a first area where the first optical element is to be formed, a second area where the second optical element is to be formed, and a third area between the first and second areas, has a first light transmission rate at an end portion of the first area. A second light transmission rate is higher than the first light transmission rate at another end portion. A third light transmission rate at an end portion corresponds to a boundary between the second and third areas. A fourth light transmission rate is higher than the third light transmission rate at another end portion of the second area. The light transmission rate distribution along a first direction is higher than a segment connecting the second and third light transmission rates in the third area. | 12-03-2015 |
20160071896 | SOLID-STATE IMAGE SENSING DEVICE AND CAMERA - A solid-state image sensing device including a pixel array including a plurality of pixels, wherein each pixel comprises a photoelectric conversion portion arranged in a substrate and a microlens arranged thereon, an insulating member is arranged between the substrate and the microlens, each pixel further comprises a light-guide portion configured to guide incident light to the photoelectric conversion portion, the pixel array includes a central region and a peripheral region, in a pixel located in the peripheral region, the microlens is arranged while being shifted to a side of the central region with respect to the photoelectric conversion portion, and, on a cross section along the shift direction, the microlens has a left-right asymmetric shape and a highest portion of the microlens is located on the side of the central region. | 03-10-2016 |