Patent application number | Description | Published |
20090032777 | CARBON NANOTUBE DISPERSION LIQUID AND TRANSPARENT CONDUCTIVE FILM USING SAME - Disclosed is a carbon nanotube dispersion liquid which enables to easily form a transparent conductive film. Also disclosed is a transparent conductive film obtained by using such a carbon nanotube dispersion liquid. Specifically disclosed is a carbon nanotube dispersion liquid containing a carbon nanotube (A), a dispersing agent (B) composed of an organic compound containing one of a carboxyl group, epoxy group, amino group and sulfonyl group and having a boiling point of not less than 30˚C and not more than 150˚C, and a solvent (C). Also disclosed are a transparent conductive film containing a layer composed of a solid component of such a dispersion liquid, and a method for producing such a transparent conductive film. | 02-05-2009 |
20090052025 | LENS SHEET, PROCESS FOR PRODUCING THE SAME, AND RESIN COMPOSITION FOR TRANSFER MATERIAL - To provide a lenticular lens sheet having a fine light shielding pattern that has high color reproducibility. [MEANS FOR SOLVING PROBLEMS] The above problem can be solved by a lenticular lens sheet, in which the average primary particle diameter of carbon black contained in a light shielding layer is not less than 10 nm and not more than 50 nm and, preferably, in an image of the cross-section of the light shielding layer under scanning electron microscopic observation, the area ratio of carbon black to the whole image is not less than 60% and not more than 95%, and a process for producing the lenticular lens sheet. | 02-26-2009 |
20090252932 | ACTINIC ENERGY RAY CURABLE RESION COMPOSITION AND USE THEREOF - An active energy ray-curable resin composition is handleable when it is formed into an uncured film. The resin composition cures quickly, is formable, and can be used to make a hard coat layer with a high hardness. Specifically, the active energy ray-curable resin composition of the present invention contains a vinyl polymer having alkoxysilyl groups in its side chain, along with a photoacid generator. In its uncured state, the active energy ray-curable resin composition has a glass transition temperature of 15° C. to 100° C. 90 mass % or more of the Si-containing compound or Si-containing compound unit present in the active energy ray-curable resin composition is represented by the following structural formula 1: | 10-08-2009 |
20100187485 | SINGLE-WALLED CARBON NANOTUBE DISPERSION LIQUID AND METHOD FOR PRODUCING SINGLE-WALLED CARBON NANOTUBE DISPERSION LIQUID - Disclosed is a single-walled carbon nanotube dispersion liquid containing a single-walled carbon nanotube, a fullerene and a solvent. | 07-29-2010 |
20100215985 | TRANSPARENT CONDUCTIVE FILM AND METHOD FOR PRODUCING TRANSPARENT CONDUCTIVE FILM - Disclosed is a transparent conductive film containing a single-walled carbon nanotube and a fullerene. | 08-26-2010 |
20100297449 | TRANSPARENT CONDUCTIVE FILM, TRANSPARENT ELECTRODE SUBSTRATE AND METHOD FOR PRODUCING LIQUID CRYSTAL ALIGNMENT FILM BY USING THE SAME, AND CARBON NANOTUBE AND METHOD FOR PRODUCING THE SAME - The present invention is a transparent conductive film characterized in that: a major component of the transparent conductive film is a single-walled carbon nanotube; the single-walled carbon nanotubes are present in a bundle state; and a rope-like shape, which is a state where the bundles are gathered together, can be confirmed by scanning electron microscope observation. The present invention is also a method for producing a liquid crystal alignment film using a transparent electrode substrate, with an electrode layer being the aforementioned transparent conductive film. According to the invention, a transparent electrode substrate with high wettability can be obtained, and further a method for producing an alignment film by which a uniform alignment film can be obtained without deteriorating an electrical characteristic is provided. | 11-25-2010 |
Patent application number | Description | Published |
20080305434 | Developing Apparatus and Developing Method - A developing apparatus has a substrate holder to hold a substrate, a heater which is provided in a substrate holder, and heats a substrate on a substrate holder for processing a resist film by PEB, a cooler to cool a substrate on a substrate holder, a developing solution nozzle to supply a developing solution to a substrate on a substrate holder, and a controller to control a heater, a cooler and a developing nozzle. | 12-11-2008 |
20090207390 | ADHESION PROMOTING PROCESS, ADHESION PROMOTING DEVICE, COATING AND DEVELOPING SYSTEM AND STORAGE MEDIUM - There are provided an adhesion promoting process using a comparatively small amount of an adhesion promoting gas for processing a workpiece, an adhesion promoting device for carrying out the adhesion promoting process, a coating and developing system including the adhesion promoting device, and a storage medium storing a program specifying a set of instructions for carrying out the adhesion promoting process. | 08-20-2009 |
20090285984 | COATING APPARATUS AND METHOD - A coating apparatus includes a driving unit configured to rotate a substrate holding member about a vertical axis to spread a coating liquid supplied on a front side central portion of a substrate toward a front side peripheral portion of the substrate by a centrifugal force. The apparatus is provided with a wobble damping mechanism including a gas delivery port and a suction port both disposed to face a back side of the substrate and configured to damp a wobble of the substrate being rotated by delivering a gas from the delivery port and sucking the gas into the suction port. | 11-19-2009 |
20090285991 | COATING APPARATUS AND METHOD - A coating apparatus includes a liquid film forming mechanism configured to form a liquid film of a process liquid for preventing a contaminant derived from a coating liquid from being deposited or left on a back side peripheral portion of a substrate. The liquid film forming mechanism includes a counter face portion facing the back side peripheral portion of the substrate and a process liquid supply portion for supplying the process liquid onto the counter face portion. The coating apparatus further includes a posture regulating mechanism disposed around the substrate holding member and configured to damp a vertical wobble of the peripheral portion of the substrate being rotated. The posture regulating mechanism includes delivery holes arrayed in a rotational direction of the substrate and configured to deliver a gas onto a back side region of the substrate on an inner side of the peripheral portion. | 11-19-2009 |
20100216077 | DEVELOPING APPARATUS AND DEVELOPING METHOD - A developing apparatus has a substrate holder to hold a substrate, a heater which is provided in a substrate holder, and heats a substrate on a substrate holder for processing a resist film by PEB, a cooler to cool a substrate on a substrate holder, a developing solution nozzle to supply a developing solution to a substrate on a substrate holder, and a controller to control a heater, a cooler and a developing nozzle. | 08-26-2010 |
20120213925 | COATING APPARATUS AND METHOD - A coating method includes holding a substrate in a horizontal state on a substrate holding member; supplying a coating liquid onto a front side central portion of the substrate held on the substrate holding member; rotating the substrate holding member about a vertical axis to spread the coating liquid supplied on the front side central portion of the substrate toward a front side peripheral portion of the substrate by a centrifugal force; and damping a wobble of the substrate being rotated, by a wobble damping mechanism including a gas delivery port and a suction port both disposed to face a back side of the substrate, while delivering a gas from the delivery port and sucking the gas into the suction port. | 08-23-2012 |
20120301612 | COATING METHOD - A coating method includes supplying a coating liquid from a coating nozzle onto a front side central portion of a substrate held on a substrate holding member, rotating the substrate holding member about a vertical axis to spread the coating liquid toward a peripheral portion of the substrate by a centrifugal force and thereby form a film of the coating liquid, forming a liquid film of a process liquid for preventing a contaminant derived from the coating liquid from being deposited or left on a back side peripheral portion of the substrate, and damping a vertical wobble of the peripheral portion of the substrate being rotated, by a posture regulating mechanism, while delivering a gas from delivery holes onto a back side region of the substrate on an inner side of the peripheral portion on which the liquid film is formed. | 11-29-2012 |
20140102474 | SUBSTRATE CLEANING APPARATUS, SUBSTRATE CLEANING METHOD, AND COMPUTER-READABLE STORAGE MEDIUM - A substrate cleaning apparatus for cleaning a substrate back surface includes a first substrate supporting portion supporting the substrate at a first area of the substrate back surface, the back surface facing down; a second substrate supporting portion supporting the substrate at a second area of the substrate back surface, the second area being separated from the first area; a cleaning liquid supplying portion supplying cleaning liquid to the substrate back surface; a drying portion drying the second area of the substrate back surface; and a cleaning portion cleaning a third area of the substrate back surface when the substrate is supported by the first substrate supporting portion, the third area including the second area, and cleaning a fourth area of the substrate back surface when the substrate is supported by the second substrate supporting portion, the fourth area excluding the second area. | 04-17-2014 |
Patent application number | Description | Published |
20110117291 | TEMPLATE TREATMENT METHOD, PROGRAM, COMPUTER STORAGE MEDIUM, TEMPLATE TREATMENT APPARATUS AND IMPRINT SYSTEM - In a template treatment of forming a film of a release agent on a treatment surface of a template, the treatment surface of the template is first cleaned. Thereafter, in a coating unit, the release agent is applied to the treatment surface of the template. The release agent on the template is then dried. Then, alcohol is applied to the release agent on the template to make the release agent adhere to the treatment surface of the template and to remove an unreacted portion of the release agent. Thereafter, the alcohol on the template is dried and removed. In this manner, a film of the release agent is formed in a predetermined film thickness on the treatment surface of the template. | 05-19-2011 |
20120034369 | VAPORIZING APPARATUS, SUBSTRATE PROCESSING APPARATUS, COATING AND DEVELOPING APPARATUS, AND SUBSTRATE PROCESSING METHOD - A vaporizing apparatus includes a heating plate disposed in a container to heat and vaporize a liquid chemical, a gas supply unit configured to supply a carrier gas carrying the chemical vaporized by the heating plate, into the container, a first detecting unit configured to detect the supply of the carrier gas into the container, and a second detecting unit configured to detect the vaporization of the liquid chemical by the heating plate. | 02-09-2012 |
20150062545 | PATTERN FORMING METHOD, PATTERN FORMING APPARATUS, AND COMPUTER READABLE STORAGE MEDIUM - The present invention is a pattern forming method of forming a pattern on a substrate using a block copolymer, the pattern forming method including the steps of: forming a film of a block copolymer containing at least two kinds of polymers on the substrate; heating the film of the block copolymer; irradiating the heated film of the block copolymer with ultraviolet light in an atmosphere of an inert gas; and supplying an organic solvent to the film of the block copolymer irradiated with the ultraviolet light. | 03-05-2015 |
20150072536 | PATTERN FORMING METHOD, PATTERN FORMING APPARATUS, AND NON-TRANSITORY COMPUTER-READABLE STORAGE MEDIUM - A photoresist pattern used for forming a pattern of a block copolymer is formed on a substrate, and then an acid solution is supplied and an alkaline solution is further supplied to the photoresist pattern so as to slim and smooth the photoresist pattern. A block copolymer solution is applied to the substrate on which the smoothed photoresist pattern has been formed, to form a film of the block copolymer, and the film is heated. | 03-12-2015 |
20150228512 | SUBSTRATE TREATMENT METHOD, COMPUTER-READABLE STORAGE MEDIUM, AND SUBSTRATE TREATMENT SYSTEM - The present invention is a method of treating a substrate using a block copolymer containing a first polymer and a second polymer, the method including: a block copolymer coating step of applying the block copolymer onto a substrate or a base film applied on the substrate; and a polymer separation step of phase-separating the block copolymer into the first polymer and the second polymer by thermally treating the block copolymer on the substrate in a non-oxidizing gas atmosphere. | 08-13-2015 |
20150255271 | SUBSTRATE TREATMENT METHOD, COMPUTER STORAGE MEDIUM, AND SUBSTRATE TREATMENT SYSTEM - The present invention is configured to: form, on a substrate, a neutral layer having an intermediate affinity to a hydrophilic polymer and a hydrophobic polymer; form a resist pattern by performing exposure processing on a resist film formed on the neutral layer and then developing the resist film after the exposure processing; perform a surface treatment on the resist pattern by supplying an organic solvent having a polarity to the resist pattern; apply the block copolymer onto the neutral layer; and phase-separate the block copolymer on the neutral layer into the hydrophilic polymer and the hydrophobic polymer. | 09-10-2015 |
Patent application number | Description | Published |
20110204300 | METHOD FOR PRODUCING METALLIC CARBON NANOTUBE, CARBON NANOTUBE DISPERSION LIQUID, CARBON NANOTUBE-CONTAINING FILM, AND TRANSPARENT CONDUCTIVE FILM - [Description] A method for producing a metallic carbon nanotube, by which a dispersion with a high concentration can be obtained. Specifically disclosed is a method for producing a metallic carbon nanotube, which comprises a fullerene addition step wherein fullerenes are added into a carbon nanotube-containing solution in which metallic carbon nanotubes and semiconductive carbon nanotubes are mixed, and a taking-out step wherein carbon nanotubes dispersed by the added fullerenes are taken out. | 08-25-2011 |
20120214375 | CARBON FIBER NONWOVEN FABRIC, CARBON FIBER, PRODUCING METHOD THEREOF, ELECTRODE, BATTERY, AND FILTER - The present invention has an object of providing the carbon fiber (or the nonwoven fabric configured of the aforementioned carbon fiber) of which the surface area, the graphitization degree, and the fiber diameter are large, high, and small, respectively, and yet of which dispersion is small. | 08-23-2012 |
Patent application number | Description | Published |
20120073461 | IMPRINT SYSTEM, IMPRINT METHOD, AND NON-TRANSITORY COMPUTER STORAGE MEDIUM - The present invention is an imprint system including an imprint unit transferring a transfer pattern to a coating film formed on a substrate using a template having the transfer pattern formed on a front surface thereof to form a predetermined pattern in the coating film, the imprint system including: a substrate carry-in/out station connected to the imprint unit, capable of keeping a plurality of the substrates, and carrying the substrate into/out of the imprint unit side; and a template carry-in/out station connected to the imprint unit, capable of keeping a plurality of the templates, and carrying the template into/out of the imprint unit side at a predetermined timing. | 03-29-2012 |
20120086142 | IMPRINT SYSTEM, IMPRINT METHOD, AND NON-TRANSITORY COMPUTER STORAGE MEDIUM - The present invention is a system including: an imprint unit transferring a transfer pattern to a coating film on a substrate using a template to form a predetermined pattern in the coating film; a treatment station connected to the imprint unit and performing a predetermined treatment on the template; a template carry-in/out station connected to the treatment station, capable of keeping templates, and carrying the template in/out from/to the treatment station; a carry line provided through the imprint unit and carrying the template between the imprint unit and the treatment station; and a substrate carry-in/out station connected to the imprint unit, capable of keeping substrates, and carrying the substrate in/out from/to the imprint unit. | 04-12-2012 |
20120097336 | TEMPLATE TREATMENT APPARATUS AND IMPRINT SYSTEM - The present invention is a template treatment apparatus forming a film of a release agent on a template having a transfer pattern formed on a front surface thereof, the template treatment apparatus including: a treatment station forming a film of a release agent on the front surface of the template; and a template carry-in/out station capable of keeping a plurality of the templates, and carrying the template into/out of the treatment station, wherein the treatment station includes: a cleaning unit cleaning the front surface of the template; a coating unit applying a release agent to the cleaned front surface of the template; a heating unit baking the applied release agent; and a carry unit carrying the template to the cleaning unit, the coating unit, and the heating unit. | 04-26-2012 |
20140000517 | COATING APPARATUS AND NOZZLE | 01-02-2014 |
Patent application number | Description | Published |
20140197360 | PRODUCTION METHOD FOR WATER-ABSORBING RESIN COMPOSITION - A method for being capable of sufficiently exerting property improvement effect by the addition of additive particles other than water-absorbing resin to water-absorbing resin particles. The problems can be solved by using additive particles having over cohesive particles in an amount equal to or less than a predetermined amount, or by using the additive particles by crushing or classifying in advance, before mixing with water-absorbing resin particles. Alternatively, the problem can be solved by subjecting a mixture of the water-absorbing resin particles and the additive particles to pneumatic transportation processing, in particular, in a heated state, after mixing or at the same time as mixing. Further, provided is a water-absorbing resin composition, which is capable of stably exerting high-level property. The problems can be solved by a water-absorbing resin composition, where the addition amount of additive particles and amount of free additive particles satisfies a predetermined relation. | 07-17-2014 |
20150217270 | PARTICULATE WATER ABSORBING AGENT AND METHOD FOR MANUFACTURING SAME - A water absorbent resin (water absorbing agent) and method for producing it are provided which improve, in a water absorbent article (in particular, a diaper) including a water absorbent resin as a water absorbing agent, the absolute absorption amount (g), liquid absorbing times (in particular, liquid absorbing times at the second instance and later), re-wet (g), and diffusion distance (%) of the water absorbent article. | 08-06-2015 |