Patent application number | Description | Published |
20100073657 | Nanolithography system - A nanolithography system comprising a novel optical printing head suitable for high throughput nanolithography. This optical head enables a super-resolution lithographic exposure tool that is otherwise compatible with the optical lithographic process infrastructure. The exposing light is transmitted through specially designed super-resolution apertures, of which the “C-aperture” is one example, that create small but bright images in the near-field transmission pattern. A printing head comprising an array of these apertures is held in close proximity to the wafer to be exposed. In one embodiment, an illumination source is divided into parallel channels that illuminate each of the apertures. Each of these channels can be individually modulated to provide the appropriate exposure for the particular location on the wafer corresponding to the current position of the aperture. A data processing system is provided to re-interpret the layout data into a modulation pattern used to drive the individual channels. In one embodiment of the invention, the exposure head remains stationary while the material to be exposed rotates beneath the head. Such an embodiment comprises a circular data fracturing system to process the layout data to determine the correct modulation pattern. | 03-25-2010 |
20100075259 | Illuminating waveguide fabrication method - A nanolithography system comprising a novel optical printing head suitable for high throughput nanolithography. This optical head enables a super-resolution lithographic exposure tool that is otherwise compatible with the optical lithographic process infrastructure. The exposing light is transmitted through specially designed super-resolution apertures, of which the “C-aperture” is one example, that create small but bright images in the near-field transmission pattern. A printing head comprising an array of these apertures is held in close proximity to the wafer to be exposed. In one embodiment, an illumination source is divided into parallel channels that illuminate each of the apertures. Each of these channels can be individually modulated to provide the appropriate exposure for the particular location on the wafer corresponding to the current position of the aperture. A data processing system is provided to re-interpret the layout data into a modulation pattern used to drive the individual channels. In one embodiment of the invention, the exposure head remains stationary while the material to be exposed rotates beneath the head. Such an embodiment comprises a circular data fracturing system to process the layout data to determine the correct modulation pattern. | 03-25-2010 |
20120257183 | Nanolithography system - A nanolithography system comprising a novel optical printing head suitable for high throughput nanolithography. This optical head enables a super-resolution lithographic exposure tool that is otherwise compatible with the optical lithographic process infrastructure. The exposing light is transmitted through specially designed super-resolution apertures, of which the “C-aperture” is one example, that create small but bright images in the near-field transmission pattern. A printing head comprising an array of these apertures is held in close proximity to the wafer to be exposed. In one embodiment, an illumination source is divided into parallel channels that illuminate each of the apertures. Each of these channels can be individually modulated to provide the appropriate exposure for the particular location on the wafer corresponding to the current position of the aperture. A data processing system is provided to re-interpret the layout data into a modulation pattern used to drive the individual channels. In one embodiment of the invention, the exposure head remains stationary while the material to be exposed rotates beneath the head. Such an embodiment comprises a circular data fracturing system to process the layout data to determine the correct modulation pattern. | 10-11-2012 |
20120312774 | Illuminating waveguide fabrication method - A method for fabricating waveguides comprising nano-apertures for illumination of sub-resolution exposures is presented. In particular, the end of a waveguide, such as an optical fiber, is coated with a material, such as an electrically conducting metal or a semiconductor. This material is then selectively removed through the process of ion milling, creating an aperture in the material at the end of the waveguide. Under normal conditions, if the aperture is smaller than the wavelength of light in the waveguide, there is little or no transmission through the aperture. However, with the appropriate selection of materials and aperture geometry, for example a metallic conducting coating and sub-wavelength “C-shaped” or “bow-tie” aperture, enhancement of transmission of light through the aperture can be achieved, allowing effective illumination of sub-resolution spots using the ion-milled aperture. This can be used in a nanolithography system incorporating waveguide illuminators as well. | 12-13-2012 |
20140055769 | Method For Nanolithography - A method of performing nanolithography is disclosed, comprising use of an optical printing head that enables a super-resolution lithographic exposures compatible with conventional optical lithographic processes. The super-resolution exposures are carried out using light transmitted through specially designed super-resolution apertures, of which the “bow-tie” and “C-aperture” are examples. These specially designed apertures create small but bright images in the near-field transmission pattern. A printing head comprising an array of these apertures is held in close proximity to the object to be exposed. A data processing system is provided to re-interpret the layout data into a modulation pattern used to drive the multiple individual channels and the multiple exposures. | 02-27-2014 |
20140116982 | ILLUMINATING WAVEGUIDE FABRICATION METHOD - A method for fabricating waveguides comprising nano-apertures for illumination of sub-resolution exposures is presented. In particular, the end of a waveguide, such as an optical fiber, is coated with a material, such as an electrically conducting metal or a semiconductor. This material is then selectively removed through a lithography process using photon exposure to create an aperture in the material at the end of the waveguide. Under normal conditions, if the aperture is smaller than the wavelength of light in the waveguide, there is little or no transmission through the aperture. However, with the appropriate selection of materials and aperture geometry, for example a metallic conducting coating and sub-wavelength “C-shaped” or “bow-tie” aperture, enhancement of the transmission of light through the aperture can be achieved, allowing effective illumination of sub-resolution spots using the nano-aperture. This can be used in a nanolithography system incorporating waveguide illuminators as well. | 05-01-2014 |
20150042971 | METHOD AND SYSTEM FOR NANOLITHOGRAPHY - A method of performing nanolithography is disclosed, comprising use of an optical printing head that enables a super-resolution lithographic exposures compatible with conventional optical lithographic processes. The super-resolution exposures are carried out using light directed onto a data recording medium using plasmonic structures, and in particular using plasmonic structures using specially designed super-resolution apertures, of which the “bow-tie” and “C-aperture” are examples. These specially designed apertures create small but bright images in the near-field transmission pattern. A printing head comprising an array of these apertures is held in close proximity to a data recording medium. A data processing system is provided to re-interpret the data to be patterned into a set of modulation signals used to drive the multiple individual channels and the multiple exposures. | 02-12-2015 |
20150198895 | METHOD AND SYSTEM FOR WRITING NANOSCALE PATTERNS - A method of performing nanolithography is disclosed, comprising use of an optical printing head that enables a super-resolution lithographic exposures compatible with conventional optical lithographic processes. The super-resolution exposures are carried out using light directed onto a data recording medium using plasmonic structures, and in particular using plasmonic structures using specially designed super-resolution apertures, of which the “bow-tie” and “C-aperture” are examples. These specially designed apertures create small but bright images in the near-field transmission pattern. A printing head comprising an array of these apertures is held in close proximity to a data recording medium. A data processing system is provided to re-interpret the data to be patterned into a set of modulation signals used to drive the multiple individual channels and the multiple exposures. | 07-16-2015 |
20160116846 | SUPER-RESOLUTION EXPOSURE SYSTEM - An optical device for performing nanolithography is disclosed, comprising an optical printing head that enables a super-resolution lithographic exposures compatible with conventional optical lithographic processes. The super-resolution exposures are carried out using light directed onto a data recording medium using plasmonic structures, and in particular using plasmonic structures using specially designed super-resolution apertures, of which the “bow-tie” and “C-aperture” are examples. These specially designed apertures create small but bright images in the near-field transmission pattern. A printing head comprising an array of these apertures is held in close proximity to a data recording medium. A data processing system is provided to re-interpret the data to be patterned into a set of modulation signals used to drive the multiple individual channels and the multiple exposures. | 04-28-2016 |
Patent application number | Description | Published |
20110251480 | Movable Integrated Scanner for Surgical Imaging Applications - A patient imaging system includes a patient support table, an MRI system including a cylindrical magnet and a PET system including positron detectors mounted in a ring. The magnet defines a cylindrical bore for receiving the patient on the table where the magnet is mounted for rotation about a vertical axis on a slew ring carried on rails allowing longitudinal movement. The PET ring is mounted in the bore for longitudinal movement. The quench tube for the magnet passes through the slew ring with a rotary union at the axis. The shielding covers include a fixed upper part and a lower part which rotates about the axis with the magnet. The magnet is arranged in a two or three room diagnostic configuration in which a holding bay houses the magnet and the diagnostic patients are organized in the three rooms each cooperating with the magnet bay as the magnet is rotated. | 10-13-2011 |
20130137964 | MR GAMMA HYBRID IMAGING SYSTEM - A pendant breast imaging system that operates with a MRI system and which allows a planar gamma camera breast imaging system to be positioned away from the breast area while MRI imaging is occurring, and which then moves into breast imaging position after MRI imaging is complete, and which can again be removed from the breast area to allow intervention to occur is described. It may use various collimator or scintillator materials and designs. | 05-30-2013 |
20140303483 | BREAST BIOPSY SYSTEM USING MR AND GAMMA IMAGING - Described herein is the use of gamma cameras in the fringe field of the MRI system. Specifically, an MR image of the breast with lesion identification is first produced. Then, a gamma camera is attached to the existing breast immobilization system for generating one or more gamma images of the breast. The gamma camera is then removed from the breast immobilization system, and a breast biopsy is performed. The gamma camera can then be used to image the biopsy cores that have been removed from the patient in order to verify that the biopsy cores are radioactive, that the biopsy cores extend from one end of the lesion to the other and have a radioactive profile in which the tip is not as radioactive as the middle, and in which the ratio of amount of radioactivity in the middle of the core to the amount of radioactivity that is present in the tip of the core can be expressed as a ratio. | 10-09-2014 |
20140343344 | Radiation Therapy Guided Using Gamma Imaging - Radiation therapy of a lesion within a patient is guided to take into account movement of the lesion caused by respiration and/or cardiac effects by using MRI or other imaging system suitable for locating the lesion to image the patient while on the treatment support and using a gamma imaging system responsive to a radiation source preferentially taken up by the lesion and registered with the MRI so as to monitor movement of the lesion in real time and thus guide the beam of the RT. | 11-20-2014 |
Patent application number | Description | Published |
20090306205 | METHOXYPOLYETHYLENE GLYCOL THIOESTER CHELATE AND USES THEREOF - The present invention is directed generally to protecting cells, tissues and organs against the damaging effects of ionizing or other damaging agents associated with radiation or chemotherapy, or degenerative diseases or processes of various organs that elicit the production of free radicals or oxidants such as peroxides, superoxide anions, hydroxyl radicals or nitric oxides, or heavy metal cations. More particularly, the present invention is concerned with methoxypolyethylene glycol thioester chelate methyl esters that are useful as protectors against tissue damage by penetrating the cell membrane to donate electrons to free radical oxidants and remove heavy metals that may react with peroxides to produce the reactive hydroxyl radical, or remove Ca++ that may be released from organelles. These chelate esters will also have utility in reducing intraocular pressure in glaucoma patients. | 12-10-2009 |
20120016030 | METHOXYPOLYETHYLENE GLYCOL THIOESTER CHELATE AND USES THEREOF - The present invention is directed generally to protecting cells, tissues and organs against the damaging effects of ionizing or other damaging agents associated with radiation or chemotherapy, or degenerative diseases or processes of various organs that elicit the production of free radicals or oxidants such as peroxides, superoxide anions, hydroxyl radicals or nitric oxides, or heavy metal cations. More particularly, the present invention is concerned with methoxypolyethylene glycol thioester chelate methyl esters that are useful as protectors against tissue damage by penetrating the cell membrane to remove electrons from free radical oxidants and remove heavy metals that may react with peroxides to produce the reactive hydroxyl radical, or remove Ca | 01-19-2012 |