Tsen
Alex Tsen, Toronto CA
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20140060967 | Fall Protection System for Shipping Containers - Apparatus and associated methods relate to a fall protection system including a manually-operable locking assembly releasably coupled to a corner casting of an ISO Standard shipping container, a safety lanyard extending from the locking assembly and connected to a user-worn harness via a connecting device. In an illustrative example, multiple simultaneous points of connection may be established with one or more corner castings to provide securement when moving along or climbing shipping containers. In another illustrative example, the lanyard may be connected to a cable and trolley system for mobility along one or more shipping container surfaces. The cable may be oriented horizontally or vertically to permit horizontal or vertical travel of the user. In some implementations, the locking assembly may employ a twist-lock structure. In an illustrative example, the locking assembly may releasably couple to the corner casting without the use of additional tools or hardware. | 03-06-2014 |
20140090927 | Variable-Height Attachment Point System for a Safety Harness - Systems and methods relate to a operator selectable, variable-height attachment point system for a safety harness, where the attachment point is disposed on a radial support member that can be reversibly coupled to a vertical support member, and where the attachment point height can be selected by the operator by reversing a coupled orientation of the radial support member to the vertical support member. | 04-03-2014 |
Chao-Chung Tsen, Hsin-Chu TW
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20150029752 | DISPLAY DEVICE - A display device includes a light guide plate, at least one illuminating element, a side frame, and a display panel. The light guide plate includes a main body and at least one light-incident protrusion part. The main body has a light-emitting surface. The light-incident protrusion part is connected to the main body and has a light-incident surface. The illuminating element is arranged along the light-incident surface and is capable of emitting a light beam. The light beam enters the light guide plate from the light-incident surface and leaves the light guide plate from the light-emitting surface. The side frame is located on the light guide plate. The display panel is located between the light guide plate and the side frame. The side frame and the display panel expose the light-incident protrusion part. The side frame of the display device described herein has the small width. | 01-29-2015 |
Charles Tsen, Portland, OR US
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20140188963 | EFFICIENT CORRECTION OF NORMALIZER SHIFT AMOUNT ERRORS IN FUSED MULTIPLY ADD OPERATIONS - A method for correcting a shift error in a fused multiply add operation. The method comprises adjusting a normalized floating-point number before performing a shift error correction to produce an adjusted normalized floating-point number, and correcting a shift error in the adjusted normalized floating-point number. The correcting the shift error comprises shifting a mantissa of the adjusted normalized floating-point number in one direction. A fused multiply add module comprising a normalizer module, a compensation logic, and a round. The normalizer module is operable to normalize a floating-point number to produce a normalized floating-point number. The floating-point number is normalized based upon an estimated quantity of leading zeros. The compensation logic is operable to manage a correction of a shift error in the normalized floating-point number. The rounder is operable to correct the shift error with a mantissa shift in only one direction. | 07-03-2014 |
Chih-Chun Tsen, Taoyuan City TW
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20100040457 | Light-emitting fan - A light-emitting fan includes a frame, a vane, at least one flexible circuit structures, and a plurality of light-emitting elements. The van is pivotally provided on the frame. The van has a hub and a plurality of blades connected to the hub. The flexible circuit structure is circumferentially provided on the frame. The light-emitting elements are provided on the flexible circuit structure to emit light respectively. With the above arrangement, the light-emitting elements can be combined with the frame easily via the flexible circuit structure. | 02-18-2010 |
Chiu-Jung Tsen, Hsinchu TW
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20150016040 | INFORMATION HANDLING SYSTEM HOUSING LID WITH SYNCHRONIZED MOTION PROVIDED BY A FLEXIBLE COMPRESSIVE MEMBER - An information handling system converts from a closed position to a tablet position by rotating a lid with a display 360 degrees about a hinge having synchronized and continuous motion. The hinge has first and second axles held in a spaced and substantially parallel orientation by a support. A flexible compressive member translates motion of each axle to the other to provide fluid movement of the lid relative to the housing. For instance, ball bearings disposed in guide formed in the support translate rotational motion between a first and second axles. | 01-15-2015 |
20150309540 | Information Handling System Hinge Support Frame - Low profile portable information handling systems rotationally couple a lid and chassis portion with a dual axis hinge that couples at one axis with an extension and countersink engagement to enhance system strength. For example, a conical boss in a lid support frame extends into a countersink formed in a hinge axis and includes threads to accept a screw inserted from the hinge axis into the conical boss. The conical boss inner diameter extends the space available for placement of threads to engage a screw to provide enhanced coupling strength between the hinge axis and lid support frame. | 10-29-2015 |
Chiu-Jung Tsen, Hsinchu City TW
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20130320177 | TILT ASSEMBLY FOR USE WITH A DISPLAY SCREEN - A tilt assembly for a display screen is provided. The tilt assembly includes a base assembly that includes a base casing configured to engage with a proximally positioned surface and a base plate configured to cooperatively form the tilt assembly with the base casing. The base plate is configured to translate aft and fore and impart a pivot to the display screen. | 12-05-2013 |
20140268513 | DISPLAY SCREEN ASSEMBLY HAVING A SELECTIVELY ENGAGEABLE MOUNT ASSEMBLY - A display screen assembly is provided. The display screen defines a channel for allowing selective engagement of the display screen. A mount assembly is provided and includes a base for supporting the display screen assembly about a support surface, and a locking assembly that selectively engages the channel to thereby lock the mount assembly to the display screen. | 09-18-2014 |
Chi-Wang Tsen, Taipei City TW
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20150346909 | MOTION TRAJECTORY CAPTURING DEVICE AND MOTION TRAJECTORY CAPTURING MODULE THEREOF - A motion trajectory capturing module includes a light-emitting element, a light-splitting element, a first light-reflecting element, a second light-reflecting element, a lens assembly and a motion trajectory sensing element, characterized in that: a projection light beam generated by the light-emitting element is reflected by the light-splitting element and the first light-reflecting element in sequence to form an illumination light beam passing through a light-transmitting element and projected onto an object moving on the light-transmitting element, the illumination light beam is reflected by the object to form an image light beam reflected by the first light-reflecting element, the image light beam sequentially passes through the light-splitting element and the lens assembly and is projected onto the motion trajectory sensing element through the second light-reflecting element, and the motion trajectory sensing element receives the image light beam to obtain a motion trajectory of the object moving on the light-transmitting element. | 12-03-2015 |
20150347813 | FINGERPRINT IMAGE CAPTURING DEVICE AND FINGERPRINT IMAGE CAPTURING MODULE THEREOF - A fingerprint image capturing module includes a light-emitting element, a light-splitting element, a first light-reflecting element, a second light-reflecting element, a lens assembly and a fingerprint image sensing element, characterized in that: a projection light beam generated by the light-emitting element is reflected by the light-splitting element and the first light-reflecting element in sequence to form an illumination light beam that passes through a light-transmitting element and is projected onto a fingerprint of a finger, the illumination light beam is reflected by the finger to form an image light beam that is reflected by the first light-reflecting element, the image light beam sequentially passes through the light-splitting element and the lens assembly and is projected onto the fingerprint image sensing element through the second light-reflecting element, and the fingerprint image sensing element receives the image light beam to obtain a fingerprint image of the fingerprint of the finger. | 12-03-2015 |
Chun-Chieh Tsen, Tu-Cheng TW
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20120040568 | AUDIO PLUG AND AUDIO CONNECTOR USING THE SAME - An audio connector includes an audio plug and a jack. The audio connector includes an isolating housing and a terminal partially positioned in the housing. The jack forms a receiving portion for receiving the terminal. The terminal includes a metallic flange extending out of the housing. The housing forms an isolated covering portion on the main body surrounding the metallic flange. | 02-16-2012 |
20120134525 | AUDIO INTERFACE - An audio interface used for mating with an earphone plug having an electronic conductor is disclosed. The audio interface comprises a socket body; and an insulation wrap protruding from the socket body, the insulation wrap defining a receptacle, the electronic conductor inserted in the receptacle and wholly wrapped by the insulation wrap. | 05-31-2012 |
20120249381 | RADIO FREQUENCY PRINTED CIRCUIT BOARD - A radio frequency(RF) printed circuit board (PCB) includes an RF circuit for generating high frequency signals. The RF PCB is connected to an EMC measuring device when measuring the EMC thereof. The measuring device includes a probe pin and a shielding barrel surrounding the probe pin. The shielding barrel includes an end surface at a distal end thereof. The RF PCB further includes a test node connected to the RF circuit and a ground node surrounding the test node. The test node contacts the probe pin and outputs the high frequency signals when measuring the EMC of the RF PCB. The ground node corresponds to the end surface and contacts the end surface while the probe pin contacts the test node. | 10-04-2012 |
Chun-Chieh Tsen, New Taipei TW
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20140239976 | AUXILIARY TEST APPARATUS FOR ELECTROMAGNETIC COMPATIBILITY AND TEST METHOD USING THE SAME - An auxiliary test apparatus for electromagnetic compatibility includes two substantially parallel side plates and a dividing plate substantially perpendicularly connected between centerlines of the side plates. A through hole is defined in a center portion of the dividing plate. Top and bottom surfaces of the dividing plate and the inner surfaces of the side plates are covered by conductive foam. | 08-28-2014 |
Fun-Tun Tsen, Taipei City TW
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20120113400 | EASILY-ASSEMBLED REAR PROJECTION SYSTEM WITH COMPACT STORAGE - An easily assembled and collapsible rear projection system comprises an easily dismantled and assembled fixture, a projector, a screen and three to five plane mirrors. The fixture is composed of extruded aluminum multi-hole tubes, H-shaped tubes, die-cast aluminum angled bolt holders, extruded aluminum coupling bolt holders, aluminum plates and bolts to join the tubes at various angles for mounting the projector and relative position of the plane mirrors. The multi-hole tubes have five holes passing through the tubes in parallel. There are four holes located at four corners and one at the center of the cross-section of the tube. The coupling bolt holder is used to join the tubes at a 180 degree angle. The angled bolt holder is used to join tubes at various angles. The fixture of the rear projection system is designed for fast dismantling into four modules, including top, a bottom, a front and a back subassemblies, by simply removing the coupling bolt holders. | 05-10-2012 |
James Tsen, Needham, MA US
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20160000181 | ATHLETIC SHOE WITH ENERGY RETURN SYSTEM - In one implementation, the present invention provides for a shoe comprising a shoe sole assembly and a shoe upper assembly. The shoe sole assembly comprises a midsole, at least one stabilizer plug, and at least one outsole member. The midsole has an upper midsole surface, a lower midsole surface, a midsole forefoot portion, and a midsole heel portion. The at least one stabilizer plug has an upper stabilizer plug surface, a lower stabilizer plug surface, at least one trampoline recess disposed in the upper stabilizer plug surface, and at least one projection extending from the lower stabilizer plug surface. The at least one projection substantially underlies at least a portion of the at least one trampoline recess. The lower midsole surface defines at least one stabilizer plug recess sized and shaped to receive a corresponding stabilizer plug. The at least one outsole member has an upper outsole surface and a lower outsole surface. The upper outsole surface is adapted to complimentarily receive the at least one projection extending from the lower stabilizer plug surface. A shoe upper assembly has a bottom portion that is attached to the shoe sole assembly and extends upward to a central, foot-receiving portion. In operation, when a force is applied to the lower outsole surface during a foot strike, the at least one trampoline recess receives underlying portions of the stabilizer plug to accommodate elastic deflection of the underlying portions of the stabilizer plug and the outsole. | 01-07-2016 |
James Kuangcheng Tsen, Needham, MA US
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20120285045 | REMOVABLE CLEAT PROTECTOR FOR CLEATED CYCLING SHOES - A removable cleat protector for a cycling shoe having a cleat with particular size and shape attached thereto. The cleat protector including: a contoured base; and a plurality of wall sections extending upwardly from a perimeter of the contoured base, the wall sections having a catch portion sized and shaped to snap into and contact with one end of the cleat, and a cavity portion sized and shaped to securely contact with another end of the cleat. | 11-15-2012 |
Jimmy Tsen, Needham, MA US
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20110185598 | PROTECTIVE COVER FOR BICYCLE AND TRACK AND FIELD FOOTWEAR - A protective cover for a shoe having cleats including a front end, an opposing rear end, an upper which extends from the front to the rear end, a bottom extending rearwardly from the front end, an approximate midpoint of the cover where the bottom terminates, a cavity formed into the bottom for receiving a cleat disposed on a forward part of the shoe and for receiving an insert configured to engage and contact a cleat of the shoe, where the upper extends around and over a portion of a toe area of the shoe, and where the upper extends from the midpoint rearward around a heel area of the shoe to delimit an opening in the cover adjacent to the bottom and rearward of the midpoint through which a portion of the shoe extends when the cover is worn. | 08-04-2011 |
20120066935 | RETRACTABLE CLEAT PROTECTOR FOR CLEATED BICYCLE SHOES - A retractable cleat protector for cleated bicycle shoes. It has a cleat protector body with a lower ground facing surface, and an upper cleat facing surface having recesses formed therein for engaging with a cleat. A cleat retention loop of flexible and elastic material is connected to the cleat protector body for retaining the cleat protector to the bottom of a cleated bicycle shoe. A mode selection loop of flexible and elastic material is connected to the cleat protector body for selectively retaining the cleat protector body in a first orientation wherein the cleat protector body covers a cleat on a bottom of a cleated bicycle shoe, and a second orientation wherein the cleat protector body is retained away from the cleat on the bottom of a cleated bicycle shoe. | 03-22-2012 |
Kong-Thon Tsen, Chandler, AZ US
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20100136646 | Selective Inactivation Of Microorganisms With A Femtosecond Laser - A method is provided for selectively inactivating microorganisms with femtosecond pulsed lasers. Under proper laser conditions, irradiation of the femtosecond pulsed laser causes inactivation of pathogenic microorganisms, for example, viruses, bacteria and protozoa, without causing cytotoxicity in mammalian cells. Pathogenic microorganism activity is diminished through an impulsive stimulated Raman scattering process, that is, through the excitation of the low-energy vibrational state on the outer structure of a microorganism with femtosecond pulsed lasers. The wavelength of the laser pulses is in a range of the electromagnetic spectrum, for example, visible and near-infrared where water is substantially transparent. The method is utilized for cleansing blood components, disinfecting drinking water, treating viral and bacterial diseases, extracting nucleic acid from microorganisms, and for manufacturing vaccines. | 06-03-2010 |
Kong-Thon Tsen, Tempe, AZ US
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20080299636 | SYSTEM AND METHOD FOR INACTIVATING MICROORGANISMS WITH A FEMTOSECOND LASER - The invention relates to a method of inactivating or diminishing the activity of microorganisms and an apparatus implementing that method. Microorganism activity is diminished through exciting the vibrational state of a microorganism with pulses of radiation femtoseconds in width. The wavelength of the pulses is in a range of the electromagnetic spectrum to which water is substantially transparent such as visible light. The pulses cause the microorganisms to vibrate such that their activities become diminished. A laser produces the pulses. A harmonic generator then acts upon the pulses to produce a scattering effect that is used to irradiate the microorganisms. One such laser is a titanium sapphire laser. One example of a harmonic generator is a nonlinear crystal such as a BBO crystal. The apparatus may also have a focusing lens such as a microscope objective that focuses the beam on a microorganism. The invention is effective for the inactivation of viruses or bacteria. The present invention may be utilized in order for extracting nucleic acid from microorganisms. The invention may be used in the manufacturing of vaccines. The invention enables the selective inactivation of target viruses and bacteria without causing cytotoxicity in mammalian cells. | 12-04-2008 |
Kuo-Chang Tsen, Linkou Township TW
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20110057254 | METAL-OXIDE-SEMICONDUCTOR CHIP AND FABRICATION METHOD THEREOF - A metal-oxide-semiconductor chip having a semiconductor substrate, an epitaxial layer, at least a MOS cell, and a metal pattern layer is provided. The epitaxial layer is located on the semiconductor substrate and has an active region, a termination region, and a scribe line preserving region defined on an upper surface thereof. An etched sidewall of the epitaxial layer is located in the scribe line preserving region. The boundary portion of the upper surface of the semiconductor substrate is thus exposed. The MOS cell is located in the active region. The metal pattern layer is located on the epitaxial layer and has a gate pad coupled to the gate of the MOS cell, a source pad coupled to the source of the MOS cell, and a drain pattern, which is partly located on the upper surface of the semiconductor substrate. | 03-10-2011 |
Kuo Lun Tsen, New Taipei City TW
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20140153146 | CONNECTION APPARATUS CIRCUIT AND HIGH VOLTAGE SURGE PROTECTION METHOD THEREOF - A connection apparatus circuit includes an isolation transformer, an impedance matching network, a high-voltage capacitor and a first high-voltage surge protector. The isolation transformer has a first coil and a second coil, wherein the first coil has a first terminal, a second terminal and a center tap. The impedance matching network is coupled between the center tap and a relay terminal. The high-voltage capacitor is coupled between the relay terminal and a ground terminal. The first high-voltage surge protector is coupled between the relay terminal and the ground terminal. When a high-voltage surge exceeds a default value between the first terminal or the second terminal and the ground terminal, the first high-voltage surge protector is conducted to clamp current on the impedance matching network. | 06-05-2014 |
Kuo-Lun Tsen, Hsin-Tien TW
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20110058294 | Protection Circuit - A protection circuit is coupled between a chipset and an I/O port. The protection circuit comprises at least two protection devices and a control device. The protection devices are coupled in parallel with each other, and coupled between the I/O port and the chipset. The protection devices receive an input signal from the I/O port. When the I/O port has a surge current thereon, the protection devices perform a discharge operation for the surge current. The control device selects one of the protection devices to transmit the input signal t the chipset. | 03-10-2011 |
Samson Tsen, Taipei City TW
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20080245240 | Heat isolation structure for baking trays - A heat isolation structure for baking trays mainly includes a base which has an open surface, a heat transfer element located on the open surface to transfer heat energy that has a first surface in contact with food and a second surface on another side opposing the first surface, and a housing space formed between the base and the second surface. The housing space has a heat isolation member to prevent the heat energy from transferring to the base. Thus high temperature heat energy of the heat transfer element is prevented from transferring to the base. Thereby the trays with the base made from plastics that tend to be damaged by burning or melting due to overheat can be maintained intact after adopting the heat isolation member of the invention. | 10-09-2008 |
20120318393 | FLOW GUIDE STRUCTURE FOR BLADELESS AIR FANS - A flow guide structure for a bladeless air fan. The bladeless air fan includes a host and an airflow guiding frame. The host includes an airflow generator. The airflow guiding frame is connected to the host and includes an air discharging portion which has an airflow guiding passage inside to communicate with the airflow generator. The air discharging portion also includes an airflow gathering wall, an inner ring compression wall and an outer ring compression wall extended forwards from two ends of the airflow gathering wall. From the junctions of the airflow gathering wall and inner ring compression wall and outer ring compression wall, the inner ring compression wall and outer ring compression wall are spaced from each other at a decreasing interval between them, and the inner ring compression wall and outer ring compression wall also have distal ends forming a front air outlet to discharge airflow forwards. | 12-20-2012 |
Shaw-Wei D. Tsen, Baltimore, MD US
Patent application number | Description | Published |
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20080299636 | SYSTEM AND METHOD FOR INACTIVATING MICROORGANISMS WITH A FEMTOSECOND LASER - The invention relates to a method of inactivating or diminishing the activity of microorganisms and an apparatus implementing that method. Microorganism activity is diminished through exciting the vibrational state of a microorganism with pulses of radiation femtoseconds in width. The wavelength of the pulses is in a range of the electromagnetic spectrum to which water is substantially transparent such as visible light. The pulses cause the microorganisms to vibrate such that their activities become diminished. A laser produces the pulses. A harmonic generator then acts upon the pulses to produce a scattering effect that is used to irradiate the microorganisms. One such laser is a titanium sapphire laser. One example of a harmonic generator is a nonlinear crystal such as a BBO crystal. The apparatus may also have a focusing lens such as a microscope objective that focuses the beam on a microorganism. The invention is effective for the inactivation of viruses or bacteria. The present invention may be utilized in order for extracting nucleic acid from microorganisms. The invention may be used in the manufacturing of vaccines. The invention enables the selective inactivation of target viruses and bacteria without causing cytotoxicity in mammalian cells. | 12-04-2008 |
Shaw-Wei D. Tsen, Chandler, AZ US
Patent application number | Description | Published |
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20100136646 | Selective Inactivation Of Microorganisms With A Femtosecond Laser - A method is provided for selectively inactivating microorganisms with femtosecond pulsed lasers. Under proper laser conditions, irradiation of the femtosecond pulsed laser causes inactivation of pathogenic microorganisms, for example, viruses, bacteria and protozoa, without causing cytotoxicity in mammalian cells. Pathogenic microorganism activity is diminished through an impulsive stimulated Raman scattering process, that is, through the excitation of the low-energy vibrational state on the outer structure of a microorganism with femtosecond pulsed lasers. The wavelength of the laser pulses is in a range of the electromagnetic spectrum, for example, visible and near-infrared where water is substantially transparent. The method is utilized for cleansing blood components, disinfecting drinking water, treating viral and bacterial diseases, extracting nucleic acid from microorganisms, and for manufacturing vaccines. | 06-03-2010 |
Ting-Chin Tsen, Taipei TW
Patent application number | Description | Published |
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20100176794 | Signal Detector And Signal Detection Method - A signal detector and a signal detection method adapted for detecting a voltage signal are provided. According to a digital signal converted from a low voltage full wave or half wave signal and/or a mains AC signal inputted thereto, the signal detector and the signal detection method is capable of detecting a voltage level, and/or a frequency, and/or a zero point, and/or a phase of the low voltage full wave or half wave signal and/or the mains AC signal inputted thereto, and determining whether the detected factor is abnormal, and is further capable of outputting interrupt signal for subsequent processing. | 07-15-2010 |
20100176863 | Signal Converter And Method Thereof - A signal converter and a method thereof are provided. The signal converter and the method are adapted for a voltage signal converting application. The signal converter and the method are adapted for converting a high voltage sine wave signal into a low voltage full wave and/or low wave signal, and improving the stability of the circuit. The signal converter is configured in an IC type, and can be integrated with other ICs, thus improving the systematic integration. | 07-15-2010 |
20110182097 | Pulse Width Modulation Step Wave And Sine Wave Driving Device - A PWM step wave and sine wave driving device is provided. The driving device includes an ADC unit, an input processing unit, a first pulse width calculation unit, a register unit, a first output unit, a zero point detecting unit, a second pulse width calculation unit, a second output unit, and a multiplexer output unit. The driving device receives input signals, and output desired step wave or sine wave driving signals for driving an external electric device. The driving device detects a point of zero voltage of the system power supply by the zero point detecting unit. When the system power supply is abnormal, the first output unit outputs predetermined PWM step wave output signals, or the second output unit outputs predetermined PWM sine wave output signals. In such a way, the external electric device can be maintained for regular operation, so that the malfunction or breakdown thereof is prevented. | 07-28-2011 |
20130027004 | POWER DETECTION REGULATION DEVICE - A power detection regulation device including a power detection signal generator, a power state detector and a regulated output unit is disclosed. The power detection signal generator receives the input power from an external power supply and generates a power detection signal. The power state detector generates a power state signal based on the power state derived from the power detection signal. The regulated output unit receives the power state signal and generates a driving signal to an external electrical device in accordance with the feedback signal from the external electrical device. The power state signal is provided for the external electrical element to perform relevant processes, and the regulated output device can output the predetermined driving signal on receiving the power state signal indicating some abnormal situation in the input power so as to maintain the normal operation performed by the actuating element in the external electrical device. | 01-31-2013 |
Ting-Chin Tsen, Taipei City TW
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20140218125 | DIGITAL PULSE WIDTH MODULATION CONTROLLER - A digital pulse width modulation controller includes a pulse width modulation controller, a selection unit having at least one selector, a comparison unit having at least one comparator, and a signal conversion unit having at least one digital-to-analog converter. The digital-to-analog converter generates a reference current and/or voltage. The comparator receives the reference current and/or voltage, and performs a comparison operation to generate a comparison signal based on a feedback signal. The selector selects one selection signal to input into the pulse width modulation controller, which receives other parameters set by a user or the system at the same time so as to control characteristics of the digital pulse width modulation signals, thereby improving the electric properties of a loading circuit. | 08-07-2014 |
Wen-Yuan Tsen, Nan-Tou Hsien TW
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20090195264 | High temperature test system - A high temperature test system is adapted for testing a device under test (DUT) under a high temperature environment. The high temperature test system includes a preheating unit, a first moving unit, a testing unit, and a second moving unit. The preheating unit is adapted for preheating the DUT. The first moving unit is adapted for removing the preheated DUT from the preheating unit. The testing unit is adapted for placement of the DUT removed by the first moving unit, for testing the DUT, and for providing the high temperature environment to the DUT during testing. The second moving unit is adapted for removing the DUT that has passed testing from the testing unit. | 08-06-2009 |
Yen-Di Tsen, Chung-Ho City TW
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20110282885 | Processing Exception Handling - In accordance with an embodiment, a method for exception handling comprises accessing an exception type for an exception, filtering historical data based on at least one defined criterion to provide a data train comprising data sets, assigning a weight to each data set, and providing a current control parameter. The data sets each comprise a historical condition and a historical control parameter, and the weight assigned to each data set is based on each historical condition. The current control parameter is provided using the weight and the historical control parameter for each data set. | 11-17-2011 |
20110301736 | APC Model Extension Using Existing APC Models - A method of extending advanced process control (APC) models includes constructing an APC model table including APC model parameters of a plurality of products and a plurality of work stations. The APC model table includes empty cells and cells filled with existing APC model parameters. Average APC model parameters of the existing APC model parameters are calculated, and filled into the empty cells as initial values. An iterative calculation is performed to update the empty cells with updated values. | 12-08-2011 |
20110314336 | Physical Failure Analysis Guiding Methods - A method includes providing a plurality of failure dies, and performing a chip probing on the plurality of failure dies to generate a data log comprising electrical characteristics of the plurality of failure dies. An automatic net tracing is performed to trace failure candidate nodes in the failure dies. A failure layer analysis is performed on results obtained from the automatic net tracing. Physical failure analysis (PFA) samples are selected from the plurality of failure dies using results obtained in the step of performing the failure layer analysis. | 12-22-2011 |
20120016509 | Semiconductor Processing Dispatch Control - An embodiment is a method for semiconductor processing control. The method comprises identifying a key process stage from a plurality of process stages based on a parameter of processed wafers, forecasting a trend for a wafer processed by the key process stage and some of the plurality of process stages based on the parameter, and dispatching the wafer to one of a first plurality of tools in a tuning process stage. The one of the first plurality of tools is determined based on the trend. | 01-19-2012 |
20120028174 | Defense System in Advanced Process Control - A method includes performing a lithography process on a wafer to form a patterned photo resist, and measuring the wafer to determine an overlay error of the patterned photo resist. A high/low specification is determined using the overlay error. An overlay process value setting is generated and compared with the high/low specification to determine whether the overlay process value setting is within a range defined by the high/low specification. | 02-02-2012 |
20120129431 | APPARATUS AND METHOD FOR TARGET THICKNESS AND SURFACE PROFILE UNIFORMITY CONTROL OF MULTI-HEAD CHEMICAL MECHANICAL POLISHING PROCESS - An apparatus and method for providing target thickness and surface profile uniformity control of a multi-head chemical mechanical polishing (CMP) process is disclosed. An exemplary method includes providing at least two wafers; determining a surface profile of each of the at least two wafers; determining an operation mode for a chemical mechanical polishing (CMP) process based on the surface profiles of the at least two wafers; determining a CMP polishing recipe for each of the at least two wafers based on the operation mode; and performing the CMP process on the at least two wafers based on the determined CMP polishing recipes. | 05-24-2012 |
20120215337 | TWO-DIMENSIONAL MULTI-PRODUCTS MULTI-TOOLS ADVANCED PROCESS CONTROL - The present disclosure provides a method. The method includes gathering advanced process control (APC) data from a subset of available wafers and a subset of available processing chambers. The method includes establishing a matrix that contains a plurality of cells. The cells each correspond to one of the available wafers and one of the available processing chambers. The matrix is partially filled by populating cells for which the APC data has been gathered. The method includes determining a plurality of chamber-coverage-rate (CCR) parameters associated with the matrix. The method includes optimizing the CCR parameters through an iteration process to obtain optimized CCR parameters. The method includes predicting an APC data value for a designated cell of the matrix based on the optimized CCR parameters. The designated cell is an empty cell before the predicting and is populated by the predicting. | 08-23-2012 |
20130013097 | Semiconductor Processing Dispatch Control - An embodiment is a method for semiconductor processing control. The method comprises identifying a key process stage from a plurality of process stages based on a parameter of processed wafers, forecasting a trend for a wafer processed by the key process stage and some of the plurality of process stages based on the parameter, and dispatching the wafer to one of a first plurality of tools in a tuning process stage. The one of the first plurality of tools is determined based on the trend. | 01-10-2013 |
20130144423 | SYSTEMS AND METHODS OF AUTOMATIC BOUNDARY CONTROL FOR SEMICONDUCTOR PROCESSES - A system and method of automatically calculating boundaries for a semiconductor fabrication process. The method includes selecting a first parameter for monitoring during a semiconductor fabrication process. A first set of values for the first parameter are received and a group value of the first set is determined. Each value in the first set of values is normalized. A first weighting factor is selected based on a number of values in the first set. The embodiment also includes generating a first and a second boundary value as a function of the weighting factor, the first set normalized values and the group value of the first set and applying the first and second boundary values to control the semiconductor fabrication process. | 06-06-2013 |
20130288403 | SYSTEMS AND METHODS OF AUTOMATICALLY DETECTING FAILURE PATTERNS FOR SEMICONDUCTOR WAFER FABRICATION PROCESSES - A system and method of automatically detecting failure patterns for a semiconductor wafer process is provided. The method includes receiving a test data set collected from testing a plurality of semiconductor wafers, forming a respective wafer map for each of the wafers, determining whether each respective wafer map comprises one or more respective objects, selecting the wafer maps that are determined to comprise one or more respective objects, selecting one or more object indices for selecting a respective object in each respective selected wafer map, determining a plurality of object index values in each respective selected wafer map, selecting an object in each respective selected wafer map, determining a respective feature in each of the respective selected wafer, classifying a respective pattern for each of the respective selected wafer maps and using the respective wafer fingerprints to adjust one or more parameters of the semiconductor fabrication process. | 10-31-2013 |
20140033159 | Method of Optimizing Design for Manufacturing (DFM) - The present disclosure describes a method of optimizing a design for manufacture (DFM) simulation. The method includes receiving an integrated circuit (IC) design data having a feature, receiving a process data having a parameter or a plurality of parameters, performing the DFM simulation, and optimizing the DFM simulation. The performing the DFM simulation includes generating a simulation output data using the IC design data and the process data. The optimizing the DFM simulation includes generating a performance index of the parameter or the plurality of parameters by the DFM simulation. The optimizing the DFM simulation includes adjusting the parameter or the plurality of parameters at outer loop, middle loop, and the inner loop. The optimizing the DFM simulation also includes locating a nadir of the performance index of the parameter or the plurality of parameters over a range of the parameter or the plurality of parameters. | 01-30-2014 |
20140106474 | SYSTEMS AND METHODS OF AUTOMATICALLY DETECTING FAILURE PATTERNS FOR SEMICONDUCTOR WAFER FABRICATION PROCESSES - A system and method of automatically detecting failure patterns for a semiconductor wafer process is provided. The method includes receiving a test data set collected from testing a plurality of semiconductor wafers, forming a respective wafer map for each of the wafers, determining whether each respective wafer map comprises one or more respective objects, selecting the wafer maps that are determined to comprise one or more respective objects, selecting one or more object indices for selecting a respective object in each respective selected wafer map, determining a plurality of object index values in each respective selected wafer map, selecting an object in each respective selected wafer map, determining a respective feature in each of the respective selected wafer, classifying a respective pattern for each of the respective selected wafer maps and using the respective wafer fingerprints to adjust one or more parameters of the semiconductor fabrication process. | 04-17-2014 |
20140170782 | SCANNER OVERLAY CORRECTION SYSTEM AND METHOD - A method includes performing a semiconductor fabrication process on a plurality of substrates. The plurality of substrates are divided into a first subset and a second subset. A rework process is performed on the second subset of the plurality of substrates but not on the first subset. A respective mean value of at least one exposure parameter for a lithography process is computed for each respective one of the first and second subsets of the plurality of substrates. A scanner overlay correction and a mean correction are applied to expose a second plurality of substrates on which the rework process has been performed. The mean correction is based on the computed mean values. | 06-19-2014 |
20140303765 | Semiconductor Processing Dispatch Control - An embodiment is a method for semiconductor processing control. The method comprises identifying a key process stage from a plurality of process stages based on a parameter of processed wafers, forecasting a trend for a wafer processed by the key process stage and some of the plurality of process stages based on the parameter, and dispatching the wafer to one of a first plurality of tools in a tuning process stage. The one of the first plurality of tools is determined based on the trend. | 10-09-2014 |
20150015870 | Overlay Abnormality Gating by Z Data - The present disclosure relates to a method of monitoring wafer topography. A position and orientation of a plurality first alignment shapes disposed on a surface of a wafer are measured. Wafer topography as a function of wafer position is modeled by subjecting the wafer to an alignment which simultaneously minimizes misalignment between the wafer and a patterning apparatus and maximizes a focus of radiation on the surface. A non-correctable error is determined as a difference between the modeled wafer topography and a measured wafer topography. A maximum non-correctable error per field is determined for a wafer, and a mean variation in the maximum non-correctable error across each field within each wafer of a lot is determined, both within a layer and across layers. These values are then verified against a set of statistical process control rules to determine if they are within a specification limit of the manufacturing process. | 01-15-2015 |
20150027636 | SCANNER OVERLAY CORRECTION SYSTEM AND METHOD - A method includes performing a semiconductor fabrication process on a plurality of substrates. The plurality of substrates are divided into a first subset and a second subset. A rework process is performed on the second subset of the plurality of substrates but not on the first subset. A respective mean value of at least one exposure parameter for a lithography process is computed for each respective one of the first and second subsets of the plurality of substrates. A scanner overlay correction and a mean correction are applied to expose a second plurality of substrates on which the rework process has been performed. The mean correction is based on the computed mean values. | 01-29-2015 |
20150125970 | SYSTEMS AND METHODS OF AUTOMATICALLY DETECTING FAILURE PATTERNS FOR SEMICONDUCTOR WAFER FABRICATION PROCESSES - A system and method of automatically detecting failure patterns for a semiconductor wafer process is provided. The method includes receiving a test data set collected from testing a plurality of semiconductor wafers, forming a respective wafer map for each of the wafers, determining whether each respective wafer map comprises one or more respective objects, selecting the wafer maps that are determined to comprise one or more respective objects, selecting one or more object indices for selecting a respective object in each respective selected wafer map, determining a plurality of object index values in each respective selected wafer map, selecting an object in each respective selected wafer map, determining a respective feature in each of the respective selected wafer, classifying a respective pattern for each of the respective selected wafer maps and using the respective wafer fingerprints to adjust one or more parameters of the semiconductor fabrication process. | 05-07-2015 |
20150187662 | METHOD AND/OR SYSTEM FOR CHEMICAL MECHANICAL PLANARIZATION (CMP) - One or more methods or systems for performing chemical mechanical planarization (CMP) are provided. The system includes at least one of an emitter, a detector, a spectroscopic signal generator, a comparator, a spectral library, a controller or a CMP device. A spectroscopic signal is generated and is used to determine the thickness of a first material formed on or from a wafer by comparing the spectroscopic signal to a spectral library. Responsive to the thickness not being equal to the desired thickness, the controller instructs the CMP device to perform a rotation to reduce the thickness of the first material. The system and method herein increase the sensitivity of the CMP, such that the thickness of the first material is reduced with greater accuracy and precision, as compared to where the thickness is not measured between consecutive rotations of a wafer. | 07-02-2015 |
20150348797 | Apparatus and Method for Chemical Mechanical Polishing Process Control - An apparatus and method for providing target thickness and surface profile uniformity control of a multi-head chemical mechanical polishing (CMP) process is disclosed. An exemplary method includes providing at least two wafers; determining a surface profile of each of the at least two wafers; determining an operation mode for a chemical mechanical polishing (CMP) process based on the surface profiles of the at least two wafers; determining a CMP polishing recipe for each of the at least two wafers based on the operation mode; and performing the CMP process on the at least two wafers based on the determined CMP polishing recipes. | 12-03-2015 |