Patent application number | Description | Published |
20080299497 | METHOD FOR MANUFACTURING LIQUID DISCHARGE HEAD - A manufacturing method of a liquid discharge head having therein liquid discharge ports and liquid flow passageways communicated with the discharge ports, includes: providing, by depositing, on a substrate, lamination of first and second material layers containing first and second positive type photosensitive resins, respectively, first material layer containing a light absorber absorbing a light in a specific wavelength range to which first positive type photosensitive resin is photosensitive, second positive type photosensitive resin able to be photosensitive to the light in specific wavelength range; exposing second material layer to light in specific wavelength range thereby forming a pattern made of material of second material layer; exposing first material layer to light in specific wavelength range thereby forming a pattern made of first material layer; forming a coating layer covering obtained patterns formed on substrate; forming discharge ports in coating layer; and removing patterns to eventually obtain flow passageways. | 12-04-2008 |
20080309719 | LIQUID DISCHARGE HEAD - A liquid discharge head comprises a discharge port forming member having formed therein a discharge port arranged correspond to an energy generating element which generates energy to eject a liquid and a flow path forming member for forming a flow path to supply ink to the discharge port. At least one of the discharge port forming member and the flow path forming member is made of a cured material of a composition containing an epoxy resin and a phenol resin having a higher oxygen equivalent than that of the epoxy resin. | 12-18-2008 |
20080309733 | LIQUID DISCHARGING HEAD, PRODUCING METHOD THEREOF, STRUCTURE, AND PRODUCING METHOD THEREOF - A producing method of a liquid discharging head includes a discharge port discharging a liquid and a flow path communicating with the discharge port, the method comprising the steps of forming a pattern of a shape of the flow path on a substrate, forming a layer of a negative type photosensitive resin composition including a photo-initiated polymerization initiator on the substrate so as to coat the pattern, at least a region of the layer in a vicinity of the substrate including a sensitizing agent of the photo-initiated polymerization initiator, a density of the sensitizing agent in the layer formed to be higher in the region than in a part where the discharge port is formed, forming the discharge port by exposing the layer to pattern the layer, and removing a pattern to form the flow path. | 12-18-2008 |
20100255422 | MANUFACTURING METHOD OF LIQUID DISCHARGE HEAD - A manufacturing method of a liquid discharge head having a liquid flow path which communicates with a discharge port for discharging liquid, includes: providing a first layer made of a first photosensitive resin on a substrate; forming a mold of the flow path from the first layer by exposing a part of the first layer and developing the first layer; applying a light absorbent to a surface of the mold; providing a second layer made of a second photosensitive resin to coat the mold applied with the light absorbent; forming an opening that is to be the discharge port in the second layer by exposing a part of the second layer with light having a wavelength that can be absorbed by the light absorbent and developing the second layer; and forming the flow path by removing the mold. | 10-07-2010 |
20100255424 | LIQUID DISCHARGE HEAD MANUFACTURING METHOD - Provided is a method for manufacturing a liquid discharge head including a flow path forming member connected to a discharge port on or above a substrate, the method including: providing a layer containing a photosensitive resin on or above the substrate; providing a mask layer that enables reduction of transmission of light with a photosensitive wavelength of the photosensitive resin, at an area on the layer containing the photosensitive resin, the area corresponding to the flow path; performing exposure for the layer containing the photosensitive resin using the mask layer to make the layer containing the photosensitive resin be a pattern having the shape of the flow path; providing a layer that becomes the flow path forming member, so as to cover the pattern; forming the discharge port at a part of the layer that becomes the flow path forming member; and forming the flow path by removing the pattern. | 10-07-2010 |
20120115089 | PROCESS FOR FORMING A HYDROPHILIC COATING AND HYDROPHILIC COATING, AND PROCESS FOR FORMING AN INK JET RECORDING HEAD AND INK JET RECORDING HEAD - A process for forming a hydrophilic coating and a hydrophilic coating, the process including the steps of: (1) forming, on a substrate, a first coating resin layer including a first cationic polymerization resin and a first photoacid generator; (2) laminating, on the first coating resin layer, a second coating resin layer including a second cationic polymerization resin which includes an acid-cleavable linkage in its main chain, and a second photoacid generator which generates methide acid by irradiation with an active energy ray including ultraviolet light; (3) forming a coating by curing the first coating resin layer and the second coating resin layer through exposure of the first coating resin layer and the second coating resin layer to the active energy ray to conduct development; and (4) forming a hydrophilic coating by hydrophilizing a surface of the coating through heat treatment of the coating. | 05-10-2012 |
20120115985 | PROCESS FOR FORMING A HYDROPHILIC COATING AND HYDROPHILIC COATING, AND PROCESS FOR FORMING AN INK JET RECORDING HEAD AND INK JET RECORDING HEAD - A process for forming a hydrophilic coating, including (1) forming, on a substrate, coating resin layer including a cationic polymerization resin having an acid-cleavable linkage in its main chain, and a photoacid generator which generates antimonic acid or an acid having a weaker acid strength than that of antimonic acid by irradiation with active energy ray including ultraviolet light; (2) laminating, on the resin layer, a photoacid generator holding layer including a photoacid generator which generates an acid having a stronger acid strength than that of antimonic acid by irradiation with the energy ray, and a holder which holds the photoacid generator and can be removed in step (3); (3) removing the holding layer and curing the resin layer through exposure of those layers to the energy ray to conduct development; and (4) forming a hydrophilic coating by hydrophilizing a surface of the resin layer through heat treatment thereof. | 05-10-2012 |
20130057618 | METHOD OF MANUFACTURING A LIQUID EJECTION HEAD AND LIQUID EJECTION HEAD - Provided is a method of manufacturing a liquid ejection head, including: forming a covering resin layer including a photocationic polymerization initiator and a cationically polymerizable resin on a substrate having provided thereon an energy generating element for generating energy for ejecting liquid and a solid layer which is formed of a positive resist and serves as a pattern for a liquid flow path which communicates with a liquid ejection orifice for ejecting the liquid; exposing the covering resin layer to development to form the liquid ejection orifice; and removing the solid layer to form the liquid flow path, in which the covering resin layer includes, as a cationic polymerization inhibitor, an amine compound having a perfluoroalkyl group. Also provided is a liquid ejection head obtained by the method. | 03-07-2013 |
20130323650 | METHOD FOR MANUFACTURING LIQUID EJECTION HEAD - There is provided a method for manufacturing a liquid ejection head having a substrate and a channel-forming member having an ejection port from which a liquid is ejected, the method including forming a negative photosensitive resin layer on or above the substrate; forming a lens layer on the negative photosensitive resin layer, the lens layer having a lens; exposing the negative photosensitive resin layer through the lens to form an ejection port in the negative photosensitive resin layer; and removing the lens layer. | 12-05-2013 |
20140329181 | METHOD OF MANUFUCTURING LIQUID EJECTION HEAD - A method of manufacturing a liquid ejection head, and the method includes a process of providing a first photosensitive resin layer containing a photodegradable positive photosensitive resin and serving as a mold material of the channel on a substrate, a process of providing a gas barrier layer having a film density of 1 g/cm | 11-06-2014 |
Patent application number | Description | Published |
20100045739 | RESIN COMPOSITION, RESIN CURED PRODUCT, AND LIQUID DISCHARGE HEAD - An epoxy resin composition, including: an epoxy resin (A) represented by Formula (1); an epoxy resin (B) having an epoxy equivalent of 220 or less and having twice or more epoxy groups in a molecule than epoxy groups of the epoxy resin (A); and a photocationic polymerization initiator (C), in which: the epoxy resins (A) and (B) constitute main components; and a weight of the epoxy resin (A) is 40% or more and a weight of the epoxy resin (B) is 30% or more with respect to a total weight of the epoxy resins (A) and (B): | 02-25-2010 |
20100134555 | RESIN COMPOSITION, RESIN CURED PRODUCT, AND LIQUID DISCHARGE HEAD - An epoxy resin composition, including: an epoxy resin (A) represented by Formula (1); an epoxy resin (B) having an epoxy equivalent of 220 or less and having twice or more epoxy groups in a molecule than epoxy groups of the epoxy resin (A); and a photocationic polymerization initiator (C), in which: the epoxy resins (A) and (B) constitute main components; and a weight of the epoxy resin (A) is 40% or more and a weight of the epoxy resin (B) is 30% or more with respect to a total weight of the epoxy resins (A) and (B): | 06-03-2010 |
20100248156 | RESIN COMPOSITION, RESIN CURED PRODUCT, AND LIQUID DISCHARGE HEAD - An epoxy resin composition, including: an epoxy resin (A) represented by Formula (1); an epoxy resin (B) having an epoxy equivalent of 220 or less and having twice or more epoxy groups in a molecule than epoxy groups of the epoxy resin (A); and a photocationic polymerization initiator (C), in which: the epoxy resins (A) and (B) constitute main components; and a weight of the epoxy resin (A) is 40% or more and a weight of the epoxy resin (B) is 30% or more with respect to a total weight of the epoxy resins (A) and (B): | 09-30-2010 |