Patent application number | Description | Published |
20080309405 | Power Amplifier Pre-Distortion - The present invention is directed to systems and methods for reducing the distortion of power amplifiers. In particular, methods and systems are described that enable a determination of a pre-distortion correction signal to be determined, which when added to the nominal signal, a reduction in the distortion of the power amplifier results. In addition, methods and systems are described that enable calibration of individual power amplifiers to be accomplished for use with the above described approach. More specifically, the methods and systems are described for use in a MIMO application. These approaches may be applied to on-chip power amplifiers, off-chip power amplifiers, or any combination thereof. | 12-18-2008 |
20080310351 | Preamble Formats for MIMO Wireless Communications - A method for generating a preamble of a frame for a multiple input multiple output (MIMO) wireless communication begins by, for each transmit antenna of the MIMO wireless communication, generating a carrier detect field, wherein, from transmit antenna to transmit antenna, the carrier detect field is cyclically shifted. The method continues by, for a first grouping of the transmit antennas of the MIMO wireless communication: generating a first guard interval following the carrier detect field; and generating at least one channel sounding field, wherein, from transmit antenna to transmit antenna in the first grouping, the at least one channel sounding field is cyclically shifted, and wherein the at least one channel sounding field follows the first guard interval. The method continues by, when the MIMO wireless communication includes more than the first grouping of the transmit antennas, for another grouping of the transmit antennas: generating at least one other channel sounding field, wherein, from transmit antenna to transmit antenna in the another grouping, the at least one other channel sounding field is cyclically shifted, and wherein the at least one other channel sounding field follows the at least one channel sounding field; and generating the first guard interval prior to the at least one other channel sounding field. | 12-18-2008 |
20100266064 | MIMO WIRELESS COMMUNICATION GREENFIELD PREAMBLE FORMATS - A method for multiple input multiple output wireless communication begins by determining protocols of wireless communication devices within a proximal region. The method continues by determining whether the protocols of the wireless communication devices within the proximal region are of a like protocol. The method continues by determining the number of transmit antennas. The method continues, when the protocols of the wireless communication devices within the proximal region are of the like protocol, formatting a preamble of a frame of the wireless communication utilizing at least one of cyclic shifting of symbols, cyclic shifting of tones, sparse tone allocation, and sparse symbol allocation based on the number of transmit antennas. | 10-21-2010 |
20110044395 | MIXED MODE PREAMBLE FOR MIMO WIRELESS COMMUNICATIONS - A preamble of a frame for a multiple input multiple output (MIMO) wireless communication for a first transmit antenna of the MIMO communication includes a legacy preamble portion in accordance with a legacy wireless communication protocol. The preamble of the frame for the MIMO wireless communication for the first transmit antenna also includes a current protocol preamble portion in accordance with a protocol of the MIMO wireless communication. The preamble of a frame for at least a second antenna of the MIMO communication includes a cyclically shifted legacy preamble portion for the frame. The preamble of the frame for the MIMO wireless communication for the second transmit antenna also includes a second current protocol preamble portion in accordance with a protocol of the MIMO wireless communication. | 02-24-2011 |
20110280331 | PREAMBLE FORMATS FOR MIMO WIRELESS COMMUNICATIONS - A method for generating a preamble of a frame for a multiple input multiple output (MIMO) wireless communication begins by, for each transmit antenna, generating a carrier detect field. The method continues by, for a first grouping of the transmit antennas, generating a first guard interval following the carrier detect field; and generating at least one channel sounding field. Continuing, the method applies cyclical shift prior to transmission via the first grouping of the transmit antennas. When the MIMO wireless communication includes more than the first grouping of the transmit antennas, for another grouping of the transmit antennas. For the another grouping of the transmit antennas, generating at least one other channel sounding field. The method proceeds by generating the first guard interval prior to the at least one other channel sounding field, and applying another cyclical shift prior to transmission via the another grouping of the transmit antennas. | 11-17-2011 |
20110299611 | METHOD AND SYSTEM FOR MULTI-ANTENNA PREAMBLES FOR WIRELESS NETWORKS PRESERVING BACKWARD COMPATIBILITY - A method for processing a wireless signal includes performing by one or more processors, selecting a plurality of training sequences from a preamble of the wireless signal. Each of the selected plurality of training sequences may include a plurality of energy tones. The selected plurality of training sequences from the preamble may be shifted, in time domain, to generate a plurality of subsequent preambles for transmission. Each of the generated plurality of subsequent preambles may include the plurality of energy tones. The preamble may include a legacy preamble and/or an 802.11(n) preamble. The shifting in the time domain may include circular shifting. The circular shifting may include forward circular shifting and/or backwards circular shifting. | 12-08-2011 |
20120008610 | MIXED MODE PREAMBLE FOR MIMO WIRELESS COMMUNICATIONS - A preamble of a frame for a multiple input multiple output (MIMO) wireless communication for a first transmit antenna of the MIMO communication includes a legacy preamble portion in accordance with a legacy wireless communication protocol. The preamble of the frame for the MIMO wireless communication for the first transmit antenna also includes a current protocol preamble portion in accordance with a protocol of the MIMO wireless communication. The preamble of a frame for at least a second antenna of the MIMO communication includes a cyclically shifted legacy preamble portion for the frame. The preamble of the frame for the MIMO wireless communication for the second transmit antenna also includes a second current protocol preamble portion in accordance with a protocol of the MIMO wireless communication. | 01-12-2012 |
20120320885 | MIXED MODE PREAMBLE FOR MIMO WIRELESS COMMUNICATIONS - A preamble of a frame for a multiple input multiple output (MIMO) wireless communication for a first transmit antenna of the MIMO communication includes a legacy preamble portion in accordance with a legacy wireless communication protocol. The preamble of the frame for the MIMO wireless communication for the first transmit antenna also includes a current protocol preamble portion in accordance with a protocol of the MIMO wireless communication. The preamble of a frame for at least a second antenna of the MIMO communication includes a cyclically shifted legacy preamble portion for the frame. The preamble of the frame for the MIMO wireless communication for the second transmit antenna also includes a second current protocol preamble portion in accordance with a protocol of the MIMO wireless communication. | 12-20-2012 |
20120321015 | PREAMBLE FORMATS FOR MIMO WIRELESS COMMUNICATIONS - A method for generating a preamble of a frame for a multiple input multiple output (MIMO) wireless communication begins by, for each transmit antenna, generating a carrier detect field. The method continues by, for a first grouping of the transmit antennas, generating a first guard interval, and at least one channel sounding field. Continuing, the method applies cyclical shift prior to transmission via the first grouping of the transmit antennas. When the MIMO wireless communication includes more than the first grouping of the transmit antennas, for another grouping of the transmit antennas. For the another grouping of the transmit antennas, generating at least one other channel sounding field. The method proceeds by generating the first guard interval prior to the at least one other channel sounding field, and applying another cyclical shift prior to transmission via the another grouping of the transmit antennas. | 12-20-2012 |
20130009701 | Power Amplifier Pre-Distortion - The present invention is directed to systems and methods for reducing the distortion of power amplifiers. In particular, methods and systems are described that enable a determination of a pre-distortion correction signal to be determined, which when added to the nominal signal, a reduction in the distortion of the power amplifier results. In addition, methods and systems are described that enable calibration of individual power amplifiers to be accomplished for use with the above described approach. More specifically, the methods and systems are described for use in a MIMO application. These approaches may be applied to on-chip power amplifiers, off-chip power amplifiers, or any combination thereof. | 01-10-2013 |
20130089054 | MIMO WIRELESS COMMUNICATION GREENFIELD PREAMBLE FORMATS - A method for multiple input multiple output wireless communication begins by determining protocols of wireless communication devices within a proximal region. The method continues by determining whether the protocols of the wireless communication devices within the proximal region are of a like protocol. The method continues by determining the number of transmit antennas. The method continues, when the protocols of the wireless communication devices within the proximal region are of the like protocol, formatting a preamble of a frame of the wireless communication utilizing at least one of cyclic shifting of symbols, cyclic shifting of tones, sparse tone allocation, and sparse symbol allocation based on the number of transmit antennas. | 04-11-2013 |
Patent application number | Description | Published |
20130153412 | APPARATUS FOR ENABLING CONCENTRICITY OF PLASMA DARK SPACE - In some embodiments, substrate processing apparatus may include a chamber body; a lid disposed atop the chamber body; a target assembly coupled to the lid, the target assembly including a target of material to be deposited on a substrate; an annular dark space shield having an inner wall disposed about an outer edge of the target; a seal ring disposed adjacent to an outer edge of the dark space shield; and a support member coupled to the lid proximate an outer end of the support member and extending radially inward such that the support member supports the seal ring and the annular dark space shield, wherein the support member provides sufficient compression when coupled to the lid such that a seal is formed between the support member and the seal ring and the seal ring and the target assembly. | 06-20-2013 |
20130255576 | PROCESS KIT SHIELD FOR PLASMA ENHANCED PROCESSING CHAMBER - Apparatus for processing substrates is disclosed herein. In some embodiments, an apparatus includes a first shield having a first end, a second end, and one or more first sidewalls disposed between the first and second ends, wherein the first end is configured to interface with a first support member of a process chamber to support the first shield in a position such that the one or more first sidewalls surround a first volume of the process chamber; and a second shield having a first end, a second end, and one or more second sidewalls disposed between the first and second ends of the second shield and about the first shield, wherein the first end of the second shield is configured to interface with a second support member of the process chamber to support the second shield such that the second shield contacts the first shield to form a seal therebetween. | 10-03-2013 |
20130256125 | SUBSTRATE PROCESSING SYSTEM WITH MECHANICALLY FLOATING TARGET ASSEMBLY - Substrate processing systems are provided herein. In some embodiments, a substrate processing system may include a target assembly having a target comprising a source material to be deposited on a substrate; a grounding assembly disposed about the target assembly and having a first surface that is generally parallel to and opposite a backside of the target assembly; a support member coupled to the grounding assembly to support the target assembly within the grounding assembly; one or more insulators disposed between the backside of the target assembly and the first surface of the grounding assembly; and one or more biasing elements disposed between the first surface of the grounding assembly and the backside of the target assembly to bias the target assembly toward the support member. | 10-03-2013 |
20130256126 | SUBSTRATE SUPPORT WITH RADIO FREQUENCY (RF) RETURN PATH - Apparatus for processing substrates are provided herein. In some embodiments, an apparatus for processing a substrate includes a substrate support that may include a dielectric member having a surface to support a substrate thereon; one or more first conductive members disposed below the dielectric member and having a dielectric member facing surface adjacent to the dielectric member; and a second conductive member disposed about and contacting the one or more first conductive members such that RF energy provided to the substrate by an RF source returns to the RF source by traveling radially outward from the substrate support along the dielectric member facing surface of the one or more first conductive members and along a first surface of the second conductive member disposed substantially parallel to a peripheral edge surface of the one or more first conductive members after travelling along the dielectric layer facing surface. | 10-03-2013 |
20130256127 | SUBSTRATE PROCESSING SYSTEM HAVING SYMMETRIC RF DISTRIBUTION AND RETURN PATHS - A processing system may include a target having a central axis normal thereto; a source distribution plate having a target facing side opposing a backside of the target, wherein the source distribution plate includes a plurality of first features such that a first distance of a first radial RF distribution path along a given first diameter is about equal to a second distance of an opposing second radial RF distribution path along the given first diameter; and a ground plate opposing a target opposing side of the source distribution plate and having a plurality of second features disposed about the central axis and corresponding to the plurality of first features, wherein a third distance of a first radial RF return path along a given second diameter is about equal to a fourth distance of an opposing second radial RF return path along the given second diameter. | 10-03-2013 |
20130256128 | PROCESS KIT WITH PLASMA-LIMITING GAP - Apparatus for processing substrates are provided herein. In some embodiments, an apparatus includes a process kit comprising a shield having one or more sidewalls configured to surround a first volume, the first volume disposed within an inner volume of a process chamber; and a first ring moveable between a first position, wherein the first ring rests on the shield, and a second position, wherein a gap is formed between an outer surface of the first ring and an inner surface of the one or more sidewalls, wherein a width of the gap is less than about two plasma sheath widths for a plasma formed at a frequency of about 40 MHz or higher and at a pressure of about 140 mTorr or lower. | 10-03-2013 |
20140158049 | PROCESS KIT SHIELD FOR PLASMA ENHANCED PROCESSING CHAMBER - Apparatus for processing substrates is disclosed herein. In some embodiments, an apparatus includes a first shield having a first end, a second end, and one or more first sidewalls disposed between the first and second ends, wherein the first end is configured to interface with a first support member of a process chamber to support the first shield in a position such that the one or more first sidewalls surround a first volume of the process chamber; and a second shield having a first end, a second end, and one or more second sidewalls disposed between the first and second ends of the second shield and about the first shield, wherein the first end of the second shield is configured to interface with a second support member of the process chamber to support the second shield such that the second shield contacts the first shield to form a seal therebetween. | 06-12-2014 |
Patent application number | Description | Published |
20100156997 | DROP GENERATING APPARATUS - A drop generator having a via structure configured for electrical and fluidic interconnection. The via structure includes an electrically conductive layer and an electrically insulating layer disposed on the electrically conductive layer. | 06-24-2010 |
20100159193 | COMBINED ELECTRICAL AND FLUIDIC INTERCONNECT VIA STRUCTURE - A via structure configured for electrical and fluidic interconnection, and including an electrically conductive layer and an electrically insulating layer disposed on the electrically conductive layer. | 06-24-2010 |
20110141206 | STACKED SLICE PRINTHEAD - A side-firing printhead comprises a stack that includes a plurality of slices, wherein each slice includes a PCB trigger layer and a diaphragm layer, the PCB trigger layer controls the flow of ink from the diaphragm layer, a first side of the diaphragm layer includes at least one cavity that delivers ink via one or more aperture braces. An aperture plate is coupled to one side of the stack to interface to the diaphragm layers contained therein, wherein the aperture plate contains a plurality of apertures that are located at each aperture brace. A first bracket is disposed on the top of the stack and a second bracket is disposed on the bottom of the stack, wherein at least one fastener couples the second bracket to the first bracket such that a predetermined amount of pressure is applied to the stack. | 06-16-2011 |
20150027332 | Method of Making a Molded Textured Imaging Blanket Surface - Forming an imaging blanket for a printing apparatus includes depositing a patternable material over a substrate, etching the patternable material according to a desired exposure pattern, hardening the etched patternable material to thereby form a template surface comprising a desired template pattern of texture features, depositing a layer of curable liquid polymer over and in physical contact with the template surface, curing the liquid polymer to thereby form the imaging blanket, and removing the imaging blanket from the template surface to thereby expose a patterned imaging surface of the imaging blanket. The image blanket may thereby be provided with a desired texture surface, for example comprised of individual molded image blanket features, such as recesses or pillars, of a desired cross-sectional shape. The image blanket is configured for and may be disposed on an image forming member of a variable data lithography system. | 01-29-2015 |
20150027982 | Ultra-Fine Textured Digital Lithographic Imaging Plate and Method of Manufacture - A method of forming an imaging blanket for a printing apparatus comprises preparing a support structure (e.g., mold) for receipt of a polymer blanket compound, introducing the polymer blanket compound in liquid state over the support structure, curing the polymer blanket compound to produce an imaging blanket, releasing the imaging blanket from the support structure, and etching a surface of the imaging blanket to form a texture pattern therein, the surface forming an imaging surface of said imaging blanket. An imaging surface providing desirable dampening fluid retention is provided. Wet etch, dry etch or a combination of both may be used. The polymer may be a silicone compound, may include 3 percent by weight granular material. | 01-29-2015 |
20150029293 | Molded Textured Imaging Blanket Surface - Forming an imaging blanket for a printing apparatus includes depositing a patternable material over a substrate, etching the patternable material according to a desired exposure pattern, hardening the etched patternable material to thereby form a template surface comprising a desired template pattern of texture features, depositing a layer of curable liquid polymer over and in physical contact with the template surface, curing the liquid polymer to thereby form the imaging blanket, and removing the imaging blanket from the template surface to thereby expose a patterned imaging surface of the imaging blanket. The image blanket may thereby be provided with a desired texture surface, for example comprised of individual molded image blanket features, such as recesses or pillars, of a desired cross-sectional shape. The image blanket is configured for and may be disposed on an image forming member of a variable data lithography system. | 01-29-2015 |
Patent application number | Description | Published |
20090262776 | METHOD AND APPARATUS FOR CALIBRATING A THERMISTOR - The presently described embodiments are directed to a calibration method and system for thin film thermistors that are locally heated with integrated thin film heaters. Initially, print head temperature is either measured or referenced. Then, transient thermistor resistances are measured and used to determine the thermistor resistance at a higher temperature. Notably, this calibration method is advantageously implemented as a step of an existing process without having to expose the print heads to operating temperatures. In some implementations of the presently described embodiments, trimming of the thermistors may be required once calibrated. | 10-22-2009 |
20090320992 | METHODS FOR MANUFACTURING STRESSED MATERIAL AND SHAPE MEMORY MATERIAL MEMS DEVICES - Disclosed is a MEMS device which comprises at least one shape memory material such as a shape memory alloy (SMA) layer and at least one stressed material layer. Examples of such MEMS devices include an actuator, a micropump, a microvalve, or a non-destructive fuse-type connection probe. The device exhibits a variety of improved properties, for example, large deformation ability and high energy density. Also provided is a method of easily fabricating the MEMS device in the form of a cantilever-type or diaphragm-type structure. | 12-31-2009 |
20110185322 | METHOD OF IN-PROCESS INTRALAYER YIELD DETECTION, INTERLAYER SHUNT DETECTION AND CORRECTION - A system and method for in-process yield evaluation and correction in an array type of device are provided. The system and method include measuring electrical resistance between individual GATE lines, DATA lines, a DATA bus I/O pad, and a GATE bus I/O pad; and analyzing the measured electrical resistance to identify at least one of the following: GATE line open defects, GATE line bridge defects, DATA line open defects, DATA line bridge defects, and interlayer shunt defects. | 07-28-2011 |