Patent application number | Description | Published |
20080285004 | Monolithic, Non-Contact Six Degree-of-Freedom Stage Apparatus - Methods and apparatus for controlling a stage assembly in up to six degrees of freedom using actuators which each allow for forces to be generated in a horizontal direction and a vertical direction are disclosed. According to one aspect of the present invention, a stage apparatus includes a stage assembly and a first stator arrangement. The stage assembly includes a first magnet arrangement of an actuator assembly, and the first stator arrangement is part of the actuator assembly. The first magnet arrangement cooperates with the first stator arrangement to allow the stage assembly to move relative to a first horizontal axis as well as a vertical axis. | 11-20-2008 |
20080291411 | DEVICES AND METHODS FOR REDUCING RESIDUAL RETICLE CHUCKING FORCES - Devices and methods are disclosed for holding an object, particularly a planar object. An exemplary device has a chuck and pressure-changing device. The chuck has an object-mounting surface and a deformable membrane coupled to the object-mounting surface such that conformational changes in the membrane produce corresponding changes in the object-mounting surface. The chuck has a first cavity separated by the membrane from the chuck cavity. The pressure-changing device is coupled to the first cavity to change pressure in the first cavity, relative to outside it, sufficiently to produce a conformational change of the membrane and a corresponding change in the object-mounting surface sufficient to reduce the force with which the object is being held to the object-mounting surface. The pressure change can be a pressure increase or decrease. The change in the object-mounting surface can be, for example, a reduction in area of contact of the object-mounting surface with the object, thereby reducing the holding force. | 11-27-2008 |
20090027639 | EUV Reticle Handling System and Method - An enclosure for protecting at least a pattern side and an opposing side of a reticle is disclosed. The enclosure includes a first and second part that form an enclosure around a reticle to be protected during handling, inspection, storage, and transport. The enclosure in conjunction with a heater and heat sink provides thermophoretic protection of an enclosed reticle. | 01-29-2009 |
20090033895 | Lithography apparatus with flexibly supported optical system - A lithography apparatus includes a projection optical system that projects an image of a pattern, a first support member, a second support member that is flexibly coupled to the first support member by a first flexible coupling device such that the second support member is suspended from the first support member, and a second flexible coupling device that flexibly couples the projection optical system to the second support structure. This arrangement is capable of improving the vibration characteristics of the projection optical system. | 02-05-2009 |
20090033907 | DEVICES AND METHODS FOR DECREASING RESIDUAL CHUCKING FORCES - Devices and methods are disclosed for holding a reticle or analogous object, particularly a planar object. An exemplary reticle-holding device includes a reticle chuck having a reticle-holding surface on which a reticle is placed to hold the reticle. The device includes at least one ultrasonic transducer (as an exemplary vibration-inducing device) sonically coupled to the reticle to excite, whenever the ultrasonic transducer is being energized, a vibrational mode in the reticle or reticle chuck, or both. The vibration mode is sufficient to reduce an adhesion force holding the reticle to the reticle-holding surface. Sonic coupling can be by direct contact with the transducer or across a gap. | 02-05-2009 |
20090122428 | Reflective optical elements exhibiting multimetallic-like self-correction of distortions caused by heating - Optical elements are disclosed that exhibit “multimetallic”-like self corrections of thermally induced distortions. An exemplary optical element includes first and second portions. The first portion has a first coefficient of thermal expansion (CTE), an obverse surface, and a reverse surface. A second portion is bonded to the reverse surface. The second portion has a second CTE different from the first CTE to form an optical element exhibiting a thermally multimetallic-like change in curvature of the obverse surface accompanying a temperature change of the optical element. The second portion has a thermal-response property in a first direction that is different from a thermal-response property in a second direction. Thus, aberrations such as astigma-type aberrations can be readily self-corrected. | 05-14-2009 |
20090122429 | Self-correcting optical elements for high-thermal-load optical systems - Mirrors and other optical elements are disclosed that include a body defining an optical surface (typically a reflective surface) and an opposing second surface. The body has a coefficient of thermal expansion (CTE). The optical element includes a correcting portion (e.g., a layer) attached to the second surface and having a CTE that, during heating of the optical element, imparts a bending moment to the body that at least partially offsets a change in curvature of the optical surface caused by heating. The body can be internally cooled. The body and correcting portion desirably are made of respective thermally conductive materials that can vary only slightly in CTE. The body desirably has a lower CTE than the correcting portion, and the correcting portion can be tuned according a variable property of the body and/or reflective surface. The body and correcting portion desirably function cooperatively in a thermally bimetallic-like manner. | 05-14-2009 |
20100020423 | HYDROSTATIC LIQUID-METAL DEFORMABLE OPTICAL ELEMENTS - Optical components and systems are disclosed that include an optical element and a base member. Multiple wells correspond to respective locations on a surface of the optical element. Liquid metal in the wells is coupled to the respective locations to apply respective hydrostatic pressures to the locations. At least one displacement device is coupled to at least one well to selectively change the respective hydrostatic pressure applied, relative to the base member, by the liquid metal in the well to the respective location. The “liquid metal” is any of several formulations of metal that are liquid under actual-use conditions (e.g., a liquid alloy of gallium). The liquid metal can be displaced through conduits to change the hydrostatic pressure being applied to the respective locations. The displacement, and hence the hydrostatic pressure, can be feedback controlled. | 01-28-2010 |
20100097588 | EXPOSURE METHOD, DEVICE MANUFACTURING METHOD, AND MASK - An exposure method that uses a substrate (M) held by a holding member ( | 04-22-2010 |
20100110397 | High Heat Load Optics with a Liquid Metal Interface for Use in an Extreme Ultraviolet Lithography System - Methods and apparatus for cooling mirrors in an extreme ultraviolet (EUV) lithography system using a liquid metal interface are described. According to one aspect of the present invention, an apparatus which may be used in an EUV lithography system includes a heat exchanger, a mirror assembly, and a first liquid metal interface. The heat exchanger including at least a first surface. The mirror assembly includes a first mirror block having a first mirrored surface, as well as at least a first well. Finally, the first liquid metal interface includes liquid metal which is contained in the first well. The first surface is in contact with the liquid metal such that heat may be transferred form the first mirror block to the heat exchanger. | 05-06-2010 |
20100156198 | SHIELD LAYER PLUS REFRIGERATED BACKSIDE COOLING FOR PLANAR MOTORS - According to one aspect of the present invention, a motor arrangement includes at least one coil, a cover plate, and a shield layer. The at least one coil has a first side and a second side. The cover plate is positioned substantially over the first side of the at least one coil at a distance from the at least one coil. The shield layer is positioned between the first side of the at least one coil and the cover plate, and has a top surface. The top surface contacts the cover plate, and includes a liquid and a gas that form a mixture and cause the top surface to have a substantially constant temperature. | 06-24-2010 |
20100186942 | RETICLE ERROR REDUCTION BY COOLING - Methods and apparatus for cooling a reticle are disclosed. According to one aspect of the present invention, an apparatus for providing top side cooling to a reticle includes a heat exchanger arrangement and an actuator. The heat exchanger arrangement includes a first surface arranged to facilitate heat transfer between the reticle and the heat exchanger arrangement. The heat transfer provides cooling to at least some portions of the reticle. The actuator positions the first surface of the heat exchanger arrangement at a distance over the reticle. | 07-29-2010 |
20100263192 | Multi-Element Mirror Assembly and Alignment - Methods and apparatus for aligning a mirror block with a base plate to form a mirror assembly are disclosed. According to one aspect of the present invention, a method for forming a mirror assembly includes positioning a mirror block in contact with a base plate that has at least one alignment feature, and indexing a portion of an alignment tool with respect to the base plate. The method also includes applying at least a first force by moving the mirror block with respect to alignment feature. A determination is made as to when a first surface of the mirror block is substantially coplanar with a first surface of the alignment feature. The mirror block is coupled to the base plate when the first surface of the mirror block is substantially coplanar with the first surface of the alignment feature. | 10-21-2010 |
20110109419 | Thermally Conductive Coil and Methods and Systems - Embodiments of the invention provide improved thermal conductivity within, among other things, electromagnetic coils, coil assemblies, electric motors, and lithography devices. In one embodiment, a thermally conductive coil includes at least two adjacent coil layers. The coil layers include windings of wires formed from a conductor and an insulator that electrically insulates the windings within each coil layer. In some cases the insulator of the wires is at least partially absent along an outer surface of one or both coil layers to increase the thermal conductivity between the coil layers. In some embodiments, an insulation layer is provided between the coil layers to electrically insulate the coil layers. In some cases the insulation layer has a thermal conductivity greater than the thermal conductivity of the wire insulator. | 05-12-2011 |
20110211178 | TEMPERATURE-CONTROLLED HOLDING DEVICES FOR PLANAR ARTICLES - An exemplary apparatus includes a controllably movable body, a holding device, and a coolant circulation device. The body comprises a wall including a planar contact surface that receives the reverse surface of the article. The wall co-extends with at least a heat-receiving area of the utility surface whenever the article is being held by the body. The wall also includes a second surface separated from but proximal to the contact surface, and is thermally conductive from the contact surface to the second surface. The holding device holds the article to the contact surface with the reverse surface contacting the contact surface. The coolant circulation device delivers flow of a coolant fluid to the second surface to urge conduction of heat from the contact surface to the second surface. The holding device and coolant-circulation device operate in concert to actively control shape of the article being held by the apparatus. | 09-01-2011 |
20120099088 | HIGH HEAT LOAD OPTICS WITH A LIQUID METAL INTERFACE FOR USE IN AN EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEM - Methods and apparatus for cooling mirrors in an extreme ultraviolet (EUV) lithography system using a liquid metal interface are described. According to one aspect of the present invention, an apparatus which may be used in an EUV lithography system includes a heat exchanger, a mirror assembly, and a first liquid metal interface. The heat exchanger including at least a first surface. The minor assembly includes a first mirror block having a first mirrored surface, as well as at least a first well. Finally, the first liquid metal interface includes liquid metal which is contained in the first well. The first surface is in contact with the liquid metal such that heat may be transferred form the first minor block to the heat exchanger. | 04-26-2012 |
20120120379 | SYSTEM AND METHOD FOR CONTROLLING THE DISTORTION OF A RETICLE - An apparatus for controlling the distortion of a reticle ( | 05-17-2012 |
20130250271 | STAGE ASSEMBLY WITH SECURE DEVICE HOLDER - A stage assembly ( | 09-26-2013 |
20140071419 | FLY'S EYE OPTICAL MIRROR WITH A PLURALITY OF OPTICAL ELEMENTS ROTATIONALLY ALIGNED ALONG TWO AXES - A fly's eye mirror including first and second complementary M×N arrays, each including a plurality of faceted reflective surfaces arranged along both the first and the second axes. When assembled, the two complementary arrays are integrated together and mounted onto a common base plate. With the increased lineal length of each array along both axes, the faceted reflective surfaces of each array are in rotational or tilt alignment with a base plate along both axes. | 03-13-2014 |
20140078485 | MIRROR ASSEMBLY FOR AN EXPOSURE APPARATUS - A mirror assembly ( | 03-20-2014 |
20140176931 | INTERMITTENT TEMPERATURE CONTROL OF MOVABLE OPTICAL ELEMENTS - An optical system including an optical element, a positioning mechanism configured to position the optical element into an operational position, and a temperature control mechanism configured to intermittently control the temperature of the optical element between operations. By alternatively positioning the optical element between an operational position and a position in thermal contact with the temperature control mechanism, the two mechanisms for positioning and controlling the temperature of the optical element are de-coupled from one another. As a result, the mechanism for each may be optimized In non-exclusive embodiments, the temperature control mechanism may be used to control the temperature of an individual optical element or a plurality of optical elements, such as for example, a fly's eye mirror used in an illumination unit of an EUV lithography tool. | 06-26-2014 |