Patent application number | Description | Published |
20080203828 | Displacement Device - Especially for use in the semiconductor industry, a displacement device ( | 08-28-2008 |
20090001260 | System for Detecting Motion of a Body - The invention relates to a system ( | 01-01-2009 |
20090002676 | Lithographic apparatus - A lithographic apparatus including means for selectively transmitting a projection beam before imaging the patterned projection beam onto a substrate. The means may include any of the following: a selectively transmitting device disposed downstream of a patterning device in the direction of the projection beam, a fixed and a moving set of masking blades in a scanning system or an array of switchable elements. The means may be provided to a mask table/holder or to a frame or structure of the lithographic projection apparatus. | 01-01-2009 |
20100157263 | LITHOGRAPHIC APPARATUS, AND PATTERNING DEVICE FOR USE IN A LITHOGRAPHIC PROCESS - The invention relates to a lithographic apparatus including an illumination system configured to condition a radiation beam, a patterning device support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate support constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate, and an encoder-type measurement system configured to at least during projection of the patterned radiation beam onto a target portion of the substrate continuously determine a position quantity of a patterning device supported on the patterning device support using a grid or grating provided on the patterning device. | 06-24-2010 |
20100159399 | LITHOGRAPHIC APPARATUS WITH GAS PRESSURE MEANS FOR CONTROLLING A PLANAR POSITION OF A PATTERNING DEVICE CONTACTLESS - A lithographic apparatus includes a position controller configured to control a position of a patterning device in its planar direction by selectively pressing at least one of the side faces of the patterning device. The position controller includes a gas pressure supply and one or more outflow openings directed towards at least one side face of the patterning device so as to exert pressurized gas on this side face in order to control the position of the patterning device in its planar direction in a contactless manner. | 06-24-2010 |
20100302518 | LITHOGRAPHIC APPARATUS - The invention relates to a lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate, including a cooling system to cool a part of the lithographic apparatus, the cooling system including a droplet ejector to form droplets and fire the droplets towards a cooling surface of the part of the lithographic apparatus to cool the part by evaporation of the droplets. | 12-02-2010 |
20110007294 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate. The substrate table and/or the support may be provided with an accelerometer to measure an acceleration of the substrate table and/or the support and the apparatus is provided with a calculator in communication with the accelerometer to calculate an acceleration based position signal from the acceleration measured by the accelerometer. | 01-13-2011 |
20110026004 | POSITIONING SYSTEM, LITHOGRAPHIC APPARATUS AND METHOD - A positioning system to position a movable object having a body, the positioning system includes an object position measurement system, an object actuator, and an object controller, wherein the positioning system further includes a stiffener to increase the stiffness and/or to damp relative movements within the body of the object, the stiffener including; one or more sensors, wherein each sensor is arranged to determine a measurement signal representative of an internal strain or relative displacement in the body, one or more actuators, wherein each actuator is arranged to exert an actuation force on a part of the body, and at least one controller, configured to provide on the basis of the measurement signal of at least one of the sensors, an actuation signal to at least one of the actuators to increase the stiffness and/or to damp movements within the body. | 02-03-2011 |
20110075122 | POSITIONING SYSTEM AND A METHOD FOR POSITIONING A SUBSTAGE WITH RESPECT TO A FRAME - A method for positioning a substage, supported by a main stage, relative to a reference object, the substage moveable in a direction between a first and second position relative to the main stage. The method includes positioning the first stage using a passive force system that is activated by positioning the main stage. The passive force system includes two magnet systems, each magnet system being configured to apply a force in the direction to the first stage with respect to the second stage in a non-contact manner, the forces resulting in a resultant force applied to the first stage in the direction by the passive force system. A magnitude and/or a direction of the resultant force depends on the position of the first stage relative to the second stage, and the first stage has a zero-force position between the first and second position in which the resultant force is zero. | 03-31-2011 |
20110239397 | SUCTION UNIT AND AUTONOMOUS VACUUM CLEANER - The invention relates to a suction unit and a vacuum cleaner. The suction unit comprises a drive system for driving the suction unit on a surface to be treated; a chassis supporting the drive system; a nozzle for removing particles from a surface to be treated, which nozzle is configured to move with relation to the chassis in a direction away from the surface to be treated, the nozzle having an interior space defining an opening that faces the surface to be treated; and an outlet communicating with the interior space, the outlet being arranged for communication with a fan unit during operating conditions. The suction unit further comprises coupling means for coupling the nozzle to the chassis, wherein the coupling means is arranged to exert a force that is directed away from the surface to be treated when the underpressure in the interior space increases. In this manner the problem of the suction unit getting stuck on the floor can be overcome or at least reduced. Furthermore, the traction of the drive system can be improved. An autonomous vacuum cleaner according to the invention comprises such a suction unit and further comprises a dust chamber, and a fan unit that communicates with the dust chamber. The fan unit communicates with the outlet for creating an underpressure in the interior space of the nozzle during operating conditions. | 10-06-2011 |
20120212723 | ELECTROMAGNETIC ACTUATOR, STAGE APPARATUS AND LITHOGRAPHIC APPARATUS - An electromagnetic actuator includes a first and second magnetic members that are displaceable relative to each other and are arranged to provide a magnetic circuit; and a coil configured to, in use, receive a current to generate a magnetic flux through the magnetic circuit, thereby generating a force between the first and second magnetic members in a first direction, the magnetic flux, in use, being transferred between the first and second magnetic members through a first surface of the first magnetic member and a second surface of the second magnetic member, the first and second surface being separated by an airgap, wherein the first surface and the second surface are arranged relative to each other such that an outer dimension of the first surface extends beyond an outer dimension of the second surface in a second direction substantially perpendicular to the first direction. | 08-23-2012 |
20120241268 | ARRANGEMENT FOR THE VIBRATION ISOLATION OF A PAY LOAD - The disclosure relates to arrangements and methods for vibration isolation of a payload from a body. An arrangement for vibration isolation of a payload from a body having vibrations includes a sensor for measuring vibrations, and an actuator for generating a compensation force on the payload, at least on the basis of the measurement of the sensor. At least one balancing mass is arranged in the reaction path of a reaction force associated with the compensation force, and the sensor is mounted on the body. | 09-27-2012 |
20120300188 | LITHOGRAPHIC APPARATUS COMPRISING A SUBSTRATE TABLE - A lithographic apparatus includes an illumination system configured to condition a radiation beam and a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The lithographic apparatus further includes a substrate table constructed to hold a substrate; a positioner constructed to position the substrate table; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; a substrate surface actuator arranged to engage a part of a surface of the substrate facing the projection system, and a position controller configured to control a position of the substrate table, the position controller being arranged to drive the positioner and the substrate surface actuator. | 11-29-2012 |
20120327386 | LITHOGRAPHIC APPARATUS, METHOD OF DEFORMING A SUBSTRATE TABLE AND DEVICE MANUFACTURING METHOD - A lithographic apparatus includes a projection system, a substrate table, a plurality of sensors, an actuator and a controller. The projection system is configured to project a patterned beam of radiation onto a substrate. The substrate table is configured to support the substrate and to move relative to the projection system. The plurality of sensors is configured to measure a deformation of the substrate table. The actuator is configured to deform the substrate table. The controller is configured to control the actuator to deform the substrate table based on measurements made by the sensors. The plurality of sensors is located on a first side of the substrate table opposite to a second side of the substrate table facing the projection system. The plurality of sensors is substantially stationary relative to the projection system. | 12-27-2012 |
20130194586 | System for Detecting Motion, Lithographic Apparatus and Device Manufacturing Method - A system for detecting motion of a body, the system comprising: a body; a first grating mounted substantially stationary relative to a frame of reference; a second grating mounted on the body; a detector arranged to receive one or more radiation beams diffracted at the first and second gratings thereby to detect motion of the body relative to the frame of reference; wherein the detector is coupled to the body and moveable relative to the body. | 08-01-2013 |
20140022526 | LITHOGRAPHIC APPARATUS, AND PATTERNING DEVICE FOR USE IN A LITHOGRAPHIC PROCESS - The invention relates to a lithographic apparatus including an illumination system configured to condition a radiation beam, a patterning device support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate support constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate, and an encoder-type measurement system configured to at least during projection of the patterned radiation beam onto a target portion of the substrate continuously determine a position quantity of a patterning device supported on the patterning device support using a grid or grating provided on the patterning device. | 01-23-2014 |