Patent application number | Description | Published |
20100108012 | MOVEABLE VALVE SEALING BODY EXPOSED TO HOT GASES - A moveable valve sealing body, especially a valve sealing body of a gas exchange valve of an internal combustion engine, exposed to hot gases and comprising a sealing area that can be applied to a valve seat ring, enabling good heat dissipation outside an oil-lubricated guiding means connected to the sealing body. For this purpose, such a sealing body is characterised in that at least one surface region of the sealing body, which region being exposed to the hot gases, up to maximally directly on the sealing region of this sealing body, is composed respectively of at least one first and one second material ( | 05-06-2010 |
20140173895 | METHOD FOR THERMALLY JOINING NON-ROUND FUNCTIONAL COMPONENTS TO A SHAFT - A method may include thermally joining at least one of a non-round functional component to a shaft and a cam to a camshaft, elastically compressing the functional component during introduction of a round through-opening, and creating a through-opening which is not round when the functional component is unstressed and at least minimizes an asymmetrical deformation of the shaft after the thermal joining of the functional component to the shaft. | 06-26-2014 |
20140196552 | DEVICE FOR POSITIONING MULTIPLE FUNCTION ELEMENTS - A device for positioning multiple function elements having a recess for receiving a shaft in a predetermined angle position may include multiple mountings for receiving the function elements. The mountings may be equipped with a moulding establishing the predetermined angle position of the respective function element corresponding to the angle position on the shaft. The mountings may be positioned such that the recesses of the function elements lie on a common straight line. The mountings may be arranged vertically on top of one another so that the common straight line runs in vertical direction. A vertically moveable guide carriage for the shaft may be provided for joining the shaft with the function elements in vertical direction. | 07-17-2014 |
20140251255 | PISTON - A piston for an internal combustion engine may include a surface in a region on a crankshaft side. The piston may include a thermally conductive coating disposed on the surface via thermal spraying. | 09-11-2014 |
Patent application number | Description | Published |
20100151087 | Composition - The invention relates to acidified cocoa nibs, wherein the nibs comprise at least 20 mg/g of polyphenols, preferably more than 30 mg/g of polyphenols, most preferably from 40 to 60 mg/g of polyphenols, cocoa refiner or expeller flakes, liquor, cakes, and cocoa powder obtainable from the nibs and a process for producing cocoa-derived material, comprising the steps of: (i) treating cocoa nibs obtained from beans or seeds which have a higher polyphenol content than fermented cocoa beans with an acid; and (ii) optionally drying the nibs. | 06-17-2010 |
20130251858 | COMPOSITION - The invention relates to acidified cocoa nibs, wherein the nibs comprise at least 20 mg/g of polyphenols, preferably more than 30 mg/g of polyphenols, most preferably from 40 to 60 mg/g of polyphenols, cocoa refiner or expeller flakes, liquor, cakes, and cocoa powder obtainable from the nibs and a process for producing cocoa-derived material, comprising the steps of: (i) treating cocoa nibs obtained from beans or seeds which have a higher polyphenol content than fermented cocoa beans with an acid; and (ii) optionally drying the nibs. | 09-26-2013 |
Patent application number | Description | Published |
20080278702 | Lithographic apparatus and sensor calibration method - A method for calibrating an auxiliary sensor system is provided. The auxiliary sensor system measures a position of a grating relative to a reference, the grating forming part of an encoder measurement system. The encoder measurement system is adapted to measure a position of a substrate table of a lithographic apparatus and further comprises a sensor mounted to the substrate table. The method comprises exciting the grating to make a movement in at least one measurement direction of the auxiliary sensor system, obtaining an auxiliary sensor system output signal from the sensor system during the movement, and adjusting a parameter of the auxiliary sensor system based on the output signal obtained during the movement to thereby calibrate the auxiliary sensor system. | 11-13-2008 |
20080291413 | Lithographic apparatus having encoder type position sensor system - A lithographic apparatus is disclosed that includes an encoder type sensor system configured to measure a position of a substrate table of the lithographic apparatus relative to a reference structure. The encoder type sensor system includes an encoder sensor head and an encoder sensor target and the lithographic apparatus comprises a recess to accommodate the encoder sensor target. | 11-27-2008 |
20100297561 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus is provided with an optical encoder measurement system having an irradiation system to direct an irradiation beam to a first scale. The system has optics to direct a primary diffracted beam diffracted from the first scale upon irradiation by the irradiation beam to a second scale and a detector to detect a secondary diffracted beam after interference and a second diffraction of the primary diffracted irradiation beam on the second scale to measure the position of the first scale with respect to the second scale. | 11-25-2010 |
20110085180 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A position measurement system configured to measure a position quantity of a movable object in a measurement direction, the system including a radiation source, a beam splitter to split the radiation beam in a measurement beam and a reference beam, a first reflective surface mounted on the movable object to receive the measurement beam, a second reflective surface mounted on a reference object to receive the reference beam, and a detector arranged to receive a first and second reflected beam reflected by the first and second reflective surface, respectively, and configured to provide a signal representative of the position quantity of the movable object based on the first and the second beam, wherein the radiation source and detector are mounted on an object that is different from the movable object and the reference object. | 04-14-2011 |
20110205517 | OPTICAL ELEMENT MOUNT FOR LITHOGRAPHIC APPARATUS - A mount configured to mount an optical element in a module for a lithographic apparatus. The mount includes a plurality of resilient members constructed and arranged to circumferentially support the optical element. Each resilient member includes a plurality of resilient subsections that are configured to engage the optical element around a perimeter thereof Each resilient subsection is configured to flex independent of another resilient subsection. | 08-25-2011 |
20110304839 | POSITION SENSOR AND LITHOGRAPHIC APPARATUS - A position sensor is configured to measure a position data of a target. The position sensor includes a radiation source configured to irradiate a radiation beam, a first grating configured to diffract the radiation beam in a first diffraction direction into at least a first order diffraction beam, and a second grating, arranged in an optical path of the first order diffraction beam, the second grating being configured to diffract the first order diffraction beam diffracted at the first grating in a second diffraction direction substantially perpendicular to the first diffraction direction. The second grating is connected to the target. A first detector is configured to detect at least a part of the beam diffracted by the first grating, and at least one second detector is configured to detect at least part of the beam diffracted by the first grating and the second grating. | 12-15-2011 |
20120075613 | Lithographic Apparatus Having an Encoder Type Position Sensor System - A lithographic apparatus is disclosed that includes an encoder type sensor system configured to measure a position of a substrate table of the lithographic apparatus relative to a reference structure. The encoder type sensor system includes an encoder sensor head and an encoder sensor target and the lithographic apparatus comprises a recess to accommodate the encoder sensor target. | 03-29-2012 |
20120162621 | LITHOGRAPHIC APPARATUS AND REMOVABLE MEMBER - A lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate, the lithographic apparatus having a first object and a planar member mounted on the first object to improve thermal transfer to/from a second object. | 06-28-2012 |
20120212715 | LITHOGRAPHIC APPARATUS AND LITHOGRAPHIC PROJECTION METHOD - A lithographic apparatus, includes an illumination system configured to condition a radiation beam, a first support constructed to support a first patterning device and a second support to support a second patterning device, the first and second patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto a target portion of the substrate. The first support and second support are movable in a scanning direction and in a second direction substantially perpendicular to the scanning direction. By movement of the first support and second support in the second direction the first support and second support can selectively be aligned with the projection system. | 08-23-2012 |
20120224161 | Lithographic Apparatus and Method - A lithographic apparatus comprising an illumination system for providing a beam of radiation, a support structure for supporting a patterning device, the patterning device serving to impart the radiation beam with a pattern in its cross-section, a substrate table for holding a substrate, and a projection system for projecting the patterned radiation beam onto a target portion of the substrate, wherein the projection system includes a moveable lens connected to an actuator which is configured to move the moveable lens during projection of the patterned radiation beam onto the target portion of the substrate. | 09-06-2012 |
20120249987 | LITHOGRAPHIC APPARATUS AND METHOD - A lithographic apparatus includes: an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate, and a deformation sensor to determine deformations of an object of the lithographic apparatus, wherein the deformation sensor includes at least one optical fiber arranged on or in the object, the optical fiber including one or more Bragg gratings, and an interrogation system to interrogate the one or more Bragg gratings. | 10-04-2012 |
20130077072 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus includes a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate, and a measurement system with a measurement radiation system to provide a measurement beam of radiation, at least two reflectors to reflect a portion of the measurement beam between the reflectors; and a detector to detect a wavelength of at least a portion of the measurement beam transmitted through one of the reflectors. | 03-28-2013 |
20130162966 | Lithographic Apparatus and Method - A displacement measurement system comprising at least one retro reflector and a diffraction grating. Said displacement measurement system is constructed and arranged to measure a displacement by providing a first beam of radiation to the measurement system, wherein the diffraction grating is arranged to diffract the first beam of radiation a first time to form diffracted beams. The at least one retro reflector is arranged to subsequently redirect the diffracted beams to diffract a second time on the diffraction grating. The at least one retro reflector is arranged to redirect the diffraction beams to diffract at least a third time on the diffraction grating before the diffracted beams are being recombined to form a second beam. And the displacement system is provided with a sensor configured to receive the second beam and determine the displacement from an intensity of the second beam. | 06-27-2013 |
20130335722 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus includes a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; a sensor array positioned and arranged to detect an acoustic wave from a movable part of the lithographic apparatus, a controller, the controller having a controller input connected to the sensor array so as to receive a sensor array output signal, and a controller output connected to at least one actuator arranged to act on the movable part, the controller being arranged to: calculate a movement of the movable part from the sensor array output signal, and drive via the controller output the at least one actuator in response to the calculated movement. | 12-19-2013 |
20140192337 | LITHOGRAPHIC APPARATUS, METHOD OF SETTING UP A LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus having a programmable patterning device and a projection system. The programmable patterning device is configured to provide a plurality of radiation beams. The projection system has a lens group array configured to project the plurality of radiation beams onto a substrate. The projection system further includes a focus adjuster in an optical path corresponding to a lens group of the lens group array. The focus adjuster has an optical element having substantially zero optical power. | 07-10-2014 |
20140340666 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - An exposure apparatus including a projection system configured to project a plurality of radiation beams onto a target; a movable frame that is at least rotatable around an axis; and an actuator system configured to displace the movable frame to an axis away from an axis corresponding to the geometric center of the movable frame and to cause the frame to rotate around an axis through the center of mass of the frame. | 11-20-2014 |