Patent application number | Description | Published |
20080203393 | THIN FILM TRANSISTOR ARRAY PANEL AND FABRICATION - The present invention provides a manufacturing method of a thin film transistor array panel, which includes forming a gate line on a substrate; forming a gate insulating layer, a semiconductor layer, and an ohmic contact on the gate line; forming a first conducting film including Mo, a second conducting film including Al, and a third conducting film including Mo on the ohmic contact; forming a first photoresist pattern on the third conducting film; etching the first, second, and third conducting films, the ohmic contact, and the semiconductor layer using the first photoresist pattern as a mask; removing the first photoresist pattern by a predetermined thickness to form a second photoresist pattern; etching the first, second, and third conducting films using the second photoresist pattern as a mask to expose a portion of the ohmic contact; and etching the exposed ohmic contact using a Cl-containing gas and a F-containing gas. | 08-28-2008 |
20080204615 | LIQUID CRYSTAL DISPLAY AND METHOD THEREOF - A liquid crystal display (“LCD”) includes a gate line, a data line intersecting the gate line, a pixel including first and second sub-pixels connected to the gate line and the data line, and a coupling capacitor coupled between the first and the second sub-pixels. The first sub-pixel includes a first liquid crystal (“LC”) capacitor and a first thin film transistor (“TFT”). The second sub-pixel includes a second LC capacitor and a second TFT. The first and second TFTs respectively include a gate electrode, a source electrode, and a drain electrode. The gate electrodes of the first and second TFTs are connected to the gate line, the source electrodes of the first and second TFTs are connected to the data line, and the coupling capacitor includes the sub-pixel electrode of the second sub-pixel and the drain electrode of the second TFT as two terminals. | 08-28-2008 |
20090239733 | Methods of heat-treating soda-lime glass substrates and heat-treated soda-lime glass substrates formed using the same - A soda-lime glass substrate formed through a heat-treatment method has an absorption coefficient ranging from about 0.15 λ,W/m·K to about 0.54 λ,W/m·K, and a free path length ranging from about 0.12 cm to about 0.24 cm. The heat-treated soda-lime glass substrate is formed by heating for a selected time at a pre-specified maximum temperature of about 270° C. to about 330° C. so as to remove thermally induced residual deformations from the substrate and then the substrate is slowly cooled so as to substantially avoid reintroducing thermally induced residual deformations into the cooling substrate. Thus, the soda-lime glass substrate is transformed to one at or close to its contraction saturation point. This allows the heat-treated soda-lime glass substrate to serve in a practical way as a substrate of a flat display panel. | 09-24-2009 |
20090278132 | ARRAY SUBSTRATE OF LIQUID CRYSTAL DISPLAY DEVICE HAVING THIN FILM TRANSISTOR ON COLOR FILTER AND METHOD OF FABRICATING THE SAME - An array substrate of a liquid crystal display device having a color filter on a gate metal layer, and a data metal layer formed on the color filter. First a gate insulating layer is formed on the gate metal layer to protect and a second gate insulating layer is formed on the color filter layer. Gate lines and gate electrodes are formed in direct contact with the substrate, and color filters are formed on the gate electrodes. To protect gate lines in the patterning process of color filters, a first gate insulating layer is formed on the gate lines and electrodes. Therefore, a high aperture ratio may be enhanced, and the manufacturing yield may be increased. | 11-12-2009 |
20090280587 | METHOD OF TREATING SODA-LIME GLASS SUBSTRATE AND METHOD OF MANUFACTURING A DISPLAY SUBSTRATE USING THE SAME - A method of treating a soda-lime glass (SLG) substrate includes cleaning the SLG substrate using an alkali cleaning solution and cleaning the cleaned SLG substrate using a plasma process. The SLG substrate is cleaned using the alkali cleaning solution to remove particles adhered to the SLG substrate. Thus, defects due to the adhering particles may be reduced. | 11-12-2009 |
20100136775 | METHOD OF MANUFACTURING THIN-FILM TRANSISTOR SUBSTRATE - Provided is a method for manufacturing a thin-film transistor substrate, in which the etching characteristics of an insulating film and a passivation layer are enhanced. The insulating film and the passivation layer are deposited by low temperature chemical vapor deposition. The method includes disposing a gate wiring on an insulating substrate; disposing a gate insulating film on the gate wiring; disposing a data wiring on the gate insulating film; disposing a passivation layer on the data wiring; and forming a contact hole by etching at least one of the gate insulating film and the passivation layer, wherein at least one of the gate insulating film and the passivation layer is disposed at a temperature of about 280° C. or below, and the forming of the contact hole is performed at a pressure of about 60 mT or below. | 06-03-2010 |
20100203715 | THIN FILM TRANSISTOR ARRAY PANEL AND FABRICATION - The present invention provides a manufacturing method of a thin film transistor array panel, which includes forming a gate line on a substrate; forming a gate insulating layer, a semiconductor layer, and an ohmic contact on the gate line; forming a first conducting film including Mo, a second conducting film including Al, and a third conducting film including Mo on the ohmic contact; forming a first photoresist pattern on the third conducting film; etching the first, second, and third conducting films, the ohmic contact, and the semiconductor layer using the first photoresist pattern as a mask; removing the first photoresist pattern by a predetermined thickness to form a second photoresist pattern; etching the first, second, and third conducting films using the second photoresist pattern as a mask to expose a portion of the ohmic contact; and etching the exposed ohmic contact using a Cl-containing gas and a F-containing gas. | 08-12-2010 |
20110051059 | ORGANIC LAYER COMPOSITION AND LIQUID CRYSTAL DISPLAY USING THE SAME - An organic layer composition and a liquid crystal display including the same are provided. An organic layer composition according to an exemplary embodiment includes a binder formed by copolymerizing compounds included in a first group and a second group, wherein the first group includes an acryl-based compound and the second group includes a compound without a —COO— group. | 03-03-2011 |
20110177639 | METHOD FOR MANUFACTURING A THIN FILM TRANSISTOR ARRAY PANEL - A thin film transistor display panel includes gate wiring formed on an insulation substrate and including gate lines, and gate electrodes and gate pads connected to the gate lines; a gate insulation layer covering the gate wiring; a semiconductor pattern formed over the gate insulation layer; data wiring formed over the gate insulation layer or the semiconductor pattern and including source electrodes, drain electrodes, and data pads; a protection layer including a Nega-PR type of organic insulating layer formed all over the semiconductor pattern and the data wiring, wherein the thickness of the Nega-PR type of organic insulating layer in both the gate and data pad regions is smaller than in the other regions; and a pixel electrode connected to the drain electrode. When exposing the Nega-PR type of passivation layer in the pad region during a photolithography process, a photomask having a lattice pattern made of a metal such as Cr that has a line width of less than the resolution of a light exposer is used. Thus, the resulting post-etch height of the passivation layer can be selectively controlled so as to provide reduced effective thickness in the pad regions. | 07-21-2011 |
20110269309 | PHOTORESIST COMPOSITION, METHOD OF FORMING PATTERN BY USING THE PHOTORESIST COMPOSITION, AND METHOD OF MANUFACTURING THIN-FILM TRANSISTOR SUBSTRATE - Provided are a photoresist composition having superior adhesion to an etch target film, a method of forming a pattern by using the photoresist composition, and a method of manufacturing a thin-film transistor (TFT) substrate. The photoresist composition includes an alkali-soluble resin; a photosensitive compound; a solvent; and 0.01 to 0.1 parts by weight of a compound represented by Formula 1: | 11-03-2011 |
20120138934 | DISPLAY DEVICE AND METHOD FOR MANUFACTURING THE SAME - The present invention relates to a display device and a method of manufacturing the display device. The display device includes an insulation substrate, a gate conductor including a gate line and a gate electrode, an organic layer on the insulation substrate and the gate line, and a data conductor including a data line, a drain electrode, and a source electrode. The data line crosses the gate line. The gate electrode, the drain electrode, and the source electrode form a transistor, and a thickness of the gate electrode may be larger than a thickness of the gate line. | 06-07-2012 |
20120156594 | PHOTOMASK INCLUDING SUPER LENS AND MANUFACTURING METHOD THEREOF - A photomask includes a substrate, a mask pattern layer and a super lens. The substrate includes a pattern which includes protruding portions, and open portions between the protruding portions. The mask pattern layer is in the open portions of the pattern and fills the open portions of the pattern. The super lens is on the substrate and the mask pattern layer. | 06-21-2012 |
20120161131 | THIN-FILM TRANSISTOR SUBSTRATE AND METHOD OF MANUFACTURING THE SAME - A thin-film transistor (“TFT”) substrate includes a metal wiring including copper or a copper alloy on a substrate, an inorganic layer on an upper surface and side surfaces of the metal wiring to surround the metal wiring, the inorganic layer in direct contact with the metal wiring, and a planarization layer on the inorganic layer and in direct contact with the inorganic layer. | 06-28-2012 |
20120244471 | PHOTORESIST RESIN COMPOSITION AND METHOD OF FORMING PATTERNS BY USING THE SAME - A method for forming a pattern includes forming a photosensitive film by coating a photosensitive resin composition on a substrate, exposing the photosensitive film to light through a mask that includes a light transmission region and a non-light transmission region, coating a developing solution on the photosensitive film, and forming a photosensitive film pattern by baking the photosensitive film, wherein the photosensitive resin composition includes an alkali soluble base resin, a photoacid generator and a photoactive compound. | 09-27-2012 |
20120248480 | DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME - Provided are a display device and a method of manufacturing of the display device. The display device includes a substrate subjected to a primary preprocess; a conductor formed on the substrate and subjected to a secondary preprocess; and an insulating layer formed on the substrate and the conductor, in which the primary preprocess is performed for a surface energy of the first substrate higher than a first reference value and the secondary preprocess is performed for a surface energy of the conductor lower than a second reference value. | 10-04-2012 |
20130017637 | METHOD FOR FORMING PATTERN AND METHOD FOR MANUFACTURING DISPLAY DEVICE BY USING THE SAMEAANM JEON; Woo-SeokAACI SeoulAACO KRAAGP JEON; Woo-Seok Seoul KRAANM LEE; Jong KwangAACI DaejeonAACO KRAAGP LEE; Jong Kwang Daejeon KRAANM JU; Jin HoAACI SeoulAACO KRAAGP JU; Jin Ho Seoul KRAANM KANG; MinAACI SeoulAACO KRAAGP KANG; Min Seoul KRAANM KANG; HoonAACI Suwon-siAACO KRAAGP KANG; Hoon Suwon-si KRAANM SHIM; Seung BoAACI Asan-siAACO KRAAGP SHIM; Seung Bo Asan-si KRAANM PARK; Gwui-HyunAACI Osan-siAACO KRAAGP PARK; Gwui-Hyun Osan-si KRAANM KIM; Bong-YeonAACI SeoulAACO KRAAGP KIM; Bong-Yeon Seoul KR - A method for forming a fine exposure pattern where a width and an interval of the pattern are each 1CD, by first exposing a photoresist by using an exposure mask where an interval ratio of a light shielding part and a light transmission part is 2CD:1CD to 4CD:1CD, and then second exposing the photoresist after the exposure mask is shifted at a predetermined interval, or second exposing the photoresist by using an exposure mask formed at a position where a light transmission part is shifted at a predetermined interval, and developing the photoresist, such that it is possible to form a display device having a pixel electrode including a plurality of fine branch electrodes having a smaller width and interval than a resolution of an exposure apparatus. | 01-17-2013 |
20130048604 | PHOTORESIST COMPOSITION AND METHOD OF FORMING A FINE PATTERN USING THE SAME - A photoresist composition includes from about 20% to about 50% by weight of a polymer, from about 0.5% to about 1.5% by weight of a photo-acid generator, from about 0.01% to about 0.5% by weight of a photo absorber and the remainder includes an organic solvent. Also provided is a method of forming a fine pattern including forming a thin film on a substrate; forming a photoresist pattern by using a photoresist composition that includes from about 20% to about 50% by weight of a polymer, from about 0.5% to about 1.5% by weight of a photo-acid generator, from about 0.01% to about 0.5% by weight of a photo absorber and a remainder comprising an organic solvent; and patterning the thin film by using the photoresist pattern as an etch-stop layer to form a fine pattern. | 02-28-2013 |
20130106313 | COLOR FILTER AND COLOR FILTER ARRAY PANEL | 05-02-2013 |
20130122403 | MASK FOR EXPOSURE AND METHOD OF FABRICATING SUBSTRATE USING SAID MASK - Provided is a photolithography mask capable of forming fine patterns beyond a critical resolution of an exposer without replacing or changing the exposer. The mask includes an at least partially light absorbing phase shift layer and uses a complex wavelength light source. | 05-16-2013 |
20130122428 | EXPOSURE SYSTEM, METHOD OF FORMING PATTERN USING THE SAME AND METHOD OF MANUFACTURING DISPLAY SUBSTRATE USING THE SAME - An exposure system includes an exposure apparatus and a phase shift mask. The exposure apparatus emits a multi-wavelength light including a plurality of wavelengths different from each other. The phase shift mask includes a transparent substrate and a light blocking layer. The transparent substrate includes a first surface, and a second surface opposite to the first surface. The multi-wavelength light is incident into the first surface. The transparent substrate further includes a recess which extends from the second surface toward the first surface. The light blocking layer includes a first opening which exposes the second surface of the transparent substrate, and a second opening which is spaced apart from the first opening and exposes the recess of the transparent substrate. | 05-16-2013 |
20130143149 | MASK FOR USE IN PHOTOLITHOGRAPHY, MANUFACTURING METHOD THEREOF AND MANUFACTURING METHOD OF DEVICES BY USING THE MASK - Provided are a photomask, including: a substrate; an opaque pattern formed on the substrate and made of a material which does not penetrate light; a first dielectric layer formed on the substrate and the opaque pattern; and a negative refractive-index meta material layer formed on the first dielectric layer, in which a dispersion mode used in the photomask uses a Quasi bound mode, a manufacturing method of the photomask, and a manufacturing method of a substrate using the photomask. | 06-06-2013 |
20130210202 | METHOD OF PLANARIZING SUBSTRATE AND METHOD OF MANUFACTURING THIN FILM TRANSISTOR USING THE SAME - A method of planarizing a substrate includes forming a conductive pattern on a first surface of a base substrate, forming a positive photoresist layer on the base substrate and the conductive pattern, exposing the positive photoresist layer to light by irradiating a second surface of the base substrate opposite to the first surface with light, developing the positive photoresist layer to form a protruded portion on the conductive pattern, forming a planarizing layer on the base substrate and the protruded portion and eliminating the protruded portion. | 08-15-2013 |
20130248868 | DISPLAY PANEL AND METHOD OF MANUFACTURING THE SAME - A display panel includes a base substrate, a common electrode, a liquid crystal layer, a pixel electrode, a gate line, a data line, a switching element, a color filter and a light blocking pattern. The base substrate includes a trench. The common electrode is disposed in the trench. The liquid crystal layer is disposed in the trench and disposed on the common electrode. The pixel electrode is disposed on the base substrate and the liquid crystal layer. The gate line, the data line and the switching element are disposed on the base substrate and the pixel electrode. The color filter and the light blocking pattern are disposed on the gate line, the data line and the switching element. | 09-26-2013 |
20130271816 | SUBSTRATE FOR AN ELECTROWETTING DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SUBSTRATE - A substrate for an electrowetting display device including a pixel electrode, a partition wall pattern and a water-repellent pattern. The pixel electrode is formed on a base substrate. The partition wall pattern is disposed along an edge of the pixel electrode to expose the pixel electrode. The water-repellent pattern is disposed at a space formed by the pixel electrode and the partition wall pattern to be extended along a lower portion of side surfaces of the partition wall pattern from an area on which the pixel electrode is formed. The water-repellent pattern exposes an upper portion of the side surfaces and an upper surface of the partition wall pattern. Thus, a manufacturing reliability of a substrate for an electrowetting display device is improved to prevent a display quality from being reduced. | 10-17-2013 |
20130316270 | MASK HAVING ASSIST PATTERN - A mask may include a circuit area and a pixel area. The circuit area includes a circuit pattern. The pixel area includes a pixel pattern which is extended in a length direction and an assist pattern which is at an end portion of the pixel pattern and adjacent to the circuit area. | 11-28-2013 |
20130335664 | DISPLAY PANEL AND METHOD OF MANUFACTURING THE SAME - A display panel includes a substrate, a thin film transistor on the substrate, a first electrode electrically connected to the thin film transistor, a first insulation layer covering the first electrode, an image displaying layer disposed on the first insulation layer, a second insulation layer disposed on the image displaying layer, a second electrode disposed on the second insulation layer and insulated from the first electrode, and a protecting layer disposed on the second electrode. The protecting layer surrounds a portion of an upper surface and a side surface of the image displaying layer. The protecting layer includes a light curable material. | 12-19-2013 |
20140065523 | PATTERN MASK AND METHOD OF MANUFACTURING THIN FILM PATTERN USING PATTERN MASK - A pattern mask for patterning a thin film includes a transparent or translucent substrate with a plurality of grooves formed thereon having a pitch of about 4.6 μm to about 10.8 μm. | 03-06-2014 |
20140076847 | PHOTORESIST COMPOSITION AND METHOD OF FORMING A METAL PATTERN USING THE SAME - A method of forming a metal pattern is disclosed. In the method, a metal layer is formed on a base substrate. A photoresist composition is coated on the metal layer to form a coating layer. The photoresist composition includes a binder resin, a photo-sensitizer, a mercaptopropionic acid compound and a solvent. The coating layer is exposed to a light. The coating layer is partially removed to form a photoresist pattern. The metal layer is patterned by using the photoresist pattern as a mask. | 03-20-2014 |
20140127612 | PHOTOMASK FOR EXPOSURE AND METHOD OF MANUFACTURING PATTERN USING THE SAME - A photomask for exposure includes: a transparent substrate; a light blocking pattern layer positioned on the transparent substrate; a first dielectric layer positioned on the light blocking pattern layer and including a dielectric material; and a negative refractive index layer positioned on the first dielectric layer and including a metal. A surface plasmon quasi-bound mode of the photomask for exposure overlaps a wavelength range of the light source of the light exposer which irradiates light to the photomask for exposure. | 05-08-2014 |
20140147976 | EXPOSURE MASK AND METHOD OF MANUFACTURING A SUBSTRATE USING THE EXPOSURE MASK - An exposure mask includes a first transmission portion, a second transmission portion, and a blocking portion. The first transmission portion is configured to, when illuminated with light, transmit the light at a first energy level. The first transmission portion is disposed in association with formation of a first contact hole in an underlying layer. The second transmission portion is configured to, when illuminated with the light, transmit the light at a second energy level. The second transmission portion is disposed in association with formation of a second contact hole in the underlying layer. The blocking portion is configured to block the light, and is disposed in association with a boundary region between a first region and a second region of the underlying layer. The second transmission portion is further configured to enable the second contact hole to be formed deeper into the underlying layer than the first contact hole. | 05-29-2014 |
20140162177 | OPTICAL MASK FOR FORMING PATTERN - An optical mask for forming a pattern is provided. The optical mask includes: a substrate including a light blocking pattern formed on portions of the substrate, wherein the light blocking pattern includes a halftone layer and a light blocking layer formed on the halftone layer, and the halftone layer and the light blocking layer overlap such that at least an edge portion of the halftone layer is exposed. A pitch of the light blocking pattern may about 6 μm, and a transmission ratio of the halftone layer may range from about 10% to about 50%. | 06-12-2014 |
20140176893 | DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME - A display device according to an exemplary embodiment of the present invention includes a substrate including a plurality of pixel regions, a thin film transistor disposed on the substrate, and a pixel electrode connected to the thin film transistor and disposed in a first pixel region. A roof layer is disposed on the pixel electrode and spaced apart from the pixel electrode with a microcavity interposed therebetween. The plurality of pixel regions is disposed in a matrix form including a plurality of pixel rows and a plurality of pixel columns, the roof layer is disposed along the plurality of pixel rows, and the roof layer includes a bridge portion connecting the roof layers disposed in different pixel rows. | 06-26-2014 |
20140183536 | THIN FILM TRANSISTOR PANEL AND METHOD FOR MANUFACTURING THE SAME - A thin film transistor array panel according to an exemplary embodiment of the present invention includes: an insulation substrate; a thin film transistor disposed on the insulation substrate, wherein the thin film transistor includes a first electrode; a first contact hole pattern having a first width, wherein the first contact hole pattern exposes a portion of the first electrode, and a first contact hole to expose the portion of the first electrode, wherein an inner sidewall of the first contact hole pattern constitutes a first portion of the first contact hole. | 07-03-2014 |
20140184972 | DISPLAY PANEL AND LIQUID CRYSTAL DISPLAY INCLUDING THE SAME - A display panel includes: a substrate including red, green, blue and white sub-pixel areas; red, green and blue color filter layers respectively in the red, green and blue sub-pixel areas; and a dummy color filter layer in the white sub-pixel area. The dummy color filter layer is adjacent to at least one of the red color filter layer, the green color filter layer, and the blue color filter layer, and the dummy color filter layer forms a step with the adjacent color filter layer. | 07-03-2014 |
20140234776 | PHOTOSENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME - A photosensitive resin composition includes: an acrylic copolymer comprising a polymerization product of a first monomer comprising at least one selected from an unsaturated carboxylic acid and an unsaturated carboxylic acid anhydride, and a second monomer comprising an olefin-based unsaturated compound; a photosensitive component comprising at least one 1,2-quinonediazide-5-sulfonic acid ester compound selected from compounds represented by Chemical Formulae 1 to 4; a coupling agent; and a solvent, wherein a total amount of asymmetric compounds in the photosensitive component is greater than or equal to 45 area percent as determined by high performance liquid chromatography: | 08-21-2014 |
20140327866 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD OF FORMING PATTERN, AND LIQUID CRYSTAL DISPLAY USING THE SAME - A photosensitive resin composition is disclosed. The disclosed photosensitive resin composition includes an acryl-based copolymer formed by copolymerizing i) unsaturated carboxylic acid, unsaturated carboxylic acid anhydride, or a mixture thereof, and ii) an olefin-based unsaturated compound or a mixture thereof, a dissolution inhibitor in which a phenolic hydroxyl group is protected by an acid-degradable acetal or ketal group, a photoacid generator, and a solvent. | 11-06-2014 |
20150024583 | METHOD OF MANUFACTURING LIQUID CRYSTAL DISPLAY - A method of manufacturing a liquid crystal display includes disposing a gate electrode and a light blocking member on a substrate, disposing a source electrode and a drain electrode on the gate electrode to form a thin film transistor, disposing a data line on the light blocking member, disposing an organic layer on the thin film transistor and the data line, exposing a first convex part of the organic layer to light in a first area corresponding to the thin film transistor during an exposure process, and exposing a second convex part of the organic layer to the light in a second area corresponding to the data line during the exposure process using a mask. The mask includes a first transflective part aligned with the first area and a second transflective part aligned with the second area during the exposure process. | 01-22-2015 |
20150055208 | ELECTROWETTING DISPLAY DEVICE - An electrowetting display device includes a black matrix that includes a plurality of openings corresponding to pixels, respectively, a first extension portion extending in a driving direction of an electrowetting layer, the driving direction being a direction in which motion of the electrowetting layer is induced when a voltage difference is applied between a common electrode and a pixel electrode, and a partition wall that partitions the pixels. The first extension portion includes first and second areas respectively extending in opposite directions to each other and a third area having a width substantially the same as a width of the partition wall. The first area has a width less than about half of a first length corresponding to a length extending between both sides of each pixel in the driving direction, and the second area has a width less than the width of the first area. | 02-26-2015 |