Patent application number | Description | Published |
20080203314 | Prism spectrometer - An optical spectroscopy tool is provided. In one embodiment a highly efficient means by which moderate resolution spectroscopy may be performed in the vacuum ultraviolet (VUV) is described. In one embodiment the techniques can be used as a high throughput spectrometer to spatially disperse wavelengths in and around the VUV in such a manner as to generate a substantially flat field focal plane, suitable for use in combination with an array detector. Some embodiments utilize prism based spectrometers. Some embodiments utilize detector elements that may be movable and/or located within the spectrometer. In some embodiments, collimated light may be provided as an input to the spectrometer. | 08-28-2008 |
20080204710 | Spectrometer with collimated input light - An optical spectroscopy tool is provided. In one embodiment a highly efficient means by which moderate resolution spectroscopy may be performed in the vacuum ultraviolet (VUV) is described. In one embodiment the techniques can be used as a high throughput spectrometer to spatially disperse wavelengths in and around the VUV in such a manner as to generate a substantially flat field focal plane, suitable for use in combination with an array detector. Some embodiments utilize prism based spectrometers. Some embodiments utilize detector elements that may be movable and/or located within the spectrometer. In some embodiments, collimated light may be provided as an input to the spectrometer. | 08-28-2008 |
20080204711 | Spectrometer with moveable detector element - An optical spectroscopy tool is provided. In one embodiment a highly efficient means by which moderate resolution spectroscopy may be performed in the vacuum ultraviolet (VUV) is described. In one embodiment the techniques can be used as a high throughput spectrometer to spatially disperse wavelengths in and around the VUV in such a manner as to generate a substantially flat field focal plane, suitable for use in combination with an array detector. Some embodiments utilize prism based spectrometers. Some embodiments utilize detector elements that may be movable and/or located within the spectrometer. In some embodiments, collimated light may be provided as an input to the spectrometer. | 08-28-2008 |
20080246951 | Method and system for using reflectometry below deep ultra-violet (DUV) wavelengths for measuring properties of diffracting or scattering structures on substrate work-pieces - A method and apparatus is disclosed for using below deep ultra-violet (DUV) wavelength reflectometry for measuring properties of diffracting and/or scattering structures on semiconductor work-pieces is disclosed. The system can use polarized light in any incidence configuration, but one technique disclosed herein advantageously uses un-polarized light in a normal incidence configuration. The system thus provides enhanced optical measurement capabilities using below deep ultra-violet (DUV) radiation, while maintaining a small optical module that is easily integrated into other process tools. A further refinement utilizes an r−θ stage to further reduce the footprint. | 10-09-2008 |
20090002711 | Broad band referencing reflectometer - A spectroscopy system is provided which is optimized for operation in the VUV region and capable of performing well in the DUV-NIR region. Additionally, the system incorporates an optical module which presents selectable sources and detectors optimized for use in the VUV and DUV-NIR. As well, the optical module provides common delivery and collection optics to enable measurements in both spectral regions to be collected using similar spot properties. The module also provides a means of quickly referencing measured data so as to ensure that highly repeatable results are achieved. The module further provides a controlled environment between the VUV source, sample chamber and VUV detector which acts to limit in a repeatable manner the absorption of VUV photons. The use of broad band data sets which encompass VUV wavelengths, in addition to the DUV-NIR wavelengths enables a greater variety of materials to be meaningfully characterized. Array based detection instrumentation may be exploited to permit the simultaneous collection of larger wavelength regions. | 01-01-2009 |
20100000569 | CONTAMINATION MONITORING AND CONTROL TECHNIQUES FOR USE WITH AN OPTICAL METROLOGY INSTRUMENT - A technique is provided for monitoring and controlling surface contaminants on optical elements contained within the optical path (or sub-path) of an optical metrology instrument. The technique may be utilized in one embodiment in such a manner as to not require that additional components and/or instrumentation be coupled to, or integrated into, existing metrology equipment. Surface contaminants on optical elements within an optical metrology instrument are monitored so that cleaning procedures can be performed as deemed necessary. The cleaning procedures may include the use of exposing the optical elements to optical radiation. The optical metrology instrument may be an instrument which operates at wavelengths that include vacuum ultra-violet (VUV) wavelengths. | 01-07-2010 |
20100051822 | Broad band referencing reflectometer - A spectroscopy system is provided which is optimized for operation in the VUV region and capable of performing well in the DUV-NIR region. Additionally, the system incorporates an optical module which presents selectable sources and detectors optimized for use in the VUV and DUV-NIR. As well, the optical module provides common delivery and collection optics to enable measurements in both spectral regions to be collected using similar spot properties. The module also provides a means of quickly referencing measured data so as to ensure that highly repeatable results are achieved. The module further provides a controlled environment between the VUV source, sample chamber and VUV detector which acts to limit in a repeatable manner the absorption of VUV photons. The use of broad band data sets which encompass VUV wavelengths, in addition to the DUV-NIR wavelengths enables a greater variety of materials to be meaningfully characterized. Array based detection instrumentation may be exploited to permit the simultaneous collection of larger wavelength regions. | 03-04-2010 |
20100277741 | COMBINED OPTICAL METROLOGY TECHNIQUES - A method and apparatus is disclosed for using below deep ultra-violet (DUV) wavelength reflectometry for measuring properties of diffracting and/or scattering structures on semiconductor work-pieces is disclosed. The system can use polarized light in any incidence configuration, but one technique disclosed herein advantageously uses un-polarized light in a normal incidence configuration. The system thus provides enhanced optical measurement capabilities using below deep ultra-violet (DUV) radiation, while maintaining a small optical module that is easily integrated into other process tools. A further refinement utilizes an r-θ stage to further reduce the footprint. | 11-04-2010 |
20100294922 | Automated calibration methodology for VUV metrology system - A calibration pad having multiple calibration sites is provided. A particular calibration site may be utilized until that particular site has been determined to have become unacceptable for further use, for example from contamination, in which case the calibration processes may then move to use a different calibration site(s) on the calibration pad(s). A variety of techniques may be utilized to provide the determination that a site is no longer acceptable for use. Movement may thus occur over time from site to site for use in a calibration process. A variety of criteria may be established to determine when to move to another site. Though the designation of a site as “bad” may be based upon measured reflectance data, other criteria may also be used. For example, the number of times a site has been exposed to light may be the criteria for designating a site as bad. Alternatively the cumulative exposure of a site may be the criteria. Further, the plurality of calibration sites that are provided on the single calibration pad may be pre-evaluated so as to initially screen out unacceptable calibration sites prior to use. The techniques provided may be utilized in calibration processes which utilize a single calibration sample or processes which require a plurality of calibration samples. | 11-25-2010 |
20100301225 | Method and Apparatus for Accurate Calibration of VUV Reflectometer - A calibration technique is provided that utilizes a standard sample that allows for calibration in the wavelengths of interest even when the standard sample may exhibit significant reflectance variations at those wavelengths for subtle variations in the properties of the standard sample. A second sample, a reference sample may have a relatively featureless reflectance spectrum over the same spectral region and is used in combination with the calibration sample to achieve the calibration. In one embodiment the spectral region may include the VUV spectral region. | 12-02-2010 |
20100328648 | BROAD BAND REFERENCING REFLECTOMETER - A spectroscopy system is provided which is optimized for operation in the VUV region and capable of performing well in the DUV-NIR region. Additionally, the system incorporates an optical module which presents selectable sources and detectors optimized for use in the VUV and DUV-NIR. As well, the optical module provides common delivery and collection optics to enable measurements in both spectral regions to be collected using similar spot properties. The module also provides a means of quickly referencing measured data so as to ensure that highly repeatable results are achieved. The module further provides a controlled environment between the VUV source, sample chamber and VUV detector which acts to limit in a repeatable manner the absorption of VUV photons. The use of broad band data sets which encompass VUV wavelengths, in addition to the DUV-NIR wavelengths enables a greater variety of materials to be meaningfully characterized. Array based detection instrumentation may be exploited to permit the simultaneous collection of larger wavelength regions. | 12-30-2010 |
20120182542 | Optical Vacuum Ultra-Violet Wavelength Nanoimprint Metrology - An optical metrology apparatus for measuring nanoimprint structures using Vacuum Ultra-Violet (VUV) light is described. | 07-19-2012 |
20120268740 | METHODS AND APPARATUS FOR VACUUM ULTRAVIOLET (VUV) OR SHORTER WAVELENGTH CIRCULAR DICHROISM SPECTROSCOPY - A highly efficient vacuum ultraviolet circular dichroism spectrometer is provided; the spectrometer suitable for laboratory use or for integration into a beam line at a synchrotron radiation facility. In one embodiment, a spectroscopic circular dichroism instrument is provided; the instrument configured so as to enable circular dichroism data to be simultaneously obtained for multiple wavelengths of light. The instrument may be further configured to operate in at least a portion of the vacuum ultraviolet wavelength region. | 10-25-2012 |
20140192343 | Vacuum Ultraviolet Absorption Spectroscopy System And Method - An efficient absorption spectroscopy system is provided. The spectroscopy system may be configured to measure solid, liquid or gaseous samples. Vacuum ultra-violet wavelengths may be utilized. Some of the disclosed techniques can be used for detecting the presence of trace concentrations of gaseous species. A preferable gas flow cell is disclosed. Some of the disclosed techniques may be used with a gas chromatography system so as to detect and identify species eluted from the column. Some of the disclosed techniques may be used in conjunction with an electrospray interface and a liquid chromatography system so as to detect and identify gas phase ions of macromolecules produced from solution. Some of the disclosed techniques may be used to characterize chemical reactions. Some of the disclosed techniques may be used in conjunction with an ultra short-path length sample cell to measure liquids. | 07-10-2014 |
20140264053 | Methods And Apparatus For Vacuum Ultraviolet (VUV) Or Shorter Wavelength Circular Dichroism Spectroscopy - A highly efficient vacuum ultraviolet circular dichroism spectrometer is provided; the spectrometer suitable for laboratory use or for integration into a beam line at a synchrotron radiation facility. In one embodiment, a spectroscopic circular dichroism instrument is provided; the instrument configured so as to enable circular dichroism data to be simultaneously obtained for multiple wavelengths of light. The instrument may be further configured to operate in at least a portion of the vacuum ultraviolet wavelength region. | 09-18-2014 |
20150059440 | Vacuum Ultraviolet Absorption Spectroscopy System And Method - An efficient absorption spectroscopy system is provided. The spectroscopy system may be configured to measure solid, liquid or gaseous samples. Vacuum ultra-violet wavelengths may be utilized. Some of the disclosed techniques can be used for detecting the presence of trace concentrations of gaseous species. A preferable gas flow cell is disclosed. Some of the disclosed techniques may be used with a gas chromatography system so as to detect and identify species eluted from the column. Some of the disclosed techniques may be used in conjunction with an electrospray interface and a liquid chromatography system so as to detect and identify gas phase ions of macromolecules produced from solution. Some of the disclosed techniques may be used to characterize chemical reactions. Some of the disclosed techniques may be used in conjunction with an ultra short-path length sample cell to measure liquids. | 03-05-2015 |