Ping-Hsu
Ping-Hsu Chen, Hsinchu TW
Patent application number | Description | Published |
---|---|---|
20080305563 | Method and system for controlling copper chemical mechanical polish uniformity - A system and method for controlling resistivity uniformity in a Copper trench structure by controlling the CMP process is provided. A preferred embodiment comprises a system and a method in which a plurality of CMP process recipes may be created comprising at least a slurry arm position. A set of metrological data for at least one layer of the semiconductor substrate may be estimated, and an optimum CMP process recipe may be selected based on the set of metrological data. The optimum CMP process recipe may be implemented on the semiconductor substrate. | 12-11-2008 |
Ping-Hsu Chen, Hsinchu City TW
Patent application number | Description | Published |
---|---|---|
20080275586 | Novel Methodology To Realize Automatic Virtual Metrology - A method to enable wafer result prediction includes collecting manufacturing data from various semiconductor manufacturing tools and metrology tools; choosing key parameters using an autokey method based on the manufacturing data; building a virtual metrology based on the key parameters; and predicting wafer results using the virtual metrology. | 11-06-2008 |
20080275588 | PREDICTION OF UNIFORMITY OF A WAFER - A method of monitoring uniformity of a wafer is provided. A wafer parameter is selected. Manufacturing data is collected. The manufacturing data includes measurements of the selected wafer parameter. An average offset profile of the wafer parameter for a first and second wafer is determined using the manufacturing data. The first and second wafer are associated with a product type and were processed by a processing tool. An offset profile for a third wafer is predicted for a wafer using the average offset profile. The third wafer is associated with the product type and was processed by the processing tool. | 11-06-2008 |
Ping-Hsu Cheng, Miao-Li County TW
Patent application number | Description | Published |
---|---|---|
20150301637 | TOUCH PANEL AND TOUCH PANEL DISPLAY DEVICE - A touch panel is provided. The touch panel includes a substrate having a viewing area and a peripheral area and a light shielding layer disposed over the peripheral area of the substrate. In addition, the light shielding layer has a top surface and a first sloped sidewall. The touch panel further includes a sensing electrode layer disposed over the viewing area of the substrate, and the sensing electrode layer includes an extending electrode extending from the viewing area of the substrate to the light shielding layer. In addition, the extending electrode over the top surface of the light shielding layer has a first thickness and the extending electrode over the first sloped sidewall has a second thickness smaller than the first thickness. | 10-22-2015 |
Ping-Hsu Lin, Tu-Cheng TW
Patent application number | Description | Published |
---|---|---|
20090278939 | QUALITY MONITORING SYSTEM AND METHOD FOR EXPIRABLE OBJECTS - A quality monitoring system for an expirable object includes an image capturing unit capable of capturing an image of the expirable object, a setting unit capable of setting an expiring date and a warning date and associating the set dates with the captured image, a storage unit configured for storing the captured image and its associated dates, a date acquiring unit capable of acquiring the expiring date and the warning date, a processing unit capable of monitoring whether the warning date is due, and a display unit configured for displaying the captured image and the expiring day of the expirable object. | 11-12-2009 |