Patent application number | Description | Published |
20080274351 | Sintered Body, Sputtering Target and Molding Die, and Process for Producing Sintered Body Employing the Same - To provide a large sputtering target excellent in discharge characteristics during sputtering and in characteristics of a thin film thereby obtainable. Further, a process for producing a sintered body is provided, whereby a large green body excellent in shape accuracy can be obtained by means of cold isostatic pressing directly without preforming, and a sintered body capable of providing the above-mentioned excellent sputtering target, can be produced efficiently at a low cost. | 11-06-2008 |
20100326823 | CYLINDRICAL SPUTTERING TARGET - To provide a cylindrical sputtering target, whereby cracking during sputtering can be remarkably reduced. | 12-30-2010 |
20110240467 | CYLINDRICAL SPUTTERING TARGET, AND METHOD FOR MANUFACTURING SAME - Provided is a cylindrical sputtering target which attains a high production yield in a film-forming process even when a film is formed by sputtering with a long cylindrical sputtering target constituted by a plurality of cylindrical target materials. | 10-06-2011 |
20130214215 | ZINC OXIDE SINTERED COMPACT, SPUTTERING TARGET, AND ZINC OXIDE THIN FILM - There is provided a zinc oxide sintered compact with a zirconium content of 10 to 1000 ppm, and a sputtering target containing the zinc oxide sintered compact. There is also provided a zinc oxide thin-film having a zirconium content of 10 to 2000 ppm and a resistivity of 10 Ω·cm or greater. | 08-22-2013 |
20130273346 | GALLIUM NITRIDE SINTERED BODY OR GALLIUM NITRIDE MOLDED ARTICLE, AND METHOD FOR PRODUCING SAME - The present invention provides a gallium nitride sintered body and a gallium nitride molded article which have high density and low oxygen content without using a special apparatus. According to the first embodiment, a gallium nitride sintered body, which is characterized by having density of 2.5 g/cm | 10-17-2013 |
20140332735 | COMPLEX OXIDE SINTERED BODY, SPUTTERING TARGET, TRANSPARENT CONDUCTIVE OXIDE FILM, AND METHOD FOR PRODUCING SAME - The present invention provides a complex oxide sintered body | 11-13-2014 |