Sakakibara, Tokyo
Akifumi Sakakibara, Tokyo JP
Patent application number | Description | Published |
---|---|---|
20150376730 | HOT-ROLLED STEEL SHEET AND MANUFACTURING METHOD THEREOF - A hot-rolled steel sheet has a composition containing: in mass %, C: 0.01 to 0.2%; Si: 2.5% or less; Mn: 4.0% or less; P: 0.10% or less; S: 0.03% or less; Al: 0.001 to 2.0%; N: 0.01% or less; and O: 0.01% or less, and one kind or a total of two kinds of Ti and Nb for 0.01 to 0.30%. An average effective crystal grain diameter at a sheet thickness ¼ part is 10 μm or less, and an average effective crystal grain diameter at a part of a range of 50 μm from a surface is 6 μm or less. A structure of the steel sheet is tempered martensite or lower bainite, and a volume fraction thereof is 90% or more as a total. | 12-31-2015 |
Daisuke Sakakibara, Tokyo JP
Patent application number | Description | Published |
---|---|---|
20110003079 | PROCESSES FOR PREPARING COATED PAPERS - An object of the present invention is to provide a process for preparing a high-quality coated paper with high runnability while preventing damage to the elastic roll surface of the soft calender encountered during high-speed operation. The present invention provides a process for preparing a coated paper, comprising the steps of: making a base paper; applying a coating solution containing a pigment and an adhesive on the base paper to form one or more pigment coating layers; and surface-treating the pigment coating layers by a soft calender, said papermaking and coating steps being performed at an operating speed of 1300 m/min; wherein said surface-treating step comprises treating the outermost one of the pigment coating layers using a soft calender comprising a metallic roll and an elastic roll with at least two or more nips and wherein the elastic roll has a Shore D hardness of 90-96 and the metallic roll surface temperature at the first nip is less than 130° C. | 01-06-2011 |
Eiji Sakakibara, Tokyo JP
Patent application number | Description | Published |
---|---|---|
20080313444 | MICROCOMPUTER AND DIVIDING CIRCUIT - Herein disclosed is a microcomputer MCU adopting the general purpose register method. The microcomputer is enabled to have a small program capacity or a high program memory using efficiency and a low system cost, while enjoying the advantage of simplification of the instruction decoding as in the RISC machine having a fixed length instruction format of the prior art, by adopting a fixed length instruction format having a power of 2 but a smaller bit number than that of the maximum data word length fed to instruction execution means. And, the control of the coded division is executed by noting the code bits. | 12-18-2008 |
20100191934 | MICROCOMPUTER AND DIVIDING CIRCUIT - Herein disclosed is a microcomputer MCU adopting the general purpose register method. The microcomputer is enabled to have a small program capacity or a high program memory using efficiency and a low system cost, while enjoying the advantage of simplification of the instruction decoding as in the RISC machine having a fixed length instruction format of the prior art, by adopting a fixed length instruction format having a power of 2 but a smaller bit number than that of the maximum data word length fed to instruction execution means. And, the control of the coded division is executed by noting the code bits. | 07-29-2010 |
Fumihiko Sakakibara, Tokyo JP
Patent application number | Description | Published |
---|---|---|
20090281691 | Vehicle control device - A vehicle control device and a vehicle are provided with compatibility between high grip performance and fuel efficiency. When a camber angle of a wheel is adjusted as a negative camber, the ground contact pressure on a first tread is increased and the ground contact pressure on a second tread is decreased, thus providing the high grip performance. On the other hand, when the camber angle of the wheel is adjusted as a positive camber, the ground contact pressure on the first tread is decreased and the ground contact pressure on the second tread is increased, thereby reducing resistance and achieving fuel saving. By adjusting the camber angle of the wheel, compatibility can be provided between high grip performance and fuel saving which otherwise conflict with each other. | 11-12-2009 |
20100023213 | VEHICLE CONTROL DEVICE - A vehicle control device which can at least provide compatibility between a high grip performance and fuel efficiency or compatibility between quietness and fuel efficiency is provided. When a camber angle of a wheel | 01-28-2010 |
20100030397 | Vehicle - To provide a vehicle which can move independently as an own independent vehicle and can run integrally in linkage with another vehicle. A plurality of single-seat vehicles which can move independently are combined and they move integrally while a predetermined formation is maintained through linkage among respective vehicles. One of all the vehicles moving in linkage serves as a host vehicle and an occupant in the host vehicle becomes a driver in the linkage moving. A host vehicle | 02-04-2010 |
Hajime Sakakibara, Tokyo JP
Patent application number | Description | Published |
---|---|---|
20140149029 | TRAFFIC EVALUATION DEVICE AND TRAFFIC EVALUATION METHOD - This traffic simulator is provided with a simulator engine unit for performing computation on the basis of a formula representing a movement model for a vehicle, a traffic volume calculation unit for calculating a generated traffic volume and a removed traffic volume on the basis of a given OD traffic volume, an estimated congestion length calculation unit for calculating (estimating) an estimated congestion length for each link on the basis of the calculated traffic volume thereof, an origin and destination generation unit for generating an origin traffic volume and an destination traffic volume to adjust the estimated congestion length on the basis of the difference between the estimated congestion length and the measured congestion length, a storage unit for storing predetermined information, and an evaluation condition setting unit for setting evaluation conditions for evaluating the traffic various quantities metrics. | 05-29-2014 |
Hidekazu Sakakibara, Tokyo JP
Patent application number | Description | Published |
---|---|---|
20130276920 | CONTROL VALVE FOR A VARIABLE DISPLACEMENT COMPRESSOR - A control valve according to an embodiment includes a body having a valve hole and a guiding passage formed coaxially with the valve hole, an actuating rod, slidably supported along the guiding passage, which is provided with a valve element, a solenoid for applying the solenoidal force in an opening or closing direction of a valve section to the valve element via the actuating rod, and a seal section, provided between the actuating rod and the guiding passage, which houses a sealing member for restricting the leakage of refrigerant from a high pressure side to a low pressure side. The actuating rod and the guiding passage are configured such that the clearance, between the actuating rod and the guiding passage, which is at a higher-pressure side of the seal section is larger than the clearance which is at a lower-pressure side of the seal section. | 10-24-2013 |
Hirokazu Sakakibara, Tokyo JP
Patent application number | Description | Published |
---|---|---|
20100178608 | RADIATION-SENSITIVE RESIN COMPOSITION - A radiation-sensitive resin composition includes a resin (A1) that includes a repeating unit shown by the following formula (1-1) and a repeating unit shown by the following formula (1-2), and a radiation-sensitive acid generator (B). The radiation-sensitive resin composition exhibits excellent sensitivity, and can reduce a mask error factor (MEEF). | 07-15-2010 |
20100255420 | RADIATION SENSITIVE RESIN COMPOSITION AND POLYMER - A radiation-sensitive resin composition includes a polymer, an acid-labile group-containing resin, a radiation-sensitive acid generator, and a solvent, the polymer including repeating units shown by following general formulas (1) and (2). | 10-07-2010 |
20100266953 | COPOLYMER AND TOP COATING COMPOSITION - A resin composition for forming a top coat which can be formed on a photoresist film without causing intermixing with the photoresist film, can maintain a stable film coating which is not eluted into a medium during immersion lithography, does not impair pattern profiles during dry exposure (which is not immersion lithography), and can be easily dissolved in an alkaline developer. The resin is a copolymer which has a recurring unit (I) having a carboxyl group, a recurring unit (II) having a sulfo group and a recurring unit obtained by copolymerizing fluoroalkyl(meth)acrylates having 1 to 20 carbon atoms in a fluoroalkyl group thereof other than a recurring unit having a side chain that includes an alcoholic hydroxyl group having a fluoroalkyl group at least in an α-position thereof, the copolymer having a weight average molecular weight determined by gel permeation chromatography of 2,000 to 100,000. | 10-21-2010 |
20110014569 | RADIATION-SENSITIVE RESIN COMPOSITION AND POLYMER - A radiation-sensitive resin composition includes a solvent and a polymer. The polymer includes a first repeating unit shown by a general formula (1) in which R | 01-20-2011 |
20110104611 | NOVEL COMPOUND, POLYMER, AND RADIATION-SENSITIVE COMPOSITION - A compound is shown by a following formula (1), | 05-05-2011 |
20110151378 | RADIATION-SENSITIVE RESIN COMPOSITION FOR LIQUID IMMERSION LITHOGRAPHY, POLYMER, AND RESIST PATTERN-FORMING METHOD - A radiation-sensitive resin composition for liquid immersion lithography includes a resin component, a photoacid generator and a solvent. The resin component includes an acid-dissociable group-containing resin in an amount of more than 50% by mass. The acid-dissociable group-containing resin includes a repeating unit that includes a fluorine atom and an acid-dissociable group in a side chain of the repeating unit. | 06-23-2011 |
20120045719 | RADIATION-SENSITIVE RESIN COMPOSITION AND COMPOUND - A radiation-sensitive resin composition includes an acid-dissociable group-containing resin, and a compound shown by the following general formula (1). | 02-23-2012 |
20120070783 | RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER, AND METHOD FOR FORMING RESIST PATTERN - A radiation sensitive resin composition capable of forming a photoresist film which has excellent basic resist performances concerning sensitivity, LWR, development defects, etc., gives a satisfactory pattern shape, has an excellent depth of focus, is reduced in the amount of components dissolving in a liquid for immersion exposure which is in contact with the film during immersion exposure, has a large receding contact angle with the liquid for immersion exposure, and is capable of forming a microfine resist pattern with high accuracy. The radiation sensitive resin composition contains (A) a polymer that comprises a repeating unit represented by formula (1) and a repeating unit having a fluorine atom and has an acid dissociable group in the side chain, and (B) a solvent. [In the formula (1), R | 03-22-2012 |
20120082936 | RADIATION-SENSITIVE RESIN COMPOSITION - A radiation-sensitive resin composition includes an acid-labile group-containing resin, and a compound shown by the following general formula (i). R | 04-05-2012 |
20120100480 | COMPOUND, FLUORINE-CONTAINING POLYMER, RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR PRODUCING COMPOUND - A compound has a following general formula (1). | 04-26-2012 |
20120101205 | COPOLYMER AND TOP COATING COMPOSITION - A resin composition for forming a top coat which can be formed on a photoresist film without causing intermixing with the photoresist film, can maintain a stable film coating which is not eluted into a medium during immersion lithography, does not impair pattern profiles during dry exposure (which is not immersion lithography), and can be easily dissolved in an alkaline developer. The resin is a copolymer which includes at least one recurring unit (I) selected from the group consisting of a recurring unit having a group shown by the following formula (1), a recurring unit having a group shown by the following formula (2), and a recurring unit having a carboxyl group, and a recurring unit (II) having a sulfo group, the copolymer having a weight average molecular weight determined by gel permeation chromatography of 2,000 to 100,000. | 04-26-2012 |
20120183908 | RESIST PATTERN-FORMING METHOD - A resist pattern-forming method includes applying a resist underlayer film-forming composition to a substrate to form a resist underlayer film. The resist underlayer film-forming composition includes (A) a polysiloxane. A radiation-sensitive resin composition is applied to the resist underlayer film to form a resist film. The radiation-sensitive resin composition includes (a1) a polymer that changes in polarity and decreases in solubility in an organic solvent due to an acid. The resist film is exposed. The exposed resist film is developed using a developer that includes an organic solvent. | 07-19-2012 |
20120202150 | RADIATION-SENSITIVE RESIN COMPOSITION - A radiation-sensitive resin composition includes an acid-labile group-containing polymer and photoacid generator. The radiation-sensitive resin composition is used to form a resist pattern using a developer that includes an organic solvent in an amount of 80 mass % or more. The radiation-sensitive resin composition has a contrast value γ of 5.0 to 30.0. The contrast value γ is calculated from a resist dissolution contrast curve obtained when developing the radiation-sensitive resin composition using the organic solvent. | 08-09-2012 |
20120308938 | METHOD FOR FORMING PATTERN AND DEVELOPER - A pattern-forming method includes forming a resist film on a substrate using a photoresist composition, exposing the resist film, and developing the exposed resist film using a negative developer that includes an organic solvent. The photoresist composition includes (A) a polymer that includes a structural unit (I) including an acid-labile group that dissociates due to an acid, the solubility of the polymer in the developer decreasing upon dissociation of the acid-labile group, and (B) a photoacid generator. The developer includes a nitrogen-containing compound. | 12-06-2012 |
20130224661 | PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION - A pattern-forming method includes coating a radiation-sensitive resin composition on a substrate to provide a resist film. The resist film is exposed. The exposed resist film is developed. A developer solution used in developing the exposed resist film includes no less than 80% by mass of an organic solvent. The radiation-sensitive resin composition includes a first polymer and a radiation-sensitive acid generator. The first polymer includes a first structural unit having an acid-labile group and an alicyclic group. The alicyclic group is capable of avoiding dissociation from a molecular chain by an action of an acid. | 08-29-2013 |
20130224666 | RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION - A resist pattern-forming method includes coating a radiation-sensitive resin composition on a substrate to provide a resist film. The resist film is exposed. The exposed resist film is developed using a developer solution including no less than 80% by mass of an organic solvent. The radiation-sensitive resin composition includes a polymer and a radiation-sensitive acid generator. The polymer has a weight average molecular weight in terms of the polystyrene equivalent of greater than 6,000 and includes a first structural unit that includes an acid-labile group. The polymer includes less than 5 mol % or 0 mol % of a second structural unit that includes a hydroxyl group. | 08-29-2013 |
20130230803 | RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION - A resist pattern-forming method includes coating a radiation-sensitive resin composition on a substrate to provide a resist film. The resist film is exposed. The exposed resist film is developed with a developer solution including no less than 80% by mass of an organic solvent. The radiation-sensitive resin composition includes a base polymer, a fluorine-atom-containing polymer, a radiation-sensitive acid generator, a solvent, and a compound. The base polymer has an acid-labile group. The fluorine-atom-containing polymer has a content of fluorine atoms higher than a content of fluorine atoms of the base polymer. The compound has a relative permittivity greater than a relative permittivity of the solvent by at least 15. A content of the compound is no less than 10 parts by mass and no greater than 200 parts by mass with respect to 100 parts by mass of the base polymer. | 09-05-2013 |
20130230804 | PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE COMPOSITION - A pattern-forming method includes providing a resist film on a substrate using a radiation-sensitive composition. The resist film is exposed. The exposed resist film is developed using a developer solution. The developer solution includes no less than 80% by mass of an organic solvent. The radiation-sensitive composition includes at least two components including a first polymer and a radiation-sensitive acid generator. The first polymer includes a structural unit having an acid-labile group. One or more components of the radiation-sensitive composition have a group represented by a formula (1). A | 09-05-2013 |
20130295506 | RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION - A resist pattern-forming method includes forming a resist coating film using a radiation-sensitive resin composition. The resist coating film is exposed and developed using a developer solution containing no less than 80% by mass of an organic solvent. The radiation-sensitive resin composition includes a polymer component including a polymer having an acid-labile group, and a radiation-sensitive acid generator. The polymer component includes, in an identical polymer or different polymers, a first structural unit having a first hydrocarbon group, and a second structural unit having a second hydrocarbon group. The first hydrocarbon group is an unsubstituted or substituted branched chain group, or the is like. The second hydrocarbon group has an adamantane skeleton. A molar ratio of the second hydrocarbon group to the first hydrocarbon group is less than 1. A proportion of a structural unit having a hydroxyl group in the polymer component is less than 5 mol %. | 11-07-2013 |
20130316287 | PHOTORESIST COMPOSITION - A photoresist composition includes a base polymer, a polymer and an acid generator. The base polymer includes a first structural unit that includes an acid-labile group. The polymer includes a second structural unit that includes an acid-labile group, and has a fluorine atom content higher than a fluorine atom content of the base polymer. The photoresist composition is developed using an organic solvent. The second structural unit is represented by a formula (1) or a formula (2). R | 11-28-2013 |
20130323653 | RESIST PATTERN-FORMING METHOD - A resist pattern-forming method includes applying a radiation-sensitive resin composition on a substrate to form a resist film. The radiation-sensitive resin composition includes an acid-labile group-containing polymer and a photoacid generator. The resist film is exposed. The resist film is developed using a developer including an organic solvent in an amount of no less than 80% by mass to a total amount of the developer. The radiation-sensitive resin composition has a contrast value γ of from 5.0 to 30.0. The contrast value γ is calculated from a resist dissolution contrast curve obtained by changing only a dose of a light used for exposing the resist film. | 12-05-2013 |
20130337385 | NEGATIVE PATTERN-FORMING METHOD AND PHOTORESIST COMPOSITION - A negative pattern-forming method includes providing a resist film on a substrate using a photoresist composition. The photoresist composition includes a first polymer and an organic solvent. The first polymer includes a first structural unit having an acid-generating capability. The resist film is exposed. The exposed resist film is developed using a developer that includes an organic solvent. | 12-19-2013 |
20140134544 | RESIST PATTERN-FORMING METHOD - A resist pattern-forming method includes applying a resist underlayer film-forming composition to a substrate to form a resist underlayer film. The resist underlayer film-forming composition includes (A) a polysiloxane. A radiation-sensitive resin composition is applied to the resist underlayer film to form a resist film. The radiation-sensitive resin composition includes (a1) a polymer that changes in polarity and decreases in solubility in an organic solvent due to an acid. The resist film is exposed. The exposed resist film is developed using a developer that includes an organic solvent. | 05-15-2014 |
20140178825 | DEVELOPER - A developer includes an organic solvent and a nitrogen-containing compound. The developer is configured to develop a resist film to form a negative resist pattern. The resist film is formed using a photoresist composition. The photoresist composition includes a polymer and a radiation-sensitive acid generator. The polymer includes a structural unit including an acid-labile group. | 06-26-2014 |
20140255854 | PATTERN-FORMING METHOD - A pattern-forming method includes providing a resist film on a substrate using a photoresist composition. The resist film is exposed. The exposed resist film is developed using a developer having an organic solvent content of 80 mass % or more. The photoresist composition includes a first polymer, a second polymer, and an acid generator. The first polymer is a base polymer and includes a first structural unit that includes an acid-labile group. The second polymer includes a second structural unit that includes an acid-labile group, and has a fluorine atom content higher than a fluorine atom content of the first polymer. The second structural unit is represented by a formula (1) or a formula (2). | 09-11-2014 |
20140295350 | RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION - A resist pattern-forming method includes coating a radiation-sensitive resin composition on a substrate to provide a resist film. The resist film is exposed. The exposed resist film is developed using a developer solution including no less than 80% by mass of an organic solvent. The radiation-sensitive resin composition includes a polymer, a radiation-sensitive acid generator, and an acid diffusion controller which includes a compound having an amide group. The polymer has a weight average molecular weight in terms of the polystyrene equivalent of greater than 6,000 and includes a first structural unit that includes an acid-labile group. The polymer includes less than 5 mol % or 0 mol % of a second structural unit that includes a hydroxyl group. | 10-02-2014 |
20140363766 | RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION - A resist pattern-forming method includes forming a resist coating film using a radiation-sensitive resin composition. The resist coating film is exposed and developed using a developer solution containing no less than 80% by mass of an organic solvent. The radiation-sensitive resin composition includes a polymer component including a polymer having an acid-labile group, and a radiation-sensitive acid generator. The polymer component includes, in an identical polymer or different polymers, a first structural unit having a first hydrocarbon group, and a second structural unit having a second hydrocarbon group. The first hydrocarbon group is an unsubstituted or substituted branched chain group, or the is like. The second hydrocarbon group has an adamantane skeleton. A molar ratio of the second hydrocarbon group to the first hydrocarbon group is less than 1. A proportion of a structural unit having a hydroxyl group in the polymer component is less than 5 mol %. | 12-11-2014 |
20150050600 | RESIST PATTERN-FORMING METHOD - A resist pattern-forming method includes applying a resist underlayer film-forming composition to a substrate to form a resist underlayer film. The resist underlayer film-forming composition includes (A) a polysiloxane. A radiation-sensitive resin composition is applied to the resist underlayer film to form a resist film. The radiation-sensitive resin composition includes (a1) a polymer that changes in polarity and decreases in solubility in an organic solvent due to an acid. The resist film is exposed. The exposed resist film is developed using a developer that includes an organic solvent. | 02-19-2015 |
20150160556 | RESIST PATTERN-FORMING METHOD - A resist pattern-forming method includes applying a resist underlayer film-forming composition to a substrate to form a resist underlayer film. The resist underlayer film-forming composition includes (A) a polysiloxane. A radiation-sensitive resin composition is applied to the resist underlayer film to form a resist film. The radiation-sensitive resin composition includes (a1) a polymer that changes in polarity and decreases in solubility in an organic solvent due to an acid. The resist film is exposed. The exposed resist film is developed using a developer that includes an organic solvent. | 06-11-2015 |
20150177616 | PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE COMPOSITION - A pattern-forming method includes providing a resist film on a substrate using a radiation-sensitive composition. The resist film is exposed. The exposed resist film is developed using a developer solution. The developer solution includes no less than 80% by mass of an organic solvent. The radiation-sensitive composition includes at least two components including a first polymer and a radiation-sensitive acid generator. The first polymer includes a structural unit having an acid-labile group. One or more components of the radiation-sensitive composition have a group represented by a formula (1). A | 06-25-2015 |
20160097978 | RESIST PATTERN-FORMING METHOD - A resist pattern-forming method includes applying a resist underlayer film-forming composition to a substrate to form a resist underlayer film. The resist underlayer film-forming composition includes (A) a polysiloxane. A radiation-sensitive resin composition is applied to the resist underlayer film to form a resist film. The radiation-sensitive resin composition includes (a1) a polymer that changes in polarity and decreases in solubility in an organic solvent due to an acid. The resist film is exposed. The exposed resist film is developed using a developer that includes an organic solvent. | 04-07-2016 |
Hiroki Sakakibara, Tokyo JP
Patent application number | Description | Published |
---|---|---|
20090014900 | Equipment and process for the production of carbonated water - A process for producing carbonated water having a high concentration, inexpensively and easily, involves using a static mixer having 20 to 100 elements so as to provide a value Re×N of 100,000 to 2,000,000, in with Re represents a Reynolds number, when a mixture of water and carbonic acid gas flow in the static mixer. | 01-15-2009 |
20090039534 | Apparatus for producing carbonated water and method for producing carbonated water using the same - This invention concerns an apparatus and a method for producing carbonated water capable of obtaining high concentration carbonated water effectively. Carbon dioxide gas is passed through a first carbon dioxide gas dissolver composed of a membrane module to be dissolved in water and the carbonated water passing through the first carbon dioxide gas dissolver is passed through a static mixer, which is a second carbon dioxide gas dissolver. Consequently, a high concentration carbonated water can be obtained remarkably, effectively and easily with a simpler structure than conventionally. | 02-12-2009 |
20110123402 | CARBONATE SPRING PRODUCING SYSTEM - A carbonate spring producing system includes a gas-liquid separator ( | 05-26-2011 |
Hiroshi Sakakibara, Tokyo JP
Patent application number | Description | Published |
---|---|---|
20080274248 | Device and method for manufacturing carbonated spring and carbonic water, control method for gas density applied thereto and membrane module - Hot water is pumped by a suction pump and introduced into a carbon dioxide (CO | 11-06-2008 |
Kazuya Sakakibara, Tokyo JP
Patent application number | Description | Published |
---|---|---|
20140030065 | Steam Turbine, and Steam Turbine Stationary Blade - The present invention is a steam turbine comprising a turbine stage having a stationary blade and a moving blade provided on the downstream side of the stationary blade in a working fluid flow direction, wherein the stationary blade is formed in a hollow blade shape by deformation processing a metal plate, and wherein a slit to guide liquid droplets deposited on a blade wall surface to the inside of the blade is formed in the blade wall by overlaying an airfoil suction-side metal plate and an airfoil pressure-side metal plate with a gap therebetween in a blade tail part of the stationary blade. | 01-30-2014 |
Ken Sakakibara, Tokyo JP
Patent application number | Description | Published |
---|---|---|
20080244070 | SYSTEM, METHOD AND PROGRAM FOR NETWORK MANAGEMENT - A network management system transmits/receives an email via a network; saves, in a database, first history information including the address of at least one of the destination and the source of the email written in the email; receives transmission information in which access information for accessing a web page via a network is written; saves, in the database, second history information including the access information written in the transmission information; inputs authentication information for identifying a user; and selectively displays the first history information saved in the first saving unit and the second history information saved in the second saving unit in a predetermined display format on a display unit by switching between the first history information and the second history information based on an instruction inputted by a user when the inputted authentication information is identical to previously registered information. | 10-02-2008 |
Kenichi Sakakibara, Tokyo JP
Patent application number | Description | Published |
---|---|---|
20090161456 | Semiconductor memory device which delays refreshment signal for performing self-refreshment - A semiconductor memory device having two refreshment modes of auto-refreshment and partial self-refreshment imposed on memory cells includes a command decoder which detects one of the refreshment modes from an input command, outputs type data which indicates the detected refreshment mode, and outputs a refreshment signal which indicates the start of refreshment; a mode register in which the type data is set; a signal selection circuit which determines whether or not the refreshment signal is to be delayed, in accordance with the type data set in the mode register, and outputs the refreshment signal, which is delayed or not delayed in accordance with the result of the determination, as a refreshment start signal; and a control circuit which reads the type data set in the mode register based when receiving the refreshment start signal, and performs refreshment corresponding to the type data. | 06-25-2009 |
20120263003 | DEVICE PERFORMING REFRESH OPERATIONS OF MEMORY AREAS - Disclosed herein is a device that includes a plurality of memory circuits and a refresh control circuit configured to generate a plurality of refresh initiation signals such that one of the refresh initiation signals takes an active level. Each of the memory circuits comprises a memory cell array including a plurality of memory cells, at least one data terminal, a data read/write circuit performing a data read operation to read out read-data from a selected one of the memory cells and supply the read-data to the data terminal and a data write operation to receive write-data from the data terminal and write the write-data into a selected one of the memory cells, and a refresh circuit performing a data refresh operation on selected one or ones of the memory cells of the memory cell array in response to an associated one of the refresh initiation signals taking the active level. | 10-18-2012 |
20130114364 | SEMICONDUCTOR DEVICE PERFORMING REFRESH OPERATION - Disclosed herein is a device that includes a first semiconductor chip. The first semiconductor chip includes a first data storage area storing data, a first refresh circuit repeating a first refresh operation on the first data storage area to make the first data storage area retain the data, a first terminal supplied with a first control signal from outside of the first semiconductor chip, and a first control circuit coupled between the first terminal and the first refresh circuit to control a repetition cycle of the first refresh operation in response to the first control signal. | 05-09-2013 |
20150063050 | SEMICONDUCTOR DEVICE PERFORMING REFRESH OPERATION - Disclosed herein is a device that includes a first semiconductor chip. The first semiconductor chip includes a first data storage area storing data, a first refresh circuit repeating a first refresh operation on the first data storage area to make the first data storage area retain the data, a first terminal supplied with a first control signal from outside of the first semiconductor chip, and a first control circuit coupled between the first terminal and the first refresh circuit to control a repetition cycle of the first refresh operation in response to the first control signal. | 03-05-2015 |
20150109872 | DEVICE PERFORMING REFRESH OPERATIONS OF MEMORY AREAS - Disclosed heroin is a device that includes a plurality of memory circuits and a refresh control circuit configured to generate a plurality of refresh initiation signals such that one of the refresh initiation signals takes an active level. Each of the memory circuits comprises a memory cell array including a plurality of memory cells, at least one data terminal, a data read/write circuit performing a data read operation to read out read-data from a selected one of the memory cells and supply the read-data to the data terminal and a data write operation to receive write-data from the data terminal and write the write-data into a selected one of the memory cells, and a refresh circuit performing a data refresh operation on selected one or ones of the memory cells of the memory cell array in response to an associated one of the refresh initiation signals taking the active level. | 04-23-2015 |
Kenji Sakakibara, Tokyo JP
Patent application number | Description | Published |
---|---|---|
20100045293 | SUPERCONDUCTIVE MAGNETIC DEVICE, MAGNETIC RESONANCE IMAGING APPARATUS AND MAGNETIC FIELD INHOMOGENEITY COMPENSATION METHOD - The magnetic field homogeneity adjusting device ( | 02-25-2010 |
20120188156 | OPERATION MEMBER PROVIDED IN ELECTRONIC DEVICE, AND ELECTRONIC DEVICE - An operation member and an electronic device capable of maintaining operability while enhancing cushioning properties provided in the outer surface of an operation member are provided. An operation stick has a cushion portion and a base portion on which the cushion portion is placed. The base portion is supported to be movable. The base portion has a frame portion surrounding the outer periphery of the cushion portion. The base portion and the frame portion are formed of a material having a higher rigidity than that of the material of the cushion portion. | 07-26-2012 |
20120188694 | PORTABLE ELECTRONIC DEVICE - An electronic device ( | 07-26-2012 |
20120306789 | PORTABLE ELECTRONIC DEVICE - An electronic device includes a front panel made of resin. The front panel is disposed on the front side of an organic electroluminescent display panel and functions as the front surface of the electronic device; and an adhesive agent layer formed between the organic electroluminescent display panel and the front panel. The organic electroluminescent display panel is fixed to the front panel via the adhesive agent layer. This structure is able to reduce a load applied to the organic electroluminescent display panel and ensure shock resistance for the organic electroluminescent display panel. | 12-06-2012 |
20140141885 | PORTABLE ELECTRONIC DEVICE - An electronic device ( | 05-22-2014 |
20140340312 | OPERATION MEMBER PROVIDED IN ELECTRONIC DEVICE, AND ELECTRONIC DEVICE - An operation member and an electronic device capable of maintaining operability while enhancing cushioning properties provided in the outer surface of an operation member are provided. An operation stick has a cushion portion and a base portion on which the cushion portion is placed. The base portion is supported to be movable. The base portion has a frame portion surrounding the outer periphery of the cushion portion. The base portion and the frame portion are formed of a material having a higher rigidity than that of the material of the cushion portion. | 11-20-2014 |
20150085435 | PORTABLE TYPE ELECTRONIC DEVICE, PORTABLE TYPE ELECTRONIC DEVICE GROUP, AND METHOD OF MANUFACTURING PORTABLE TYPE ELECTRONIC DEVICE - A first antenna ( | 03-26-2015 |
20150301134 | MAGNETIC RESONANCE IMAGING APPARATUS AND OPERATING METHOD OF COOLING FAN MOTOR OF MAGNETIC RESONANCE IMAGING APPARATUS - To prevent image quality deterioration of an image due to a variable magnetic field generated by a fan motor provided in a position where a measuring magnetic field leaks, a magnetic resonance imaging apparatus has a gantry including a static magnetic field generating magnet; a gradient magnetic field generating coil; and an irradiation coil, a table for placing the object, and an input/output device including a display device and is provided with at least a pair of cooling fan motors arranged almost symmetrically to the central axis that extends along the long-axis direction of the cylindrical space and is located in the center in the horizontal direction of the static magnetic field generating magnet or the vertical plane passing through the central axis. | 10-22-2015 |
Kiyohiko Sakakibara, Tokyo JP
Patent application number | Description | Published |
---|---|---|
20080217786 | Semiconductor device and method of manufacturing semiconductor device - According to one embodiment of the present invention, a method of manufacturing a semiconductor device includes below steps. | 09-11-2008 |
20100159690 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE THAT USES BOTH A NORMAL PHOTOMASK AND A PHASE SHIFT MASK FOR DEFINING INTERCONNECT PATTERNS - According to one embodiment of the present invention, a method of manufacturing a semiconductor device includes below steps. | 06-24-2010 |
Makoto Sakakibara, Tokyo JP
Patent application number | Description | Published |
---|---|---|
20150041648 | PATTERN CRITICAL DIMENSION MEASUREMENT EQUIPMENT AND METHOD FOR MEASURING PATTERN CRITICAL DIMENSION - Pattern critical dimension measurement equipment includes an electron source configured to generate a primary electron beam, a deflector configured to deflect the primary electron beam emitted from the electron source, a focusing lens configured to focus the primary electron beam deflected by the deflector, a decelerator configured to decelerate the primary electron beam that irradiates the sample, a first detector located between the electron source and the focusing lens, the first detector being configured to detect electrons at part of azimuths of electrons generated from the sample upon irradiation of the sample with the primary electron beam, and a second detector located between the electron source and the first detector, the second detector being configured to detect electrons at substantially all azimuths of the electrons generated from the sample. | 02-12-2015 |
20150228443 | CHARGED PARTICLE BEAM APPARATUS - A charged particle beam apparatus includes a charged particle beam source which irradiates a sample with a charged particle beam, an electromagnetic lens, a lens control electric source for controlling strength of a convergence effect of the electromagnetic lens; and a phase compensation circuit which is connected to the lens control electric source in parallel with the electromagnetic lens, and controls a lens current at the time of switching the strength of the convergence effect of the electromagnetic lens such that the lens current monotonically increases or monotonically decreases. | 08-13-2015 |
Masato Sakakibara, Tokyo JP
Patent application number | Description | Published |
---|---|---|
20140177131 | HIGH VOLTAGE CAPACITOR - A high voltage capacitor comprises a columnar capacitor element body, made of a dielectric material, having a pair of principal surfaces opposing each other; a pair of electrodes arranged on the respective principal surfaces; a pair of terminal metal fittings connected to the respective electrodes; a case; and a resin part. The case contains a resin material and has a bottom part formed with an opening for exposing the terminal metal fitting and a trunk part extending from an edge of the bottom part in a direction intersecting the bottom part. The bottom part and trunk part define a space for containing the capacitor element body. The resin part is made of an insulating material and arranged within the case so as to seal the capacitor element body within the case. The case has a degree of hardness lower than that of the resin part. | 06-26-2014 |
Masayoshi Sakakibara, Tokyo JP
Patent application number | Description | Published |
---|---|---|
20130184852 | NUMERICAL CONTROL DEVICE - A numerical control device including a collision determining unit that detects a possibility of collision between a machine and an area set as an entry prohibited area; an operation-continuation instructing unit that instructs whether to continue an operation when the collision determining unit detects the possibility of collision and shaft movement is temporarily stopped; a machining-information storage unit that stores internal operation information of the numerical control device regarding the temporary stop when the operation-continuation instructing unit instructs continuation of the operation; and a collision-determination processing unit that invalidates a collision determination on the basis of the operation information stored in the machining-information storage unit when executing the same machining program the next and subsequent times | 07-18-2013 |
Mizuho Sakakibara, Tokyo JP
Patent application number | Description | Published |
---|---|---|
20090257589 | MONITORING CAMERA SYSTEM, IMAGING DEVICE, AND VIDEO DISPLAY DEVICE - An imaging device ( | 10-15-2009 |
20110030138 | BED - A movable bed of the present invention, which includes a mat portion of a bed to lie thereon, and is composed of a fixed portion and a moving portion, is designed as a wheel chair in such a manner that the moving portion can be separated from or joined to the fixed portion and be transformed from a lying posture state to a sitting posture state, and when the moving portion is joined to the fixed portion so as to form the movable bed, an upper surface of a resting portion, allowing a person to carry thereon, of the moving portion and an inner surface of an armrest portion are configured to form a mat surface of the mat portion of the movable bed. | 02-10-2011 |
20120283929 | RIDING TYPE VEHICLE AND METHOD OF CONTROLLING RIDING TYPE VEHICLE - A vehicle includes a contact-position-dependent type operational intention determining unit that detects a change in posture of a rider using posture sensors for a backrest disposed in areas of a backrest with which left and right shoulder blades of the rider come into contact, and thereby determines whether there is an operational intention of the rider; and a left-right amount-of-change comparison type turn intention determining unit that determines, only when it is determined that there is an operational intention, whether there is a left or right turn intention of the rider from a difference between sensor output values located left-right symmetrically. | 11-08-2012 |
20120330237 | SYRINGE DRIVE DEVICE - A syringe drive device | 12-27-2012 |
20130038634 | INFORMATION DISPLAY DEVICE - An information display device includes: an image display unit that displays an image according to an orientation of a display screen; a terminal posture detection unit that detects a posture of the device using an acceleration sensor, an angular velocity sensor, and a geomagnetic sensor; and a display direction determination unit that determines whether or not the posture of the device changes, and determines the orientation of the display screen. In the case where the display screen is substantially horizontal and the posture of the device changes, the orientation of the display screen is determined so that, when the device moves by a predetermined angle or more with respect to the orientation (reference orientation) of the display screen before the determination of the posture change, a side of the device at the predetermined angle or more from the reference orientation corresponds to the top of the display screen. | 02-14-2013 |
20130247117 | COMMUNICATION DEVICE - A mobile device includes a position sensing unit, a remote control information obtainment unit, and a storage unit. Position information obtained by the position sensing unit is stored in the storage unit in association with remote control information. The mobile device further includes a directional space obtainment unit and an apparatus specification unit. The mobile device recognizes a direction pointed by a user using the mobile device, and enables operation of a terminal apparatus existing in the pointing direction. | 09-19-2013 |
20150082537 | WHEELCHAIR AND BED TO BE COMBINED WITH THE SAME - A wheelchair includes a first seat portion and a second armrest rotatably fixed to a first support portion of the first seat portion, a first rotation axis of this second armrest is arranged on an imaginary plane perpendicular to a back bottom support surface and parallel to the front and rear direction of the first seat portion so as to make a predetermined angle with respect to the back bottom support surface. | 03-26-2015 |
20150310736 | COMMUNICATION DEVICE - A mobile device includes a position sensing unit, a remote control information obtainment unit, and a storage unit. Position information obtained by the position sensing unit is stored in the storage unit in association with remote control information. The mobile device further includes a directional space obtainment unit and an apparatus specification unit. The mobile device recognizes a direction pointed by a user using the mobile device, and enables operation of a terminal apparatus existing in the pointing direction. | 10-29-2015 |
Naoya Sakakibara, Tokyo JP
Patent application number | Description | Published |
---|---|---|
20160086280 | EVALUATION METHOD, EVALUATION DEVICE, AND PROGRAM - An investment judgement support server refers a website ranking of a corresponding website for each search term in a search term group ranking list as a ranking reference destination, sums a multiplication result obtained by multiplying a click through rate, which corresponds to the referred ranking of each search term, by a search volume of each search term, and makes a division result of dividing a sum of the multiplication result by a sum of the search volume of each search term a click share rate that is unique to the search term group ranking list as the ranking reference destination in the corresponding website. | 03-24-2016 |
Shigeshi Sakakibara, Tokyo JP
Patent application number | Description | Published |
---|---|---|
20160089652 | SMALL REACTOR AND REACTION DEVICE - A small reactor, which contains an inorganic transparent substrate, which contains: a reaction channel configured to allow a chemical reaction to proceed therein; a supply channel, which is connected to one end of the reaction channel, and is configured to supply samples to be reacted in the reaction channel; and a discharge channel, which is connected to the other end of the reaction channel, and is configured to discharge a reaction product from the reaction channel, wherein the inorganic transparent substrate is in the shape of an arc-shaped curve. | 03-31-2016 |
Tadashi Sakakibara, Tokyo JP
Patent application number | Description | Published |
---|---|---|
20110244956 | IMAGE GENERATION SYSTEM, IMAGE GENERATION METHOD, AND INFORMATION STORAGE MEDIUM - An image generation system includes an image information acquisition section that acquires image information from an image sensor, an information acquisition section that acquires position information about a player relative to a display section that displays an image or the image sensor based on the image information, a virtual camera control section that controls at least one of a distance between a character corresponding to the player and a virtual camera in a depth direction, a distance between the character and the virtual camera in a height direction, a distance between the character and the virtual camera in a transverse direction, and an angle of view of the virtual camera, based on the position information about the player acquired by the information acquisition section, and an image generation section that generates an image viewed from the virtual camera in an object space. | 10-06-2011 |
20110304540 | IMAGE GENERATION SYSTEM, IMAGE GENERATION METHOD, AND INFORMATION STORAGE MEDIUM - An image generation system includes an image information acquisition section that acquires image information from an image sensor, a motion information acquisition section that acquires motion information about an operator based on the image information from the image sensor, an object control section that moves an object in a movement area based on the motion information about the operator, and an image generation section that generates an image displayed on a display section. The object control section limits movement of the object so that the object does not move beyond a movement limiting boundary set in the movement area even when it has been determined that the object has moved beyond the movement limiting boundary based on the motion information. | 12-15-2011 |
20110305398 | IMAGE GENERATION SYSTEM, SHAPE RECOGNITION METHOD, AND INFORMATION STORAGE MEDIUM - An image generation system includes a moving path data acquisition section that acquires moving path data about a shape input indicator, a moving path data storage section that stores the moving path data acquired by the moving path data acquisition section, and a shape recognition section that performs a shape recognition process on an input shape that has been input using the shape input indicator based on the moving path data. The shape recognition section performs the shape recognition process on the input shape that has been input using the shape input indicator based on the moving path data in each of first to Nth (1≦K12-15-2011 | |
20110306420 | IMAGE GENERATION SYSTEM, IMAGE GENERATION METHOD, AND INFORMATION STORAGE MEDIUM - An image generation system includes an image information acquisition section that acquires image information from an image sensor, a skeleton information acquisition section that acquires skeleton information based on the image information from the image sensor, the skeleton information specifying a motion of an operator, a reliability information acquisition section that acquires reliability information that indicates reliability of the skeleton information, and an image generation section that generates an image displayed on a display section. The image generation section generates an image corresponding to the acquired reliability information as the image displayed on the display section. | 12-15-2011 |
20110306421 | IMAGE GENERATION SYSTEM, IMAGE GENERATION METHOD, AND INFORMATION STORAGE MEDIUM - An image generation system includes an image information acquisition section that acquires image information from an image sensor, a motion information acquisition section that acquires motion information about an operator based on the image information from the image sensor, a correction section that performs a correction process on the motion information based on at least one of an aspect ratio of the image sensor and an aspect ratio of a display section, and an image generation section that generates an image displayed on the display section. | 12-15-2011 |
20110306422 | IMAGE GENERATION SYSTEM, IMAGE GENERATION METHOD, AND INFORMATION STORAGE MEDIUM - An image generation system includes an image information acquisition section that acquires image information from an image sensor, a skeleton information acquisition section that acquires skeleton information based on the image information from the image sensor, the skeleton information specifying a motion of an operator viewed from the image sensor, a correction section that performs a correction process on position information about a bone of a skeleton indicated by the skeleton information, and an image generation section that generates an image based on a result of the correction process. | 12-15-2011 |
20150375105 | GAME SYSTEM - A game system includes at least one game device, a control section that is communicably connected to the game device, and a projection section that includes at least one projection device that projects a projection image onto a projection target object. The control section performs a control process that controls the game device and a projection control process that controls projection of the projection image. The projection section projects a game image generated by the game device and a created image created by the control section onto the projection target object as the projection image. | 12-31-2015 |
Teigo Sakakibara, Tokyo JP
Patent application number | Description | Published |
---|---|---|
20100255189 | METHOD OF PRODUCING OPTICAL FILM AND COATING LIQUID FOR PRODUCTION OF OPTICAL FILM - Provided is a method of producing an optical film which has an excellent strength and a low refractive index, and can be used for an optical antireflective film. The production method includes preparing a coating liquid including a capsule having a shell of a halogenated compound of an element of Group 2 by forming an emulsion of one of an aqueous solution including a compound containing an element of Group 2 and an aqueous solution including a compound containing a halogen, and an organic solvent, applying the coating liquid on a substrate, and heating the coating liquid, thereby forming an optical film containing a hollow particle having the shell of a halogenated compound of an element of Group 2. | 10-07-2010 |
20110027577 | METHOD OF PRODUCING MAGNESIUM FLUORIDE COATING, ANTIREFLECTION COATING, AND OPTICAL ELEMENT - A method of producing a magnesium fluoride coating includes a step of forming a coating by applying a solution containing a fluorine-containing organic magnesium compound represented by the following formula to a base and a step of heat-treating the coating while the coating is being irradiated with a beam of light with a wavelength of 246 nm or less: | 02-03-2011 |
20130094090 | COATING LIQUID, METHOD FOR MANUFACTURING OPTICAL COMPONENT, AND PHOTOGRAPHIC OPTICAL SYSTEM - A coating liquid including a fluorine-containing organic magnesium compound represented by the following chemical formula (1), a method for manufacturing an optical component having an optical film obtained from the coating liquid, and a photographic optical system are disclosed: | 04-18-2013 |
20130156973 | METHOD OF PRODUCING MAGNESIUM FLUORIDE COATING, ANTIREFLECTION COATING, AND OPTICAL ELEMENT - A method of producing a magnesium fluoride coating includes a step of forming a coating by applying a solution containing a fluorine-containing organic magnesium compound represented by the following formula to a base and a step of heat-treating the coating while the coating is being irradiated with a beam of light with a wavelength of 246 nm or less: | 06-20-2013 |
Tsuyoshi Sakakibara, Tokyo JP
Patent application number | Description | Published |
---|---|---|
20160061943 | RECEPTION SIGNAL PROCESSING DEVICE, RADAR, AND OBJECT DETECTION METHOD - A signal processing device according to an embodiment includes a plurality of signal processing units and a pseudo signal generating unit. The plurality of signal processing units are provided in a plurality of reception antennas which receive reflection signals of a transmission signal reflected on an object, and perform signal processing in parallel on beat signals which are generated based on the transmission signal and the reflections signals. The pseudo signal generating unit generates a pseudo signal imitating the beat signal, and inputs the pseudo signal as a target of the signal processing into the plurality of signal processing units in parallel. | 03-03-2016 |
Yoshinobu Sakakibara, Tokyo JP
Patent application number | Description | Published |
---|---|---|
20150123002 | DOSAGE RATE MEASUREMENT SYSTEM AND DOSAGE RATE MEASUREMENT METHOD - Provided is a measurement unit and measurement method for reducing attenuation due to optical fiber length and SN degradation due to background in a dosage rate monitor that uses optical fiber. This system comprises: a radiation detector for detecting radiation dosage; a light source for irradiating stimulating light on the radiation detector; a photodetector for detecting light generated by the radiation detector; an optical fiber for connecting the photodetector and the radiation detector and light source, and transmitting light from the light source and light from the radiation detector; a measurement unit for counting the pulses outputted from the photodetector; and an analysis unit for extracting the luminous energy originating from the radiation detector, from time information, wave height information, and the count value, which are measurement results obtained by the measurement unit, and converting the luminous energy to a dosage and dosage rate. | 05-07-2015 |
Yuhiro Sakakibara, Tokyo JP
Patent application number | Description | Published |
---|---|---|
20130171740 | REAGENT COMPOSITION FOR NUCLEIC ACID CHROMATOGRAPHY OR IMMUNOCHROMATOGRAPHY, METHOD FOR MEASUREMENT BY NUCLEIC ACID CHROMATOGRAPHY OR IMMUNOCHROMATOGRAPHY, AND KIT FOR MEASUREMENT BY NUCLEIC ACID CHROMATOGRAPHY OR IMMUNOCHROMATOGRAPHY - A reagent composition for nucleic acid chromatography or immunochromatography which includes a water-soluble polymer having a weight average molecular weight of 8,000 or more, a salt of a divalent or trivalent metal, a nonionic surfactant, and an aprotic water-soluble organic compound. The reagent composition is capable of determining an analyte accurately and rapidly even when it has a low concentration in a measurement by nucleic acid chromatography or immunochromatography, by reducing the binding of components other than the analyte through a non-specific reaction and enhancing the dispersion capability of the analyte to improve the developability on a chromatography carrier and to promote a specific reaction. | 07-04-2013 |
Yuichi Sakakibara, Tokyo JP
Patent application number | Description | Published |
---|---|---|
20150323896 | IMAGE-FORMING APPARATUS - An image-forming apparatus includes an apparatus main body, a cartridge, a movable member, including an attachment portion for attachment of the cartridge, configured to be movable relative to the apparatus main body in a state such that the cartridge is attached to the attachment portion, a protection member configured to protect the cartridge, an engagement member, provided in the cartridge, configured to be movable to an engagement position where an engagement state of the protection member with the cartridge is secured by the engagement member engaging with the protection member, and to a release position where engagement between the protection member and the engagement member is released and removal of the protection member from the cartridge is allowed, and a release member configured to move the engagement member from the engagement position to the release position by abutting the engagement member, when the cartridge is attached to the attachment portion. | 11-12-2015 |
Yuzuru Sakakibara, Tokyo JP
Patent application number | Description | Published |
---|---|---|
20120015229 | LAMINATED SEPARATOR, POLYOLEFIN MICROPOROUS MEMBRANE, AND SEPARATOR FOR ELECTRICITY STORAGE DEVICE - Disclosed is a laminated separator including a first polyolefin microporous layer and a second polyolefin microporous layer which is laminated on the first polyolefin microporous layer and which is different from the first polyolefin microporous layer, wherein at least one of the first microporous layer and the second microporous layer includes an inorganic particle having a primary particle size of 1 nm or more and 80 nm or less. | 01-19-2012 |
20140329127 | Laminated Separator, Polyolefin Microporous Membrane, and Separator for Electricity Storage Device - Disclosed is a laminated separator including a first polyolefin microporous layer and a second polyolefin microporous layer which is laminated on the first polyolefin microporous layer and which is different from the first polyolefin microporous layer, wherein at least one of the first microporous layer and the second microporous layer includes an inorganic particle having a primary particle size of 1 nm or more and 80 nm or less. | 11-06-2014 |
20140329128 | Laminated Separator, Polyolefin Microporous Membrane, and Separator for Electricity Storage Device - Disclosed is a laminated separator including a first polyolefin microporous layer and a second polyolefin microporous layer which is laminated on the first polyolefin microporous layer and which is different from the first polyolefin microporous layer, wherein at least one of the first microporous layer and the second microporous layer includes an inorganic particle having a primary particle size of 1 nm or more and 80 nm or less. | 11-06-2014 |
20140329129 | Laminated Separator, Polyolefin Microporous Membrane, and Separator for Electricity Storage Device - Disclosed is a laminated separator including a first polyolefin microporous layer and a second polyolefin microporous layer which is laminated on the first polyolefin microporous layer and which is different from the first polyolefin microporous layer, wherein at least one of the first microporous layer and the second microporous layer includes an inorganic particle having a primary particle size of 1 nm or more and 80 nm or less. | 11-06-2014 |