Patent application number | Description | Published |
20140030444 | HIGH PRESSURE, HIGH POWER PLASMA ACTIVATED CONFORMAL FILM DEPOSITION - Methods and apparatus for depositing a film on a substrate surface including plasma assisted surface mediated reactions in which a film is grown over one or more cycles of reactant adsorption and reaction are provided. The embodiments disclosed herein relate to methods and apparatus for performing conformal film deposition and atomic layer deposition reactions that result in highly uniform films with low particle contamination. According to various embodiments, the methods and apparatus involve high deposition chamber pressures and plasma generation using high radio frequency powers. | 01-30-2014 |
20160032453 | SYSTEMS AND METHODS FOR VAPOR DELIVERY - A vapor delivery system includes an ampoule to store liquid precursor and a heater to partially vaporize the liquid precursor. A first valve communicates with a push gas source and the ampoule. A second valve supplies vaporized precursor to a heated injection manifold. A valve manifold includes a first node in fluid communication with an outlet of the heated injection manifold, a third valve having an inlet in fluid communication with the first node and an outlet in fluid communication with vacuum, a fourth valve having an inlet in fluid communication with the first node and an outlet in fluid communication with a second node, a fifth valve having an outlet in fluid communication with the second node, and a sixth valve having an outlet in fluid communication with the second node. A gas distribution device is in fluid communication with the second node. | 02-04-2016 |
20160035566 | METHODS AND APPARATUSES FOR SHOWERHEAD BACKSIDE PARASITIC PLASMA SUPPRESSION IN A SECONDARY PURGE ENABLED ALD SYSTEM - Disclosed are methods of depositing films of material on semiconductor substrates employing the use of a secondary purge. The methods may include flowing a film precursor into a processing chamber and adsorbing the film precursor onto a substrate in the processing chamber such that the precursor forms an adsorption-limited layer on the substrate. The methods may further include removing at least some unadsorbed film precursor from the volume surrounding the adsorbed precursor by purging the processing chamber with a primary purge gas, and thereafter reacting adsorbed film precursor while a secondary purge gas is flowed into the processing chamber, resulting in the formation of a film layer on the substrate. The secondary purge gas may include a chemical species having an ionization energy and/or a disassociation energy equal to or greater than that of O | 02-04-2016 |
20160079036 | Systems and Methods for Suppressing Parasitic Plasma and Reducing Within-Wafer Non-Uniformity - A substrate processing system for depositing film on a substrate includes a processing chamber defining a reaction volume. A showerhead includes a stem portion having one end connected adjacent to an upper surface of the processing chamber. A base portion is connected to an opposite end of the stem portion and extends radially outwardly from the stem portion. The showerhead is configured to introduce at least one of process gas and purge gas into the reaction volume. A plasma generator is configured to selectively generate RF plasma in the reaction volume. An edge tuning system includes a collar and a parasitic plasma reducing element that is located around the stem portion between the collar and an upper surface of the showerhead. The parasitic plasma reducing element is configured to reduce parasitic plasma between the showerhead and the upper surface of the processing chamber. | 03-17-2016 |
20160079057 | SYSTEMS AND METHODS FOR REDUCING BACKSIDE DEPOSITION AND MITIGATINGTHICKNESS CHANGES AT SUBSTRATE EDGES - A substrate processing system for depositing film on a substrate includes a processing chamber defining a reaction volume and including a substrate support for supporting the substrate. A gas delivery system is configured to introduce process gas into the reaction volume of the processing chamber. A plasma generator is configured to selectively generate RF plasma in the reaction volume. A clamping system is configured to clamp the substrate to the substrate support during deposition of the film. A backside purging system is configured to supply a reactant gas to a backside edge of the substrate to purge the backside edge during the deposition of the film. | 03-17-2016 |
Patent application number | Description | Published |
20150126042 | SOFT LANDING NANOLAMINATES FOR ADVANCED PATTERNING - Methods for depositing nanolaminate protective layers over a core layer to enable deposition of high quality conformal films over the core layer for use in advanced multiple patterning schemes are provided. In certain embodiments, the methods involve depositing a thin silicon oxide or titanium oxide film using plasma-based atomic layer deposition techniques with a low high frequency radio frequency (HFRF) plasma power, followed by depositing a conformal titanium oxide film or spacer with a high HFRF plasma power. | 05-07-2015 |
20150247238 | RF CYCLE PURGING TO REDUCE SURFACE ROUGHNESS IN METAL OXIDE AND METAL NITRIDE FILMS - Methods of reducing particles in semiconductor substrate processing are provided herein. Methods involve performing a precursor-free radio frequency cycle purge without a substrate in the process chamber by introducing a gas without a precursor into the process chamber through the showerhead and igniting a plasma one or more times after a film is deposited on the substrate by introducing a vaporized liquid precursor to the process chamber. | 09-03-2015 |
20150315706 | LOW VOLUME SHOWERHEAD WITH POROUS BAFFLE - A low volume showerhead in a semiconductor processing apparatus can include a porous baffle to improve the flow uniformity and purge time during atomic layer deposition. The showerhead can include a plenum volume, one or more gas inlets in fluid communication with the plenum volume, a faceplate including a plurality of first through-holes for distributing gas onto a substrate in the semiconductor processing apparatus, and a porous baffle positioned in a region between the plenum volume and the one or more gas inlets. The one or more gas inlets can include a stem having a small volume to improve purge time. The baffle can be porous and positioned between the stem and the plenum volume to improve flow uniformity and avoid jetting. | 11-05-2015 |
20160052651 | FILL ON DEMAND AMPOULE - Methods and apparatus for use of a fill on demand ampoule are disclosed. The fill on demand ampoule may refill an ampoule with precursor concurrent with the performance of other deposition processes. The fill on demand may keep the level of precursor within the ampoule at a relatively constant level. The level may be calculated to result in an optimum head volume. The fill on demand may also keep the precursor at a temperature near that of an optimum precursor temperature. The fill on demand may occur during parts of the deposition process where the agitation of the precursor due to the filling of the ampoule with the precursor minimally effects the substrate deposition. Substrate throughput may be increased through the use of fill on demand. | 02-25-2016 |
20160090650 | METHOD AND APPARATUS FOR RF COMPENSATION IN PLASMA ASSISTED ATOMIC LAYER DEPOSITION - The embodiments herein relate to methods, apparatus, and systems for depositing film on substrates. In these embodiments, the substrates are processed in batches. Due to changing conditions within a reaction chamber as additional substrates in the batch are processed, various film properties may trend over the course of a batch. Disclosed herein are methods and apparatus for minimizing the trending of film properties over the course of a batch. More specifically, film property trending is minimized by changing the amount of RF power used to process substrates over the course of the batch. Such methods are sometimes referred to as RF compensation methods. | 03-31-2016 |
Patent application number | Description | Published |
20100234466 | Compositions and Methods for Reducing Body Fat - The present invention relates to compositions, such as bimatoprost, latanoprost and travoprost, and methods to reduce fat in the body of an individual, for example, by topical administration, injection, and/or implantation of such compositions. | 09-16-2010 |
20140163098 | COMPOSITIONS AND METHODS FOR REDUCING BODY FAT - The present invention relates to compositions, such as bimatoprost, latanoprost and travoprost, and methods to reduce fat in the body of an individual, for example, by topical administration, injection, and/or implantation of such compositions. | 06-12-2014 |
20150025151 | COMPOSITIONS AND METHODS FOR REDUCING BODY FAT - The present invention relates to compositions, such as bimatoprost, latanoprost and travoprost, and methods to reduce fat in the body of an individual, for example, by topical administration, injection, and/or implantation of such compositions. | 01-22-2015 |
20150359801 | COMPOSITIONS AND METHODS FOR REDUCING BODY FAT - The present invention relates to compositions, such as bimatoprost, latanoprost and travoprost, and methods to reduce fat in the body of an individual, for example, by topical administration, injection, and/or implantation of such compositions. | 12-17-2015 |
Patent application number | Description | Published |
20080273687 | System and Method for Providing Customer Activities While in Queue - A system and method for providing customer activities while in queue allows for one or more customers to interact with one or more customer activities while waiting to speak with a live agent. The customers engage the customer activities while holding in a queue where the customer activities reduce the boredom, frustration, and perceived hold duration associated with holding to speak to a live agent. The customers are offered one or more options of the customer activities to interact with and the system and method monitors the customers' selections and interaction with the customer activities. As agents become available, each customer is transferred to an agent along with information regarding the customer's interaction with a selected customer activity. Upon completion of the interaction between the agent and the customer, the customer has the option to return to the selected customer activity and continue interacting with the selected customer activity. | 11-06-2008 |
20080313571 | METHOD AND SYSTEM FOR AUTOMATING THE CREATION OF CUSTOMER-CENTRIC INTERFACES - An interface is provided by creating prompts for the interface. The prompts represent tasks to be accomplished by a user and are obtained based on user input. The prompts are grouped according to relationships, obtained from the user input, among the tasks. The interface is updated based on user feedback. Each of the prompts is designated using user terminology obtained from the user input. | 12-18-2008 |
20100061544 | SYSTEM, METHOD AND SOFTWARE FOR TRANSITIONING BETWEEN SPEECH-ENABLED APPLICATIONS USING ACTION-OBJECT MATRICES - A system, method and software are described for facilitating transitions between speech-enabled applications employing action-object matrices. In an exemplary embodiment, an automatic call router determines a service agent destination by identifying an action-object combination included in a user utterance. In addition to forwarding the user to the service agent destination, the automatic call router sends one or more aspects of the user utterance to the service agent for use therewith. The service agent may then use aspects of the forwarded information to request further information from the user or to begin performance of a user desired transaction. | 03-11-2010 |
20110106586 | SYSTEM AND METHOD FOR AUTOMATED CUSTOMER FEEDBACK - A system and method for automated customer feedback allows for automatically collecting and analyzing customer feedback data regarding customer satisfaction and customer task completion with respect to self-service applications and live agents. When contacting a customer service center, customers provide one or more customer tasks. The customers are routed within the customer service center based on the customer task and/or one or more customer characteristics. While interacting with the customer service center, the customers are automatically asked one or more specific survey questions relating to the customers' interaction with the customer service center and the customers' satisfaction levels. The customers provide one or more survey responses to the survey questions. The survey responses are recorded and analyzed in order to modify and update the customer service center and the survey questions in order to increase customer satisfaction and increase customer task completion. | 05-05-2011 |
20110260864 | INFORMATION HANDLING SYSTEM STATUS ALERT SYSTEM - An information handling system status alert system includes an information handling system (IHS). The IHS includes a frame, a processor supported by the frame and a memory module communicatively coupled to the processor. The IHS additionally includes an operational display device coupled with the frame such that the operational display device is viewable from a first side of the frame. Furthermore, the IHS includes a status alert display device coupled with the frame such that the status alert display device is viewable from a second side of the frame, wherein the second side of the frame is substantially opposite the first side of the frame. | 10-27-2011 |
20110264927 | MOBILE COMPUTING MANAGEMENT AND STORAGE DEVICE - A mobile computing management and storage device configured as a portable information handling system (IHS) storage device includes a frame and a docking station supported by the frame. The docking station includes a plurality of channels configured to receive a plurality of portable IHSs. The channels include a power coupling plug and a communication coupling plug such that the power coupling plug and the communication coupling plug are configured and positioned with respect to the channels to mate with corresponding power and communication couplings of the plurality of portable IHSs when the plurality of IHSs are engaged in the plurality of channels. The device further includes a power supply system supported by the frame and electrically coupled to the power coupling(s). The power supply system is configured to provide staged charging when a plurality of portable IHSs are stored in the docking station. In addition, the device includes a communication switching system supported by the frame and communicatively coupled to the communication coupling(s) such that the communication coupling(s) provide communication signals to the plurality of portable IHSs when stored in the docking station. | 10-27-2011 |
20120269339 | System and Method for Providing Customer Activities While in Queue - A system and method for providing customer activities while in queue allows for one or more customers to interact with one or more customer activities while waiting to speak with a live agent. The customers engage the customer activities while holding in a queue where the customer activities reduce the boredom, frustration, and perceived hold duration associated with holding to speak to a live agent. The customers are offered one or more options of the customer activities to interact with and the system and method monitors the customers' selections and interaction with the customer activities. As agents become available, each customer is transferred to an agent along with information regarding the customer's interaction with a selected customer activity. Upon completion of the interaction between the agent and the customer, the customer has the option to return to the selected customer activity and continue interacting with the selected customer activity. | 10-25-2012 |
20140219429 | SYSTEM AND METHOD FOR AUTOMATED CUSTOMER FEEDBACK - A system and method for automated customer feedback allows for automatically collecting and analyzing customer feedback data regarding customer satisfaction and customer task completion with respect to self-service applications and live agents. When contacting a customer service center, customers provide one or more customer tasks. The customers are routed within the customer service center based on the customer task and/or one or more customer characteristics. While interacting with the customer service center, the customers are automatically asked one or more specific survey questions relating to the customers' interaction with the customer service center and the customers' satisfaction levels. The customers provide one or more survey responses to the survey questions. The survey responses are recorded and analyzed in order to modify and update the customer service center and the survey questions in order to increase customer satisfaction and increase customer task completion. | 08-07-2014 |