Patent application number | Description | Published |
20140110626 | CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR SHALLOW TRENCH ISOLATION (STI) APPLICATIONS AND METHODS OF MAKING THEREOF - Methods for removing, reducing or treating the trace metal contaminants and the smaller fine sized cerium oxide particles from cerium oxide particles, cerium oxide slurry or chemical mechanical polishing (CMP) compositions for Shallow Trench Isolation (STI) process are applied. The treated chemical mechanical polishing (CMP) compositions, or the CMP polishing compositions prepared by using the treated cerium oxide particles or the treated cerium oxide slurry are used to polish substrate that contains at lease a surface comprising silicon dioxide film for STI (Shallow trench isolation) processing and applications. The reduced nano-sized particle related defects have been observed due to the reduced trace metal ion contaminants and reduced very smaller fine cerium oxide particles in the Shallow Trench Isolation (STI) CMP polishing. | 04-24-2014 |
20140273458 | Chemical Mechanical Planarization for Tungsten-Containing Substrates - Chemical mechanical polishing (CMP) compositions for polishing tungsten or tungsten-containing substrates comprise an abrasive, at least one solid catalyst, a chemical additive selected from the groups consisting of piperazine derivatives, salts of cyanate, and combinations thereof; and a liquid carrier. Systems and processes use the aqueous formulations for polishing tungsten or tungsten-containing substrates. | 09-18-2014 |
20140315386 | Metal Compound Coated Colloidal Particles Process for Making and Use Therefor - Solid metal compound coated colloidal particles are made through a process by coating metal compounds onto colloidal particle surfaces. More specifically, metal compound precursors react with the base solution to form solid metal compounds. The solid metal compounds are deposited onto the colloidal particle surfaces through bonding. Excess ions are removed by ultrafiltration to obtain the stable metal compound coated colloidal particle solutions. Chemical mechanical polishing (CMP) polishing compositions using the metal compound coated colloidal particles prepared by the process as the solid state catalyst, or as both catalyst and abrasive, provide uniform removal profiles across the whole wafer. | 10-23-2014 |
20140374378 | Chemical Mechanical Polishing (CMP) Composition for Shallow Trench Isolation (STI) Applications and Methods of Making Thereof - Methods for removing, reducing or treating the trace metal contaminants and the smaller fine sized cerium oxide particles from cerium oxide particles, cerium oxide slurry or chemical mechanical polishing (CMP) compositions for Shallow Trench Isolation (STI) process are applied. The treated chemical mechanical polishing (CMP) compositions, or the CMP polishing compositions prepared by using the treated cerium oxide particles or the treated cerium oxide slurry are used to polish substrate that contains at lease a surface comprising silicon dioxide film for STI (Shallow trench isolation) processing and applications. The reduced nano-sized particle related defects have been observed due to the reduced trace metal ion contaminants and reduced very smaller fine cerium oxide particles in the Shallow Trench Isolation (STI) CMP polishing. | 12-25-2014 |
20150247063 | Chemical Mechanical Polishing (CMP) Composition for Shallow Trench Isolation (STI) Applications and Methods of Making Thereof - Methods for removing, reducing or treating the trace metal contaminants and the smaller fine sized cerium oxide particles from cerium oxide particles, cerium oxide slurry or chemical mechanical polishing (CMP) compositions for Shallow Trench Isolation (STI) process are applied. The treated chemical mechanical polishing (CMP) compositions, or the CMP polishing compositions prepared by using the treated cerium oxide particles or the treated cerium oxide slurry are used to polish substrate that contains at least a surface comprising silicon dioxide film for STI (Shallow trench isolation) processing and applications. The reduced nano-sized particle related defects have been observed due to the reduced trace metal ion contaminants and reduced very smaller fine cerium oxide particles in the Shallow Trench Isolation (STI) CMP polishing. | 09-03-2015 |
Patent application number | Description | Published |
20090261851 | SPRING PROBE - According to some example embodiments, an interconnect has a crown with contact tips, in which each of the contact tips is structured to physically contact a substantially spherical solder ball along a curved inner surface of the contact tip. | 10-22-2009 |
20120142229 | Electrical Connector With Embedded Shell Layer - An electrical connector and method of forming the same are provided, where the method can include affixing at least one layer to a core such that the layer is isomorphic to at least a portion of on an external surface of the core, press fitting the core with the layer into a socket cavity in a socket body, and removing the core from the socket cavity while leaving at least a portion of the layer so that the layer forms a shell layer affixed to an internal surface of the socket cavity. The method can further include inserting at least one plunger and a biasing device into a shell cavity so that a tail of the plunger is slidably received in the shell cavity and the biasing device biases a tip of the plunger away from an internal surface of the shell cavity. | 06-07-2012 |
20120315775 | INSULATED METAL SOCKET - A socket for use in a test system is provided, where the test system is configured to align at least a portion of an electronic device with a plurality of aligned connectors. The socket can include a metal structure having a plurality of openings, the plurality of openings spaced to accommodate the plurality of aligned connectors. At least one opening in the plurality of openings can extend through a thickness of the metal structure and can have an annular inner surface. The annular inner surface can be proximal to at least a portion of a conductive outer surface of at least one aligned connector of the plurality of aligned connectors in the test system. The socket can further include an insulation layer provided on the annular inner surface. | 12-13-2012 |
20130203298 | Electrical Connector With Insulation Member - A contact probe and method of forming the same are provided, where the contact probe can include a shell including a body having a shell cavity. The contact probe can also include at least one plunger slidably received in the shell cavity and extending through at least one opening in at least one end of the shell. The contact probe can further include a biasing device configured to exert a biasing force on the at least one plunger and at least one insulation member including an insulative material. The at least one insulation member can be disposed on at least a portion of an outer surface of at least one of: the shell and the at least one plunger. | 08-08-2013 |
Patent application number | Description | Published |
20130242079 | CORRECTION OF A FIELD-OF-VIEW OVERLAY IN A MULTI-AXIS PROJECTION IMAGING SYSTEM - Two-dimensional scanning array microscope system, which has fields of view of individual objectives overlapping at the object, produces a composite image of the object that is devoid of optical distortions caused by such overlapping. Method for processing imaging data with the system includes precise identification of detector pixels corresponding to different portions of multiple image swaths projected on the detector by the system during the scan of the object, and, based on such identification, allocating or assigning of detector pixels that receive light from the object through more than one objective to only one of objectives, thereby correcting imaging data received in real time to remove a portion of data corresponding to image overlaps. | 09-19-2013 |
20130242384 | MANIPULATION OF TOPOGRAPHY OF LARGE-FORMAT GLASS SLIDES - System and method for correcting a topography of an object being imaged by a multi-array microscope system. The object is forced to conform to a surface of the substrate supporting the object with a suction force and the topography of the chosen object surface is determined. The supporting substrate is bent with the use of force applied to the substrate with at least one actuator such as to reduce the deviations of the determined topography of the object's surface from a pre-determined reference surface by transferring the changes in the curvature of the supporting substrate to the object. In particular, the chosen surface of the object can be substantially flattened for ease of simultaneous imaging of this surface with multiple objective of the multi-array microscope. | 09-19-2013 |
20130279750 | IDENTIFICATION OF FOREIGN OBJECT DEBRIS - System and method for identification of foreign object debris, FOD, in a sample, based on comparison of edge features identified in images of the sample takes at a reference point in time and at a later time (when FOD may be already present). The rate of success of identification of the FOD is increased by compensation for relative movement between the imaging camera and the sample, which may include not only processing the sample's image by eroding of imaging data but also preceding spatial widening of edge features that may be indicative of FOD. | 10-24-2013 |
20140118527 | MATCHING OBJECT GEOMETRY WITH ARRAY MICROSCOPE GEOMETRY - A method for object preparation for imaging with an array microscope system without scanning. Artifact-free image is formed based on scanning-free imaging of an object array formed from spatially-separated portions of the initially spatially-continuous object that are arranged, in the object plane of the array microscope, in a pattern associated with an array of individual objectives of the array microscope. The size of an individual portion of the object does not exceed the size of a FOV of the individual objective defined in the object plane. | 05-01-2014 |
20150276374 | INTERFEROMETRIC APPARATUS WITH COMPUTER-GENERATED HOLOGRAM FOR MEASURING NON-SPHERICAL SURFACES - Method and system of interferometrically measuring, in reflection, a non-spherical surface with two diffracted beams (of different diffraction orders) formed by a diffractive element positioned transversely to the axis of a common-path interferometer. The first diffracted beam substantially maintains the wavefront of a beam incident onto the diffractive element, while the second diffracted beam has a wavefront profile corresponding to the profile of the measured surface. The first diffracted beam may be reflected by the surface in a cat's eye configuration, while the second diffracted beam is reflected by the surface in a confocal configuration. The surface being measured can be modified to substantially balance radiant powers of the first and second diffracted beams upon reflection off the surface. | 10-01-2015 |
20160084643 | INTERFEROMETRIC APPARATUS WITH COMPUTER-GENERATED HOLOGRAM FOR MEASURING NON-SPHERICAL SURFACES - Method and system of interferometrically measuring, in reflection, a non-spherical surface with two diffracted beams (of different diffraction orders) formed by a diffractive element positioned transversely to the axis of a common-path interferometer. The first diffracted beam substantially maintains the wavefront of a beam incident onto the diffractive element, while the second diffracted beam has a wavefront profile corresponding to the profile of the measured surface. The first diffracted beam may be reflected by the surface in a cat's eye configuration, while the second diffracted beam is reflected by the surface in a confocal configuration. The surface being measured can be modified to substantially balance radiant powers of the first and second diffracted beams upon reflection off the surface. | 03-24-2016 |
Patent application number | Description | Published |
20090087549 | SELECTIVE COATING OF FUEL CELL ELECTROCATALYST - A method is provided for selectively coating a catalyst layer ( | 04-02-2009 |
20100203422 | PROTON SELECTIVE MEMBRANE FOR SOLID POLYMER FUEL CELLS - A proton selective membrane for solid polymer electrolyte fuel cells that is produced by providing one or more template molecules, providing one or more functional monomers to interact with the template molecules, providing a cross-linking agent(s) to covalently bond polymer chains created with the template molecules and functional monomers by polymerization, providing an initiating agent to start a chemical reaction which results in an imprinted polymer, and removing the template molecules from the imprinted polymer to create a proton selective membrane. | 08-12-2010 |
20100203623 | SUBSTRATE IMPRINTED UNIVERSAL SENSORS AND SENSORS HAVING NANO-TUNNELING EFFECT - A universal sensor fabrication approach, molecular substrate imprinting technique, which utilizes the interaction between molecular building blocks and the surface of a transducer to develop specific molecular recognition cavities has been established. Integration of molecular recognition cavities with the surface of a nanoscale transducer will result in a nano-tunneling effect that takes place which will provide a sensor or a device that exhibits new properties not already exhibited by either the molecular recognition cavities on a bulk transducer or the nanotransducer material. One of the new properties of this nano-tunneling effect is that a universal potentiometric molecular sensor can be fabricated and used to detect any compounds, whether they are ions or molecules, with enhanced selectivity, sensitivity, and stability when molecular recognition cavities or elements are integrated on the surface of a nanoscale transducer. | 08-12-2010 |
20100226984 | MOLECULAR RECOGNITION MATRIX AND METHOD FOR MAKING SAME - A molecular recognition matrix which utilizes the interaction between molecular building blocks and the surface of a substrate to develop specific molecular recognition cavities. | 09-09-2010 |