Patent application number | Description | Published |
20080230830 | NONVOLATILE MEMORY DEVICE AND METHOD OF FABRICATING THE SAME - A nonvolatile memory device and a method of fabricating the same is provided to prevent charges stored in a charge trap layer from moving to neighboring memory cells. The method of fabricating a nonvolatile memory device, includes forming a first dielectric layer on a semiconductor substrate in which active regions are defined by isolation layers, forming a charge trap layer on the first dielectric layer, removing the first dielectric layer and the charge trap layer over the isolation layers, forming a second dielectric layer on the isolation layers including the charge trap layer, and forming a conductive layer on the second dielectric layer. | 09-25-2008 |
20080272424 | Nonvolatile Memory Device Having Fast Erase Speed And Improved Retention Characteristics And Method For Fabricating The Same - Disclosed herein is a nonvolatile memory device that includes a substrate, a tunneling layer over the substrate, a charge trapping layer over the tunneling layer, an insulating layer for improving retention characteristics over the charge trapping layer, a blocking layer over the insulating layer, and a control gate electrode over the blocking layer. Also disclosed herein is a method of making the device. | 11-06-2008 |
20090004802 | METHOD OF FABRICATING NON-VOLATILE MEMORY DEVICE HAVING CHARGE TRAPPING LAYER - A method of fabricating a non-volatile memory device having a charge trapping layer includes forming a tunneling layer, a charge trapping layer, a blocking layer and a control gate electrode layer over a substrate, forming a mask layer pattern on the control gate electrode layer, performing an etching process using the mask layer pattern as an etching mask to remove an exposed portion of the control gate electrode layer, wherein the etching process is performed as excessive etching to remove the charge trapping layer by a specified thickness, forming an insulating layer for blocking charges from moving on the control gate electrode layer and the mask layer pattern, performing anisotropic etching on the insulating layer to form an insulating layer pattern on a sidewall of the control gate electrode layer and a partial upper sidewall of the blocking layer, and performing an etching process on the blocking layer exposed by the anisotropic etching, wherein the etching process is performed as excessive etching to remove the charge trapping layer by a specified thickness. | 01-01-2009 |
20090108332 | Non-volatile memory device with charge trapping layer and method for fabricating the same - Disclosed herein are a non-volatile memory device and a method of manufacturing the same. The non-volatile memory device includes a substrate, a tunneling layer disposed on the substrate, a charge trapping layer disposed on the tunneling layer, a blocking layer disposed on the charge trapping layer, and a control gate electrode disposed on the blocking layer. The blocking layer in contact with the charge trapping layer includes an aluminum nitride layer. | 04-30-2009 |
20090108334 | Charge Trap Device and Method for Fabricating the Same - A charge trapping device includes a plurality of isolation layers, a plurality of charge trapping layers, a blocking layer, and a control gate electrode. The isolation layers define active regions, and the isolation layers and active regions extend as respective stripes along a first direction on a semiconductor substrate. The charge trapping layers are disposed on the active regions in island forms where the charge trapping layers are separated from each other in the first direction and disposed on the respective active regions between the isolation layers in a second direction perpendicular to the first direction. The blocking layer is disposed on the isolation layers and the charge trapping layers. The control gate electrode is disposed on the charge trapping layer. | 04-30-2009 |
20090114977 | NONVOLATILE MEMORY DEVICE HAVING CHARGE TRAPPING LAYER AND METHOD FOR FABRICATING THE SAME - Disclosed herein is a nonvolatile memory device having a charge trapping layer and a method of making the same. The nonvolatile memory device includes a substrate, a tunneling layer disposed on the substrate, a charge trapping layer disposed on the tunneling layer, a first blocking layer disposed on the charge trapping layer, a second blocking layer disposed on the first blocking layer, and a control gate electrode disposed on the second blocking layer. A first band gap between the first blocking layer and the charge trapping layer is larger than a second band gap between the second blocking layer and the charge trapping layer. | 05-07-2009 |
20090273018 | NONVOLATILE MEMORY DEVICE WITH MULTIPLE BLOCKING LAYERS AND METHOD OF FABRICATING THE SAME - A nonvolatile memory device with a blocking layer controlling the transfer of electric charges in a charge storage layer includes the blocking layer having a first blocking layer in contact with the charge storage layer and a second blocking layer over the first blocking layer, wherein the first blocking layer has a greater energy band gap than the second blocking layer and the second blocking layer has a greater permittivity than the first blocking layer. | 11-05-2009 |
20090325369 | Semiconductor device and method of fabricating the same - A method of fabricating a semiconductor device includes forming a gate dielectric on a substrate, forming a gate structure on the gate dielectric, the gate structure comprising a stacked layer of a silicon layer and a metal layer, selectively etching the gate structure to form a gate pattern, forming a capping layer surrounding the gate pattern, plasma-treating the capping layer, and performing a gate reoxidation process | 12-31-2009 |
20110165769 | NONVOLATILE MEMORY DEVICE WITH MULTIPLE BLOCKING LAYERS AND METHOD OF FABRICATING THE SAME - A nonvolatile memory device with a blocking layer controlling the transfer of electric charges in a charge storage layer includes the blocking layer having a first blocking layer in contact with the charge storage layer and a second blocking layer over the first blocking layer, wherein the first blocking layer has a greater energy band gap than the second blocking layer and the second blocking layer has a greater permittivity than the first blocking layer. | 07-07-2011 |
20110193154 | Non-volatile Memory Device - A non-volatile memory device includes a substrate, a tunneling layer over the substrate, a charge trapping layer including a nitride layer and a silicon boron nitride layer over the tunneling layer, and a blocking layer over the charge trapping layer, and a control gate electrode arranged on the blocking layer. | 08-11-2011 |
20110204430 | NONVOLATILE MEMORY DEVICE AND METHOD OF FABRICATING THE SAME - A nonvolatile memory device and a method of fabricating the same is provided to prevent charges stored in a charge trap layer from moving to neighboring memory cells. The method of fabricating a nonvolatile memory device, includes forming a first dielectric layer on a semiconductor substrate in which active regions are defined by isolation layers, forming a charge trap layer on the first dielectric layer, removing the first dielectric layer and the charge trap layer over the isolation layers, forming a second dielectric layer on the isolation layers including the charge trap layer, and forming a conductive layer on the second dielectric layer. | 08-25-2011 |
20110250746 | NONVOLATILE MEMORY DEVICE WITH MULTIPLE BLOCKING LAYERS AND METHOD OF FABRICATING THE SAME - A nonvolatile memory device with a blocking layer controlling the transfer of electric charges in a charge storage layer includes the blocking layer having a first blocking layer in contact with the charge storage layer and a second blocking layer over the first blocking layer, wherein the first blocking layer has a greater energy band gap than the second blocking layer and the second blocking layer has a greater permittivity than the first blocking layer. | 10-13-2011 |