Patent application number | Description | Published |
20090130605 | RESIST COMPOSITION - A resist composition which is stable relative to solvents used in immersion lithography processes and displays excellent sensitivity and resist pattern profile, and a method of forming a resist pattern that uses such a resist composition are provided. The resist composition is in accordance with predetermined parameters, or is a positive resist composition comprising a resin component (A) which contains an acid dissociable, dissolution inhibiting group and displays increased alkali solubility under the action of acid, an acid generator component (B), and an organic solvent (C), wherein the component (A) contains a structural unit (a1) derived from a (meth)acrylate ester containing an acid dissociable, dissolution inhibiting group, but contains no structural units (a0), including structural units (a0-1) containing an anhydride of a dicarboxylic acid and structural units (a0-2) containing a phenolic hydroxyl group. | 05-21-2009 |
20100151383 | POLYMER COMPOUND, PHOTORESIST COMPOSITION CONTAINING SUCH POLYMER COMPOUND, AND METHOD FOR FORMING RESIST PATTERN - A polymer compound that, within a chemically amplified positive resist system, exhibits a significant change in alkali solubility from a state prior to exposure to that following exposure, as well as a photoresist composition that includes such a polymer compound and a method for forming a resist pattern, which are capable of forming fine patterns with a high level of resolution. The polymer compound includes, as an alkali-soluble group (i), a substituent group in which a group selected from amongst alcoholic hydroxyl groups, carboxyl groups, and phenolic hydroxyl groups is protected with an acid dissociable, dissolution inhibiting group (ii) represented by a general formula (1) shown below: | 06-17-2010 |
20100151395 | Protective film-removing solvent and method of photoresist patterning with it - Disclosed are a protective film-removing solvent for re-moving a protective film laminated on a photoresist film, which contains at least a hydrofluoroether; and a method of photoresist patterning in liquid immersion lithography, using the protective film-removing solvent. | 06-17-2010 |
20110054184 | SURFACE TREATMENT AGENT AND SURFACE TREATMENT METHOD - The object is to provide a surface treatment agent that can effectively prevent pattern collapse of an inorganic pattern or resin pattern provided on a substrate, and a surface treatment method using such a surface treatment agent. In addition, as another object, the present invention has an object of providing a surface treatment agent that can carry out silylation treatment to a high degree on the surface of a substrate, and a surface treatment method using such a surface treatment agent. The surface treatment agent used in the surface treatment of a substrate contains a silylation agent and a silylated heterocyclic compound. | 03-03-2011 |
20110065053 | MATERIAL FOR FORMING PROTECTIVE FILM AND METHOD FOR FORMING PHOTORESIST PATTERN - The present invention provides a material for forming a protective film that has favorable alkali solubility and gives a protective film excelling in water repellency, as well as a method for forming a photoresist pattern using this material for forming a protective film. The material for forming a protective film of the present invention contains an alkali-soluble polymer having a unit derived from a monomer represented by the following general formula (A-1) as a constitutional unit. | 03-17-2011 |
20110073011 | SURFACE TREATMENT AGENT AND SURFACE TREATMENT METHOD - Provided are a surface treatment agent that can effectively suppress pattern collapse of an inorganic pattern or resin pattern provided on a substrate, a surface treatment method using such a surface treatment agent, as well as a surface treatment agent that can carry out silylation treatment to a high degree on the surface of a substrate, and a surface treatment method using such a surface treatment agent. A surface treatment agent is used that is employed in hydrophobization treatment of a substrate surface and includes a silylation agent containing at least one compound having a disilazane structure and a solvent containing a five- or six-membered ring lactone compound. | 03-31-2011 |
20110118494 | SURFACE TREATMENT AGENT AND SURFACE TREATMENT METHOD - Provided are a surface treatment agent for which hydrophobization to a high degree is possible even in a case of the material of a substrate surface being TiN or SiN, and surface treatment method using such a surface treatment agent. The surface treatment agent according to the present invention contains a cyclic silazane compound. As this cyclic silazane compound, a cyclic disilazane compound such as 2,2,5,5-tetramethyl-2,5-disila- | 05-19-2011 |
20130122425 | METHOD FOR FORMING FINE PATTERN, AND COATING FORMING AGENT FOR PATTERN FINING - A resist pattern formed by a method including forming a resist film by applying, on a substrate, a resist composition containing a base material having a solubility, in a developer liquid containing an organic solvent, that decreases according to an action of an acid, a compound which generates an acid upon irradiation, and a solvent; exposing the resist film; developing the exposed resist film; forming a first coating film by applying, on the resist pattern, a first coating forming agent containing a resin having a solubility in an organic solvent that decreases under action of an acid, and a solvent; and heating the resist pattern on which the first coating forming agent has been applied. | 05-16-2013 |
Patent application number | Description | Published |
20080311523 | Material for Formation of Resist Protection Film and Method of Forming Resist Pattern Therewith - In the liquid immersion lithography process, by simultaneously preventing deterioration of a resist film and deterioration of an immersion liquid employed during liquid immersion lithography which uses various immersion liquids, including water, resistance to post exposure delay of the resist film can be improved without increasing the number of processes, thereby making it possible to form a high resolution resist pattern using liquid immersion lithography. Furthermore, it is possible to apply a high refractive index liquid immersion medium, used in combination with the high refractive index liquid immersion medium, thus making it possible to further improve pattern accuracy. Using a composition comprising an acrylic resin component having characteristics which have substantially no compatibility with a liquid in which a resist film is immersed, particularly water, and are also soluble in alkaline, a protective film is formed on the surface of a resist film used. | 12-18-2008 |
20090011375 | IMMERSION LIQUID FOR LIQUID IMMERSION LITHOGRAPHY PROCESS AND METHOD FOR FORMING RESIST PATTERN USING THE SAME - A liquid immersion lithography process is provided. In particular, the liquid immersion lithography process is one in which the resolution of a resist pattern is improved by exposure to light through a liquid having a refractive index higher than that of air and a predetermined thickness, while being arranged on at least a resist film in a pathway allowing exposure light for lithography to reach to the resist film. Accordingly, both the resist film and the liquid used are prevented from deterioration in liquid immersion lithography. Thus, the formation of a high-resolution resist pattern can be attained with liquid immersion lithography. Therefore, the liquid comprised of a silicon-based liquid transparent to exposure light used in the lithography process is employed as an immersion liquid for liquid immersion lithography. | 01-08-2009 |
20090268173 | METHOD FOR MEASURING LIQUID IMMERSION LITHOGRAPHY SOLUBLE FRACTION IN ORGANIC FILM - A method for measuring a liquid immersion lithography soluble fraction in an organic film including a mounting step of mounting a droplet of a liquid immersion medium for liquid immersion lithography on a surface of an organic film formed on a substrate and a transfer step of transferring a component in the organic film into the droplet. | 10-29-2009 |
20100124720 | MATERIAL FOR PROTECTIVE FILM FORMATION, AND METHOD FOR PHOTORESIST PATTERN FORMATION USING THE SAME - This invention provides a material for protective film formation, comprising at least an alkali soluble polymer comprising at least one of constitutional units represented by general formulae (I) and (II) and an alcoholic solvent. The material for protective film formation can simultaneously prevent a deterioration in a resist film during liquid immersion exposure and a deterioration in a liquid for liquid immersion exposure used and, at the same time, can form a resist pattern with a good shape without the need to increase the number of treatment steps. | 05-20-2010 |
20140183954 | POWER SUPPLY DEVICE AND ELECTRIC APPARATUS - A power supply device is connected to an external power supply and supplies electric power to a load. The power supply device includes a battery terminal that is used to connect a secondary battery, a superposition unit that superposes second electric power output from the secondary battery on first electric power supplied from the external power supply, and that outputs resultant electric power to the load; a power consumption amount retrieve unit that retrieves a power consumption amount of the load; and a controller that controls an amount of the second electric power to be output from the secondary battery, based on the power consumption amount. | 07-03-2014 |
20150073614 | ELECTRICAL EQUIPMENT AND ELECTRIC POWER CONTROL SYSTEM - An electrical equipment is supplied with electric power from one of an electric power supply system and a secondary battery. The electrical equipment includes a switch circuit and a module. The switching circuit switches a power supply source for supplying electric power to the electrical equipment between the electric power supply system and the secondary battery. The module includes a processor to execute a program to perform a controlling process including a process of controlling the switch circuit to selectively connect the electrical equipment to one of the electric power supply system and the secondary battery according to a control signal supplied from an external device. | 03-12-2015 |
20150357837 | BATTERY CHARGER, BATTERY CHARGING SYSTEM, AND BATTERY CHARGING METHOD - A battery charger for charging a battery includes a charger; an acquisition unit acquiring information of the battery; and a control unit setting a charging condition of the battery based on the information of the battery and controlling the charger. | 12-10-2015 |
Patent application number | Description | Published |
20080268626 | Semiconductor device having a plurality of kinds of wells and manufacturing method thereof - A semiconductor device has a configuration in which more than three kinds of wells are formed with small level differences. One kind of well from among the more than three kinds of wells has a surface level higher than other kinds of wells from among the more than three kinds of wells. The one kind of well is formed adjacent to and self-aligned to at least one kind of well from among the other kinds of wells. The other kinds of wells are different in one of a conductivity type, an impurity concentration and a junction depth, and include at least two kinds of wells having the same surface level. | 10-30-2008 |
20080296651 | SEMICONDUCTOR DEVICE - A disclosed semiconductor device comprises a non-volatile memory cell including a PMOS write transistor and an NMOS read transistor. The PMOS write transistor includes a write memory gate oxide film formed on a semiconductor substrate and a write floating gate of electrically-floating polysilicon formed on the write memory gate oxide film. The NMOS read transistor includes a read memory gate oxide film formed on the semiconductor substrate and a read floating gate of electrically-floating polysilicon formed on the read memory gate oxide film. The write floating gate and the read floating gate are electrically connected to each other. The PMOS write transistor is configured to perform writing in the non-volatile memory cell, and the NMOS read transistor is configured to perform reading from the non-volatile memory cell. | 12-04-2008 |
20090146731 | REFERENCE VOLTAGE GENERATING CIRCUIT AND POWER SUPPLY DEVICE USING THE SAME - A disclosed reference voltage generating circuit for generating a reference voltage includes MOSFETs connected in series or in parallel. At least one of the MOSFETs includes a control gate and a floating gate that is made hole-rich or discharged by ultraviolet irradiation, and the reference voltage generating circuit is configured to output the difference between threshold voltages of a pair of the MOSFETs as the reference voltage. | 06-11-2009 |
20090272973 | Semiconductor wafer including semiconductor chips divided by scribe line and process-monitor electrode pads formed on scribe line - The present invention discloses a semiconductor wafer having a scribe line dividing the semiconductor wafer into a matrix of plural semiconductor chips. The semiconductor wafer includes a polysilicon layer, a poly-metal interlayer insulation film formed on the polysilicon layer, and a first metal wiring layer formed on the poly-metal interlayer insulation film. The semiconductor wafer includes a process-monitor electrode pad formed on a dicing area of the scribe line. The process-monitor electrode pad has a width greater than the width of the dicing area. The process-monitor electrode pad includes a contact hole formed in the poly-metal insulation film for connecting the first metal wiring layer to the polysilicon layer. | 11-05-2009 |