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Yu Chang
SAN JOSE, CA US
1. 20090218324 DIRECT REAL-TIME MONITORING AND FEEDBACK CONTROL OF RF PLASMA OUTPUT FOR WAFER PROCESSING 09-03-20092. 20090139854 CONTROL OF ARBITRARY SCAN PATH OF A ROTATING MAGNETRON 06-04-2009
3. 20090111280 METHOD FOR REMOVING OXIDES - method for removing native oxides from a substrate surface is provided 04-30-2009
4. 20080268645 METHOD FOR FRONT END OF LINE FABRICATION 10-30-2008
5. 20080206987 PROCESS FOR TUNGSTEN NITRIDE DEPOSITION BY A TEMPERATURE CONTROLLED LID ASSEMBLY 08-28-2008
6. 20080202425 TEMPERATURE CONTROLLED LID ASSEMBLY FOR TUNGSTEN NITRIDE DEPOSITION 08-28-2008