Patent application number | Description | Published |
20080261496 | Apparatus for supplying constant quantity of abrasive - A rotating disk | 10-23-2008 |
20090011682 | ABRASIVE FOR BLAST PROCESSING AND BLAST PROCESSING METHOD EMPLOYING THE SAME - An abrasive has a plate shape with a flat surface, in which a maximum diameter of the flat surface thereof is in the range of 0.05 mm to 10 mm, and 1.5 to 100 times as the maximum diameter as thick of the adhesive, and the blast processing method is one in which this abrasive is ejected by being inclined at an incident angle with respect to a surface of a product to be treated. The ejected plate-shaped abrasive slides along the surface of the product to be treated while having the flat surface in slidable contact with the surface of the product to be treated which is an object surface to be treated, so that the surface of the product to be treated is flattened by removing the peaks only, without increasing the depth of the valleys of the roughness curve. | 01-08-2009 |
20090032507 | METHOD FOR PRODUCING METAL MASK FOR SCREEN PRINTING - A method for producing a metal mask for screen printing is provided, in which dross that is deposited at the time a boring operation is conducted via a laser beam is removed, without causing warpage or bending. The method for producing a metal mask for screen printing includes steps of: forming openings in the metal plate by melting the metal plate at positions irradiated by the laser beam; and ejecting an abrasive onto the other surface of the metal plate after the openings are formed. The abrasive ejected in the abrasive ejection step is one having a predetermined flat shape (plate-shaped abrasive), so as to form a plate shape having a flat surface, or an elastically deformable abrasive, with an average grain diameter of a dispersed or carried abrasive grain being 1 mm to 0.1 μm, and which is ejected at an incident angle of equal to or less than 80 degrees with respect to the other surface of the metal plate, and at an ejection pressure of 0.01 MPa to 0.7 MPa or at an ejection speed of 5 m/sec to 150 m/sec, so as to slide along the other surface of the metal plate. | 02-05-2009 |
20090075569 | APPARATUS FOR SUPPLYING CONSTANT AMOUNT OF ABRASIVES - An apparatus for supplying a constant amount of abrasives that can accurately control the amount of the abrasives to be supplied to a blasting machine is provided. A horizontally rotating disc | 03-19-2009 |
20090098810 | ABRASIVE-RECOVERY MECHANISM IN BLASTING MACHINE - A bottom wall surface of a blasting chamber of a blasting machine provided with hoppers for recovering an abrasive is formed at a lowest possible position. A cabinet | 04-16-2009 |
20090130959 | BLASTING METHOD AND BLASTING MACHINE - In blasting with an abrasive containing liquid to confer elasticity, the abrasive from which liquid evaporates in the course of continuance use is uniformly supplied with liquid. Liquid for swelling an elastic abrasive is sprayed in an air flow for transporting the abrasive in a blasting machine | 05-21-2009 |
20100035522 | BLASTING METHOD AND APPARATUS HAVING ABRASIVE RECOVERY SYSTEM, PROCESSING METHOD OF THIN-FILM SOLAR CELL PANEL, AND THIN-FILM SOLAR CELL PANEL PROCESSED BY THE METHOD - Particularly, a thin-film solar cell panel or the like is processed without necessity of attaching and detaching of mask and washing steps with respect to a workpiece in a fine blasting employing a fine abrasive. | 02-11-2010 |
20100122719 | BLASTING METHOD AND APPARATUS HAVING ABRASIVE RECOVERY SYSTEM, PROCESSING METHOD OF THIN-FILM SOLAR CELL PANEL, AND THIN-FILM SOLAR CELL PANEL PROCESSED BY THE METHOD - Particularly, a thin-film solar cell panel or the like is processed without necessity of attaching and detaching of mask and washing steps with respect to a workpiece in a fine blasting employing a fine abrasive. A negative pressure space ( | 05-20-2010 |
20110005142 | PROCESS FOR PRODUCING GEL-LIKE ABRASIVE MATERIAL AND GEL-LIKE ABRASIVE MATERIAL - An abrasive that can impart a mirror finish, glossiness, or the like to a surface of a workpiece by blasting is provided. A crosslinked polyrotaxane compound having a network structure where crosslinking points are circular molecules of polyrotaxane and also having abrasive grains dispersedly mixed therein is obtained by causing chemical bonding between the circular molecules of the polyrotaxane in a state where the abrasive grains and the polyrotaxane are mixed. Then, the crosslinked polyrotaxane compound is granulated to a predetermined grain diameter to obtain a gel-like abrasive where a part of the dispersedly mixed abrasive grain is exposed at the surface. By using the thus-obtained gel-like abrasive in blasting by projecting the abrasive at an angle tilted with respect to a surface of a workpiece, mirror finishing or the like is possible without making the surface of the workpiece pearskin-like. | 01-13-2011 |
20110034119 | Blasting Chamber - A blasting chamber capable of conducting painting on a workpiece subsequent to a blasting process in the same working chamber is provided. A dust collection unit | 02-10-2011 |
20120002290 | LIGHT-TRANSMITTING MEMBER - The present invention provides a light-transmitting member that not only exhibits high antiglare properties but also shows a transmission image with a sharp outline. A reflecting surface of a light-transmitting member formed of an optically transparent material, for example, a glass plate, has minute hubbly surface profile formed therein by blasting the reflecting surface with an abrasive or the like to mill the surface. The minute hubbly surface profile in the reflecting surface are formed so that, when the reflecting surface is divided into minute compartments of a prescribed size and a histogram is constructed on the basis of measurement values obtained by measuring the height in each compartment, the probability density of the mode in the histogram is 10 to 30%, and the variance (σ | 01-05-2012 |
20120015593 | Apparatus for Supplying Constant Amount of Abrasive - An apparatus for supplying a constant amount of abrasive which can supply even dry ice particles, ice particles, or the like as abrasive in a constant amount is provided. In order to take out abrasive contained in measuring holes | 01-19-2012 |
20120231704 | ABRASIVE FOR BLAST PROCESSING AND BLAST PROCESSING METHOD EMPLOYING THE SAME - An abrasive has a plate shape with a flat surface, in which a maximum diameter of the flat surface thereof is in the range of 0.05 mm to 10 mm, and 1.5 to 100 times as the maximum diameter as thick of the abrasive, and the blast processing method is one in which this abrasive is ejected by being inclined at an incident angle with respect to a surface of a product to be treated. The ejected plate-shaped abrasive slides along the surface of the product to be treated while having the flat surface in slidable contact with the surface of the product to be treated which is an object surface to be treated, so that the surface of the product to be treated is flattened by removing the peaks only, without increasing the depth of the valleys of the roughness curve. | 09-13-2012 |
20120264355 | POLISHING METHOD BY BLASTING AND NOZZLE STRUCTURE FOR A BLASTING APPARATUS FOR USE IN THE POLISHING METHOD - In a polishing performed by imparting kinetic energy to abrasive using a compressed gas flow, horizontal cutting force is obtained while vertical cutting force acting on a surface of a workpiece is inhibited. A compressed gas containing no abrasive is ejected from an accelerated flow generation nozzle | 10-18-2012 |
20130023187 | Method For Grinding Side Portion of Hard, Brittle Material Substrate - An elastic abrasive with abrasive grains dispersed in or adhered to an elastic base material is ejected toward a side portion of a substrate together with compressed air. The elastic abrasive is ejected toward a predetermined processing area centered on a processing point in an ejection direction that intersects a widthwise line at the processing point and that forms a predetermined inclination angle selected from a range of 2° to 60° relative to a contact line. Moreover, an ejection nozzle and the workpiece are moved relatively to each other so that the processing area is moved at a fixed speed in a circumferential direction of the workpiece and so that the ejection direction is maintained at each processing point after moving. If multiple stacked substrates are to be processed, the processing area is moved at a fixed speed also in a widthwise direction of the substrates. | 01-24-2013 |
20130059500 | PLATE-END PROCESSING METHOD AND BLASTING DEVICE - A plate-end processing method comprises the steps of disposing a slit nozzle having a slit-shaped opening at a nozzle tip such that a longitudinal direction of the opening extends along a longitudinal direction of an edge formed along an end of a plate, and such that a distance between the tip of the nozzle and an apex of the edge is equal to 3 mm or smaller, and ejecting an abrasive with a median diameter smaller than or equal to 20 μm with an ejection pressure of 0.1 MPa to 0.5 MPa to the edge via the nozzle and collecting the ejected abrasive and the abrasive and cut dusts adhered to the plate by suctioning the ejected abrasive, the adhered abrasive and cut dusts from a front side of an ejecting direction of the abrasive at an average flow rate of 30 m/s or higher. | 03-07-2013 |
20130303053 | METHOD AND DEVICE FOR CUTTING OUT HARD-BRITTLE SUBSTRATE - To cut out a hard-brittle substrate by blasting, laying out substrates | 11-14-2013 |
20130306148 | METHOD FOR FABRICATING SUBSTRATE FOR SOLAR CELL AND SOLAR CELL - The problem addressed by the present invention is providing a technique for fabricating, by a method simpler than conventional methods, a silicon substrate that is effective for light trapping, one surface of which has a textured structure and the other surface of which has higher reflectivity than the surface having the textured structure. The fabrication method for this semiconductor substrate comprises: a sandblasting step in which a first surface of a silicon substrate in an as-sliced state, fabricated by slicing a silicon ingot, is surface treated by sandblasting and, after the sandblasting step, a step for carrying out surface treatment using an etching solution that contains either or both of hydrofluoric acid and nitric acid on the silicon substrate. | 11-21-2013 |
20140065930 | SCRIBING METHOD AND BLASTING MACHINE FOR SCRIBING - To provide a scribing method by blasting that allows forming a groove at high accuracy without masking, a blasting machine that includes an ejection nozzle having a slit-shaped ejection opening with a width of 10 to 500 μm and a length of 5 to 5000 times the width, and an abrasive with a median diameter equal to or less than one-half of a width of the ejection opening of the ejection nozzle and with a maximum particle diameter smaller than a width of the ejection opening are used; and the abrasive is ejected together with compressed gas on a surface of a workpiece at an ejection distance of 0.1 to 3.0 mm without masking so that an ejection quantity of the abrasive is to be 0.25 cm | 03-06-2014 |
20140329441 | METHOD FOR PRODUCING ELASTIC GRINDING MATERIAL, ELASTIC GRINDING MATERIAL, AND BLASTING METHOD USING SAID ELASTIC GRINDING MATERIAL - A long-lasting elastic grinding material capable of subjecting surfaces of objects to mirror-finishing, glossifying and the like via blasting thereof. A nucleus ( | 11-06-2014 |
20140360569 | Method for Processing Surface of Light-Transmitting Glass and Light-Transmitting Glass Processed by said Method - To impart antiglare properties without reducing the amount of transmitted light, a method for processing a surface of light-transmitting-glass according to the present invention comprises a blasting step of ejecting abrasive grains with particle sizes of #800 to #3000 (average particle diameter 14 μm to 4 μm) such as WA (white alundum: high-purity alumina) having higher hardness than that of the glass onto a light-receiving surface of the glass having light-transmitting property to be processed for forming indentations and protrusions in the light-receiving surface of the glass, and after the blasting step, a hydrofluoric acid treatment step of immersing the light-receiving surface of the glass into a hydrofluoric acid solution in 10% to 20% concentration for 30 to 600 seconds thereby increase a height (amplitude) of indentations and protrusions of the surface of light-transmitting-glass. | 12-11-2014 |