Patent application number | Description | Published |
20080261331 | MRAM AND METHOD OF MANUFACTURING THE SAME - A magnetic memory device comprising, a magneto-resistance effect element that is provided at an intersection between a first write line and a second write line. And the magneto-resistance effect element having, an easy axis that extends in a direction of extension of the first write line, and a first conductive layer for electrical connection to the magneto-resistance effect element, the first conductive layer having sides which are in flush with sides of the magneto-resistance effect element. | 10-23-2008 |
20090129141 | SEMICONDUCTOR MEMORY DEVICE - A semiconductor memory device includes a memory cell array having a plurality of memory cells which are set into low-resistance states/high-resistance states according to “0” data/“1” data. An allocation of the “0” data/“1” data and the low-resistance state/high-resistance state is switched when a power source is turned on. | 05-21-2009 |
20100067283 | SENSE AMPLIFIER - A sense amplifier according to an example of the present invention has first, second, third and fourth FETs with a flip-flop connection. A drain of a fifth FET is connected to a first input node, and its source is connected to a power source node. A drain of a sixth FET is connected to a second input node, and its source is connected to the power source node. A sense operation is started by charging a first output node from the first input node with a first current and by charging a second output node from the second input node with a second current. The fifth and sixth FET are turned on after starting the sense operation. | 03-18-2010 |
20100124116 | NON-VOLATILE SEMICONDUCTOR STORAGE DEVICE - Memory strings includes: a first semiconductor layer including a columnar portion extending in a direction perpendicular to a substrate; a first electric charge storage layer formed to surround a side surface of the columnar portion; and a first conductive layer formed to surround the first electric charge storage layer. First selection transistors includes: a second semiconductor layer extending upward from a top surface of the columnar portion; a second electric charge storage layer formed to surround a side surface of the second semiconductor layer; and a second conductive layer formed to surround the second electric charge storage layer. The non-volatile semiconductor storage device further includes a control circuit that causes, prior to reading data from a selected one of the memory strings, electric charges to be accumulated in the second electric charge storage layer of one of the first selection transistors connected to an unselected one of the memory strings. | 05-20-2010 |
20100172189 | NON-VOLATILE SEMICONDUCTOR STORAGE DEVICE - A non-volatile semiconductor storage device includes: a memory string including a plurality of memory cells connected in series; a first selection transistor having one end connected to one end of the memory string; a first wiring having one end connected to the other end of the first selection transistor; a second wiring connected to a gate of the first selection transistor. A control circuit is configured to boost voltages of the second wiring and the first wiring in the erase operation, while keeping the voltage of the first wiring greater than the voltage of the second wiring by a certain potential difference. The certain potential difference is a potential difference that causes a GIDL current. | 07-08-2010 |
20100214838 | NON-VOLATILE SEMICONDUCTOR STORAGE DEVICE - A non-volatile semiconductor storage device includes a control circuit performing an erase operation to erase data from a selected one of memory transistors. The control circuit applies a first voltage to the other end of selected one of selection transistors, causes the selected one of the selection transistors to turn on, and causes any one of the memory transistors to turn on that is closer to the selection transistor than the selected one of the memory transistors. The control circuit also applies a second voltage lower than the first voltage to a gate of the selected one of the memory transistors. Such a potential difference between the first voltage and the second voltage causing a change in electric charges in the electric charge storage layer. | 08-26-2010 |
20100238732 | NON-VOLATILE SEMICONDUCTOR STORAGE DEVICE - When a data erase operation is performed in one memory cell block, a first voltage is applied to one source line selected from m source lines in the one memory cell block. A second voltage equal to a voltage of the source lines before the data erase operation begins is applied to the other source lines. Then, after a certain time delay from application of the first voltage, a third voltage smaller than the first voltage is applied to a third conductive layer of a source-side selection transistor connected to a selected source line. Then, a hole current is produced near a third gate insulation layer due to a potential difference between the first and third voltage. A fourth voltage is applied to one of first conductive layers connected to one of the memory transistor to be erased. The other first conductive layers are brought into a floating state. | 09-23-2010 |
20100246244 | MAGNETORESISTIVE EFFECT MEMORY - A magnetoresistive effect memory of an aspect of the present invention including a magnetoresistive effect element including a first magnetic layer having an invariable magnetization direction, a second magnetic layer having a variable magnetization direction, and an interlayer provided between the first magnetic layer and the second magnetic layer, and a reading circuit which passes a pulse-shaped read current through the magnetoresistive effect element to read data stored in the magnetoresistive effect element, wherein the pulse width of the read current is shorter than a period from an initial state to a cooperative coherent precession movement of magnetizations included in the second magnetic layer. | 09-30-2010 |
20110013454 | NONVOLATILE SEMICONDUCTOR MEMORY DEVICE - A nonvolatile semiconductor memory device comprises: a plurality of first memory strings; a first select transistor having one end thereof connected to one end of the first memory strings; a first line commonly connected to the other end of a plurality of the first select transistors; a switch circuit having one end thereof connected to the first line; and a second line commonly connected to the other end of a plurality of the switch circuits. The switch circuit controls electrical connection between the second line and the first line. | 01-20-2011 |
20110069552 | NONVOLATILE SEMICONDUCTOR MEMORY DEVICE AND METHOD OF DATA READ THEREIN - A nonvolatile semiconductor memory device comprises: a memory cell array having a plurality of memory strings each having a plurality of memory cells connected in series; and a control circuit configured to execute a read operation for reading data from the memory cells included in a selected memory string from among the plurality of memory strings. During the read operation, the control circuit is configured to apply a first voltage to a gate of at least one of the memory cells in a non-selected memory string not subject to the read operation, and apply a second voltage lower than the first voltage to a gate of another of the memory cells in the non-selected memory string not subject to the read operation. | 03-24-2011 |
20110157989 | NON-VOLATILE SEMICONDUCTOR MEMORY DEVICE AND SEMICONDUCTOR DEVICE - A control circuit is configured to erase a selected block in the erase operation by applying a predetermined potential to the source-line and the third conductive layer to generate a current to increase a potential of the first columnar semiconductor layer and by providing a first voltage to the first conductive layer. The control circuit is configured to keep first conductive layers at a floating state during the first period, while during the second period after the first period, to switch the first conductive layers from the floating state to a state in which the conductive layer is charged to a second voltage higher than the first voltage, in an unselected block in the erase operation. | 06-30-2011 |
20110235421 | NONVOLATILE SEMICONDUCTOR MEMORY DEVICE - According to one embodiment, in the case of performing an operation for increasing a threshold voltage of a first transistor or a third transistor, a control circuit is configured to apply a first voltage to a bit line, and apply a second voltage greater than the first voltage to a gate of a second transistor, thereby rendering the second transistor in a conductive state to transfer the first voltage to a second semiconductor layer, and then apply a program voltage to a gate of the first transistor or the third transistor to store a charge in a second charge storage layer. | 09-29-2011 |
20120068256 | NON-VOLATILE SEMICONDUCTOR MEMORY DEVICE - An dielectric film is formed above the semiconductor substrate. A first conductive layer is formed in the dielectric film and extending in a first direction. The first conductive layer is connected to a first select transistor. A second conductive layer formed in the dielectric film and extending in the first direction. The second conductive layer is connected to a second select transistor. A semiconductor layer is connected to both the first and second conductive layers and functioning as a channel layer of a memory transistor. A gate-insulating film is formed on the semiconductor layer. The gate-insulating film includes a charge accumulation film as a portion thereof. A third conductive layer is surrounded by the gate-insulating film. | 03-22-2012 |
20120069655 | NONVOLATILE SEMICONDUCTOR MEMORY DEVICE - A memory string is configured by a plurality of memory transistors and a spare memory transistor connected in series. Word lines are connected to gates of the memory transistors. A spare word line is connected to a gate of the spare memory transistor. The memory string comprises a first semiconductor layer, a charge storage layer, a plurality of first conductive layers, and a second conductive layer. The first semiconductor layer extends in a perpendicular direction with respect to a substrate. The charge storage layer surrounds a side surface of the first semiconductor layer. The plurality of first conductive layers surround a side surface of the first semiconductor layer with the charge storage layer interposed therebetween, and function as the word lines. The second conductive layer surrounds a side surface of the first semiconductor layer with the charge storage layer interposed therebetween, and functions as the spare word line. | 03-22-2012 |
20120218821 | NON-VOLATILE SEMICONDUCTOR STORAGE DEVICE - A non-volatile semiconductor storage device includes: a memory string including a plurality of memory cells connected in series; a first selection transistor having one end connected to one end of the memory string; a first wiring having one end connected to the other end of the first selection transistor; a second wiring connected to a gate of the first selection transistor. A control circuit is configured to boost voltages of the second wiring and the first wiring in the erase operation, while keeping the voltage of the first wiring greater than the voltage of the second wiring by a certain potential difference. The certain potential difference is a potential difference that causes a GIDL current. | 08-30-2012 |
20120320698 | NONVOLATILE SEMICONDUCTOR MEMORY DEVICE AND METHOD FOR ERASING DATA THEREOF - A control circuit is configured to set a drain-side select transistor and a source-side select transistor connected to a selected memory string to non-conductive states. The control circuit is configured to apply a first voltage to a non-selected word line connected to a gate of a non-selected memory cell in the selected memory string. The control circuit is configured to apply a second voltage to a selected word line connected to a gate of a selected memory cell in the selected memory string. The second voltage is smaller than the first voltage in an erasing operation. | 12-20-2012 |
20130003433 | SEMICONDUCTOR MEMORY DEVICE - A semiconductor memory device comprises: a semiconductor substrate; a plurality of memory units provided on the semiconductor substrate and each including a plurality of memory cells that are stacked; and a plurality of bit lines formed above each of a plurality of the memory units aligned in a column direction, an alignment pitch in a row direction of the plurality of bit lines being less than an alignment pitch in the row direction of the memory units, and an end of each of the memory units aligned in the column direction being connected to one of the plurality of bit lines formed above the plurality of the memory units aligned in the column direction. | 01-03-2013 |
20130248959 | PROGRAMMABLE LOGIC SWITCH - According to one embodiment, a programmable logic switch includes first and second word lines above a first path transistor, a first pillar passing through the first and second word lines and connected to the first path transistor, a second pillar passing through the first and second word lines and connected to the first path transistor, a first memory device between the first pillar and the first word line, a second memory device between the first pillar and the second word line, a third memory device between the second pillar and the first word line, and a fourth memory device between the second pillar and the second word line. | 09-26-2013 |
20140241029 | SEMICONDUCTOR MEMORY DEVICE - A memory cell array comprises first wiring lines, second wiring lines, and memory cells disposed at intersections thereof. A control circuit comprises a first power-supply line supplying a first voltage to selected ones of the first or second wiring lines, and first selection circuits connected between the first or second wiring lines and the first power-supply line, each first selection circuit comprising first and second transistors connected in series. The first selection circuits arranged along a first direction are connected to a first selection line. The first selection circuits arranged along a second direction perpendicular to the first direction are commonly connected to a second selection line. The first and second transistors each comprise a columnar semiconductor portion extending in a direction perpendicular to a semiconductor substrate, a gate-insulating film in contact with a side surface of the columnar semiconductor, and a gate electrode in contact with the gate-insulating film. | 08-28-2014 |
20140286079 | NONVOLATILE SEMICONDUCTOR MEMORY DEVICE AND METHOD OF CONTROLLING THE SAME - A control circuit, on selecting a memory cell as a selected memory cell to perform a write operation, before executing the write operation, applies a first voltage to the selected memory cell via a first line and a second line to perform a first read operation. The control circuit, when judged that a result of the first read operation does not match write data intended to be written, executes the write operation. The control circuit, when judged that a result of the first read operation matches write data intended to be written, omits a voltage application operation for the write operation. | 09-25-2014 |
20140291798 | SEMICONDUCTOR MEMORY DEVICE - A semiconductor memory device comprises: a semiconductor substrate; a plurality of memory units provided on the semiconductor substrate and each including a plurality of memory cells that are stacked; and a plurality of bit lines formed above each of a plurality of the memory units aligned in a column direction, an alignment pitch in a row direction of the plurality of bit lines being less than an alignment pitch in the row direction of the memory units, and an end of each of the memory units aligned in the column direction being connected to one of the plurality of bit lines formed above the plurality of the memory units aligned in the column direction. | 10-02-2014 |
20140334231 | NONVOLATILE SEMICONDUCTOR MEMORY DEVICE AND METHOD FORERASING DATA THEREOF - A control circuit is configured to set a drain-side select transistor and a source-side select transistor connected to a selected memory string to non-conductive states. The control circuit is configured to apply a first voltage to a non-selected word line connected to a gate of a non-selected memory cell in the selected memory string. The control circuit is configured to apply a second voltage to a selected word line connected to a gate of a selected memory cell in the selected memory string. The second voltage is smaller than the first voltage in an erasing operation. | 11-13-2014 |
20150070980 | MAGNETIC MEMORY DEVICE UTILIZING MAGNETIC DOMAIN WALL MOTION - A magnetic memory device includes a magnetic thin wire including magnetic domains along a direction in which the magnetic thin wire extends. Magnetization directions of the magnetic domains are variable. A magnetic tunnel junction (MTJ) structure includes a pinned layer with a fixed magnetization direction and an insulator, and makes an MTJ including the pinned layer and insulator and a magnetic domain in the magnetic thin wire in a first position to sandwich the insulator with pinned layer. First and second electrodes are at both ends of the magnetic thin wire. At least one third electrode is coupled to the magnetic thin wire between the first and second electrodes. | 03-12-2015 |