Patent application number | Description | Published |
20080257255 | CLAD TEXTURED METAL SUBSTRATE FOR FORMING EPITAXIAL THIN FILM THEREON AND METHOD FOR MANUFACTURING THE SAME - The present invention provides an oriented substrate for forming an epitaxial thin film thereon, which has a more excellent orientation than that of a conventional one and a high strength, and a method for manufacturing the same. The present invention provides a clad textured metal substrate for forming the epitaxial thin film thereon, which includes a metallic layer and a silver layer bonded to at least one face of the metallic layer, wherein the silver layer has a {100}<001> cube texture in which a deviating angle Δφ of crystal axes satisfies Δφ≦9 degree. The textured metal substrate can be manufactured by subjecting the silver sheet containing 30 to 200 ppm oxygen by concentration to the orienting treatment of hot-working and heat-treating, and bonding the metal sheet with the oriented silver sheet by using a surface activated bonding process. | 10-23-2008 |
20080261059 | CLAD TEXTURED METAL SUBSTRATE FOR FORMING EPITAXIAL THIN FILM THEREON AND METHOD FOR MANUFACTURING THE SAME - The present invention provides an oriented substrate for forming an epitaxial thin film thereon, which has a more excellent orientation than that of a conventional one and a high strength, and a method for manufacturing the same. A clad textured metal substrate for forming the epitaxial thin film thereon according to the present invention comprises a metallic layer and a nickel layer which is bonded to at least one face of the metallic layer, wherein the nickel layer has a {100}<001> cube texture in which a deviating angle Δφ of crystal axes satisfies Δφ≦7 degrees and has a nickel purity of 99.9% or more. The oriented metal substrate is manufactured by cold-working the nickel sheet having a purity of 99.9% or more, heat-treating it for orientation, and bonding the metal sheet with the oriented nickel sheet by using a surface activated bonding process. | 10-23-2008 |
20080261072 | CLAD TEXTURED METAL SUBSTRATE FOR FORMING EPITAXIAL THIN FILM THEREON AND METHOD FOR MANUFACTURING THE SAME - The present invention provides an oriented substrate for forming an epitaxial thin film thereon, which has a more excellent orientation than that of a conventional one and a high strength, and a method for manufacturing the same. The present invention provides a clad textured metal substrate for forming the epitaxial thin film thereon, which includes a metallic layer and a copper layer bonded to at least one face of the above described metallic layer, wherein the above described copper layer has a {100}<001> cube texture in which a deviating angle Δφ of crystal axes satisfies Δφ≦6 degree. The clad textured metal substrate for forming the epitaxial thin film thereon has an intermediate layer on the surface of the copper layer so as to form the epitaxial thin film thereon, wherein the above described intermediate layer preferably includes at least one layer of a material selected from the group consisting of nickel, nickel oxide, zirconium oxide, rare-earth oxide, magnesium oxide, strontium titanate (STO), strontium barium titanate (SBTO), titanium nitride, silver, palladium, gold, iridium, ruthenium, rhodium and platinum. | 10-23-2008 |
20080305322 | INTERLAYER OF TEXTURED SUBSTRATE FOR FORMING EPITAXIAL FILM, AND TEXTURED SUBSTRATE FOR FORMING EPITAXIAL FILM - Provided is a buffer layer of a textured substrate for forming an epitaxial film that permit the formation of an epitaxial film having a high texture. The present invention provides a buffer layer of a textured substrate for forming an epitaxial film that is provided between a base material and an epitaxial film formed on at least one surface of the base material, in which the buffer layer has a single layer structure or a multilayer structure of not less than two layers and a layer in contact with the substrate is formed from an indium tin oxide. This buffer layer can have a multilayer structure, and can be provided on the ITO layer, with at least one layer formed from nickel, nickel oxide, zirconium oxide, a rare earth oxide, magnesium oxide, strontium titanate (STO), strontium titanate-barium (SBTO), titanium nitride, silver, palladium, gold, iridium, ruthenium, rhodium, and platinum. | 12-11-2008 |
20090053550 | TEXTURED SUBSTRATE FOR EPITAXIAL FILM FORMATION AND SURFACE IMPROVING METHOD OF TEXTURED SUBSTRATE FOR EPITAXIAL FILM FORMATION - Orientation degree and smoothness of a substrate surface better than those of conventional ones are provided in a textured substrate for epitaxial thin film growth. The present invention is a textured substrate for epitaxial film formation, including a crystal orientation improving layer made of a metal thin film of 1 to 5000 nm in thickness on the surface of the textured substrate for epitaxial film formation having a textured metal layer at least on one surface, wherein differences between orientation degrees (Δφ and Δω) in the textured metal layer surface and orientation degrees (Δφ and Δω) in the crystal orientation improving layer surface are both 0.1 to 3.0°. Further, when another metal different from the metal constituting this textured substrate crystal orientation improving layer is added equivalent to a thin film which is 30 nm or less, and subsequently is subjected to heat treatment, the smoothness of that surface can be improved. At this time, the surface roughness of the substrate surface becomes 20 nm or less. | 02-26-2009 |
20100170297 | LIQUEFIED GAS RELIQUEFIER, LIQUEFIED-GAS STORAGE FACILITY AND LIQUEFIED-GAS TRANSPORT SHIP INCLUDING THE SAME, AND LIQUEFIED-GAS RELIQUEFACTION METHOD - A liquefied gas reliquefier that can be configured compactly and that is easy to handle is provided. A liquefied gas reliquefier ( | 07-08-2010 |
20110155050 | CLAD TEXTURED METAL SUBSTRATE FOR FORMING EPITAXIAL THIN FILM THEREON AND METHOD FOR MANUFACTURING THE SAME - A method for manufacturing a oriented substrate for forming an epitaxial thin film thereon, having a more excellent orientation than that of a conventional one and a high strength, and a method for manufacturing the same. The clad textured metal substrate includes a metallic layer and a copper layer bonded to at least one face of the above described metallic layer, wherein the above described copper layer has a {100}<001> cube texture in which a deviating angle Δφ of crystal axes satisfies Δφ≦6 degree. The substrate has an intermediate layer on the surface of the copper layer, to form the epitaxial thin film thereon. | 06-30-2011 |
20120312429 | CLAD TEXTURED METAL SUBSTRATE FOR FORMING EPITAXIAL THIN FILM THEREON AND METHOD FOR MANUFACTURING THE SAME - The present invention provides an oriented substrate for forming an epitaxial thin film thereon, which has a more excellent orientation than that of a conventional one and a high strength, and a method for manufacturing the same. The present invention provides a clad textured metal substrate for forming the epitaxial thin film thereon, which includes a metallic layer and a silver layer bonded to at least one face of the metallic layer, wherein the silver layer has a {100}<001> cube texture in which a deviating angle Δφ of crystal axes satisfies Δφ≦9 degree. The textured metal substrate can be manufactured by subjecting the silver sheet containing 30 to 200 ppm oxygen by concentration to the orienting treatment of hot-working and heat-treating, and bonding the metal sheet with the oriented silver sheet by using a surface activated bonding process. | 12-13-2012 |
Patent application number | Description | Published |
20110159315 | Finishing Agent and Member Having an Overcoat Formed from the Finishing Agent - A finishing agent, which can provide a chromium-free surface treatment layer for use in forming an overcoat on an oxidation-resistant layer on a substrate, comprises an aluminum-containing substance in the form of at least one of a cation, a salt of the cation, and a coordination compound containing the cation; a zinc-containing substance in the form of at least one of a cation, a salt of the cation, and a coordination compound containing the cation; a chelating agent which is able to form a coordination compound with an aluminum ion; and a film-forming substance containing a first element selected from the group consisting of P, Mo, W, Ce, Mn, Si, Ti, Zr, and V. The preferable chelating agent is citric acid. The finishing agent may further contain an organic binder. | 06-30-2011 |
20120018053 | COMPOSITION FOR CHEMICAL CONVERSION TREATMENT, AND PROCESS FOR PRODUCING A MEMBER HAVING AN ANTICORROSIVE FILM FORMED FROM THE COMPOSITION - As an acidic liquid composition capable of forming an anticorrosive film having an appearance and corrosion resistance comparable to the anticorrosive film formed by chromate treatment on a substrate which has a metallic surface and a complicated shape, a chromium-free acidic liquid composition for reactive chemical conversion treatment for use in forming an anticorrosive film on a metallic surface is provided, the composition comprising: at least one oxidative substance selected from a nitric ion and hydrogen peroxide; at least one carboxylic acid compound selected from the group consisting of carboxylic acids, carboxylate ions, carboxylates, and derivatives of carboxylic acids; an aluminum-containing substance; a zirconium-containing substance; and a sulfate ion, wherein the composition does not substantially contain an organic film-forming component. The composition may further contain a water-soluble metal-containing substance as a film-forming component, the water-soluble metal-containing substance containing one or more elements selected from the group consisting of V, Fe, Cu, Sn, Mo, W, Ce, Co, Ni, Mg, Ca, Mn, and Li. | 01-26-2012 |