Patent application number | Description | Published |
20090295364 | Methods of Using a Nanotransfer Printing Stamp Having Conductively Coated Sidewalls - Methods and apparatuses for generating electrically-conductive and/or semi-conductive films, and more specifically, methods and apparatuses for generating conductive and/or semi-conductive films having nanoscale features are provided. In one embodiment, an electrically-conductive or semi-conductive film (e.g., a gold layer of less than 50 nanometer thickness) is provided on a substrate (e.g., a poly(dimethylsiloxane) (PDMS) stamp). The substrate may optionally include patterns or features having raised and recessed portions. A first portion of the film may be removed from the substrate, e.g., by methods such as physically contacting the first portion of the film with a surface to which the first portion preferentially adheres. This process can leave a second portion of the film remaining on the substrate. In some embodiments, the second portion includes at least one region having a dimension substantially parallel to a portion of the substrate i.e., of less than 50 nanometers. The second portion of the film may be used to establish electrical communication with an electrical contact. Advantageously, electrically-conductive and/or semi-conductive films having nanoscale features can be fabricated over large areas (e.g., areas greater than 1 cm | 12-03-2009 |
20100233434 | PATTERNING OF IONIC POLYMERS - In one aspect, methods of patterning of thin films of an ionotropic polymer (e.g., poly(acrylic acid)) are provided. These processes can create micron or sub-micron-scale patterns of ionotropic polymers such as cation crosslinked poly(acrylic acid) (CCL-PAA). In one embodiment, patterning may be performed within microfluidic channels by flowing a solution of crosslinking agent (e.g., metal cations such as Ag | 09-16-2010 |
20110006674 | METHOD FOR FABRICATING NANO-SCALE PATTERNED SURFACES - A method for fabrication of substrate having a nano-scale surface roughness is presented. The method comprises: patterning a surface of a substrate to create an array of spaced-apart regions of a light sensitive material; applying a controllable etching to the patterned surface, said controllable etching being of a predetermined duration selected so as to form a pattern with nano-scale features; and removing the light sensitive material, thereby creating a structure with the nano-scale surface roughness. Silanizing such nano-scale roughness surface with hydrophobic molecules results in the creation of super-hydrophobic properties characterized by both a large contact angle and a large tilting angle. Also, deposition of a photo-active material on the nano-scale roughness surface results in a photocathode with enhanced photoemission yield. This method also provides for fabrication of a photocathode insensitive to polarization of incident light. | 01-13-2011 |
20110171430 | MICROADHESIVE SYSTEMS AND METHODS OF MAKING AND USING THE SAME - The present invention is directed to adhesive systems and methods of making and using such systems. Exemplary adhesive systems comprise protrusions and/or grooves that can interleave to form a reversible adhesive interaction. | 07-14-2011 |
20120027045 | PASSIVE THERMAL MONITORING SYSTEMS AND METHODS OF MAKING AND USING THE SAME - The present invention is directed to passive thermal monitoring devices, and methods of making and using the passive thermal monitoring devices. | 02-02-2012 |
20130182328 | Structured Smudge-Resistant Anti-Reflective Coatings and Methods of Making and Using the Same - The present invention is directed to articles comprising smudge-resistant anti-reflective surfaces, and products and devices comprising the articles. | 07-18-2013 |