Patent application number | Description | Published |
20110095007 | THERMAL FLUX PROCESSING BY SCANNING A FOCUSED LINE BEAM - The thermal processing device includes a stage, a continuous wave electromagnetic radiation source, a series of lenses, a translation mechanism, a detection module, a three-dimensional auto-focus, and a computer system. The stage is configured to receive a substrate thereon. The continuous wave electromagnetic radiation source is disposed adjacent the stage, and is configured to emit continuous wave electromagnetic radiation along a path towards the substrate. The series of lenses is disposed between the continuous wave electromagnetic radiation source and the stage, and are configured to condense the continuous wave electromagnetic radiation into a line of continuous wave electromagnetic radiation on a surface of the substrate. The translation mechanism is configured to translate the stage and the line of continuous wave electromagnetic radiation relative to one another. The detection module is positioned within the path, and is configured to detect continuous wave electromagnetic radiation. | 04-28-2011 |
20120205347 | Scanned laser light source - The thermal processing device includes a stage, a continuous wave electromagnetic radiation source, a series of lenses, a translation mechanism, a detection module, a three-dimensional auto-focus, and a computer system. The stage is configured to receive a substrate thereon. The continuous wave electromagnetic radiation source is disposed adjacent the stage, and is configured to emit continuous wave electromagnetic radiation along a path towards the substrate. The series of lenses is disposed between the continuous wave electromagnetic radiation source and the stage, and are configured to condense the continuous wave electromagnetic radiation into a line of continuous wave electromagnetic radiation on a surface of the substrate. The translation mechanism is configured to translate the stage and the line of continuous wave electromagnetic radiation relative to one another. The detection module is positioned within the path, and is configured to detect continuous wave electromagnetic radiation. | 08-16-2012 |
Patent application number | Description | Published |
20100193154 | RAPID COOLING OF A SUBSTRATE BY MOTION - Methods for cooling a substrate are provided herein. In some embodiments, a method for cooling a substrate includes heating a substrate in a process chamber from an introductory temperature to a peak temperature of greater than about 900 degrees Celsius; and cooling the substrate from within about 50 degrees Celsius of the peak temperature by moving the substrate at a rate of at least about 3 millimeters/second in a direction normal to an upper surface of the substrate. In some embodiments, cooling the substrate by moving the substrate further comprises moving the substrate to a first position having a first distance from an upper surface of the process chamber; and subsequently moving the substrate to a second position having a second distance that is further away from the upper surface than the first distance. In some embodiments, a residence time proximate the peak temperature is about 0.6 seconds or less. | 08-05-2010 |
20110239421 | LASER BEAM POSITIONING SYSTEM - A method and apparatus for targeting a beam of radiation is provided. A beam steering mirror and a beam capture mirror are movably disposed along an optical pathway. A controller moves the beam steering mirror and the beam capture mirror in an x-y plane, and rotates the mirrors, to target the beam to a target location on a surface, while keeping the optical path length substantially constant for all target locations on the surface. The surface is rotated by a rotational actuator to bring all target locations to positions accessible by the beam targeting optics. Imprecision in targeting and optical path length may be compensated by providing an actuated aperture at the beam entry point and/or a variable focus lens with an optical range finding detector, all in communication with the controller. | 10-06-2011 |
20120170603 | PROTECTION DEVICE FOR SOLID STATE LASER - Embodiments provide systems, devices, and methods for controlling a laser. The system includes a controller to control a laser, a ramp generator to ramp down laser power, the ramp generator electrically coupled with the controller and coupleable with the laser, and a hardware protection system electrically coupled with the ramp generator, wherein the ramp generator monitors signals sent from the controller and the hardware protection system to the ramp generator to detect signal failure and ramps down the laser power upon signal failure detection. The method includes sending a control status signal from a controller for a laser to a ramp generator, monitoring the control status signal for missing pulses, sending a hardware interlock status signal from a hardware protection system to the ramp generator, monitoring the hardware interlock status signal for signal failure, and ramping down laser power upon detection of missing pulses or signal failure. | 07-05-2012 |
20150041453 | VISUAL FEEDBACK FOR PROCESS CONTROL IN RTP CHAMBERS - Embodiments of the present disclosure generally relate to methods and apparatus for visual lamp failure detection in a processing chamber, such as an RTP chamber. Visual feedback is facilitated through the use of a wide-angle lens positioned to view lamps within the process chamber. The wide-angle lens is positioned within a probe and secured using a spring in order to withstand high temperature processing. A camera coupled to the lens is adapted to capture an image of the lamps within the process chamber. The captured image of the lamps is then compared to a reference image to determine if the lamps are functioning as desired. | 02-12-2015 |