Patent application number | Description | Published |
20110050328 | Methods and Circuits for a Low Input Voltage Charge Pump - A charge pump circuit comprises a plurality of subcircuits, where the subcircuits are connected to each other in a single or a dual array having a repeating pattern. Each of the subcircuits comprises one or more of the following: an X-channel device having an X-gate terminal, an X-source terminal and an X-drain terminal, a Y-channel device having a Y-gate terminal, a Y-source terminal and a Y-drain terminal, and a capacitor; wherein a first end of the capacitor, the X-drain terminal, and the Y-drain terminal are connected with each other to form the common drain terminal; and wherein a second end of the capacitor is the clock terminal. | 03-03-2011 |
20110163796 | Load Switch System Driven by a Charge Pump - A method for operating a load switch, wherein a charge pump drives a gate of the load switch, comprises the steps of: controlling a charge pump frequency as a function of states of the load switch; generating a charge pump output as a function of the charge pump frequency; and providing the charge pump output to the gate of the load switch. | 07-07-2011 |
20110227608 | Voltage Comparators - A voltage comparator, comprises: a first branch comprising a first transistor, a first resistor (R | 09-22-2011 |
20120092064 | Temperature-Stable CMOS Voltage Reference Circuits - A temperature stable comparator circuit, comprised of: a branch C having a first end, a second end, a first type- | 04-19-2012 |
20130234786 | Methods and Circuits for a Low Input Voltage Charge Pump - A charge pump comprises, a plurality of branches each having serially-connected T-circuit cells, wherein each of the branches has a first end for receiving an input voltage and a second end for outputting a charge pump voltage, wherein each of the T-circuit cells comprises a first transistor, a second transistor, and a capacitor, wherein the first transistor and the second transistor of each of the T-circuit cells have a common drain, and wherein the gate of the first transistor of a certain one of the T-circuit cells of a certain branch is connected to a first branch and the gate of the second transistor of the certain one of the T-circuit cells of the certain branch is connected to a second branch. | 09-12-2013 |
Patent application number | Description | Published |
20120222524 | Ratcheting Hand Tool - A ratcheting hand tool, comprising a handle, a first bit holder oriented along the longitudinal axis of said handle, located at one end of said handle, a second bit holder positioned toward the opposite end said first bit holder, said second bit holder positioned within said handle, with the axis of said second bit holder oriented perpendicularly to the longitudinal axis of said handle, said second bit holder further comprising a ratchet mechanism, and a removable tool bit, comprising a shaft that can be securely inserted into, and compatible with, said first and second bit holders. The tool bit can be inserted into a second bit holder in the handle, with the shaft functioning as a torque bar. | 09-06-2012 |
20140053785 | Holder for Flexible Sheet Material - A holder for storing and securing flexible sheet materials is provided. The holder includes a base member surrounded by a vertical wall forming a reservoir. The base member has at least one attachment structure for receiving and retaining a plurality of liquid absorptive sheets that are stacked one on top of another. The attachment structure includes a plurality of slits that can be deflected to receive the sheet material. | 02-27-2014 |
Patent application number | Description | Published |
20140082111 | DOCUMENT DELIVERY SYSTEM WITH EMAIL UPLOADER FOR AUTOMATIC STORAGE OF DOCUMENTS IN A USER ACCOUNT - A computer program product and method for delivery of electronic and physical documents, with an email interface for uploading documents to be automatically stored in a user's account. The system may receive uploaded electronic documents for delivery to one or more electronic and/or physical endpoints. After the electronic documents have been received, the delivery system determines whether the received electronic documents should be delivered electronically or physically, based on recipient data in the delivery system. If physical documents are to be delivered, the system may intelligently decide whether to aggregate some documents into a multi-document package. The system provides for delivery by commercial carrier, postal service, and/or electronic delivery. Optional services available to the sender include, but are not limited to, certified mail, proof of service, and email confirmation. | 03-20-2014 |
20140250163 | DOCUMENT DELIVERY WITH MULTIPLE ADDRESSING AND DELIVERY OPTIONS - A computer program product and method for delivery of electronic and physical documents, with multiple addressing and delivery options. The system may receive uploaded electronic documents and deliver the documents electronically based on only a substantially correct physical address, or based on only a username. The recipient may choose the method of delivery of the uploaded documents. A tag may be input in order to associate the received electronic documents with others having the same tag. Optional services include, but are not limited to, e-signatures, certified mail, electronic and physical proofs of service, and email confirmation. | 09-04-2014 |
Patent application number | Description | Published |
20090120368 | ROTATING TEMPERATURE CONTROLLED SUBSTRATE PEDESTAL FOR FILM UNIFORMITY - Substrate processing systems are described. The systems may include a processing chamber, and a substrate support assembly at least partially disposed within the chamber. The substrate support assembly is rotatable by a motor yet still allows electricity, cooling fluids, gases and vacuum to be transferred from a non-rotating source outside the processing chamber to the rotatable substrate support assembly inside the processing chamber. Cooling fluids and electrical connections can be used to raise or lower the temperature of a substrate supported by the substrate support assembly. Electrical connections can also be used to electrostatically chuck the wafer to the support assembly. A rotary seal or seals (which may be low friction O-rings) are used to maintain a process pressure while still allowing substrate assembly rotation. Vacuum pumps can be connected to ports which are used to chuck the wafer. The pumps can also be used to differentially pump the region between a pair of rotary seals when two or more rotary seals are present. | 05-14-2009 |
20090120584 | COUNTER-BALANCED SUBSTRATE SUPPORT - A semiconductor processing system is described. The system includes a processing chamber having an interior capable of holding an internal chamber pressure below ambient atmospheric pressure. The system also includes a pumping system coupled to the chamber and adapted to remove material from the processing chamber. The system further includes a substrate support pedestal, where the substrate support pedestal is rigidly coupled to a substrate support shaft extending through a wall of the processing chamber. A bracket located outside the processing chamber is provided which is rigidly and sometimes rotatably coupled to the substrate support shaft. A motor coupled to the bracket can be actuated to vertically translate the substrate support pedestal, shaft and bracket from a first position to a second position closer to a processing plate. A piston mounted on an end of the bracket provides a counter-balancing force to a tilting force, where the tilting force is generated by a change in the internal chamber pressure and causes a deflection in the position of the bracket and the substrate support. The counter-balancing force reduces the deflection of the bracket and the substrate support. | 05-14-2009 |
20120079982 | MODULE FOR OZONE CURE AND POST-CURE MOISTURE TREATMENT - A substrate processing system that has a plurality of deposition chambers, and one or more robotic arms for moving a substrate between one or more of a deposition chamber, load lock holding area, and a curing and treatment module. The substrate curing and treatment module is attached to the load-lock substrate holding area, and may include: The curing chamber for curing a dielectric layer in an atmosphere comprising ozone, and a treatment chamber for treating the cured dielectric layer in an atmosphere comprising water vapor. The chambers may be vertically aligned, have one or more access doors, and may include a heating system to adjust the curing and/or heating chambers between two or more temperatures respectively. | 04-05-2012 |
20120103970 | HEATER WITH INDEPENDENT CENTER ZONE CONTROL - A substrate heater comprising a ceramic substrate support having a substantially flat upper surface for supporting a substrate during substrate processing; a resistive heater embedded within the substrate support; a heater shaft coupled to a back surface of the substrate support, the heater having an interior cavity that extends along its longitudinal axis and ends at a bottom central surface of the substrate support; and a supplemental heater, separate from the ceramic substrate support, positioned within the interior cavity of the heater shaft in thermal contact with a portion of the bottom central surface of the substrate support such that the supplemental heater can alter the temperature of a central area of the upper surface of the substrate support. | 05-03-2012 |
20120145079 | LOADLOCK BATCH OZONE CURE - A substrate processing chamber for processing a plurality of wafers in batch mode. In one embodiment the chamber includes a vertically aligned housing having first and second processing areas separated by an internal divider, the first processing area positioned directly over the second processing area; a multi-zone heater operatively coupled to the housing to heat the first and second processing areas independent of each other; a wafer transport adapted to hold a plurality of wafers within the processing chamber and move vertically between the first and second processing areas; a gas distribution system adapted to introduce ozone into the second area and steam into the first processing area; and a gas exhaust system configured to exhaust gases introduced into the first and second processing areas. | 06-14-2012 |
Patent application number | Description | Published |
20140076467 | BULK NICKEL-SILICON-BORON GLASSES BEARING CHROMIUM - Nickel based alloys capable of forming bulk metallic glass are provided. The alloys include Ni—Cr—Si—B compositions, with additions of P and Mo, and are capable of forming a metallic glass rod having a diameter of at least 1 mm. In one example of the present disclosure, the Ni—Cr—Mo—Si—B—P composition includes about 4.5 to 5 atomic percent of Cr, about 0.5 to 1 atomic percent of Mo, about 5.75 atomic percent of Si, about 11.75 atomic percent of B, about 5 atomic percent of P, and the balance is Ni, and wherein the critical metallic glass rod diameter is between 2.5 and 3 mm and the notch toughness between 55 and 65 MPa m | 03-20-2014 |
20140096873 | BULK NICKEL-PHOSPHORUS-BORON GLASSES BEARING MOLYBDENUM - The disclosure provides Ni—Mo—P—B, Ni—Mo—Nb—P—B, and Ni—Mo—Nb—Mn—P—B alloys capable of forming metallic glass objects. The metallic glass objects can have lateral dimensions in excess of 1 mm and as large as 3 mm or larger. The disclosure also provides methods for forming the metallic glasses. | 04-10-2014 |
20140116579 | BULK NICKEL-BASED CHROMIUM AND PHOSPHORUS BEARING METALLIC GLASSES WITH HIGH TOUGHNESS - A Ni-based bulk metallic glass forming alloy is provided. The alloy includes Ni | 05-01-2014 |
20140130942 | BULK IRON-NICKEL GLASSES BEARING PHOSPHORUS-BORON AND GERMANIUM - An alloy comprising Fe, Ni, P, B and Ge is disclosed, having a composition according to the formula [Fe | 05-15-2014 |
20140130945 | BULK NICKEL-PHOSPHORUS-BORON GLASSES BEARING CHROMIUM AND TANTALUM - A bulk-glass forming Ni—Cr—Nb—P—B alloy is provided. The alloy includes Ni | 05-15-2014 |
20140190593 | BULK NICKEL-SILICON-BORON GLASSES BEARING IRON - Ni—Fe—Si—B and Ni—Fe—Si—B—P metallic glass forming alloys and metallic glasses are provided. Metallic glass rods with diameters of at least one, up to three millimeters, or more can be formed from the disclosed alloys. The disclosed metallic glasses demonstrate high yield strength combined with high corrosion resistance, while for a relatively high Fe contents the metallic glasses are ferromagnetic. | 07-10-2014 |
20140202596 | MELT OVERHEATING METHOD FOR IMPROVED TOUGHNESS AND GLASS-FORMING ABILITY OF METALLIC GLASSES - A method of forming a bulk metallic glass is provided. The method includes overheating the alloy melt to a temperature above a threshold temperature, T | 07-24-2014 |
20140238551 | BULK NICKEL-PHOSPHORUS-BORON GLASSES BEARING MANGANESE - The disclosure is directed to Ni—P—B alloys bearing Mn and optionally Cr and Mo that are capable of forming a metallic glass, and more particularly metallic glass rods with diameters at least 1 mm and as large as 5 mm or larger. The disclosure is further directed to Ni—Mn—Cr—Mo—P—B alloys capable of demonstrating a good combination of glass forming ability, strength, toughness, bending ductility, and corrosion resistance. | 08-28-2014 |
20140332120 | BULK FERROMAGNETIC GLASSES FREE OF NON-FERROUS TRANSITION METALS - Ferrous metal alloys including Fe, Co and optionally Ni with metalloids Si, B and P are provided that are substantially close to the peak in glass forming ability and have a combination of both good glass formability and good ferromagnetic properties. In particular, Fe/Co-based compositions wherein the Co content is between 15 and 30 atomic percent and the metalloid content is between 22 and 24 atomic percent at a well-defined metalloid moiety, have been shown to be capable of forming bulk glassy rods with diameters as large as 4 mm or larger. In addition, incorporating a small content of Ni under 10 atomic percent and additions of Mo, Cr, Nb, Ge, or C at an incidental impurity level of up to 2 atomic percent are not expected to impair the bulk-glass-forming ability of the present alloys. | 11-13-2014 |
20140345755 | BULK NICKEL-BASED CHROMIUM AND PHOSPHORUS BEARING METALLIC GLASSES WITH HIGH TOUGHNESS - A Ni-based bulk metallic glass forming alloy is provided. The alloy includes Ni | 11-27-2014 |
20150020929 | BULK GLASS STEEL WITH HIGH GLASS FORMING ABILITY - The present disclosure provides specified ranges in the Fe—Mo—Ni—Cr—P—C—B alloys such that the alloys are capable of forming bulk glasses having unexpectedly high glass-forming ability. The critical rod diameter of the disclosed alloys is at least 10 mm. | 01-22-2015 |
20150047755 | BULK NICKEL-PHOSPHORUS-BORON GLASSES BEARING MANGANESE, NIOBIUM AND TANTALUM - The present disclosure is directed to Ni—P—B alloys and glasses containing small fractions of Nb and Ta and optionally Mn. Over a specific range, the alloys are capable of forming bulk metallic glasses having critical casting thickness in excess of 1 mm. In one embodiment, compositions with a Mn content of between 3 and 4 atomic percent, Nb content of about 3 atomic percent, B content of about 3 atomic percent, and P content of about 16.5 atomic percent, where the balance in Ni, were capable of forming bulk metallic glass rods with diameters as large as 5 mm or larger. In another embodiment, Ni-based compositions with a Mn content of between 5 and 7 atomic percent, Ta content of between 1 and 2 atomic percent, B content of about 3 atomic percent, and P content of about 16.5 atomic percent, where the balance in Ni, were capable of forming bulk metallic glass rods with diameters as large as 5 mm or larger. | 02-19-2015 |
20150050181 | FLUXING METHOD TO REVERSE THE ADVERSE EFFECTS OF ALUMINUM IMPURITIES IN NICKEL-BASED GLASS-FORMING ALLOYS - A fluxing method is disclosed by which the melt of aluminum-contaminated Ni-based glass-forming alloys is fluxed using a fluxing agent based on boron and oxygen in order to reverse the adverse effects of aluminum impurities on the glass-forming ability and toughness. | 02-19-2015 |
20150096652 | BULK NICKEL-SILICON-BORON GLASSES BEARING IRON - Ni—Fe—Si—B and Ni—Fe—Si—B—P metallic glass forming alloys and metallic glasses are provided. Metallic glass rods with diameters of at least one, up to three millimeters, or more can be formed from the disclosed alloys. The disclosed metallic glasses demonstrate high yield strength combined with high corrosion resistance, while for a relatively high Fe contents the metallic glasses are ferromagnetic. | 04-09-2015 |
Patent application number | Description | Published |
20090071932 | ETCHING PROCESSES USED IN MEMS PRODUCTION - The efficiency of an etching process may be increased in various ways, and the cost of an etching process may be decreased. Unused etchant may be isolated and recirculated during the etching process. Etching byproducts may be collected and removed from the etching system during the etching process. Components of the etchant may be isolated and used to general additional etchant. Either or both of the etchant or the layers being etched may also be optimized for a particular etching process. | 03-19-2009 |
20090071933 | ETCHING PROCESSES USED IN MEMS PRODUCTION - The efficiency of an etching process may be increased in various ways, and the cost of an etching process may be decreased. Unused etchant may be isolated and recirculated during the etching process. Etching byproducts may be collected and removed from the etching system during the etching process. Components of the etchant may be isolated and used to general additional etchant. Either or both of the etchant or the layers being etched may also be optimized for a particular etching process. | 03-19-2009 |
20090219605 | OPTICAL INTERFERENCE DISPLAY PANEL AND MANUFACTURING METHOD THEREOF - A first electrode and a sacrificial layer are sequentially formed on a substrate, and then first openings for forming supports inside are formed in the first electrode and the sacrificial layer. The supports are formed in the first openings, and then a second electrode is formed on the sacrificial layer and the supports, thus forming a micro electro mechanical system structure. Afterward, an adhesive is used to adhere and fix a protection structure to the substrate for forming a chamber to enclose the micro electro mechanical system structure, and at least one second opening is preserved on sidewalls of the chamber. A release etch process is subsequently employed to remove the sacrificial layer through the second opening in order to form cavities in an optical interference reflection structure. Finally, the second opening is closed to seal the optical interference reflection structure between the substrate and the protection structure. | 09-03-2009 |
20110261370 | OPTICAL SENSOR FOR PROXIMITY AND COLOR DETECTION - This disclosure provides systems, methods and apparatus, including computer programs encoded on computer storage media, for detecting proximity and/or color of an object. In one aspect, an optical sensor includes a plurality of transmissive interferometric elements, a plurality of detectors positioned to detect the presence and/or intensity of light transmitted through the elements, and a processor to determine the proximity of an object based at least in part upon input from the detectors. An optical signal can be sensed by selectively actuating certain elements in a set of transmissive interferometric elements in an array to allow transmission of optical signals within a first spectrum through the array, and detecting optical signals transmitted through the array. | 10-27-2011 |
Patent application number | Description | Published |
20080279498 | MEMS STRUCTURES, METHODS OF FABRICATING MEMS COMPONENTS ON SEPARATE SUBSTRATES AND ASSEMBLY OF SAME - Methods of fabricating a microelectromechanical systems (MEMS) device with reduced masking and MEMS devices formed by the same are disclosed. In one embodiment, a MEMS device is fabricated by laminating a front substrate and a carrier, each of which has components preformed thereon. The front substrate is provided with stationary electrodes formed thereover. A carrier including movable electrodes formed thereover is attached to the front substrate. The carrier of some embodiments is released after transferring the movable electrodes to the front substrate. In other embodiments, the carrier stays over the front substrate, and serves as a backplate for the MEMS device. Features are formed by deposition and patterning, by embossing, or by patterning and etching. In some embodiments in which the MEMS device serves as an interferometric modulator, the front substrate is also provided with black masks to prevent or mitigate bright areas in the actuated state of the MEMS device. Static interferometric modulators can also be formed by shaping or preformation and lamination. The methods not only reduce the manufacturing costs, but also provide a higher yield. The resulting MEMS devices can trap smaller volumes between laminated substrates and are less susceptible to pressure variations and moisture leakage. | 11-13-2008 |
20090009444 | MEMS DEVICES HAVING IMPROVED UNIFORMITY AND METHODS FOR MAKING THEM - Disclosed is a microelectromechanical system (MEMS) device and method of manufacturing the same. In one aspect, MEMS such as an interferometric modulator include one or more elongated interior posts and support rails supporting a deformable reflective layer, where the elongated interior posts are entirely within an interferometric cavity and aligned parallel with the support rails. In another aspect, the interferometric modulator includes one or more elongated etch release holes formed in the deformable reflective layer and aligned parallel with channels formed in the deformable reflective layer defining parallel strips of the deformable reflective layer. | 01-08-2009 |
20100182675 | METHODS OF FABRICATING MEMS WITH SPACERS BETWEEN PLATES AND DEVICES FORMED BY SAME - Methods of fabricating a microelectromechanical systems (MEMS) device with spacers between plates and MEMS devices formed by the same are disclosed. In one embodiment, a MEMS device is fabricated by laminating a front substrate and a carrier, each of which has components preformed thereon. The front substrate is provided with stationary electrodes formed thereover. A carrier including movable electrodes formed thereover is attached to the front substrate. The carrier of some embodiments is released after transferring the movable electrodes to the front substrate. In other embodiments, the carrier stays over the front substrate, and serves as a backplate for the MEMS device. Features are formed by deposition and patterning, by embossing, or by patterning and etching. Spacers are provided between the front substrate and the backplate to maintain a gap therebetween. The methods not only reduce the manufacturing costs, but also provide a higher yield. The resulting MEMS devices can trap smaller volumes between laminated substrates and are less susceptible to pressure variations and moisture leakage. | 07-22-2010 |
20100219155 | EQUIPMENT AND METHODS FOR ETCHING OF MEMS - Etching equipment and methods are disclosed herein for more efficient etching of sacrificial material from between permanent MEMS structures. An etching head includes an elongate etchant inlet structure, which may be slot-shaped or an elongate distribution of inlet holes. A substrate is supported in proximity to the etching head in a manner that defines a flow path substantially parallel to the substrate face, and permits relative motion for the etching head to scan across the substrate. | 09-02-2010 |
20110261036 | APPARATUS AND METHOD FOR MASSIVE PARALLEL DITHERING OF IMAGES - This disclosure provides systems, methods and apparatus for parallel dithering images are disclosed. In one aspect, a display device includes: a front substrate; a backplate opposing the front substrate; an array of display elements associated with the front substrate; and an array of processing units associated with the backplate. Each of the processing units is configured to process data for one or more of the display elements for dithering an image. Each of the processing units is spatially arranged to correspond to the one or more display elements for which it is configured to process data. The array of processing units can perform a faster dithering process than a single processor sequentially performing all computation for dithering. Further, the position of the array of processing units allows effective image data processing in an active-matrix type display device while utilizing the space of the backplate thereof. | 10-27-2011 |
20130003160 | METHODS OF FABRICATING MEMS WITH SPACERS BETWEEN PLATES AND DEVICES FORMED BY SAME - Methods of fabricating an electromechanical systems (EMS) device with spacers between plates and EMS devices formed by the same are disclosed. In one embodiment, a EMS device is fabricated by laminating a front substrate and a carrier, each of which has components preformed thereon. The front substrate is provided with stationary electrodes formed thereover. A carrier including movable electrodes formed thereover is attached to the front substrate. The carrier may be released after transferring the movable electrodes to the front substrate. In other embodiments, the carrier stays over the front substrate, and serves as a backplate for the EMS device. Features are formed by deposition and patterning, by embossing, or by patterning and etching. Spacers are provided between the front substrate and the backplate to maintain a gap therebetween. The resulting EMS devices can trap smaller volumes between laminated substrates and are less susceptible to pressure variations and moisture leakage. | 01-03-2013 |
20130109406 | COMMISSIONING SYSTEM FOR SMART BUILDINGS | 05-02-2013 |
20130188235 | SWITCHABLE WINDOWS WITH MEMS SHUTTERS - An array of MEMS shutters may incorporate opaque and/or interference-based film stacks, to control light in a window. The shutter structure may include one or more layers with a controlled stress gradient, which makes a shutter arm curl out of plane and away from a defined aperture for light, thus permitting light to be transmitted through a transparent substrate and past the MEMS structure. To close the shutter, a voltage may be applied between an electrode in the shutter arm and an electrode covering a region on the substrate, rolling the shutter arm flat against the substrate electrode and placing the shutter arm over the aperture. The shutter arm may be configured to transmit selected wavelengths of light. In some implementations, the shutter arm may be configured to filter out infrared light. | 07-25-2013 |
Patent application number | Description | Published |
20110005373 | Non-Lethal Restraint Device With Diverse Deployability Applications - An immobilization device and method of restraining vehicles, persons and animals uses tendrils attached to various devices to engage the target. The immobilization device, system and method includes a housing containing launchable tendrils that are launched from the housing by a propellant. The tendrils may be attached to straps or other elements carried by the immobilization device. The tendrils will engage the target and restrain it if it is a vehicle such as a car, truck, boat, submarine, or like vehicle. In stopping a person or animal the tendrils will deliver a marking package, a shocking package or a snare package to mark, shock or snare the target. Straps may be pulled off the housing leaving the housing near the point of deployment. | 01-13-2011 |
20110030540 | NON-LETHAL RESTRAINT DEVICE WITH DIVERSE DEPLOYABILITY APPLICATIONS - An immobilization device and method of restraining vehicles, persons and animals uses tendrils attached to various devices to engage the target. The immobilization device, system and method includes a housing containing launchable tendrils that are launched from the housing by a propellant. The tendrils may be attached to straps or other elements carried by the immobilization device. The tendrils will engage the target and restrain it if it is a vehicle such as a car, truck, boat, submarine, or like vehicle. In stopping a person or animal the tendrils will deliver a marking package, a shocking package or a snare package to mark, shock or snare the target. Straps may be pulled off the housing leaving the housing near the point of deployment. | 02-10-2011 |
20130291710 | Aquatic restraint device - A restraining device for use in a water environment includes a plurality of tendrils that can be launched from a submerged device when an unauthorized swimmer is proximate the restraining device. Data communication in a neural-network of restraining devices is facilitated by a central command that has the capability of directing restraining devices, normally, aquatic mines, to a target. | 11-07-2013 |