Patent application number | Description | Published |
20090214102 | DEFECT INSPECTION METHOD AND APPARATUS - A method of inspecting patterns, including: adjusting a brightness of at least one of a first bright field image and a second bright field image detected from a specimen and directed to similar patterns on differing parts of the specimen, so as to more closely match a brightness; comparing the images which are adjusted in brightness to match with each other to detect dissimilarities indicative of a defect of the pattern, wherein in adjusting the brightness, the brightness between the first bright field image and the second bright field image is adjusted by performing a gradation conversion of at least one of the brightness between the first bright field image and the second bright field image; and wherein in the comparing, said defect of the pattern is detected by using information of a scattered diagram of brightness of the first bright field image and the second bright field image. | 08-27-2009 |
20110170765 | DEFECT INSPECTION METHOD AND APPARATUS - Arrangements for inspecting a specimen on which plural patterns are formed; capturing a first image of a first area; capturing a second image of a second area in which patterns which are essentially the same with the patterns formed in the first area; creating data relating to corresponding pixels of the first and second images, for each pixel; determining a threshold for each pixel for detecting defects directly in accordance with the first and second images; and detecting defects on the specimen by processing the first and second images by using the threshold for each pixel and information of a scattered diagram of brightness of the first and second images, wherein the threshold is determined by using information of brightness of a local region of at least one of the first and second images, with the local region including an aimed pixel and peripheral pixels of the aimed pixel. | 07-14-2011 |
20120128230 | DEFECT INSPECTION METHOD AND APPARATUS - An inspection method, including: illuminating a light on a wafer on which plural chips having identical patterns are formed; imaging corresponding areas of two chips formed on the wafer to obtain inspection images and reference images with an image sensor; and processing the obtained inspection image and the reference image to produce a difference image which indicates a difference between the inspection image and the reference image and detect a defect by comparing the difference image with a threshold, wherein a threshold applied to a difference image which is produced by comparing the inspection image and the reference image obtained by imaging peripheral portion of the wafer is different from a threshold applied to a difference image which is produced by comparing the inspection image and the reference image obtained by imaging central portion of the wafer. | 05-24-2012 |
Patent application number | Description | Published |
20090121134 | Tool-To-Tool Matching Control Method And its System For Scanning Electron Microscope - A system for controlling a tool-to-tool disparity between a plurality of scanning electron microscopes includes a measuring unit for measuring a tool-to-tool disparity between plural scanning electron microscopes based on information extracted from secondary electron images which are captured by imaging a reference pattern formed on a wafer, a tool state monitoring unit for monitoring tool states of each of the plural scanning electron microscopes, and an output unit for displaying on a screen a relationship between the tool-to-tool disparity between the plural scanning electron microscopes and tool states of each of the plural scanning electron microscopes monitored by the tool state monitoring unit. The tool state monitoring unit monitors the tool states of each of the plural scanning electron microscopes while imaging the reference pattern formed on the wafer by using each of the plural scanning electron microscopes. | 05-14-2009 |
20100246933 | Pattern Inspection Method And Apparatus - An apparatus for processing a defect candidate image, including: a scanning electron microscope for taking an enlarged image of a specimen by irradiating and scanning a converged electron beam onto the specimen and detecting charged particles emanated from the specimen by the irradiation; an image processor for processing the image taken by the scanning electron microscope to detect defect candidates on the specimen and classify the detected defect candidates into one of plural classes; a memory for storing output from the image processor including images of the detected defect candidates; and a display unit which displays information stored in the memory and an indicator, wherein the display unit displays a distribution of the detected and classified defect candidates in a map format by distinguishing by the classified class, and the display unit also displays an image of a defect candidate stored in the memory together with the map which is indicated on the map by the indicator. | 09-30-2010 |
20110133080 | CHARGED PARTICEL BEAM APPARATUS AND METHODS FOR CAPTURING IMAGES USING THE SAME - The present invention provides a charged particle beam apparatus used to measure micro-dimensions (CD value) of a semiconductor apparatus or the like which captures images for measurement. For the present invention, a sample for calibration, on which a plurality of polyhedral structural objects with known angles on surfaces produced by the crystal anisotropic etching technology are arranged in a viewing field, is used. A beam landing angle at each position within a viewing field is calculated based on geometric deformation on an image of each polyhedral structural object. Beam control parameters for equalizing the beam landing angle at each position within the viewing field are pre-registered. The registered beam control parameters are applied according to the position of the pattern to be measured within the viewing field when performing dimensional measurement. Accordingly, the present invention provides methods for reducing the variation in the CD value caused by the variation in the electron beam landing angle with respect to the sample with an equal beam landing angle and methods for reducing the instrumental error caused by the difference in the electron beam landing angle between apparatuses. | 06-09-2011 |
20110278453 | Tool-To-Tool Matching Control Method And Its System For Scanning Electron Microscope - A system for controlling a tool-to-tool disparity between a plurality of scanning electron microscopes includes a measuring unit for measuring a tool-to-tool disparity between plural scanning electron microscopes based on information extracted from secondary electron images which are captured by imaging a reference pattern, a tool state monitoring unit for monitoring tool states of each of the plural scanning electron microscopes, and an output unit for displaying on a screen a relationship between the tool-to-tool disparity between the plural scanning electron microscopes and tool states of each of the plural scanning electron microscopes monitored by the tool state monitoring unit. The tool state monitoring unit monitors the tool states of each of the plural scanning electron microscopes while imaging the reference pattern by using each of the plural scanning electron microscopes. | 11-17-2011 |
Patent application number | Description | Published |
20090272310 | WHISTLE - An object of the present invention is to provide a whistle which has a resonance frequency shifted to the low-frequency side and a pleasant tone while retaining a compact size and light weight. In order to attain this object, a whistle comprises a mouthpiece portion, inside which an air passageway is formed and in which an air opening is opened, and a body portion, in which a connected resonance chamber that is connected to the air passageway is formed; the connected resonance chamber comprises a first resonance chamber, a second resonance chamber in which a sound-emitting opening is opened, and an orifice connecting the first resonance chamber and the second resonance chamber. | 11-05-2009 |
20090272311 | DISASSEMBLABLE WHISTLE - A whistle is provided with an interior that can be cleaned. The whistle has a body with a resonance chamber wall. One face of a resonance chamber formed by the resonance chamber wall is open. A side plate is formed separately from the body, and can be attached to and removed from the body. The side plate has a first portion that blocks the one face of the resonance chamber when attached to the body. A first flange is provided on the first portion and is engageable with the resonance chamber wall. At least one of the resonance chamber wall and the first flange is elastically deformable. An air passageway, the resonance chamber, an air opening that is opened in the air passageway, and a sound-emitting opening that is opened in the resonance chamber are formed by the body and the side plate. | 11-05-2009 |
20110315068 | Whistle - A whistle includes: an air supply opening; a first resonance chamber, a second resonance chamber and a third resonance chamber; a first air supply passage, a second air supply passage and a third air supply passage that branch from a common air supply passage; and a first sound emitting opening, a second sound emitting opening and a third sound emitting opening that emit sounds generated in the first resonance chamber, the second resonance chamber and the third resonance chamber, respectively. The first resonance chamber and the second resonance chamber are arranged side by side in a planar view. The third resonance chamber is disposed between the first resonance chamber and the second resonance chamber, as well as upside the first resonance chamber and the second resonance chamber. The first sound emitting opening, the second sound emitting opening and the third sound emitting opening are open upward. | 12-29-2011 |
Patent application number | Description | Published |
20100261403 | WHISTLE - There is provided a whistle which suppresses any delay of sound to a listener and any attenuation of a sound volume, can transmit sound waves directly, can be blown with various tones, and has a large sound volume. Two kinds of whistles are stacked up and down and integrated together as a single whistle, an orifice is formed opposite to an air feeding opening to transmit sound waves directly to a listener. Moreover, an amount of air flowing into each air feeding tube of the whistle is controlled depending on an angle of putting a mouthpiece in a mouth to select a tone. A tone selecting member or an air amount adjusting flap is provided, and tone can be selected by mechanically blocking off each air feeding tube. Furthermore, an air amount adjusting flap which changes an air-feeding-path cross-sectional area of the air feeding opening, the air feeding tube, or the orifice is provided, and a sound volume can be changed by adjusting an amount of passing air. | 10-14-2010 |
20110111897 | Three-Dimensional Panels for a Game Ball and Related Methods - A method of manufacturing a multi-layer outer panel for a game ball includes three-dimensionally forming a top layer of an outer panel, as well as one or more backing materials disposed underneath the top layer, into a shape substantially corresponding to the surface of the ball. Multi-layer outer panels are then attached to or interconnected to surround an inflatable bladder, thereby producing a game ball while minimizing overstretching of the outer material or the backing material and improving resistance of the outer panels to delamination. | 05-12-2011 |
Patent application number | Description | Published |
20110212392 | PHOTOMASK BLANK, PHOTOMASK, AND METHODS OF MANUFACTURING THE SAME - A photomask blank is for use in manufacturing a photomask to be applied with exposure light having a wavelength of 200 nm or less. The photomask blank has a light-transmitting substrate and a light-shielding film formed thereon. The light-shielding film has a light-shielding layer containing a transition metal and silicon and a front-surface antireflection layer formed contiguously on the light-shielding layer and made of a material containing at least one of oxygen and nitrogen. The light-shielding film has a front-surface reflectance of a predetermined value or less for the exposure light and has a property capable of controlling the change width of the front-surface reflectance at the exposure wavelength to be within 2% when the thickness of the front-surface antireflection layer changes in the range of 2 nm. The material of the front-surface antireflection layer having a refractive index n and an extinction coefficient k capable of achieving such property is selected. | 09-01-2011 |
20110244373 | MASK BLANK, TRANSFER MASK, AND METHODS OF MANUFACTURING THE SAME - In a mask blank for manufacturing a transfer mask adapted to exposure light having a wavelength of 200 nm or less, the mask blank has a light-shielding film on a transparent substrate. The light-shielding film is made of a material containing tantalum as a main metal component and includes a highly oxidized layer which has an oxygen content of 60 at % or more and which is formed as a surface layer of the light-shielding film, that is placed on a side opposite to a transparent substrate side. | 10-06-2011 |
20110244375 | MASK BLANK, TRANSFER MASK, METHODS OF MANUFACTURING THE SAME AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE - In a mask blank for manufacturing a transfer mask, the mask blank has a light-shielding film on a transparent substrate. The light-shielding film is made of a material containing tantalum as a main metal component and includes a highly oxidized layer which has an oxygen content of 60 at % or more and which is formed as a surface layer of the light-shielding film. The highly oxidized layer is placed on a side opposite to a transparent substrate side. | 10-06-2011 |
20110305978 | PHOTOMASK BLANK, PHOTOMASK, AND METHOD OF MANUFACTURING PHOTOMASK BLANK - The present invention provides a photomask blank for producing a photomask to which an ArF excimer laser light is applied, wherein: a thin film having a multilayer structure is provided on a light transmissive substrate; and the uppermost layer of the thin film has an amorphous structure made of a material comprising chromium and at least one of nitrogen, oxygen and carbon. | 12-15-2011 |
20130065166 | PHASE SHIFT MASK BLANK AND PHASE SHIFT MASK - The present invention provides a photomask blank used for producing a photomask to which an ArF excimer laser light is applied, wherein: a light-shielding film is provided on a light transmissive substrate; the light-shielding film has a laminated structure in which a lower layer, an interlayer and an upper layer are laminated in this order from the side close to the light transmissive substrate; the thickness of the entire light-shielding film is 60 nm or less; the lower layer is made of a film containing a metal and has a first etching rate; the upper layer is made of a film containing a metal and has a third etching rate; the interlayer is made of a film containing the same metal as that contained in the lower layer or the upper layer and has a second etching rate that is lower than the first etching rate and the third etching rate; and the thickness of the interlayer is 30% or less of the thickness of the entire light-shielding film. | 03-14-2013 |
20130071777 | PHASE SHIFT MASK BLANK, METHOD OF MANUFACTURING THE SAME, AND PHASE SHIFT MASK - Provided are a phase shift mask blank that is improved in the irradiation durability of a light-semitransmissive film (phase shift film), made of a material containing mainly a transition metal, silicon, and nitrogen, to exposure light having a wavelength of 200 nm or less and thus can improve the mask lifetime, a method of manufacturing such a phase shift mask blank, and a phase shift mask. The phase shift mask blank is used for manufacturing a phase shift mask adapted to be applied with ArF excimer laser exposure light. The phase shift mask blank has a light-semitransmissive film on a transparent substrate. | 03-21-2013 |
20130230795 | PHOTOMASK BLANK, PHOTOMASK, AND METHODS OF MANUFACTURING THE SAME - A photomask blank is for use in manufacturing a photomask to be applied with exposure light having a wavelength of 200 nm or less. The photomask blank has a light-transmitting substrate and a light-shielding film formed thereon. The light-shielding film has a light-shielding layer containing a transition metal and silicon and a front-surface antireflection layer formed contiguously on the light-shielding layer and made of a material containing at least one of oxygen and nitrogen. The light-shielding film has a front-surface reflectance of a predetermined value or less for the exposure light and has a property capable of controlling the change width of the front-surface reflectance at the exposure wavelength to be within 2% when the thickness of the front-surface antireflection layer changes in the range of 2 nm. The material of the front-surface antireflection layer having a refractive index n and an extinction coefficient k capable of achieving such property is selected. | 09-05-2013 |
20130316271 | METHOD OF MANUFACTURING A TRANSFER MASK AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE - In a mask blank for manufacturing a transfer mask, the mask blank has a light-shielding film on a transparent substrate. The light-shielding film is made of a material containing tantalum as a main metal component and includes a highly oxidized layer which has an oxygen content of 60 at % or more and which is formed as a surface layer of the light-shielding film. The highly oxidized layer is placed on a side opposite to a transparent substrate side. | 11-28-2013 |
20140057199 | PHOTOMASK BLANK, PHOTOMASK, AND METHOD FOR MANUFACTURING PHOTOMASK BLANK - A photomask blank for producing a photomask to which an ArF excimer laser light is applied. The blank includes a light transmissive substrate on which a thin film having a multilayer structure is provided. The thin film has a light-shielding film in which a back-surface antireflection layer, a light-shielding layer and a front-surface antireflection layer are laminated in this order. The light-shielding layer comprises chromium and nitrogen, and the chromium content is more than 50 atomic %. The front-surface antireflection layer and the back-surface antireflection layer each has an amorphous structure made of a material comprising chromium, nitrogen, oxygen and carbon. The chromium content ratio of the front-surface antireflection layer and the back-surface antireflection layer is 40 atomic % or less. A first sum of nitrogen content and oxygen content of the back-surface antireflection layer is less than a second sum of nitrogen content and oxygen content of the front-surface antireflection layer. | 02-27-2014 |
20150056539 | PHASE SHIFT MASK BLANK AND PHASE SHIFT MASK - The present invention provides a photomask blank used for producing a photomask to which an ArF excimer laser light is applied, wherein: a light-shielding film is provided on a light transmissive substrate; the light-shielding film has a laminated structure in which a lower layer, an interlayer and an upper layer are laminated in this order from the side close to the light transmissive substrate; the thickness of the entire light-shielding film is 60 nm or less; the lower layer is made of a film containing a metal and has a first etching rate; the upper layer is made of a film containing a metal and has a third etching rate; the interlayer is made of a film containing the same metal as that contained in the lower layer or the upper layer and has a second etching rate that is lower than the first etching rate and the third etching rate; and the thickness of the interlayer is 30% or less of the thickness of the entire light-shielding film. | 02-26-2015 |
Patent application number | Description | Published |
20110070533 | PHOTOMASK BLANK, PHOTOMASK , AND METHOD FOR MANUFACTURING PHOTOMASK BLANK - The present invention provides a photomask blank used for producing a photomask to which an ArF excimer laser light is applied, wherein: a light-shielding film is provided on a light transmissive substrate; the light-shielding film has a laminated structure in which a back-surface antireflection layer, a light-shielding layer and a front-surface antireflection layer are laminated in this order from the side close to the light transmissive substrate; the thickness of the entire light-shielding film is 70 nm or less; the back-surface antireflection layer is made of a film containing a metal and has a first etching rate; the front-surface antireflection layer is made of a film containing a metal and has a third etching rate; the light-shielding layer is made of a film containing the same metal as that contained in the back-surface antireflection layer or the front-surface antireflection layer and has a second etching rate that is lower than the first etching rate and the third etching rate; and the thickness of the light-shielding layer is 45% or less of the thickness of the entire light-shielding film. | 03-24-2011 |
20110081605 | PHOTOMASK BLANK AND METHOD FOR MANUFACTURING THE SAME - The present invention provides a photomask blank in which a light-shielding film consisting of a plurality of layers is provided on a light transmissive substrate, wherein a layer that is provided to be closest to the front surface is made of CrO, CrON, CrN, CrOC or CrOCN, and wherein the atom number density of the front-surface portion of the light-shielding film is 9×10 | 04-07-2011 |
20110104592 | PHOTOMASK BLANK, PHOTOMASK, AND METHOD FOR MANUFACTURING PHOTOMASK BLANK - The present invention provides a photomask blank used for producing a photomask to which an ArF excimer laser light is applied, wherein: a light-shielding film is provided on a light transmissive substrate; the light-shielding film has a laminated structure in which a back-surface antireflection layer, a light-shielding layer and a front-surface antireflection layer are laminated in this order from the side close to the light transmissive substrate; the thickness of the entire light-shielding film is 60 nm or less; the back-surface antireflection layer is made of a film containing a metal and has a first etching rate; the front-surface antireflection layer is made of a film containing a metal and has a third etching rate; the light-shielding layer is made of a film containing the same metal as that contained in the back-surface antireflection layer or the front-surface antireflection layer and has a second etching rate that is lower than the first etching rate and the third etching rate; and the thickness of the light-shielding layer is 30% or less of the thickness of the entire light-shielding film. | 05-05-2011 |
20110111332 | PHASE SHIFT MASK BLANK AND PHASE SHIFT MASK - The present invention provides a photomask blank used for producing a photomask to which an ArF excimer laser light is applied, wherein: a light-shielding film is provided on a light transmissive substrate; the light-shielding film has a laminated structure in which a lower layer, an interlayer and an upper layer are laminated in this order from the side close to the light transmissive substrate; the thickness of the entire light-shielding film is 60 nm or less; the lower layer is made of a film containing a metal and has a first etching rate; the upper layer is made of a film containing a metal and has a third etching rate; the interlayer is made of a film containing the same metal as that contained in the lower layer or the upper layer and has a second etching rate that is lower than the first etching rate and the third etching rate; and the thickness of the interlayer is 30% or less of the thickness of the entire light-shielding film. | 05-12-2011 |
20130059236 | MASK BLANK, TRANSFER MASK AND PROCESS FOR MANUFACTURING SEMICONDUCTOR DEVICES - The present invention is the mask blank includes a glass substrate and a thin film formed on a main surface of the glass substrate, the thin film includes a material containing tantalum and substantially no hydrogen, and the mask blank has a invasion suppressive film between the main surface of the glass substrate and the thin film which suppresses hydrogen from being invaded from the glass substrate into the thin film. | 03-07-2013 |
Patent application number | Description | Published |
20120148439 | COPPER ALLOY - A copper alloy containing Ni: 1.5%-3.6% and Si: 0.3%-1.0% in terms of mass percent with the remainder consisting of copper and unavoidable impurities, wherein: the average crystal grain size of the crystal grains in the copper alloy is 5 to 30 μm; the area ratio of the crystal grains having crystal grain sizes not less than twice the average crystal grain size is not less than 3%; and the ratio of the area of cube orientation grains to the area of the crystal grains having crystal grain sizes not less than twice the average crystal grain size is not less than 50%. | 06-14-2012 |
20130224070 | COPPER ALLOY - To provide a copper alloy sheet excellent in the balance of strength and electroconductivity and excellent in the balance of strength and bending workability also. | 08-29-2013 |
20140193293 | COPPER ALLOY - Disclosed is a copper alloy containing 1.0% to 3.6% of Ni, 0.2% to 1.0% of Si, 0.05% to 3.0% of Sn, 0.05% to 3.0% of Zn, with the remainder including copper and inevitable impurities. The copper alloy has an average grain size of 25 pm or less and has a texture having an average area percentage of cube orientation of 20% to 60% and an average total area percentage of brass orientation, S orientation and copper orientation of 20% to 50%. The copper alloy has a KAM value of 0.8 to 3.0 and does not suffer from cracking even when subjected to U-bending. The copper alloy has excellent balance between strengths (particularly yield strength in a direction perpendicular to the rolling direction) and bending workability. | 07-10-2014 |
20140356224 | COPPER ALLOY - Provided is a copper alloy sheet excellent in strengths, electroconductivity, and bending workability. The copper alloy contains Cr of 0.10% to 0.50%, Ti of 0.010% to 0.30%, and Si of 0.01% to 0.10%, where a ratio (in mass) of the Cr content to the Ti content is from 1.0 to 30, a ratio (in mass) of the Cr content to the Si content is from 3.0 to 30, with the remainder including copper and inevitable impurities. The copper alloy includes grains that have an average major axis length of 6.0 μm or less and an average minor axis length of 1.0 μm or less as measured on a microstructure of the copper alloy in a plane surface perpendicular to a transverse direction by FESEM-EBSP analysis. | 12-04-2014 |
Patent application number | Description | Published |
20090217806 | Music-piece classifying apparatus and method, and related computer program - A bibliographic-information impression word is generated from a bibliographic information segment about selected one of music pieces. An acoustic feature quantity of an audio signal representing the selected music piece is calculated. A feature-quantity impression word is generated from the calculated acoustic feature quantity. A degree of conformity between the bibliographic-information impression word and the feature-quantity impression word is determined. Both the bibliographic-information impression word and the feature-quantity impression word are. selected as final impression words when the determined conformity degree is greater than a predetermined threshold value. One is selected from the bibliographic-information impression word and the feature-quantity impression word as a final impression word when the determined conformity degree is not greater than the predetermined threshold value. A signal representing the final impression word or words is stored into a storage in relation to the selected music piece. | 09-03-2009 |
20110132173 | Music-piece classifying apparatus and method, and related computed program - Audio data representative of a music piece is converted into data components in respective different frequency bands for every unit time interval to generate time frequency data pieces assigned to the respective different frequency bands. From the generated time frequency data pieces, detection is made as to each sustain region in which an effective data component in one of the frequency bands continues to occur during a reference time interval or longer. A feature quantity is calculated from at least one of (1) a number of the detected sustain regions and (2) magnitudes of the effective data components in the detected sustain regions. The music piece is classified in response to the calculated feature quantity. | 06-09-2011 |
20110132174 | Music-piece classifying apparatus and method, and related computed program - Audio data representative of a music piece is converted into data components in respective different frequency bands for every unit time interval to generate time frequency data pieces assigned to the respective different frequency bands. From the generated time frequency data pieces, detection is made as to each sustain region in which an effective data component in one of the frequency bands continues to occur during a reference time interval or longer. A feature quantity is calculated from at least one of (1) a number of the detected sustain regions and (2) magnitudes of the effective data components in the detected sustain regions. The music piece is classified in response to the calculated feature quantity. | 06-09-2011 |
20120303376 | INFORMATION SELECTING APPARATUS AND METHOD, AND COMPUTER PROGRAM - Identifiers are of items or categories assigned to the respective items. A price influence degree of each of identifiers associated with a base identifier is calculated from price information of the identifier through the use of a price influence function. A selection index of each of the identifiers associated with the base identifier is calculated according to a rule such that the calculated selection index will increase as a degree of association with the base identifier is greater and the calculated price influence degree is greater. Identifiers each great in calculated selection index are preferentially selected from the identifiers associated with the base identifier. Items or categories having identifiers equal to the selected identifiers may be recommended to a user. | 11-29-2012 |
Patent application number | Description | Published |
20120101890 | INFORMATION PROCESSING METHOD, DISPLAY METHOD, INFORMATION PROCESSING DEVICE, TERMINAL DEVICE, AND INFORMATION PROCESSING PROGRAM - A use history that at least associates a use subject identifier for identifying a user or a terminal device a user has used with a used item identifier, which is an item identifier for identifying an item used by a user, based on use information is stored in a use history storage section. Based on the use history, a degree of similarity between two item identifiers is calculated and using the degree of similarity, associated data causing a base item identifier, which is an item identifier of a base item, and an associated item identifier, which is an item identifier of an associated item similar to the base item to correspond to each other is created. A change value to change a point value managed for each use subject identifier is calculated. | 04-26-2012 |
20120130848 | Apparatus, Method, And Computer Program For Selecting Items - A similar item set making section makes a similar item set corresponding to a target item. With respect to a first set of some or all of items in the similar item set, a first rate calculating section calculates a first rate. An item characteristic value calculating section calculates an item characteristic value by using the first rate. An item selecting section makes, from items in the similar item set, an associated item set corresponding to the target item. Recommended item conditions are for deciding whether or not an item should be recommended. The associated item set is designed so that when the item characteristic value satisfies prescribed item characteristic value conditions, the rate of the number of items satisfying recommended item conditions in the associated item set to the number of all items therein is greater than the first rate and smaller than 1. | 05-24-2012 |
20120131018 | Item Selecting Apparatus And Method, And Computer Program - A favorite item set making section makes a favorite item set. A first rate calculating section calculates, with respect to a first set of items, a first rate of the number of items satisfying recommended item conditions to the number of all items. A user characteristic value calculating section calculates a user characteristic value by using the first rate. An item selecting section selects, from items in the favorite item set, a plurality of items including items satisfying the recommended item conditions to make a result item set. When the user characteristic value satisfies prescribed conditions, the rate of the number of items in the result item set which satisfy the recommended item conditions to the number of all items in the result item set is greater than the first rate and smaller than 1 except for a case where the first rate is 1. | 05-24-2012 |
20130046766 | ITEM SELECTING APPARATUS, ITEM SELECTING METHOD AND ITEM SELECTING PROGRAM - In an item selecting apparatus performing a selection of an item to be recommended for each user, it is performed to calculate, with respect to each usage registration of an item by a user, an elapsed value as a difference between a time point of creating the item or staring providing of the item and a predetermined time point, acquire a usage characteristics of each user based on the elapsed value and calculate a freshness value representing a degree of freshness about each item. Further, using correspondence rules of different characteristics corresponding to the usage characteristics, it is performed to calculate a novelty index by applying the freshness value of each item on the correspondence rule corresponding to the usage characteristics of each user (S | 02-21-2013 |
20140222543 | INFORMATION PROCESSING METHOD, DISPLAY METHOD, INFORMATION PROCESSING DEVICE, TERMINAL DEVICE, AND INFORMATION PROCESSING PROGRAM - A use history that at least associates a use subject identifier for identifying a user or a terminal device a user has used with a used item identifier, which is an item identifier for identifying an item used by a user, based on use information is stored in a use history storage section. Based on the use history, a degree of similarity between two item identifiers is calculated and using the degree of similarity, associated data causing a base item identifier, which is an item identifier of a base item, and an associated item identifier, which is an item identifier of an associated item similar to the base item to correspond to each other is created. A change value to change a point value managed for each use subject identifier is calculated. | 08-07-2014 |
20140297628 | Text Information Processing Apparatus, Text Information Processing Method, and Computer Usable Medium Having Text Information Processing Program Embodied Therein - A text information processing apparatus includes a retrieval part, a degree-of-similarity calculation part and a determination part. The retrieval part obtains a retrieval result set which includes one or plural pieces of item information and corresponds to a retrieval key extracted from text data, from item database. The degree-of-similarity calculation part calculates a score of the retrieval result set, based on one or more pieces of degree of similarity each between different pieces of item information in the plural pieces of item information. The determination part identifies item information corresponding to the text data from among the plural pieces of item information, based on the score. | 10-02-2014 |
Patent application number | Description | Published |
20110211893 | PRINT CONTROL APPARATUS AND PRINT CONTROL METHOD - A print control apparatus may include a determination unit and a print control unit. The print control apparatus causes a printing unit to perform duplex printing on a continuous sheet and the determination unit determines whether a continuous sheet usable by a first print job is the same as a continuous sheet usable by a second print job. If the determination unit determines that the two continuous sheets are the same, the print control unit perform controls to, cause the printing unit to continuously print images of the first print job to be arranged on a first surface of the continuous sheet and images of the second print job to be arranged on the first surface and thereafter cause the printing unit to print images of the first print job and the second print job to be arranged on an opposite surface of the continuous sheet. | 09-01-2011 |
20110236105 | PRINTING CONTROL APPARATUS AND PRINTING CONTROL METHOD - A printing control apparatus may execute printing on a continuous sheet by using a printing unit. The printing control apparatus includes a reversal unit, an input unit, and a printing control unit. In executing printing by the printing unit on both surfaces of the continuous sheet, the reversal unit reverses the continuous sheet to execute printing on a second surface after executing printing on a first surface. If the printing on the first surface currently is being executed by the printing unit to execute two-sided printing of a preceding job based on a preceding job in a case where an instruction for interruption printing is input by the input unit, the printing control unit executes the interruption printing according to the instruction subsequent to the printing on the first surface of the continuous sheet based on the preceding job, and supplies the printed continuous sheet to the reversal unit. | 09-29-2011 |
20110243637 | PRINT CONTROL APPARATUS AND METHOD - In printing data of a plurality of pages on a continuous sheet, it is determined whether the data is to be printed on a single side of the continuous sheet or on both sides thereof. A first sequence of pages arranged on a first side of the continuous sheet occurring when it is determined that the data is to be printed on the single side and a second sequence of pages arranged on the first side of the continuous sheet occurring when it is determined that the data is to be printed on the both sides such that the first and second sequences are opposite to each other. Each of the first and second sequences indicates whether the pages are arranged in descending order or in ascending order. | 10-06-2011 |
20120076560 | PRINT CONTROL APPARATUS AND METHOD - In order to prevent a printing process from clogging by reason of being incapable of discharging a sheet to a discharge destination in the case of duplex printing on a continuous sheet, the number of pages to be printed continuously on the same side of the sheet is decided so that the number of required discharging destinations conforms to the number of available discharge destinations. Then, according to the decision, printing on the same side of the sheet is performed, and the sheet is discharged to the respective discharge destinations. | 03-29-2012 |
20120199022 | PRINTING METHOD AND PRINTING APPARATUS - A state of a print head is checked by printing a plurality of images in order on a sheet fed from a sheet feeding unit, and reading the printed images. A region that is inappropriate for performing printing on the fed sheet is detected. When the inappropriate region has been detected, printing the images is stopped and the sheet is cut. Of the cut sheets, the sheet at an upstream is sent back to the sheet feeding unit. Subsequently, the sheet is again fed to perform printing and conduct a test. | 08-09-2012 |
20120199026 | PRINTING METHOD AND PRINTING APPARATUS - A printing apparatus sequentially prints a plurality of images on a first surface of a sheet, and then sequentially prints a plurality of images on a second surface that is a back surface of the first surface. When a state of a printing unit is determined not to be normal when printing on the first surface, the printing apparatus executes processing for maintenance by using a sheet different from the sheet used for printing on the first surface. | 08-09-2012 |
20130100187 | PRINT CONTROL APPARATUS, PRINT CONTROL METHOD, AND RECORDING MEDIUM - A print control apparatus configured to cause a printing unit to perform print processing includes a determination unit configured to determine whether a condition for executing maintenance processing of the printing unit is satisfied, a shortening unit configured to shorten redundant maintenance operations in first maintenance processing and second maintenance processing in a case where the determination unit determines that a condition for executing the second maintenance processing is satisfied before completion of the first maintenance processing, and a control unit configured to cause the first maintenance processing and the second maintenance processing to be carried out after the shortening unit shortens the redundant maintenance operations. | 04-25-2013 |
20130336698 | PRINTING CONTROL APPARATUS AND PRINTING CONTROL METHOD - An apparatus includes an input unit and a printing control unit to cause a printing unit to execute printing on a continuous sheet. The input unit inputs an instruction for printing by the printing unit. The printing control unit causes the printing unit to execute printing according to a second job subsequent to printing on a first surface of the continuous sheet based on a first job, wherein the instruction input by the input unit may include a first job that is a two-sided printing and a second job that is a one-sided printing, or a first job that is a one-sided printing and a second job that is a two-sided printing. A supplying unit is controlled to supply the printed continuous sheet to a reversal unit which reverses the continuous sheet to execute printing on a second surface after executing printing on a first surface of the continuous sheet. | 12-19-2013 |
20140104338 | PRINT CONTROL APPARATUS AND METHOD - An apparatus capable of causing a print unit to print data on a continuous sheet includes a reception unit, a determination unit, and a print control unit. The reception unit receives data of a plurality of pages to be printed by the print unit. The determination unit determines whether the data of the received plurality of pages is to be printed on a single side or on both sides of the continuous sheet. The print control unit causes printing of the data of the received plurality of pages on the continuous sheet in a manner such that an orientation of a surface of a discharged continuous sheet in a case where being discharged after having been printed on its both sides and an orientation of a surface of a discharged continuous sheet in a case where being discharged after having been printed on its single side is the same. | 04-17-2014 |
Patent application number | Description | Published |
20110003367 | Material For Capturing Microbes, Device For Capturing Microbes, Method Of Capturing Microbes, And Method Of Producing Material For Capturing Microbes - The invention relates to a material for capturing microbes or the like, a device for capturing microbes or the like, a method of capturing microbes or the like, and a method of producing a material for capturing microbes or the like, and has an object of using a pulverizable resin whereby a minor amount of microbes or the like contained in a large amount of a liquid, or microbes or the like contained in a small amount of a liquid can be captured efficiently, quickly, labor-savingly, and reliably. Disclosed is: a material for capturing microbes or the like, which comprises irregular-shaped powdery grains made of a pulverizable adsorbent resin and distributed in a predetermined grain size range, and which can adsorb or bond to a target such as a microbe contained in a liquid; a device for capturing microbes or the like; and a method of capturing microbes or the like. | 01-06-2011 |
20130256208 | MATERIAL FOR CAPTURING MICROBES, DEVICE FOR CAPTURING MICROBES, METHOD OF CAPTURING MICROBES, AND METHOD OF PRODUCING MATERIAL FOR CAPTURING MICROBES - The invention relates to a material for capturing microbes or the like, a device for capturing microbes or the like, a method of capturing microbes or the like, and a method of producing a material for capturing microbes or the like, and has an object of using a pulverizable resin whereby a minor amount of microbes or the like contained in a large amount of a liquid, or microbes or the like contained in a small amount of a liquid can be captured efficiently, quickly, labor-savingly, and reliably. Disclosed is: a material for capturing microbes or the like, which comprises irregular-shaped powdery grains made of a pulverizable adsorbent resin and distributed in a predetermined grain size range, and which can adsorb or bond to a target such as a microbe contained in a liquid; a device for capturing microbes or the like; and a method of capturing microbes or the like. | 10-03-2013 |
Patent application number | Description | Published |
20090309213 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF THE SAME - A semiconductor chip is mounted on a heat sink disposed inside a through-hole of a wiring board, electrodes of the semiconductor chip and connecting terminals of the wiring board are connected by bonding wires, a sealing resin is formed to cover the semiconductor chip and the bonding wires, and solder balls are formed on the lower surface of the wiring board, thereby constituting the semiconductor device. The heat sink is thicker than the wiring board. The heat sink has a protruded portion protruding to outside from the side surface of the heat sink, the protruded portion is located on the upper surface of the wiring board outside the through-hole, and the lower surface of the protruded portion contacts to the upper surface of the wiring board. When the semiconductor device is manufactured, the heat sink is inserted from the upper surface side of the wiring board. | 12-17-2009 |
20110163438 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF THE SAME - A semiconductor chip is mounted on a heat sink disposed inside a through-hole of a wiring board, electrodes of the semiconductor chip and connecting terminals of the wiring board are connected by bonding wires, a sealing resin is formed to cover the semiconductor chip and the bonding wires, and solder balls are formed on the lower surface of the wiring board, thereby constituting the semiconductor device. The heat sink is thicker than the wiring board. The heat sink has a protruded portion protruding to outside from the side surface of the heat sink, the protruded portion is located on the upper surface of the wiring board outside the through-hole, and the lower surface of the protruded portion contacts to the upper surface of the wiring board. When the semiconductor device is manufactured, the heat sink is inserted from the upper surface side of the wiring board. | 07-07-2011 |
20120061817 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF THE SAME - A semiconductor chip is mounted on a heat sink disposed inside a through-hole of a wiring board, electrodes of the semiconductor chip and connecting terminals of the wiring board are connected by bonding wires, a sealing resin is formed to cover the semiconductor chip and the bonding wires, and solder balls are formed on the lower surface of the wiring board, thereby constituting the semiconductor device. The heat sink is thicker than the wiring board. The heat sink has a protruded portion protruding to outside from the side surface of the heat sink, the protruded portion is located on the upper surface of the wiring board outside the through-hole, and the lower surface of the protruded portion contacts to the upper surface of the wiring board. When the semiconductor device is manufactured, the heat sink is inserted from the upper surface side of the wiring board. | 03-15-2012 |
Patent application number | Description | Published |
20110033360 | METHOD OF OPERATING HYDROLYTIC SEPARATOR - Provided is a method of operating a hydrolytic separator in which ammonia gas to be used as a reducing agent in a flue gas denitrization apparatus is generated by the hydrolysis of an aqueous urea solution. When the hydrolytic separator is started and ammonia gas injection is initiated, the hydrolytic separator is operated in a constant-pressure mode in which the internal pressure of the hydrolytic separator is kept constant regardless of the increasing temperature of the hydrolytic separator. Thereafter, the constant-pressure operation is switched to a variable pressure operation in which the pressure is raised as the temperature of the hydrolytic separator rises. In the method, the constant-pressure operation is switched to the variable pressure operation after the temperature of the hydrolytic separator in the constant-pressure operation has reached or exceeded the variable pressure operation temperature corresponding to that pressure. As a result, the hydrolytic separator can be operated with satisfactory timing so that the generation amount of ammonia necessary for flue gas denitration can be kept proper. | 02-10-2011 |
20130071296 | FLUE GAS DENITRIFICATION APPARATUS - A vertical downflow type flue gas denitrification apparatus which has a plurality of catalyst blocks, each incorporating a catalyst unit provided therein, is provided with a first ash accumulation baffle plate and a second ash accumulation baffle plate which are slidable into a gap between catalyst blocks adjacent to each other, and processes an exhaust gas emitted from a combustor and turned to a vertical downflow. The denitrification apparatus has a simple configuration where the ash accumulation baffle plates prevent ash or the like from being accumulated in the gap between the catalyst blocks. The thermal expansion of the ash accumulation baffle plate can be absorbed even under the operating conditions which produce a change in temperature, and charging and replacing the catalyst in the catalyst blocks are possible without on-site welding of the ash accumulation baffle plates. | 03-21-2013 |
20140356236 | DENITRIFICATION APPARATUS - There is provided a denitrification apparatus capable of reducing NOx from a combustion facility and preventing evaporation of a reducing liquid in a lance and an injection nozzle in the combustion facility in operation at a low load by adjusting concentration of a reducing agent, thereby achieving complete evaporation of the reducing liquid in an exhaust gas duct. The denitrification apparatus of the present invention includes: a nozzle for spraying a reducing liquid containing a reducing agent for reducing nitrogen oxides in exhaust gas discharged from a combustion facility into the exhaust gas by using a flow of gas; a gas supply unit for supplying the gas to the nozzle; a reducing liquid supply unit for supplying the reducing liquid to the nozzle; and a concentration control unit for adjusting concentration of the reducing agent on the basis of a temperature of the exhaust gas and a supply amount of the reducing liquid by supplying a diluting liquid to the reducing liquid so that the reducing agent is not vaporized in the reducing liquid supply unit. | 12-04-2014 |
Patent application number | Description | Published |
20110182993 | FILM-FORM PREPARATION - An object of the present invention is to provide a film-form preparation to be used in desensitization therapy and a method for producing the same. This film-form preparation enables the patient to self-administer an allergen and adjust the dose, has excellent portability, has no residual sensation, provides excellent protection against accidental swallowing, is easy for a caregiver to administer, and can greatly improve the QOL of both patients and caregivers. Additionally, this film-form preparation enables arbitrary control of the dissolution time in the mouth, particularly sublingually and has very little gummy sensation in the mouth and better feeling when touched by the fingers. A film-form preparation including: an allergen; an edible polymer that is soluble in both water and a polar organic solvent; and one or two or more types of particles selected from the group consisting of monosaccharide to hexasaccharide sugars and sugar alcohols thereof that have an average particle size of 0.1 to 100 μm. | 07-28-2011 |
20110243994 | STABILIZED PHARMACEUTICAL COMPOSITION, LIQUID PREPARATION OF STABILIZED PHARMACEUTICAL COMPOSITION, FILM-FORM PREPARATION, AND METHOD FOR PRODUCING FILM-FORM PREPARATION - The present invention provides a stabilized pharmaceutical composition that enables the production of a preparation for desensitization therapy useful as an agent for the prevention or treatment of allergic diseases such as pollen hypersensitivity, has outstanding allergen protein stability, and is useful for storage and transfer. | 10-06-2011 |
20110243997 | FILM-FORM PREPARATION AND METHOD FOR PRODUCING THE SAME - The present invention provides a film-form preparation having a rapid dissolution profile in the mouth and sufficient film strength, and also having excellent appearance and feel. More specifically, the present invention provides a film-form preparation including: a water-soluble and a polar organic solvent-soluble edible polymer; and polar organic solvent-insoluble drug particles. | 10-06-2011 |
20110244047 | FILM-FORM PREPARATION AND METHOD FOR PRODUCING THE SAME - The present invention provides a film-form preparation having a rapid dissolution profile in the mouth and sufficient film strength, and also having excellent appearance and feel. More specifically, the present invention provides a film-form preparation including: a water-soluble edible polymer; and water-insoluble drug particles, wherein an average particle size of the drug particles is 0.1 to 60 μm. | 10-06-2011 |
20120148656 | SHEET-FORM PREPARATION AND METHOD FOR PRODUCING THE SAME - The present invention provides a sheet-form preparation that can be easily dissolved intraorally, allows the dissolution time thereof to be easily controlled, and can stably contain a drug except an allergenic protein from cedar pollen. The sheet-form preparation contains water, gelatin, and a drug except an allergenic protein from cedar pollen. | 06-14-2012 |
20120171251 | SHEET-FORM PREPARATION AND METHOD FOR PRODUCING THE SAME - The present invention provides a sheet-form preparation that can be easily dissolved intraorally, allows the dissolution time thereof to be easily controlled, and can stably contain an allergenic protein from cedar pollen. | 07-05-2012 |
20120294893 | EDIBLE JELLY-FORM COMPOSITION, JELLY-FORM PREPARATION AND METHOD FOR PRODUCING JELLY-FORM PREPARATION - The present invention aims to provide a jelly (as a result, easy-to-swallow), intraorally soluble edible jelly composition although it is preferably free of water. The present invention relates to an edible jelly composition including: a gelling agent; and a nonvolatile organic solvent compatible with the gelling agent. | 11-22-2012 |
20120308662 | PARTICULATE PREPARATION AND METHOD FOR PRODUCING THE SAME - The present invention aims to provide a particulate formulation with an effectively controlled dissolution characteristic of a drug even if the average particle diameter is small. The present invention provides a particulate formulation containing drug particles and a first coating layer coating the drug particles and characterized in that the first coating layer contains a water-insoluble polymer, inorganic particles, and/or a lipid component and the lipid component contains a C | 12-06-2012 |
20130017230 | JELLY-FORM PREPARATION AND METHOD FOR PRODUCING JELLY-FORM PREPARATIONAANM SHISHIDO; TakuyaAACI Ibaraki-shiAACO JPAAGP SHISHIDO; Takuya Ibaraki-shi JPAANM Asari; DaisukeAACI Ibaraki-shiAACO JPAAGP Asari; Daisuke Ibaraki-shi JPAANM Hori; MitsuhikoAACI Ibaraki-shiAACO JPAAGP Hori; Mitsuhiko Ibaraki-shi JP - Provided is a jelly preparation which enables easy intraoral dissolution thereof, easy adjustment of the dissolution time, and stable containment of a drug therein. The jelly preparation of the present invention is a jelly preparation including water, a gelatin, a drug, and a trivalent metal ion. | 01-17-2013 |
20130177605 | ORAL FILM-FORM BASE AND PREPARATION - The present invention provides an oral film-form base which has a rapid dissolution profile in the mouth and sufficient film strength, and gives an improved taking property by foaming in the mouth. The oral film-form base includes an edible polymer soluble both in water and in an organic solvent having a solubility parameter of 9.7 or higher, a foaming agent, and an auxiliary foaming agent, wherein the foaming agent is foamable in the presence of water, and the foaming agent and the auxiliary foaming agent each are insoluble in the organic solvent, have an average particle size of 0.1 to 60 μm, and are included in particle states. | 07-11-2013 |
Patent application number | Description | Published |
20100214330 | Image display device - An image display device includes a gain calculator, a multiplier and an overdrive unit. The gain calculator calculates a ratio “Gmax0/Gmax1” as gain, with respect to each segmented region of liquid crystal panel. The symbol “Gmax1” represents a maximum gradation in one frame period of an image signal to be supplied to each segmented region. The symbol “Gmax0” represents a maximum gradation to be determined depending on the number of bits in the image signal. The multiplier multiplies an image signal subjected to frame frequency conversion in a frame frequency conversion unit by the gain to generate an image signal subjected to the area control processing, with respect to each segmented region. The overdrive unit emphasizes the image signal subjected to the area control processing, using an image signal generated by delaying the image signal subjected to the area control processing for one frame period. | 08-26-2010 |
20100265406 | MOTION VECTOR DETECTING APPARATUS AND MOTION VECTOR DETECTING METHOD - A motion vector detecting apparatus includes a correlation detecting unit, a repetitive object detecting unit and a motion vector detecting unit. The correlation detecting unit detects correlations among plural pieces of pixel data in plural directions. The repetitive object detecting unit detects whether or not concerned pixel data in which a motion vector is to be detected is located in a repetitive object. The motion vector detecting unit decreases a difference value in a direction coincident with a direction of motion vector having detected at a past time when the concerned pixel data is located in the repetitive object and detects a motion vector. | 10-21-2010 |
20110007209 | REPETITIVE OBJECT DETECTING DEVICE AND METHOD - A repetitive object detecting device includes data-retention and difference-calculation units, an adding unit, a horizontal direction accumulating unit and a small and large comparing unit. Each data-retention and difference-calculation unit carries out, with respect to a plurality of lines, a process for setting as reference pixel data pixel data located at an end of a plurality of pieces of pixel data, and calculating a difference between the reference pixel data and pixel data separated from the reference pixel data by k pixels (2≦k≦maximum number) to obtain difference data by each separated pixel number k. The adding unit adds the difference data in the plurality of lines by each separated pixel number k. The horizontal direction accumulating unit accumulates the added data by each separated pixel number k in a horizontal direction. The small and large comparing unit carries out a small and large comparison with respect to the horizontal accumulated value by each separated pixel number k to decide whether or not the reference pixel data is pixel data which is located in a repetitive object including a certain repetitive pattern. | 01-13-2011 |
20120147261 | VIDEO SIGNAL PROCESSOR - A motion vector detection unit | 06-14-2012 |
Patent application number | Description | Published |
20140036236 | PROJECTION SYSTEM - A projection system includes a projector body including a projection lens that projects image light, a color wheel located in a position downstream of the projection lens, a lens moving section that moves the projection lens from an initial position in at least one of an X direction and a Y direction, a movement amount detection unit that detects the amount of movement of the projection lens and the position to which the projection lens has been moved, an adjustment section that changes the position and the attitude of the color wheel, and an adjustment controller that controls the adjustment section in accordance with a detection result from the movement amount detection unit to adjust at least one of the position and the attitude of the color wheel. | 02-06-2014 |
20140293233 | PROJECTOR AND ILLUMINATION DEVICE - A projector includes a plurality of light sources, an integrator lens and an overlapping lens, a light guide optical system, a light control device, a light modulation device, and a projection optical system, the light control device includes a pair of light-blocking members opposed to each other across a light path of the light emitted from the light sources in one direction in which the plurality of partial areas is arranged on the integrator lens, and a control device adapted to move the light-blocking members into and out of the light path, and the control device moves the pair of light-blocking members into and out of the light path so that the light entering the overlapping lens has a shape with a symmetric property in accordance with lighting and extinction states of the plurality of light sources. | 10-02-2014 |
Patent application number | Description | Published |
20110084408 | THERMOSETTING DIE-BONDING FILM - An object of the present invention is to provide a thermosetting die-bonding film that is capable of preventing warping of an adherend by suppressing curing contraction of the film after die bonding, and a dicing die-bonding film. The present invention relates to a thermosetting die-bonding film for adhering and fixing a semiconductor element onto an adherend, comprising at least an epoxy resin and a phenol resin as a thermosetting component, wherein the ratio of the number of moles of epoxy groups to the number of moles of phenolic hydroxyl groups in the thermosetting component is in a range of 1.5 to 6. | 04-14-2011 |
20110084413 | THERMOSETTING DIE-BONDING FILM - An object thereof is to provide a thermosetting die-bonding film that is capable of preventing warping of an adherend by suppressing curing contraction of the film after die bonding, and a dicing die-bonding film. The present invention relates to a thermosetting die-bonding film for adhering and fixing a semiconductor element onto an adherend, wherein the gel fraction in an organic component after thermal curing is performed by a heat treatment at 120° C. for 1 hour is 20% by weight or less, and the gel fraction in the organic component after thermal curing is performed by a heat treatment at 175° C. for 1 hour is in a range of 10 to 30% by weight. | 04-14-2011 |
20110190421 | ADHESIVE COMPOSITION FOR PRODUCING SEMICONDUCTOR DEVICE, AND ADHESIVE SHEET FOR PRODUCING SEMICONDUCTOR DEVICE - Provided is an adhesive composition into which an additive for capturing a cation is incorporated, thereby making it possible to form a semiconductor-device-producing adhesive sheet capable of preventing deterioration of the electrical characteristic of a produced semiconductor device so as to improve the product reliability of the device. An adhesive composition, for producing a semiconductor device, which contains at least an additive for capturing a cation. | 08-04-2011 |
20120231236 | DICING FILM WITH PROTECTING FILM - The present invention provides a dicing film with a protecting film that enables to paste a dicing film to a semiconductor wafer without a shift in position while reducing a downtime. There is provided a dicing film with a protecting film in which a dicing film and a protecting film are laminated, wherein the difference between the transmittance of the protecting film and the transmittance of the dicing film with a protecting film at a portion of the dicing film where light for detecting a film transmits first is 20% or more in a wavelength of 600 to 700 nm. | 09-13-2012 |
20120231557 | METHOD OF MANUFACTURING FILM FOR SEMICONDUCTOR DEVICE - The present invention aims to provides a method of manufacturing a film for a semiconductor device in which a dicing film, a die bond film, and a protecting film are laminated in this order, including the steps of: irradiating the die bond film with a light ray having a wavelength of 400 to 800 nm to detect the position of the die bond film based on the obtained light transmittance and punching the dicing film out based on the detected position of the die bond film, and in which T | 09-13-2012 |
20140001654 | ADHESIVE FILM, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | 01-02-2014 |
20140083760 | METHOD FOR PRODUCTION OF SEALED BODY, FRAME-SHAPED SPACER FOR PRODUCTION OF SEALED BODY, SEALED BODY AND ELECTRONIC INSTRUMENT - Provided is a method for production of a sealed body which is capable of improving workability and reducing costs owing to resin-sealing in which a mold is not used, while an electronic instrument obtained has no performance failure and the like. The method for production of a sealed body according to the present invention includes: an adherend providing step of providing an adherend on which at least one electronic component is so mounted as to be displaced from a first main surface; a frame-shaped spacer providing step of providing a frame-shaped spacer having an opening formed at a position corresponding to the electronic component; a step of superimposing the frame-shaped spacer and a lead frame so that the electronic component is accommodated in the opening; a first pressure-bonding step of pressure-bonding a sheet-shaped thermosetting resin composition to a second main surface on a side opposite to the first main surface in a state of superimposing the frame-shaped spacer; a frame-shaped spacer removing step of removing the frame-shaped spacer; and a second pressure-bonding step of pressure-bonding a sheet-shaped thermosetting resin composition, which is the same as or different from the sheet-shaped thermosetting resin composition, to the first main surface so as to embed the electronic component. | 03-27-2014 |
20140106106 | DICING FILM WITH PROTECTING FILM - The present invention provides a dicing film with a protecting film that enables to paste a dicing film to a semiconductor wafer without a shift in position while reducing a downtime. There is provided a dicing film with a protecting film in which a dicing film and a protecting film are laminated, wherein the difference between the transmittance of the protecting film and the transmittance of the dicing film with a protecting film at a portion of the dicing film where light for detecting a film transmits first is 20% or more in a wavelength of 600 to 700 nm. | 04-17-2014 |
Patent application number | Description | Published |
20110210455 | DIE BOND FILM, DICING DIE BOND FILM, AND SEMICONDUCTOR DEVICE - The present invention provides a die bond film for adhering, onto a semiconductor element that is electrically connected to an adherend with a bonding wire, another semiconductor element and that enables loading of the other semiconductor element and improvement in the manufacturing yield of a semiconductor device by preventing deformation and cutting of the bonding wire, and a dicing die bond film. The die bond film of the present invention is a die bond film for adhering, onto a semiconductor element that is electrically connected to an adherend with a bonding wire, another semiconductor element, in which at least a first adhesive layer that enables a portion of the bonding wire to pass through inside thereof by burying the portion upon press bonding and a second adhesive layer that prevents the other semiconductor element from contacting with the bonding wire are laminated. | 09-01-2011 |
20110217501 | DICING DIE-BONDING FILM - A dicing die-bonding film with excellent peeling property when a diced semiconductor chip and its die-bonding film are, without deteriorating a holding force during dicing a semiconductor wafer even if it is thin. A dicing die-bonding film, comprising a dicing film having at least a pressure-sensitive adhesive layer formed on a supporting base material, and a die-bonding film formed on the pressure-sensitive adhesive layer, wherein the thickness of the pressure-sensitive adhesive layer is 5 to 80 μm, and when the dicing film is peeled off from the die-bonding film after dicing from the side of the die-bonding film to a part of the pressure-sensitive adhesive layer, the maximum value of a peeling force in the vicinity of the cut surface is 0.7 N/10 mm or less under the conditions of a temperature of 23° C., a peeling angle of 180°, and a peeling point moving rate of 10 mm/min. | 09-08-2011 |
Patent application number | Description | Published |
20100261314 | THERMOSETTING DIE BONDING FILM - The present invention has been made and an object thereof is to provide a thermosetting die-bonding film which can remarkably reduce working hours at the time of die bonding of a semiconductor chip, and a dicing die-bonding film including the thermosetting die-bonding film and a dicing film layered to each other. The present invention relates to a thermosetting die-bonding film used to produce a semiconductor device, comprising a thermosetting catalyst in a non-crystalline state in an amount within a range from 0.2 to 1 part by weight based on 100 parts by weight of an organic component in the film. | 10-14-2010 |
20110057331 | THERMOSETTING DIE BONDING FILM, DICING DIE BONDING FILM AND SEMICONDUCTOR DEVICE - An object of the present invention is to provide a thermosetting die-bonding film with which a die-bonding film is suitably broken with a tensile force. The object is achieved by a thermosetting die-bonding, film at least having an adhesive layer that is used to fix a semiconductor chip to an adherend, in which the breaking energy per unit area is 1 J/mm | 03-10-2011 |
20110074050 | FILM FOR SEMICONDUCTOR DEVICE - The present invention provides a film for a semiconductor device, which is capable of preventing interface delamination between each of the films, a film lifting phenomenon, and transfer of the adhesive film onto the cover film even during transportation or after long-term storage in a low temperature condition. The film for a semiconductor device of the present invention is a film in which an adhesive film and a cover film are sequentially laminated on a dicing film, in which a peel force F | 03-31-2011 |