Patent application number | Description | Published |
20100026186 | POWER SUPPLY IGNITION SYSTEM AND METHOD - One embodiment comprises a plasma processing system having a plasma chamber, a generator, a feedback component, and a controller. The feedback component is adapted to receive at least one first signal having a level dependent upon the power signal supplied from the generator to the chamber. A feedback output is adapted to emit a second signal to the controller, which is adapted to supply a third signal to the power generator. The third signal is configured to control the power generator to supply the power signal at a power level for a particular processing application. The power generator is further controlled by the controller to one of reduce and remove power from the plasma processing chamber and subsequently increase the voltage level until the power level reaches a threshold level. The power generator is further controlled to subsequently modulate the voltage until the voltage returns to a first voltage level. | 02-04-2010 |
20100149843 | PREEMPTIVE PROTECTION FOR A POWER CONVERTOR - Among many embodiments, a power conversion apparatus and a method for converting power are disclosed. The power conversion apparatus may include switching components configured to create an alternating current; a preemptive detector arranged and configured to provide, in advance of the alternating current reaching a zero-crossing, a control signal responsive to the alternating electrical current approaching the zero-crossing; and a controller configured, at least in part, to change a state of the switching components before the zero crossing, in response to the control signal. | 06-17-2010 |
20120043890 | PROACTIVE ARC MANAGEMENT OF A PLASMA LOAD - Proactive arc management systems and methods are disclosed. In many implementations, proactive arc management is accomplished by executing an arc handling routine in response to an actual arc occurring in the plasma load and in response to proactive arc handling requests in a sampling interval. The number of proactive arc handling requests in a sampling interval is a function of a proactive arc management count that in turn is a function of actual number of arcs in a preceding sampling interval. Accordingly during a present sampling interval proactive arc management executes arc handling for actual arcs in the present sampling interval and for each count in a proactive arc management count updated as a function of the number of arcs in the immediately preceding sampling interval. | 02-23-2012 |
20140043881 | POWER CONVERTER WITH PREEMPTIVE PROTECTION - Among many embodiments, a power conversion apparatus and a method for converting power are disclosed. The power conversion apparatus may include switching components configured to create an alternating current; a preemptive detector arranged and configured to provide, in advance of the alternating current reaching a zero-crossing, a control signal responsive to the alternating electrical current approaching the zero-crossing; and a controller configured, at least in part, to change a state of the switching components before the zero crossing, in response to the control signal. | 02-13-2014 |
20140070730 | ARC MANAGEMENT WITH VOLTAGE REVERSAL AND IMPROVED RECOVERY - Systems and methods for arc handling in plasma processing operations are disclosed. The method includes providing current with a power supply to a plasma load at a first voltage polarity and energizing an energy storage device so when it is energized, the energy storage device applies a reverse polarity voltage that has a magnitude that is as least as great as the first voltage polarity. When an arc is detected, power is applied from the energy storage device to the plasma load with a reverse polarity voltage that has a polarity that is opposite of the first voltage polarity, the application of the reverse polarity voltage to the plasma load decreases a level of the current that is provided to the plasma load. | 03-13-2014 |
20140232266 | ADJUSTABLE NON-DISSIPATIVE VOLTAGE BOOSTING SNUBBER NETWORK FOR ACHIEVING LARGE BOOST VOLTAGES - This disclosure describes a non-dissipative snubber circuit configured to boost a voltage applied to a load after the load's impedance rises rapidly. The voltage boost can thereby cause more rapid current ramping after a decrease in power delivery to the load which results from the load impedance rise. In particular, the snubber can comprise a combination of a unidirectional switch, a voltage multiplier, and a current limiter. In some cases, these components can be a diode, voltage doubler, and an inductor, respectively. | 08-21-2014 |
20160071697 | ADJUSTABLE NON-DISSIPATIVE VOLTAGE BOOSTING SNUBBER NETWORK FOR ACHIEVING LARGE BOOST VOLTAGES - This disclosure describes a non-dissipative snubber circuit configured to boost a voltage applied to a load after the load's impedance rises rapidly. The voltage boost can thereby cause more rapid current ramping after a decrease in power delivery to the load which results from the load impedance rise. In particular, the snubber can comprise a combination of a unidirectional switch, a voltage multiplier, and a current limiter. In some cases, these components can be a diode, voltage doubler, and an inductor, respectively. | 03-10-2016 |
Patent application number | Description | Published |
20090127101 | METHODS AND APPARATUS FOR SPUTTERING DEPOSITION USING DIRECT CURRENT - An apparatus and methods for plasma-based sputtering deposition using a direct current power supply is disclosed. In one embodiment, a plasma is generated by connecting a plurality of electrodes to a supply of current, and a polarity of voltage applied to each of a plurality of electrodes in the processing chamber is periodically reversed so that at least one of the electrodes sputters material on to the substrate. And an amount of power that is applied to at least one of the plurality of electrodes is modulated so as to deposit the material on the stationary substrate with a desired characteristic. In some embodiments, the substrate is statically disposed in the chamber during processing. And many embodiments utilize feedback indicative of the state of the deposition to modulate the amount of power applied to one or more electrodes. | 05-21-2009 |
20090273954 | Protection Method, System and Apparatus for a Power Converter - Among many embodiments, a power converter and a method for operating a power converter are disclosed. The power converter may include a pair of switches connected in series, an output transformer connected to a common node between the switches and a protection apparatus for protecting each switch from being hard driven, each switch being enabled by a gate signal and turning ON in alternating half cycles so as to drive transformer current in alternate directions through the transformer. The protection apparatus may include: a detector configured to detect whether an intrinsic diode in a first switch is conducting the transformer current; and a gate signal disabler configured in response to the detector blocking an ON gate pulse from reaching a second switch in the pair of switches so that the second switch is not turned ON while the intrinsic diode of the first switch is conducting. | 11-05-2009 |
20120171390 | METHODS AND APPARATUS FOR SPUTTERING USING DIRECT CURRENT - An apparatus and methods for plasma-based sputtering deposition using a direct current power supply is disclosed. In one embodiment, a plasma is generated by connecting a plurality of electrodes to a supply of current, and a polarity of voltage applied to each of a plurality of electrodes in the processing chamber is periodically reversed so that at least one of the electrodes sputters material on to the substrate. And an amount of power that is applied to at least one of the plurality of electrodes is modulated so as to deposit the material on the stationary substrate with a desired characteristic. In some embodiments, the substrate is statically disposed in the chamber during processing. And many embodiments utilize feedback indicative of the state of the deposition to modulate the amount of power applied to one or more electrodes. | 07-05-2012 |