Wen-Chuan
Wen-Chuan Chang, Taipei City TW
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20120236646 | NON-VOLATILE MEMORY CELL - The non-volatile memory cell includes a coupling device and a first select transistor. The coupling device is formed in a first conductivity region. The first select transistor is serially connected to a first floating gate transistor and a second select transistor, all formed in a second conductivity region. An electrode of the coupling device and a gate of the first floating gate transistor are a monolithically formed floating gate; wherein the first conductivity region and the second conductivity region are formed in a third conductivity region; wherein the first conductivity region, the second conductivity region, and the third conductivity region are wells. | 09-20-2012 |
Wen-Chuan Chen, Hukou Township TW
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20120187582 | INJECTION MOLDING SYSTEM AND METHOD OF CHIP PACKAGE - The injection molding system comprises a substrate, an inner cover, a molding tool, and a bottom plate. The substrate is used to locate at least one semiconductor device under molding and the inner cover with at least one first injection via, cavity and runner placed over the substrate. In addition, the molding tool includes at least one second injecting via aligned with the runner and the bottom plate is placed under the substrate. Furthermore, a filling material is filled into the cavity and runner of the inner cover during molding. In order to avoid overflowing the filling material, the system further comprises an O-ring placed between the molding tool and the inner cover. The inner radius of the O-ring corresponds with the inner radius of the injection via and is aligned with it. | 07-26-2012 |
Wen-Chuan Chen, Chutung TW
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20140143468 | REAL-TIME SAMPLING DEVICE AND METHOD THEREOF - A real-time sampling device for being coupled to a processing unit includes a first register, a second register, a third register, a trigger output element and a timer for outputting an interrupt signal. The first register externally receives and processes a first input signal to produce processed data. The second register retrieves the processed data from the first register upon receiving the interrupt signal, and the processing unit, upon receiving the interrupt signal, retrieves the processed data from the second register and performs calculation thereon to produce a processed data calculation value and temporarily store the processed data calculation value in the third register. The trigger output element outputs the processed data calculation value in the third register in real time upon receiving the interrupt signal. The real-time sampling device an be applied to digital control systems in order to perform real-time sampling on controlled subjects. | 05-22-2014 |
Wen-Chuan Chen, Jincheng Township TW
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20120275454 | ASYNCHRONOUS MASTER-SLAVE SERIAL COMMUNICATION SYSTEM, DATA TRANSMISSION METHOD, AND CONTROL MODULE USING THE SAME THEREOF - An asynchronous master-slave serial communication system, a data transmission method, and a control module using the same are disclosed. The asynchronous master-slave serial communication system comprises a master control module and a slave control module. The master control module generates a check code according to an address information and a data information, and generates a data package according to the address information, the data information, the check code and the master clock signal. The slave control module generates a decoding data according to the data package and a slave clock signal, and generates the address information, the data information and the check code according to the decoding data. | 11-01-2012 |
Wen-Chuan Chen, Hsinchu City TW
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20100152868 | MOTION CONTROL SERVO LOOP APPARATUS - A motion control servo loop apparatus, comprising: a feed-forward control module, and a proportional-integral-derivative (PID) control loop and a compensation adder. The feed-forward control module is capable of generating a feed-forward compensation. The PID control loop further comprises: a proportional control module, an integral control module and a derivative control module. The proportional control module is capable of generating a proportional compensation. The derivative control module is capable of generating a derivative compensation. The integral control module uses a digital differential analyzer (DDA) algorithm to perform integration for accumulated errors with respect to each sampling clock at each DDA pulse and thus output an accumulated error, which is then processed to generate an integral compensation. Thereafter, the compensation adder receives the feed-forward compensation, the proportional compensation, the integral compensation and the derivative compensation to calculate a position error compensation for a motor driver. | 06-17-2010 |
Wen-Chuan Chen, Kaohsiung City TW
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20110084289 | ACTIVE DEVICE ARRAY SUBSTRATE AND FABRICATION METHOD THEREOF - An active device array substrate including a substrate, a plurality of scan lines, a plurality of data lines, a plurality of active devices, a first passivation layer, a transparent pad layer, a plurality of color filter patterns, a second passivation layer, a plurality of pixel electrodes, and a black matrix layer is provided. Each of the active devices is electrically connected to one of the scan lines and one of the data lines, respectively. The transparent pad layer having a plurality of openings for accommodating the color filter patterns is disposed on the first passivation layer located above the scan lines and the data lines. The first passivation layer, the color filter patterns and the second passivation layer have a plurality of contact windows therein. The black matrix layer is disposed above the transparent pad layer to cover a portion of the pixel electrodes. | 04-14-2011 |
Wen-Chuan Chen, Taipei TW
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20110071636 | Displacement Leaf Spring and Artificial Intervertebral Disc Containing the Same - A displacement leaf spring and an artificial intervertebral disc containing the same, particularly about the artificial intervertebral disc using the displacement leaf spring to cushion axial compression, wherein the artificial intervertebral disc includes a displacement leaf spring and the displacement leaf spring further includes an upper plate, an inclined plate, and a lower plate. The upper plate has a first breach, and the inclined plate has a first connecting side which connects to one side of the first breach. There is an angle between the inclined plate and the upper plate. The inclined plate has a second breach, and the lower plate has a second connecting side which connects to one side of the second breach. There is an angle between the lower plate and the inclined plate, and the lower plate parallels the upper plate. The artificial intervertebral disc equipped with the displacement leaf spring further comprises a top plate, a bottom plate, a core structure, and a socket structure. The top and bottom plate connect to the bottom of the upper vertebral body and the top of the lower vertebral body respectively. The form of the core structure fits in the socket structure. The core structure and the socket structure are installed between the top and bottom plate to make the artificial intervertebral disc have a wide range of activity angle and capability to cushion the axial compression. | 03-24-2011 |
Wen-Chuan Chen, Taipei City TW
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20100217389 | GRAFT ATTACHMENT DEVICE FOR LIGAMENT RECONSTRUCTION - The present invention discloses a graft attachment device for cruciate ligament reconstruction comprises a body having a screw portion with a threading area on the front end of the body, a connection member disposed on the front end, a gap formed between the front end and a predetermined portion of the body adapted for a rope-type member pass through, a pivoting member pivoted on the rear end of the body with its front end, the rear end of the pivoting member having a juncture portion for fixing a ligament, thereby the device could be screwed and fixed on a bone when rotating the device, and seamed a ligament on the rear end of the device. | 08-26-2010 |
Wen-Chuan Hsu, Hsinchu County TW
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20140100308 | METHOD FOR PREPARING PHENOL-FORMALDEHYDE RESINS, RESIN MATERIALS AND METHOD FOR PREPARING RESIN MOLDING MATERIALS - A method for preparing a phenol-formaldehyde resin is provided. The method includes extracting a biomass pyrolysis oil to obtain a first phenolic mixture, mixing the first phenolic mixture, furfural and an alkaline catalyst to proceed to a first polymerization reaction to form a phenol-formaldehyde resin precursor solution, and adding the alkaline catalyst to the phenol-formaldehyde resin precursor solution to proceed to a second polymerization reaction to form a phenol-formaldehyde resin solution. The disclosure also provides a resin material prepared from the phenol-formaldehyde resin. The disclosure further provides a method for preparing a resin molding material. | 04-10-2014 |
Wen-Chuan Hsu, Xinpu Township TW
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20130172451 | METHOD FOR PREPARING PHENOL-FORMALDEHYDE RESINS, RESIN MATERIALS AND METHOD FOR PREPARING RESIN MOLDING MATERIALS - A method for preparing a phenol-formaldehyde resin is provided. The method includes extracting a biomass pyrolysis oil to obtain a first phenolic mixture, and polymerizing the first phenolic mixture to form a phenol-formaldehyde resin solution under an aldehyde, an alcohol and an alkaline catalyst. The disclosure also provides a resin material prepared from the phenol-formaldehyde resin. The disclosure further provides a method for preparing a resin molding material. | 07-04-2013 |
Wen-Chuan Kuo, Taipei City TW
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20140198310 | Balanced-Detection Spectra Domain Optical Coherence Tomography System - A balanced-detection spectra domain optical coherence tomography system is disclosed. A light beam L emitting from the light source module is passed through the second beam splitter, the first beam splitter in series, and then split to the mirror and the sample respectively, and further simultaneously reflected to the first beam splitter, a light beam L | 07-17-2014 |
Wen-Chuan Lee, Taoyuan County TW
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20150015680 | METHOD AND ELECTRONIC DEVICE FOR GENERATING MULTIPLE POINT OF VIEW VIDEO - The present disclosure proposes a method and an electronic device of generating a multiple point of view (MPOV) video. In the present disclosure, the method for generating the MPOV video may include a step of obtaining a plurality of media contents, determining, from the plurality of media contents, a first media content and a second media content as relevant media contents, wherein each of the relevant media contents comprises a scene of a same event, identifying an overlap section comprising a portion of the first media content overlapping with a portion of the second media content, identifying a highlight period by analyzing a content feature of the portion of the first media content and the portion of the second media content within the overlap section, and generating the MPOV video based on the first media content and the second media content within the highlight period. | 01-15-2015 |
Wen-Chuan Lee, Hsinchu TW
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20080274508 | Expression system for enhancing solubility and immunogeneicity of recombinant proteins - Expression system for enhancing solubility and immunogenicity of recombinant proteins. The expression system includes a protein expression vector that contains a chimeric gene encoding a chimeric protein. The chimeric protein contains three polypeptidyl fragments: (a) a first polypeptidyl fragment at the N-terminal end of the chimeric protein that contains a protein transduction domain (PTD) or a fragment thereof having HIV Tat PTD activity; (b) a second polypeptidyl fragment at the C-terminal end of the first polypeptidyl fragment that contains a J-domain or a fragment thereof having heat shock protein 70 (Hsp70)-interacting activity; and (c) a third polypeptidyl fragment at the C-terminal end of the second polypeptidyl fragment that contains a target protein or polypeptide. | 11-06-2008 |
20090187004 | EXPRESSION SYSTEM FOR ENHANCING SOLUBILITY AND IMMUNOGENEICITY OF RECOMBINANT PROTEINS - Expression system for enhancing solubility and immunogenicity of recombinant proteins. The expression system includes a protein expression vector that contains a chimeric gene encoding a chimeric protein comprising: (a) a first polypeptidyl fragment at the N-terminal end of the chimeric protein, containing a protein transduction domain (PTD), or a fragment thereof, having HIV Tat PTD activity; (b) a second polypeptidyl fragment at the C-terminal end of the first polypeptidyl fragment, containing a J-domain, or a fragment thereof, having heat shock protein 70 (Hsp70)-interacting activity; and (c) a third polypeptidyl fragment at the C-terminal end of the second polypeptidyl fragment, containing a target protein or polypeptide. | 07-23-2009 |
Wen-Chuan Lee, Hsinchu City TW
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20090151640 | Poultry selection method to improve the egg production rate - The present invention discloses a poultry selection method to improve the egg production rate, the method comprises steps of collecting protein samples and egg productivity information of multiple poultry groups, transforming these information into multiple scores, ranks, and their corresponding codes; the next step is to combine the corresponding codes to form regional codes, and compare the matching rate; and select the poultry with the required egg production. The present invention further discloses another method, comprising: the collecting and ranking of protein samples and egg productivity information of known and unknown poultry groups to sort out the ratings; select a poultry group having the required egg production from the known group; define the regional codes based on the ratings of the known group; compare the ratings between the known and unknown groups, select the poultry (from the unknown group) with the same regional codes to the previously selected poultry group with required egg production; and select the poultry with required egg production according to the matching rate after the comparison. | 06-18-2009 |
Wen-Chuan Lin, Taichung City TW
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20080241283 | Aqueous extracts of anoectochilus spp. kinsenoside-comprising pharmaceutical compositions useful for hepatoprotection and uses of the same - A pharmaceutical composition useful for hepatoprotection is provided. The composition comprises an effective amount of kinsenoside or a pharmaceutically acceptable salt or ester thereof. An aqueous extract of | 10-02-2008 |
20120238513 | METHOD FOR INHIBITING ACTIVATION OF MACROPHAGES - Provided is a method for inhibiting the activation of macrophages in a subject, comprising administrating to the subject an effective amount of an active component selected from the group consisting of a compound of formula (I), a pharmaceutically acceptable salt of the compound, and a pharmaceutically acceptable ester of the compound, and combinations thereof: | 09-20-2012 |
Wen-Chuan Lin, Taichung TW
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20090306199 | Method for inhibiting activation of macrophages, inhibiting formation of osteoclasts, inhibiting function of osteoclasts, and/or activating osteoblasts - A method for inhibiting the activation of macrophages, inhibiting the formation of osteoclasts, inhibiting the function of osteoclasts, and/or activating osteoblasts in a mammal is provided. The method comprises the administration of an effective amount of kinsenoside of formula (I) or a pharmaceutically acceptable salt or ester thereof to the mammal: | 12-10-2009 |
20110082103 | Anoectochilus SPP. polysaccharide extracts for stimulating growth of advantageous bacteria, stimuating release of granulocyte colony-Stimulating factor, modulating T helper cell type I, and/or modulating T helper cell type II and uses of the same | 04-07-2011 |
20110082197 | Method for inhibiting formation and/or activation of osteoclasts using flemingia macrophylla extract or lespedeza flavanone A - A method for inhibiting the formation and/or activation of osteoclasts in a mammal comprising administrating an effective amount of a compound of formula (I) or a pharmaceutically acceptable salt or ester thereof to the mammal is provided: | 04-07-2011 |
20110142966 | AQUEOUS EXTRACTS OF ANOECTOCHILUS SPP. KINSENOSIDE AND PHARMACEUTICAL COMPOSITIONS USEFUL FOR HEPATOPROTECTION - A pharmaceutical composition useful for hepatoprotection is provided. The composition comprises an effective amount of kinsenoside or a pharmaceutically acceptable salt or ester thereof. An aqueous extract of | 06-16-2011 |
20120059059 | METHOD FOR INHIBITING ACTIVITY AND/OR EXPRESSION OF MATRIX METALLOPROTEINASE, INHIBITING PHOSPHORYLATION OF MITOGEN-ACTIVATED PROTEIN KINASE, AND/OR PROMOTING EXPRESSION OF COLLAGEN USING TORMENTIC ACID - A method for inhibiting the activity of matrix metalloproteinase (MMP), inhibiting the expression of matrix metalloproteinase, inhibiting the phosphorylation of mitogen-activated protein kinase (MAPK), and/or promoting the expression of collagen in a mammal is provided. The method comprises administrating to the mammal an effective amount of an active component selected from a group consisting of a compound of formula (I), a pharmaceutically acceptable salt of the compound, a pharmaceutically acceptable ester of the compound, and combinations thereof: | 03-08-2012 |
20120277182 | ANOECTOCHILUS SPP. POLYSACCHARIDE EXTRACTS FOR STIMULATING GROWTH OF ADVANTAGEOUS BACTERIA, STIMULATING RELEASE OF GRANULOCYTE COLONY-STIMULATING FACTOR, MODULATING T HELPER CELL TYPE I, AND/OR MODULATING T HELPER CELL TYPE II AND USES OF THE SAME | 11-01-2012 |
Wen-Chuan Liu, Hsi-Chih City TW
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20090123647 | TRANSPARENT AQUA-BASED NANO SOL-GEL COMPOSITION AND METHOD OF APPLYING THE SAME - The present invention relates to a transparent aqua-based nano sol-gel composition and method of applying the same to transparent substrates without decreasing the visible light and sunlight transmittance thereof. The transparent aqua-based nano sol-gel can be applied to a surface of a transparent substrate to form a porous film which will not reduce the visible light and sunlight transmittance of the transparent substrate and will impart a self-cleaning function to the transparent substrate. The transparent aqua-based nano sol-gel composition contains a transparent aqua-based zeolite sol-gel having a particle size of less than 100 nm, a polysiloxane derivate, a surfactant, a transparent aqua-based photocatalytic sol-gel of titanium dioxide having a particle size of less than 100 nm, and deionized water. | 05-14-2009 |
20120064240 | TRANSPARENT AQUA-BASED NANO SOL-GEL COMPOSITION AND METHOD OF APPLYING THE SAME - The present invention relates to a transparent aqua-based nano sol-gel composition and method of applying the same to transparent substrates without decreasing the visible light and sunlight transmittance thereof. The transparent aqua-based nano sol-gel can be applied to a surface of a transparent substrate to form a porous film which will not reduce the visible light and sunlight transmittance of the transparent substrate and will impart a self-cleaning function to the transparent substrate. The transparent aqua-based nano sol-gel composition contains a transparent aqua-based zeolite sol-gel having a particle size of less than 100 nm, a polysiloxane derivate, a surfactant, a transparent aqua-based photocatalytic sol-gel of titanium dioxide having a particle size of less than 100 nm, and deionized water. | 03-15-2012 |
Wen-Chuan Wang, New Taipei City TW
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20140291803 | CAPACITOR STRUCTURE OF GATE DRIVER IN PANEL - A capacitor structure of gate driver in panel (GIP) includes a first metal layer, a first dielectric layer, a second metal layer, a second dielectric layer, a first and second transparent capacitor electrode layers. The first dielectric layer covers the first metal layer. The second metal layer is disposed on the first dielectric layer and coupled to the first metal layer. The second dielectric layer covers the second metal layer. The first transparent capacitor electrode layer is disposed on the first dielectric layer and connected to the second metal layer. The second transparent capacitor electrode layer is disposed on the second dielectric layer and coupled to the first metal layer, in which the second and first transparent capacitor electrode layers are arranged to be stacked in a thickness direction and mutually opposed across the second dielectric layer therebetween. | 10-02-2014 |
Wen-Chuan Wang, Taipei County TW
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20100240502 | BOXING SANDBAG - A punching bag is provided. The punching bag is positioned on a fixed pillar, and comprises a supporting frame, a foam layer, a force-bearing plate, and a punch pad. The supporting frame is attached and fastened to the fixed pillar. The foam layer is disposed on the supporting frame, and at least a sensing element is positioned on a surface of the foam layer for measuring an external punch force. The force-bearing plate is disposed on the foam layer and utilized for covering the foam layer, wherein at least an elastic element correspondingly attached to the at least a sensing element is positioned on an inner side of the force-bearing plate. The punch pad is utilized for covering and attaching to the force-bearing plate to bear the external punch force. | 09-23-2010 |
Wen-Chuan Wang, Hsinchu City TW
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20090063074 | Mask Haze Early Detection - Detecting haze formation on a mask by obtaining an optical property of the mask and determining progress of the haze formation based on the obtained optical property. | 03-05-2009 |
20100084683 | LIGHT EMITTING DIODE PACKAGE AND FABRICATING METHOD THEREOF - A light emitting diode (LED) package is provided. The LED package includes a carrier, a package housing, a strength enhancement structure, an ESD protector and an LED chip. The carrier has a first surface and a second surface. The carrier includes a first electrode and a second electrode, wherein a gap is between the first electrode and the second electrode. The package housing is disposed on the carrier and has a first aperture and a second aperture. The first surface is exposed by the first aperture while the second surface is exposed by the second aperture. The strength enhancement structure is disposed at the gap. The ESD protector is disposed on the carrier and located within the second aperture. The LED chip is disposed on the carrier and located within the first aperture, wherein the ESD protector and the LED chip is electrically connected to the carrier. | 04-08-2010 |
20120235063 | Systems and Methods Providing Electron Beam Writing to a Medium - A method for electron-beam writing to a medium includes positioning the medium within an e-beam writing machine so that the medium is supported by a stage and is exposed to an e-beam source. The method also includes writing a pattern to the medium using a plurality of independently-controllable beams of the e-beam source, in which the pattern comprises a plurality of parallel strips. Each of the parallel strips is written using multiple ones of the independently-controllable beams. | 09-20-2012 |
20120264062 | ELECTRON BEAM LITHOGRAPHY SYSTEM AND METHOD FOR IMPROVING THROUGHPUT - An electron beam lithography method and apparatus for improving throughput is disclosed. An exemplary lithography method includes receiving a pattern layout having a pattern layout dimension; shrinking the pattern layout dimension; and overexposing a material layer to the shrunk pattern layout dimension, thereby forming the pattern layout having the pattern layout dimension on the material layer. | 10-18-2012 |
20130146780 | SYSTEMS AND METHODS PROVIDING ELECTRON BEAM WRITING TO A MEDIUM - A method for electron-beam writing to a medium includes positioning the medium within an e-beam writing machine so that the medium is supported by a stage and is exposed to an e-beam source. The method also includes writing a pattern to the medium using a plurality of independently-controllable beams of the e-beam source, in which the pattern comprises a plurality of parallel strips. Each of the parallel strips is written using multiple ones of the independently-controllable beams. | 06-13-2013 |
20130157389 | Multiple-Patterning Overlay Decoupling Method - A method for fabricating a semiconductor device is disclosed. An exemplary method includes forming a first structure in a first layer by a first exposure and determining placement information of the first structure. The method further includes forming a second structure in a second layer overlying the first layer by a second exposure and determining placement information of the second structure. The method further includes forming a third structure including first and second substructures in a third layer overlying the second layer by a third exposure. Forming the third structure includes independently aligning the first substructure to the first structure and independently aligning the second substructure to the second structure | 06-20-2013 |
20130203001 | Multiple-Grid Exposure Method - A method for fabricating a semiconductor device is disclosed. An exemplary method includes receiving an integrated circuit (IC) layout design including a target pattern on a grid. The method further includes receiving a multiple-grid structure. The multiple-grid structure includes a number of exposure grid segments offset one from the other by an offset amount in a first direction. The method further includes performing a multiple-grid exposure to expose the target pattern on a substrate and thereby form a circuit feature pattern on the substrate. Performing the multiple-grid exposure includes scanning the substrate with the multiple-grid structure in a second direction such that a sub-pixel shift of the exposed target pattern occurs in the first direction, and using a delta time (Δt) such that a sub-pixel shift of the exposed target pattern occurs in the second direction. | 08-08-2013 |
20130232453 | NON-DIRECTIONAL DITHERING METHODS - A method of data preparation in lithography processes is described. The method includes providing an integrated circuit (IC) layout design in a graphic database system (GDS) grid, converting the IC layout design GDS grid to a first exposure grid, applying a non-directional dither technique to the first exposure, coincident with applying dithering to the first expose grid, applying a grid shift to the first exposure grid to generate a grid-shifted exposure grid and applying a dither to the grid-shifted exposure grid, and adding the first exposure grid (after receiving dithering) to the grid-shifted exposure grid (after receiving dithering) to generate a second exposure grid. | 09-05-2013 |
20130232455 | ERROR DIFFUSION AND GRID SHIFT IN LITHOGRAPHY - The present disclosure involves a method of data preparation in lithography processes. The method of data preparation includes providing an integrated circuit (IC) layout design in a graphic database system (GDS) grid, and converting the IC layout design GDS grid to a second exposure grid by applying an error diffusion and a grid shift technique to a sub-pixel exposure grid. | 09-05-2013 |
20130273474 | Grid Refinement Method - The present disclosure provides an embodiment of a method, for a lithography process for reducing a critical dimension (CD) by a factor n wherein n<1. The method includes providing a pattern generator having a first pixel size S | 10-17-2013 |
20130273475 | Grid Refinement Method - The present disclosure provide one embodiment of a method of a lithography process for reducing a critical dimension (CD) by a factor n wherein n<1. The method includes providing a pattern generator having a first pixel area S1 to generate a data grid having a second pixel area S2 that is equal to n | 10-17-2013 |
20130323918 | METHODS FOR ELECTRON BEAM PATTERNING - A method for electron-beam patterning includes forming a conductive material layer on a substrate; forming a bottom anti-reflective coating (BARC) layer on the conductive material layer; forming a resist layer on the BARC layer; and directing an electron beam (e-beam) to the sensitive resist layer for an electron beam patterning process. The BARC layer is designed such that a top electrical potential of the resist layer is substantially zero during the e-beam patterning process. | 12-05-2013 |
20130327962 | Electron Beam Lithography System and Method For Improving Throughput - An electron beam lithography method and apparatus for improving throughput is disclosed. An exemplary lithography method includes receiving a pattern layout having a pattern layout dimension; shrinking the pattern layout dimension; and overexposing a material layer to the shrunk pattern layout dimension, thereby forming the pattern layout having the pattern layout dimension on the material layer. | 12-12-2013 |
20130330670 | Electron Beam Lithography System and Method for Improving Throughput - An electron beam lithography method and apparatus for improving throughput is disclosed. An exemplary lithography method includes receiving a pattern layout having a pattern layout dimension; shrinking the pattern layout dimension; and overexposing a material layer to the shrunk pattern layout dimension, thereby forming the pattern layout having the pattern layout dimension on the material layer. | 12-12-2013 |
20140004468 | MULTIPLE-GRID EXPOSURE METHOD | 01-02-2014 |
20140217305 | SYSTEMS AND METHODS PROVIDING ELECTRON BEAM WRITING TO A MEDIUM - A method for electron-beam writing to a medium includes positioning the medium within an e-beam writing machine so that the medium is supported by a stage and is exposed to an e-beam source. The method also includes writing a pattern to the medium using a plurality of independently-controllable beams of the e-beam source, in which the pattern comprises a plurality of parallel strips. Each of the parallel strips is written using multiple ones of the independently-controllable beams. | 08-07-2014 |
20140368806 | Grid Refinement Method - The present disclosure provides an embodiment of a method, for a lithography process for reducing a critical dimension (CD) by a factor n wherein n<1. The method includes providing a pattern generator having a first pixel size S1 to generate an alternating data grid having a second pixel size S2 that is 12-18-2014 | |
20150040079 | Method for Electron Beam Proximity Correction with Improved Critical Dimension Accuracy - The present disclosure provides one embodiment of an integrated circuit (IC) method. The method includes receiving an IC design layout having a feature; fracturing the feature into a plurality of polygons that includes a first polygon; assigning target points to edges of the first polygon; calculating corrected exposure doses to the first polygon, wherein each of the correct exposure doses is determined based on a respective one of the target points by simulation; determining a polygon exposure dose to the first polygon based on the corrected exposure doses; and preparing a tape-out data for lithography patterning, wherein the tape-out data defines the plurality of polygons and a plurality of polygon exposure doses paired with the plurality of polygons. | 02-05-2015 |
20150052489 | LONG-RANGE LITHOGRAPHIC DOSE CORRECTION - A method of quantifying a lithographic proximity effect and determining a lithographic exposure dosage is disclosed. In an exemplary embodiment, the method for determining an exposure dosage comprises receiving a design database including a plurality of features intended to be formed on a workpiece. A target region of the design database is defined such that the target region includes a target feature. A region of the design database proximate to the target region is also defined. An approximation for the region is determined, where the approximation represents an exposed area within the region. A proximity effect of the region upon the target feature is determined based on the approximation for the region. A total proximity effect for the target feature is determined based on the determined proximity effect of the region upon the target feature. | 02-19-2015 |
20150077731 | SYSTEMS AND METHODS FOR HIGH-THROUGHPUT AND SMALL-FOOTPRINT SCANNING EXPOSURE FOR LITHOGRAPHY - The present disclosure provides a lithography system comprising a radiation source and an exposure tool including a plurality of exposure columns densely packed in a first direction. Each exposure column includes an exposure area configured to pass the radiation source. The system also includes a wafer carrier configured to secure and move one or more wafers along a second direction that is perpendicular to the first direction, so that the one or more wafers are exposed by the exposure tool to form patterns along the second direction. The one or more wafers are covered with resist layer and aligned in the second direction on the wafer carrier. | 03-19-2015 |
Wen-Chuan Wang, Taipei TW
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20110005010 | SYSTEM AND METHOD FOR REMOVING PARTICLES IN SEMICONDUCTOR MANUFACTURING - A system for semiconductor wafer manufacturing, comprises a chamber process path for processing the wafer, and a device operable to remove particles from the wafer by electrostatic and electromagnetic methodologies wherein the device is installed in the chamber process path. | 01-13-2011 |