Patent application number | Description | Published |
20080308304 | Multilayer Wiring Board and Its Manufacturing Method - A multilayer wiring board employs a thin insulating substrate having substantially only resin flow as the compression property effect, and has an any-layer IVH structure where at least one core layer is formed without burying wiring. For sufficiently securing an effective compression amount of the crush-allowance of a conductor, the ratio of the thickness of a cover film to that of the electrical insulating substrate is increased, and a via can be formed in the core layer without burying the wiring in the insulating substrate. Thus, a multilayer wiring board having an any-layer IVH structure that can achieve high-density component mountability and wiring storability in an extremely small thickness can be provided. | 12-18-2008 |
20090139761 | MULTILAYER PRINTED WIRING BOARD AND MANUFACTURING METHOD THEREOF - A multilayer printed wiring board is characterized in that the interlayer connection material in the via holes has a lower coefficient of thermal expansion in the thickness direction than the electrically insulating substrate made of insulating material; the interlayer connection is formed at a temperature higher than the operating temperature; and the interlayer connection material is larger in thickness than the interlayer connection material of the same wiring layer at normal temperature. This causes a difference in the coefficient of thermal expansion between the different materials in the thickness direction of the printed wiring board in the environment in which it is used resulting in high connection reliability. | 06-04-2009 |
20090229862 | MULTILAYER PRINTED WIRING BOARD AND METHOD OF MANUFACTURING THE SAME - A plurality of double-sided boards using a film are attached to each other with a paste coupling layer sandwiched therebetween. In the paste coupling layer, a conductive paste is filled into a through hole formed in provisionally hardened resin, which is hardened. At the same time, second wirings are electrically coupled to each other by using the hardened conductive paste filled in the through holes that have been previously formed in the paste coupling layer. Thus, it is possible to provide a thinned multilayer printed wiring board without using an adhesive. | 09-17-2009 |
20100170700 | SOLID PRINTED CIRCUIT BOARD AND METHOD OF MANUFACTURING THE SAME - A solid printed circuit board is manufactured by bonding upper and lower printed circuit boards having different shapes and provided with wirings formed on surfaces thereof. A bonding layer is made of insulating material containing thermosetting resin and inorganic filler dispersed therein, and has a via-conductor made of conductive paste filling a through-hole perforated in a predetermined position of the bonding layer. This circuit board provides a packaging configuration achieving small size and thickness and three-dimensional mounting suitable for semiconductors of high performance and multiple-pin structure. | 07-08-2010 |
20100230138 | WIRING BOARD - A wiring board includes an insulating board having a top surface arranged to have an electronic component mounted thereto, a conductor pattern formed on the top surface of the insulating board, and a heat emitting layer made of heat-emitting material covering the conductor pattern. The heat-emitting material has an emissivity not less than 0.8 for an electromagnetic wave having a wavelength λ=0.002898/T at a temperature T ranging from 293K to 473K. This wiring board suppresses the temperature rise of the electronic component. | 09-16-2010 |
20100276187 | MULTILAYER PRINTED WIRING BOARD AND MOUNTING BODY USING THE SAME - A multilayer printed wiring board ( | 11-04-2010 |
20110030207 | MULTILAYER PRINTED WIRING BOARD AND MANUFACTURING METHOD THEREOF - A multilayer printed wiring board is characterized in that the interlayer connection material in the via holes has a lower coefficient of thermal expansion in the thickness direction than the electrically insulating substrate made of insulating material; the interlayer connection is formed at a temperature higher than the operating temperature; and the interlayer connection material is larger in thickness than the interlayer connection material of the same wiring layer at normal temperature. This causes a difference in the coefficient of thermal expansion between the different materials in the thickness direction of the printed wiring board in the environment in which it is used resulting in high connection reliability. | 02-10-2011 |
Patent application number | Description | Published |
20140253742 | IMAGING OPERATION TERMINAL, IMAGING SYSTEM, IMAGING OPERATION METHOD, AND PROGRAM DEVICE - An imaging operation terminal may include: a storage section configured to store switching information of an operation mode which operates according to a state of physical contact with an imaging device; a communication section configured to perform wireless communication with the imaging device; a communication detection section configured to detect whether the wireless communication by the communication section with the imaging device is possible; a physical state detection section configured to detect the state of the physical contact with the imaging device; and an operation mode selection section configured to select one operation mode based on the switching information according to the state of the physical contact with the imaging device detected by the physical state detection section after the communication detection section has detected that the wireless communication with the imaging device is possible. | 09-11-2014 |
20140313353 | IMAGING OPERATION TERMINAL, IMAGING SYSTEM, SOFTWARE EXTRACTION METHOD, AND COMPUTER-READABLE DEVICE - An imaging operation terminal includes: a storage section which stores software identification information for identifying imaging and editing software which performs at least one of an operation relating to imaging of an imaging module mounting an optical module and to editing of an image imaged by the imaging module in association with each combination of imaging module identification information for identifying imaging module and optical module identification information for identifying optical module; a communicating section which wirelessly receives the imaging module identification information for identifying the imaging module and the optical module identification information for identifying the optical module mounted to the imaging module from the imaging module when establishing wireless connection with the imaging module; and a software extracting section which extracts the software identification information corresponding to the combination of imaging module identification information and optical module identification information received by the communicating section from the storage section. | 10-23-2014 |
20140313356 | IMAGING INSTRUCTION TERMINAL, IMAGING SYSTEM, IMAGING INSTRUCTION METHOD, AND PROGRAM DEVICE - An imaging instruction terminal includes: a communication module configured to communicate with an imaging device; a motion detection section configured to detect motion information about motion of the imaging instruction terminal; a command generation section configured to generate an instruction command related to imaging for the imaging device at a timing at which the motion information detected by the motion detection section has exceeded a predetermined threshold value; and a communication control section configured to cause the instruction command related to the imaging to be transmitted from the communication module to the imaging device when the command generation section has generated the instruction command related to the imaging. | 10-23-2014 |
20140375830 | CAPTURED IMAGE DISPLAY DEVICE, IMAGING SYSTEM, CAPTURED IMAGE DISPLAY METHOD, AND COMPUTER-READABLE DEVICE - A captured image display device includes: a wireless communication unit; an imaging unit; a display unit; an imaging instruction unit which issues an imaging instruction to a remote camera that wirelessly communicates with the wireless communication unit; an image processing unit which performs image processing to convert an image data captured by the imaging unit into an image displayed on the display unit, and when the wireless communication unit wirelessly receives an image data corresponding to an image which is captured by the remote camera based on the imaging instruction, performs image processing to convert the image data into the image displayed on the display unit; and a display control unit which causes an image corresponding to the image data to be displayed on the display unit until the image processing unit ends the image processing for the image data after the imaging instruction is issued. | 12-25-2014 |
Patent application number | Description | Published |
20100249631 | RESPIRATORY WAVEFORM ANALYZER - A respiratory waveform analyzer, operable to analyze a respiratory waveform, which is generated based on a temporal change of a concentration of a component in respiratory gas of a subject, includes: a respiratory gas concentration generator which generates a concentration signal based on an output signal from a sensor that is placed to measure the concentration of the component; a flatness calculator which calculates a flatness indicative of flat degree of the respiratory waveform based on a temporal change of the concentration signal; and a reliability calculator which calculates a reliability of the respiratory waveform based on the flatness and the concentration signal. | 09-30-2010 |
20110080293 | BIOLOGICAL INFORMATION MONITORING APPARATUS - A biological information monitoring apparatus operable to receive biological information measured by a detector adapted to be attached to a patient, and operable to display the biological information on a display, includes: a first display controller which displays an alarm on the display; and a second display controller which displays, on the display, first information which responses to the displayed alarm. | 04-07-2011 |
20110080294 | BIOLOGICAL INFORMATION MONITORING APPARATUS AND ALARM CONTROL METHOD - A biological information monitoring apparatus operable to measure biological information of a patient by detecting a biological signal of the patient, and operable to output an alarm, includes an alarm controller which changes the alarm. The alarm includes a first alarm of a first priority and a second alarm of a second priority. When a first condition is satisfied, the first alarm is output. When a second condition is satisfied after the first alarm is output, the alarm controller changes from the first alarm to the second alarm to be output. | 04-07-2011 |
20120249332 | ALARM INFORMATION PROCESSING APPARATUS AND ALARM INFORMATION PROCESSING PROGRAM - An information processing apparatus and program having a reading unit configured to read a plurality of alarm information about alarms generated based on abnormalities of biological information of a patient or abnormalities of a medical apparatus, and a control unit configured to associate same alarm contents that are included in the different alarm information in terms of the alarm contents that indicate contents of abnormalities causing the generation of the alarms is provided. | 10-04-2012 |
20120283591 | RESPIRATORY WAVEFORM ANALYZER - A respiratory waveform analyzer, operable to analyze a respiratory waveform, which is generated based on a temporal change of a concentration of a component in respiratory gas of a subject, includes: a respiratory gas concentration generator which generates a concentration signal based on an output signal from a sensor that is placed to measure the concentration of the component; a flatness calculator which calculates a flatness indicative of flat degree of the respiratory waveform based on a temporal change of the concentration signal; and a reliability calculator which calculates a reliability of the respiratory waveform based on the flatness and the concentration signal. | 11-08-2012 |
20140296950 | THERMOREGULATION DEVICE, THERMOREGULATION SYSTEM, AND PACKAGE - A thermoregulation device which is adapted to be used for covering part of a living body, includes: a first sheet which is higher in thermal conductivity than cotton cloth; a second sheet which is higher in heat insulating and retaining properties than cotton cloth; and a gas passage which is formed between the first sheet and the second sheet. A first opening which communicates with the gas passage is formed in one of the first sheet and the second sheet. A second opening which communicates with the gas passage is formed in one of the first sheet and the second sheet. A gas which is introduced through the first opening is discharged from the second opening via the gas passage. | 10-02-2014 |
20150209175 | APPARATUS FOR CONTROLLING BODY TEMPERATURE AND METHOD THEREOF - The present invention provides an apparatus for controlling body temperature of a patient during hypothermia treatment, comprising: a body trunk cooling unit having a first affixing portion to be applied on a surface of the trunk of a patient's body and for cooling the surface of the trunk of the patient's body; and a body peripheral part heating unit having a second affixing portion to be applied to the peripheral part of the patient's body and for heating the peripheral part of the body by utilizing exhaust heat from the body trunk cooling unit and suppressing activation of cold receptors of the skin of the patient. | 07-30-2015 |
Patent application number | Description | Published |
20100047709 | RADIATION-SENSITIVE COMPOSITION - A radiation-sensitive composition containing a resist compound having a high sensitivity, a high resolution, a high etching resistance, and a low outgas which forms a resist pattern with a good shape is described. Further described is a method of forming a resist pattern using the radiation-sensitive composition. Still further described are a novel composition for forming a photoresist under coat film which is excellent in optical properties and etching resistance and contains substantially no sublimable substance and an under coat film formed by the composition. Still further described are a radiation-sensitive composition containing a solvent and a cyclic compound having a specific structure, for example, a cyclic compound (A) having a molecular weight of 700 to 5000 which is synthesized by the condensation reaction of a compound having 2 to 59 carbon atoms and 1 to 4 formyl groups (aldehyde compound (A1)) with a compound having 6 to 15 carbon atoms and 1 to 3 phenolic hydroxyl groups (phenol compound (A2)), and a cyclic compound for use in the radiation-sensitive composition. | 02-25-2010 |
20110165516 | COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION - A radiation-sensitive composition containing 1 to 80% by weight of a solid component and 20 to 99% by weight of a solvent. The solid component contains a compound B which has (a) a structure derived from a polyphenol compound A by introducing an acid-dissociating group to at least one phenolic hydroxyl group of the polyphenol compound A which is synthesized by a condensation between a di- to tetrafunctional aromatic ketone or aromatic aldehyde each having 5 to 36 carbon atoms with a compound having 1 to 3 phenolic hydroxyl groups and 6 to 15 carbon atoms, and (b) a molecular weight of 400 to 2000. The composition containing the compound B is useful as an acid-amplified, non-polymeric resist material, because it is highly sensitive to radiation such as KrF excimer lasers, extreme ultraviolet rays, electron beams, and X-rays, and provides resist patterns with a high resolution, high heat resistance, and high etching resistance. | 07-07-2011 |
20120156615 | CYCLIC COMPOUND, PROCESS FOR PRODUCTION OF THE CYCLIC COMPOUND, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN - A cyclic compound represented by formula (1): | 06-21-2012 |
20120164576 | CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN - A cyclic compound represented by formula (1): | 06-28-2012 |
20120171379 | RADIATION-SENSITIVE COMPOSITION - A radiation-sensitive composition containing a resist compound having a high sensitivity, a high resolution, a high etching resistance, and a low outgas which forms a resist pattern with good shape and a method of forming a resist pattern and novel compositions for forming a photoresist under coat film which is excellent in optical properties and etching resistance and contains substantially no sublimable substance and an under coat film formed by the composition. Radiation-sensitive composition containing a solvent and a cyclic compound having, e.g., a cyclic compound (A) having a molecular weight of 700 to 5000 which is synthesized by the condensation reaction of a compound having 2 to 59 carbon atoms and 1 to 4 formyl groups with a compound having 6 to 15 carbon atoms and 1 to 3 phenolic hydroxyl groups, and a cyclic compound for use in the radiation-sensitive composition. | 07-05-2012 |
20120171615 | CYCLIC COMPOUND, PROCESS FOR PRODUCTION OF THE CYCLIC COMPOUND, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN - A cyclic compound represented by formula (1): | 07-05-2012 |
20120282546 | CYCLIC COMPOUND, PRODUCTION PROCESS THEREOF, RADIATION-SENSITIVE COMPOSITION AND RESIST PATTERN FORMATION METHOD - Disclosed are: a cyclic compound which has high solubility in a safe solvent, is highly sensitive, enables the formation of a resist pattern having a good shape, and rarely causes resist pattern collapse; a process for producing the cyclic compound; a radiation-sensitive composition containing the cyclic compound; and a resist pattern formation method using the composition. Specifically disclosed are: a cyclic compound having a specific structure; a process for producing the cyclic compound; a radiation-sensitive composition containing the compound; and a resist pattern formation method using the composition. | 11-08-2012 |
20130004896 | COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION SPECIFICATION - A radiation-sensitive composition containing 1 to 80% by weight of a solid component and 20 to 99% by weight of a solvent. The solid component contains a compound B which has (a) a structure derived from a polyphenol compound A by introducing an acid-dissociating group to at least one phenolic hydroxyl group of the polyphenol compound A which is synthesized by a condensation between a di- to tetrafunctional aromatic ketone or aromatic aldehyde each having 5 to 36 carbon atoms with a compound having 1 to 3 phenolic hydroxyl groups and 6 to 15 carbon atoms, and (b) a molecular weight of 400 to 2000. The composition containing the compound B is useful as an acid-amplified, non-polymeric resist material, because it is highly sensitive to radiation such as KrF excimer lasers, extreme ultraviolet rays, electron beams, and X-rays, and provides resist patterns with a high resolution, high heat resistance, and high etching resistance. | 01-03-2013 |
20130122423 | COMPOUND, RADIATION-SENSITIVE COMPOSITION AND RESIST PATTERN FORMATION METHOD - The object is to provide a compound having high dissolvability in a safe solvent and high sensitivity, and also capable of obtaining a good resist pattern shape, a radiation-sensitive composition containing the same, and a resist pattern formation method using the composition. For this purpose, a compound (B) obtained by reaction between a polyphenol based cyclic compound (A) and a compound (C) having a particular structure, a radiation-sensitive composition containing the same, and a resist pattern formation method using the composition are provided. | 05-16-2013 |
20130150627 | PURIFICATION METHOD FOR CYCLIC COMPOUND - An industrially advantageous purification method for a cyclic compound with a particular structure is provided. | 06-13-2013 |
20130280655 | AROMATIC HYDROCARBON RESIN, UNDERLAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY, AND METHOD FOR FORMING MULTILAYER RESIST PATTERN - Provided is an aromatic hydrocarbon resin with a high carbon concentration and a low oxygen concentration that can be used as a coating agent or a resist resin for semiconductors, as well as a composition for forming an underlayer film for photolithography with excellent etching resistance as an underlayer film for a multilayer resist process, an underlayer film formed from the composition, and a method for forming a pattern using the underlayer film. | 10-24-2013 |
20150018499 | NAPHTHALENE FORMALDEHYDE RESIN, DEACETALIZED NAPHTHALENE FORMALDEHYDE RESIN, AND MODIFIED NAPHTHALENE FORMALDEHYDE RESIN - Provided are a naphthalene formaldehyde resin obtained by reacting a compound (A) represented by formula (1) and formaldehyde (B) in a molar ratio, (A):(B), of 1:1 to 1:20 in the presence of an acidic catalyst, and a deacetalized naphthalene formaldehyde resin and a modified naphthalene formaldehyde resin derived therefrom. | 01-15-2015 |
20150030980 | RADIATION-SENSITIVE COMPOSITION - A radiation-sensitive composition containing a resist compound having a high sensitivity, a high resolution, a high etching resistance, and a low outgas which forms a resist pattern with a good shape is described. | 01-29-2015 |
20150368224 | NOVEL ALLYL COMPOUND AND METHOD FOR PRODUCING THE SAME - The allyl compound of the present invention is represented by general formula (α): | 12-24-2015 |
20150376157 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYPHENOL DERIVATIVE FOR USE IN THE COMPOSITION - The present invention provides a resist composition which is excellent in heat resistance, has high solubility in a safe solvent, has high sensitivity, and can impart a good shape to a resist pattern. Such a resist composition contains a compound represented by the following general formula (1) or (2): | 12-31-2015 |
20150376158 | COMPOUND, MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY AND PATTERN FORMING METHOD - The material for forming an underlayer film for lithography of the present invention contains a compound represented by the following general formula (1). | 12-31-2015 |
20150376202 | COMPOUND, MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY AND PATTERN FORMING METHOD - The material for forming an underlayer film for lithography of the present invention contains a compound having a structure represented by the following general formula (1). | 12-31-2015 |
Patent application number | Description | Published |
20120164575 | CYCLIC COMPOUND, MANUFACTURING METHOD THEREFOR, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMING A RESIST PATTERN - A cyclic compound represented by formula (1): | 06-28-2012 |
20120251947 | CYCLIC COMPOUND, METHOD OF PRODUCING THE SAME, RADIATION SENSITIVE COMPOSITION, AND METHOD OF FORMING RESIST PATTERN - This invention addresses problems to provide a cyclic compound having a high solubility in safety solvents and a high sensitivity and being good in the shape of the resulting resist pattern, a method of producing the same, a radiation sensitive composition comprising the same, and a method of forming a resist pattern using the radiation sensitive composition. As means for solving the problem, there are provided a cyclic compound having a specific structure, a radiation sensitive composition comprising the compound, and a method of forming a resist pattern using the composition. | 10-04-2012 |
20130004894 | UNDER COAT FILM MATERIAL AND METHOD OF FORMING MULTILAYER RESIST PATTERN - Disclosed are: an underlayer underlayer film material for use in the formation of a resist underlayer film, which is highly soluble in safe solvents, has excellent etching resistance, and does not substantially cause the production of any sublimation product; and a resist pattern formation method using the underlayer film material. Specifically disclosed are: an underlayer film material comprising a cyclic compound that can have two or more specific structures; and a resist pattern formation method using the underlayer film material. | 01-03-2013 |
20130030211 | BICYCLOHEXANE DERIVATIVE COMPOUND AND MANUFACTURING METHOD OF THE SAME - A bicyclohexane derivative compound useful in the field of photoresist, the field of intermediate of drugs and pesticides, and the like, and a manufacturing method of the same are provided. A bicyclohexane derivative compound represented by the following general formula (II) is provided. | 01-31-2013 |
20140186776 | PHENOLIC RESIN AND MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY - There is provided a novel phenolic resin which can be used as a coating agent or a resist resin for a semiconductor, which has a high carbon concentration and a low oxygen concentration in the resin, which has a relatively high heat resistance and also a relatively high solvent solubility, and which can be applied to a wet process. There are also provided a material useful for forming a novel photoresist underlayer film which has a relatively high solvent solubility, which can be applied to a wet process, and which is excellent in etching resistance as an underlayer film for a multilayer resist, an underlayer film formed using the same, and a pattern forming method using the same. A resin of the present invention is obtained by reacting a compound having a specified structure and an aldehyde having a specified structure in the presence of an acidic catalyst. In addition, a material for forming an underlayer film for lithography of the present invention includes at least the resin and an organic solvent. | 07-03-2014 |
20140246400 | RESIN HAVING FLUORENE STRUCTURE AND MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY - A resin having a fluorene structure, a relatively high carbon concentration in the resin, a relatively high heat resistance and a relatively high solvent solubility has a structure represented by | 09-04-2014 |
20140248561 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYPHENOLIC COMPOUND FOR IN THE COMPOSITION, AND ALCOHOLIC COMPOUND THAT CAN BE DERIVED THEREFROM - A resist composition containing a compound represented by the general formula (1) or (2), a method for forming a resist pattern using the composition, a polyphenolic compound for use in the composition, and an alcoholic compound that can be derived therefrom are described. | 09-04-2014 |
20140308615 | CYCLIC COMPOUND, METHOD FOR PRODUCING SAME, COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN - A cyclic compound having a molecular weight of 500 to 5000 is represented by the following formula (1), | 10-16-2014 |
20140329177 | CYCLIC COMPOUND, METHOD FOR PRODUCING SAME, RADIATION-SENSITIVE COMPOSITION, AND RESIST PATTERN FORMATION METHOD - A cyclic compound of the present invention has a molecular weight of 500 to 5000, and is represented by the following formula (1): | 11-06-2014 |
20140329178 | CYCLIC COMPOUND, METHOD FOR PRODUCING THE SAME, RADIATION-SENSITIVE COMPOSITION, AND RESIST PATTERN FORMATION METHOD - A cyclic compound of the present invention has a molecular weight of 500 to 5000, and is represented by the following formula (1): | 11-06-2014 |
20150037736 | ACIDIC TREATMENT-SUBJECTED MONOALKYLNAPHTHALENE FORMALDEHYDE RESIN - Provided are a novel resin and a precursor thereof that are excellent in thermal decomposability and solubility in a solvent. The resin is obtained by subjecting, to an acidic treatment, a monoalkylnaphthalene formaldehyde resin that is obtained by reacting a compound represented by the following formula (1), wherein R | 02-05-2015 |
20150090691 | MATERIAL FOR FORMING UNDERLAYER FILM LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY AND PATTERN FORMING METHOD - Material for forming an underlayer film for lithography, which has a high carbon concentration, a low oxygen concentration, a relatively high heat resistance and also a relatively high solvent solubility, and which can be applied to a wet process is disclosed. Material for forming an underlayer film for lithography contains a compound represented by general formula (1). | 04-02-2015 |
Patent application number | Description | Published |
20130031071 | CONTROL APPARATUS, CONTROL METHOD AND RECORDING MEDIUM OF CONTROL PROGRAM - A control apparatus includes a memory, and a processor that executing a procedure, the procedure including, receiving a request corresponding to a file which is one of a plurality of files stored in a database server apparatus; in the case that the file corresponding to the request is stored in the memory, executing a process based on the request by using the file stored in the memory, and in the case that the file corresponding to the request is not stored in the memory, obtaining the file from the database server apparatus, storing the file in the memory, and processing the process by using the file. | 01-31-2013 |
20140108658 | COMPUTER-READABLE RECORDING MEDIUM STORING A RESOURCE MANAGEMENT PROGRAM, RESOURCE MANAGEMENT METHOD AND INFORMATION PROCESSING DEVICE - A first information processing device includes a determination section that determines whether or not there is an unused resource in the first information processing device by referring to information indicating whether or not there is an unused resource among resources ensured by each of a plurality of information processing devices sharing resources used in processing that is to be executed in response to a request, an specifying section that specifies, when there is not the unused resource in the first information processing device, another information processing device that has ensured an unused resource by referring to the information, a request section that requests for releasing the unused resource of the specified another information processing device, and an ensuring section that ensures an unused resource released in response to a request as a resource that the first information processing device is to use. | 04-17-2014 |
20140165064 | PROCESSING METHOD, PROCESSING APPARATUS, AND RECORDING MEDIUM - A processing method includes: collecting processing information indicating a processing state of an application executed by an information processing device and operational information indicating operational states of processing elements that are identified on the basis of configuration information stored in a storage unit and are involved in the execution of the application; determining whether or not there is a correlation between the processing state and an operational state of each of the processing elements on the basis of the processing information and the operational information when a delay of a process of the application is detected on the basis of the processing information; and extracting, from among the processing elements, a processing element of which an operational state has a correlation with the processing state on the basis of the determination. | 06-12-2014 |
Patent application number | Description | Published |
20090246554 | LAMINATE HAVING PEELABILITY AND PRODUCTION METHOD THEREFOR - A metal conductor layer is provided on at least one surface of a heat resistant base. The heat resistant base is peelable from the metal conductor layer. The heat resistant base is preferably a metal foil or a non-thermoplastic polyimide resin film. The metal conductor layer preferably includes a vapor deposition metal layer and/or a plating metal layer. The metal conductor layer preferably includes a metal layer (I) formed in an interface with the heat resistant base by vapor deposition, and at least one metal layer (II) formed on the metal layer (I) by vapor deposition or electroplating. At least one insulative film layer of a non-thermoplastic polyimide resin may be provided on the metal conductor layer. | 10-01-2009 |
20100273974 | POLYIMIDE RESIN COMPOSITION, POLYIMIDE PRECURSOR RESIN COMPOSITION FOR THE SAME, PRODUCTION METHOD THEREOF, AND POLYIMIDE FILM AND PRODUCTION METHOD THEREOF - An object of the present invention, which was made to solve the problems above, is to provide a polyimide precursor resin composition superior in transparency allowing reduction of the residual volatile material rate during molding and giving a polyimide resin composition (e.g., polyimide film) superior in mechanical properties and transparency even when a cheaper polyamide-imide is used. The present invention relates to a polyimide precursor resin composition, comprising a polyamide-imide (A) containing a diamine monomer unit represented by the following formula (1) and a polyamic acid (B) containing at least one kind of monomer unit selected tetracarboxylic acid monomer units represented by the following formulae (2p) to (2r), wherein the haze of the film having a thickness of 40 μm obtained by imidation of the polyimide precursor resin composition is 4% or less: | 10-28-2010 |
20140120360 | COATED FIBROUS COPPER MICROPARTICLES, AND ELECTRICALLY CONDUCTIVE COATING AGENT AND ELECTRICALLY CONDUCTIVE FILM EACH CONTAINING SAID COATED FIBROUS COPPER MICROPARTICLES - The present invention provides coated fibrous copper microparticles, wherein the coated fibrous copper microparticles are fibrous copper microparticles each at least partially coated with a metal other than copper, and the length and the aspect ratio of the fibrous copper microparticles are 1 μm or more and 10 or more, respectively. | 05-01-2014 |
20150147584 | FIBROUS COPPER MICROPARTICLES AND METHOD FOR MANUFACTURING SAME - Fibrous copper microparticles having a minor axis of 1 μm or less and an aspect ratio of 10 or more, wherein the content of the copper particles having a minor axis of 0.3 μm or more and an aspect ratio of 1.5 or less is 0.1 or less copper particle per one fibrous copper microparticle. | 05-28-2015 |
Patent application number | Description | Published |
20130183528 | POLYMER MICROPARTICLES AND PROCESS FOR PRODUCTION THEREOF - A process of producing polymer microparticles wherein, in a system which includes a polymer (A), a polymer (B) and an organic solvent and can cause phase separation into two phases of a solution phase mainly composed of the polymer (A) and a solution phase mainly composed of the polymer (B) when the polymer (A), the polymer (B) and the organic solvent are dissolved and mixed together, after an emulsion is formed at a temperature of 100° C. or higher, the polymer (A) is precipitated by bringing a poor solvent for the polymer (A) into contact with the emulsion. | 07-18-2013 |
20130281573 | EPOXY RESIN COMPOSITION FOR FIBER-REINFORCED COMPOSITE MATERIALS, PREPREG, AND FIBER-REINFORCED COMPOSITE MATERIAL - Provided are: a fiber-reinforced composite material which has mode I interlaminar fracture toughness, mode II interlaminar fracture toughness and compressive strength under heat and humidity conditions at the same time; an epoxy resin composition for obtaining the fiber-reinforced composite material; and a prepreg which is obtained using the epoxy resin composition. An epoxy resin composition for fiber-reinforced composite materials, which contains at least the following constituent elements (A), (B), (C) and (D). (A) An epoxy resin (B) Resin particles that satisfy the following conditions (b1)-(b3) and are insoluble in an epoxy resin (b1) The particle size distribution index is 1.0-1.8. (b2) The particle sphericity is 90 or more. (b3) The glass transition temperature of the particles is 80-180° C. (C) At least one elastomer component that is selected from among block copolymers containing a block having a glass transition temperature of 20° C. or less and rubber particles (D) An epoxy resin curing agent | 10-24-2013 |
20140162518 | PREPREG AND FIBER-REINFORCED COMPOSITE MATERIAL - The invention provides a fiber reinforced composite material having high interlaminar toughness and compressive strength under wet heat conditions, as well as an epoxy resin composition for production thereof and a prepreg producible from the epoxy resin composition. | 06-12-2014 |
20150218359 | METHOD FOR PRODUCING POLYVINYLIDENE DIFLUORIDE PARTICLES, AND POLYVINYLIDENE DIFLUORIDE PARTICLES - Provided are: fine vinylidene fluoride resin particles which are solid and have an average particle diameter of 0.3 μm or more but less than 100 μm, a particle diameter distribution index of 1-2, a repose angle of less than 40°, and an average sphericity of 80 or more said fine vinylidene fluoride particles being suitable for coating materials and coating applications; and a method for producing the fine vinylidene fluoride resin particles. | 08-06-2015 |