Nishimaki, JP
Akemi Nishimaki, Yokohama-Shi JP
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20090031322 | METHOD AND APPARATUS FOR COMMUNICATION BETWEEN APPLICATION PROGRAMS - A communication apparatus includes a reception unit configured to receive a transmission message to be transmitted from a first application to a second application, a determination unit configured to determine whether the second application is present in the same area as the first application, an encoding unit configured to encode the transmission message if the second application is determined to be in an area different from the first application, and a transmission unit configured to transmit the transmission message from the first application to the second application, wherein an encoded transmission message is transmitted if the second application is determined to be present in an area different from the first application, and an un-encoded transmission message is transmitted if the second application is determined to be present in the same area as the first application. | 01-29-2009 |
Hidekatsu Nishimaki, Kawasaki-Shi JP
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20140239406 | SEMICONDUCTOR DEVICE - A pMIS region is provided between a boundary extending in a first direction and passing through each of a plurality of standard cells and a first peripheral edge. An nMIS region is provided between the boundary and a second peripheral edge. A power supply wiring and a grounding wiring extend along the first and second peripheral edges, respectively. A plurality of pMIS wirings and a plurality of nMIS wirings are arranged on a plurality of first virtual lines and a plurality of second virtual lines, respectively, extending in the first direction and arranged with a single pitch in a second direction. The first virtual line that is the closest to the boundary and the second virtual line that is the closest to the boundary have therebetween a spacing larger than the single pitch. | 08-28-2014 |
Hidekatsu Nishimaki, Tokyo JP
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20100044755 | SEMICONDUCTOR DEVICE - A pMIS region is provided between a boundary extending in a first direction and passing through each of a plurality of standard cells and a first peripheral edge. An nMIS region is provided between the boundary and a second peripheral edge. A power supply wiring and a grounding wiring extend along the first and second peripheral edges, respectively. A plurality of pMIS wirings and a plurality of nMIS wirings are arranged on a plurality of first virtual lines and a plurality of second virtual lines, respectively, extending in the first direction and arranged with a single pitch in a second direction. The first virtual line that is the closest to the boundary and the second virtual line that is the closest to the boundary have therebetween a spacing larger than the single pitch. | 02-25-2010 |
Hirokazu Nishimaki, Toyama-Shi JP
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20110311915 | PHOTOSENSITIVE RESIST UNDERLAYER FILM FORMING COMPOSITION - A resist underlayer film forming composition used in a lithography process includes: a polymer (A) containing a unit structure having a hydroxy group, a unit structure having a carboxy group, or combination thereof; a crosslinkable compound (B) having at least two vinyl ether groups; a photoacid generator (C); a C | 12-22-2011 |
20120142195 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR LITHOGRAPHY INCLUDING RESIN CONTAINING ALICYCLIC RING AND AROMATIC RING - There is provided a resist underlayer film having both heat resistance and etching selectivity. A composition for forming a resist underlayer film for lithography, comprising a reaction product (C) of an alicyclic epoxy polymer (A) with a condensed-ring aromatic carboxylic acid and monocyclic aromatic carboxylic acid (B). The alicyclic epoxy polymer (A) may include a repeating structural unit of Formula (1): | 06-07-2012 |
20120251950 | COMPOSITION FOR FORMING PHOTOSENSITIVE RESIST UNDERLAYER FILM - A composition for forming a resist underlayer film to be used in a lithography process, that includes: a polymer containing unit structures of Formula (1), Formula (2), and Formula (3): | 10-04-2012 |
20120288795 | COMPOSITION FOR FORMATION OF PHOTOSENSITIVE RESIST UNDERLAYER FILM AND METHOD FOR FORMATION OF RESIST PATTERN - A composition for forming a photosensitive resist underlayer film and a method for forming a resist pattern. The composition for forming a photosensitive resist underlayer film includes a polymer having a structural unit of Formula (1), a compound having at least two vinyl ether groups, a photo-acid generator; and a solvent: | 11-15-2012 |
20130216956 | MONOLAYER OR MULTILAYER FORMING COMPOSITION - There is provided a composition for forming a monolayer or a multilayer on the substrate. A composition for forming a monolayer or a multilayer containing a silane compound of Formula (1A) or Formula (1B): | 08-22-2013 |
20140045119 | PHOTOSENSITIVE ORGANIC PARTICLES - A material forms a pattern by applying a photosensitive composition to a base material and drying to form a photosensitive coating and performing exposure and development, and a method for forming the pattern. A photosensitive composition includes water-soluble organic particles, and a solvent, wherein the solvent is a poor solvent for the water-soluble organic particles. Preferably, the water-soluble organic particles of the photosensitive composition includes a polymer which contains a unit structure (A) for forming organic particles, a unit structure (B) for forming interparticle crosslinkage, and a unit structure (C) for imparting dispersibility, and the photosensitive composition further includes a photoacid generator. In addition, the water-soluble organic particles of the photosensitive composition includes a polymer which contains the unit structure (A) for forming organic particles, the unit structure (B) for forming interparticle crosslinkage, the unit structure (C) for imparting dispersibility, and a unit structure (D) having a photoacid generating group. | 02-13-2014 |
20140235059 | DIARYLAMINE NOVOLAC RESIN - A novel diarylamine novolac resin such as a phenylnaphthylamine novolac resin, and further a resist underlayer film-forming composition in which the resin is used in a lithography process for manufacturing a semiconductor device. A polymer including a unit structure (A) of Formula (1): | 08-21-2014 |
20150044876 | RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING PHENYLINDOLE-CONTAINING NOVOLAC RESIN - A composition for forming a resist underlayer film having heat resistance, which is used for a lithography process of semiconductor device production. A resist underlayer film forming composition including a polymer having a unit structure of Formula (1): | 02-12-2015 |
20150184018 | RESIST UNDERLAYER FILM FORMING COMPOSITION THAT CONTAINS NOVOLAC RESIN HAVING POLYNUCLEAR PHENOL - There is provided a composition for forming a resist underlayer film which has high dry-etching resistance and wiggling resistance, and achieves excellent planarizing properties for a semiconductor substrate surface having level differences or irregular portions. A resist underlayer film-forming composition including a phenol novolac resin that is obtained by causing a compound that has at least three phenolic groups, in which each of the phenolic groups has a structure bonded to a tertiary carbon atom or has a structure bonded to a quaternary carbon atom to which a methyl group binds, to react with an aromatic aldehyde or an aromatic ketone in the presence of an acid catalyst. The phenol novolac resin preferably contains a unit structure of Formula (1), a unit structure of Formula (2), a unit structure of Formula (3), a unit structure of Formula (4), or a combination of these unit structures: | 07-02-2015 |
20150212418 | RESIST UNDERLAYER FILM FORMING COMPOSITION - A resist underlayer film forming composition including: a polymer having any one or more repeating structural units of Formulas (1a), (1b), and (1c): | 07-30-2015 |
20150378260 | RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING ARYL SULFONATE SALT HAVING HYDROXYL GROUP - There is provided a resist underlayer film-forming composition to reduce the amount of sublimate generated from the resist underlayer film at baking process and to suppress aging and have high storage stability. A resist underlayer film-forming composition including an aryl sulfonic acid salt compound having a hydroxy group of Formula (1): | 12-31-2015 |
Hiroshi Nishimaki, Hyogo JP
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20110243787 | POWER OF TUNGSTEN ALLOY WITH TRANSITION METAL DISSOLVED THEREIN AS SOLID SOLUTION AND PROCESS FOR PRODUCING THE SAME - This invention is related to a powder of a tungsten alloy with a transition metal dissolved therein as a solid solution that is suitable as material for a cemented carbide represented by formula [1] and a material for a catalyst. The powder of tungsten alloy is characterized in that at least one transition metal element selected from the group consisting of cobalt, iron, manganese and nickel is dissolved as a solid solution in a tungsten grating and a peak derived from a bcc tungsten phase appears in an X-ray diffraction diagram. Formula [1]: M−W wherein M represents one or more elements selected from Co, Fe, Mn and Ni. The use of tungsten alloy powder can provide a tungsten carbide with a transition metal dissolved therein as a solid solution in which a solid solution phase comprising at least one transition metal element selected from the group consisting of cobalt, iron, manganese and nickel, tungsten and carbon is included in a tungsten carbide skeleton, and a tungsten carbide diffused cemented carbide. | 10-06-2011 |
20110257003 | TRANSITION METAL-INCLUDED TUNGSTEN CARBIDE, TUNGSTEN CARBIDE DIFFUSED CEMENTED CARBIDE, AND PROCESS FOR PRODUCING SAME - This invention is related to a powder of a transition metal dissolved tungsten alloy carbide which comprises a transition metal element forcibly dissolved as a solid solution which represented by Formula [1] of M-W—C wherein M is one or more of Co, Fe, Ni and Mn and its tungsten alloy carbide diffused cemented carbide. The diffused cemented carbide is compatible with the conventional tungsten carbide diffused cemented carbide and comprises a binder metal and a tungsten alloy carbide which is provided with a solid solution phase of at least one transition metal element selected from the group consisting of cobalt, iron, nickel and manganese, included in a tungsten carbide skeleton, which exhibits a peak derived from a bcc tungsten phase in an X-ray diffraction diagram. | 10-20-2011 |
Hisashi Nishimaki, Kanagawa JP
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20100325638 | INFORMATION PROCESSING APPARATUS, AND RESOURCE MANAGING METHOD AND PROGRAM - An information processing apparatus includes: a resource manager that allocates a resource in response to a codec processing request from an application, wherein the resource manager has first information indicating the relationship between codec processing functions and resources and second information indicating the availability of the resources, and the resource manager identifies resources having the codec processing function corresponding to the codec processing request from the application based on the first information, selects an idle resource from the identified resources based on the second information, and allocates the idle resource. | 12-23-2010 |
20110316863 | INFORMATION PROCESSING APPARATUS AND INFORMATION PROCESSING METHOD - A memory section provides an input buffer capable of holding image data being a processing target of each processing by an image processing unit, and an output buffer capable of holding image data being a processing result. Through an input section, a user selects a plurality of kinds of processing to be executed by the image processing unit, and an execution sequence of the plurality of kinds of processing. A controller section reserves, based on information selected by a user through the input section, an input buffer and an output buffer for each processing in the memory section, sets an input-output connection relation between the buffers, and notifies, based on the set connection relation, the image processing unit of address information of the input buffer in the memory section and the output buffer for each processing sequentially executed by the image processing unit. | 12-29-2011 |
20140267839 | SIGNAL PROCESSING UNIT AND SIGNAL PROCESSING METHOD - A signal processing unit; includes: a high-frequency signal determination section configured to determine whether a reference region as a peripheral region of a phase difference pixel is a high-frequency signal region in a specific direction based on a pixel signal output from an image pickup section having the phase difference pixel disposed therein; and a synthetic ratio determination section configured to, when the reference region is determined to be not the high-frequency signal region in the specific direction, determine, using a pixel difference of the reference region, a synthetic ratio of an interpolated value of the phase difference pixel by a gain multiple interpolation technique to an interpolated value of the phase difference pixel by a peripheral pixel interpolation technique. | 09-18-2014 |
Jun Nishimaki, Yokosuka-Shi JP
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20100270476 | REACTION FORCE TREATMENT MECHANISM, XY STAGE APPARATUS, INSPECTION APPARATUS - The invention can provide a reaction force treatment mechanism used in a stage apparatus including a pedestal, a platen which supported by the pedestal through a vibration isolation unit, a mobile body which supported by the platen and moves on the platen, and an actuator which actuates the mobile body in one direction, the reaction force treatment mechanism including: a connection portion which connects a stator of the actuator to the pedestal through an stress relief mechanism for absorbing displacement in a direction different from the one direction; and a guide portion which movably guides the stator of the actuator in the one direction while restraining the stator of the actuator relative to the platen in a direction different from the one direction. | 10-28-2010 |
Kanji Nishimaki, Tokyo JP
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20110070409 | FABRIC FOR MARKING AND METHOD OF FORMING MARK WITH THE SAME - A stretchable fabric for marking, having a laminated structure of a first adhesive layer | 03-24-2011 |
Katsuhiro Nishimaki, Haibara-Gun JP
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20140024217 | METHOD FOR FORMING RESIST PATTERNS AND METHOD FOR PRODUCING PATTEREND SUBSTRATES EMPLOYING THE RESIST PATTERNS - Residual film etching steps for etching a resist film, onto which a pattern of protrusions and recesses has been formed, include: a first etching step employing a first etching gas including a sedimentary gas that generates sediment during etching, to etch the resist film such that the sediment is deposited on the sidewalls of protrusions of a resist pattern while residual film is etched. In the steps following the first etching step, the resist film is etched such that the widths of the protrusions including the deposited sediment become a desired width greater than or equal to the widths of the protrusions prior to residual film etching. Thereby, it becomes possible for the widths of protrusions of resist patterns following residual film etching to become desired widths greater than or equal to the widths of the protrusions of the resist patterns prior to residual film etching when forming resist patterns. | 01-23-2014 |
Katsuhiro Nishimaki, Odawara-Shi JP
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20090141382 | MAGNETIC TRANSFER MASTER DISK AND METHOD FOR MANUFACTURING THE SAME - A magnetic transfer master disk including a magnetic layer and exhibiting excellent shape stability of a protrusion/recess pattern is provided. An initial layer formed of a conductive film is formed on a surface of a master on which a pattern of minute protrusions/recesses is formed, and then a magnetic layer (principal layer) is formed on the initial layer, and then, a metal layer is formed by means of electroforming. A duplicate in which the initial layer, the magnetic layer and the metal layer have been integrated is peeled off from the master, thereby obtaining a magnetic transfer master disk, which is a duplicate in which the magnetic layer and the initial layer are deposited on the protruded/recessed surface of the metal layer. | 06-04-2009 |
20100003473 | METHOD FOR PRODUCING ORIGINAL MASTER USED TO PRODUCE MOLD STRUCTURE, ORIGINAL MASTER AND METHOD FOR PRODUCING MOLD STRUCTURE - A method for producing an original master used to produce a mold structure, the method including: forming a resist layer on a surface of an original master substrate, and exposing and developing the resist layer so as to form on the surface of the substrate an original master resist pattern substantially in the shape of concentric arcs utilized to form an original master concavo-convex pattern; selectively etching the resist pattern, under one of a condition that the resist pattern on an inner circumferential side is etched to a greater extent than the resist pattern on an outer circumferential side and a condition that the resist pattern on the outer circumferential side is etched to a greater extent than the resist pattern on the inner circumferential side; and etching the substrate with the selectively etched resist pattern serving as a mask so as to form the original master concavo-convex pattern. | 01-07-2010 |
Katsuhiro Nishimaki, Yamanashi JP
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20090095421 | Etch amount detection method, etching method, and etching system - This invention accurately detects an etch amount of an etching target layer irrespective of a type of a mask layer. A light La is reflected by an upper surface of a photoresist mask layer | 04-16-2009 |
Katsuhiro Nishimaki, Kanagawa JP
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20120006788 | CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME - A chemical amplification resist composition that is used for preparation of a mold, and a mold preparation method and a resist film each using the composition are provided. | 01-12-2012 |
Katsuhiro Nishimaki, Minamiashigara-Shi JP
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20110226625 | MASTER MOLD MANUFACTURING METHOD AND MOLD STRUCTURE MANUFACTURING METHOD - Disclosed is a method of manufacturing a master mold having an uneven pattern which includes wide and narrow concave portions using a reactive ion etching process. The method is capable of manufacturing a master mold improved in the uniformity of concave portions of the uneven pattern by performing a main etching step in which etching is performed, using an original plate which includes a processing target layer and a foundation layer, on the processing target layer using the foundation layer as an etch stop layer and an extra etching step in which etching is performed on the original plate degraded by the main etching step in the uniformity of concave portions in order to improve the uniformity using an etching gas which includes a first gas capable of etching the foundation layer and producing a deposit with a bias power of not greater than 15 W. | 09-22-2011 |
20130193107 | METHOD FOR PRODUCING A MASTER MOLD AND CUTOUT PROCESSING METHOD FOR A MASTER MOLD - A metal plate having a pattern of protrusions on a first surface thereof is produced; photoresist is provided on a second surface of the metal plate; the photoresist is removed from a portion of the metal plate corresponding to a loop shaped outer peripheral cutout region that contacts the outer periphery of a mold region of the metal plate; and the metal plate is etched using the remaining photoresist as a mask, in a method for producing and a method for cutting a processing a master mold having a pattern of protrusions and recesses corresponding to data to be transferred on a surface thereof. | 08-01-2013 |
20140069889 | METHOD FOR PRODUCING MOLDS - In production of a mold having a deposited film on the surface thereof as a mold release layer, a quartz substrate plasma etched employing an etching gas that includes a sedimentary gas to form a pattern of protrusions and recesses having a desired shape in a structure constituted by the quartz substrate and a mask layer, while a deposited film constituted by sediment of the sedimentary gas is formed along the pattern of protrusions and recesses. The deposited film becomes the mold release layer. Thereby, throughput of mold production is improved in the production of molds having deposited films as mold release layers on the surfaces thereof. | 03-13-2014 |
Kazuhito Nishimaki, Ishikawa JP
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20110118083 | MOTOR GRADER - A motor grader includes an engine, a torque converter, a drive wheel, an engine revolution detector, and a control unit. The torque converter, including a lock-up clutch, transmits driving force from the engine. The drive wheel is rotationally driven by the driving force from the engine. The engine revolution detector detects engine revolution. When the lock-up clutch is engaged, the control unit is configured to: maintain the engaged state of the lock-up clutch when the engine revolution is greater than a predetermined lock-up release revolution lower than a low idle revolution; and switch the lock-up clutch into a disengaged state when the engine revolution is less than or equal to the predetermined lock-up release revolution. | 05-19-2011 |
Kenta Nishimaki, Tokyo JP
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20140369813 | FAN MOTOR CONTROL UNIT - A fan motor control unit includes sensor units that each detect a rotational position of the fan motor, a switching unit that selectively connects each of stator coils of the fan motor to a rectifier circuit, a current sensor that detects a current flowing in the fan motor, and a switching control unit that advances, in the case where the current detected by the current sensor exceeds a threshold, a energization timing from the rectifier circuit to the stator coils with respect to the energization timing applied while the current detected by the current sensor is lower than the threshold, on the basis of the rotational position detected by the sensor units. | 12-18-2014 |
Koji Nishimaki, Nagano JP
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20150210081 | LIQUID SUPPLYING APPARATUS, LIQUID EJECTING APPARATUS, AND LIQUID CONTAINER UNIT - A liquid supplying apparatus configured to supply a liquid to a liquid ejecting section that is configured to eject the liquid, the liquid supplying apparatus comprising a liquid containing portion configured to contain the liquid, and a fluid communication member in fluid communication with the liquid containing portion and having one end that is exposed to air, the fluid communication member further having a liquid visual recognition portion through which the liquid inside the fluid communication member is visually recognizable. | 07-30-2015 |
Makio Nishimaki, Saitama-Shi JP
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20140021573 | SOLID-STATE IMAGING DEVICE AND MANUFACTURING METHOD OF SOLID-STATE IMAGING DEVICE - A light receiving layer is formed with an array of photodiodes for accumulating signal charge produced by photoelectric conversion of incident light. A wiring layer provided with electrodes and wiring for controlling the photodiodes is formed behind the light receiving layer in a traveling direction of the incident light. In the light receiving layer, there is formed a projection and depression structure in which a pair of inclined surfaces have symmetric inclination directions and each inclined surface corresponds to each photodiode. Each inclined surface makes the incident light enter each photodiode by a light amount corresponding to an incident angle. | 01-23-2014 |
20150194464 | SOLID-STATE IMAGING DEVICE AND MANUFACTURING METHOD OF SOLID-STATE IMAGING DEVICE - A light receiving layer is formed with an array of photodiodes for accumulating signal charge produced by photoelectric conversion of incident light. A wiring layer provided with electrodes and wiring for controlling the photodiodes is formed behind the light receiving layer in a traveling direction of the incident light. In the light receiving layer, there is formed a projection and depression structure in which a pair of inclined surfaces have symmetric inclination directions and each inclined surface corresponds to each photodiode. Each inclined surface makes the incident light enter each photodiode by a light amount corresponding to an incident angle. | 07-09-2015 |
Masanobu Nishimaki, Tokyo JP
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20130124385 | Server for Supporting an Exchange Transaction - The present invention is a server for supporting an exchange transaction, in which users can complete exchange transactions between and/or among themselves. | 05-16-2013 |
20140136393 | System for Supporting an Exchange Transaction - The present invention is a system for supporting an exchange transaction, in which users can complete exchange transactions between and/or among themselves. | 05-15-2014 |
Moe Nishimaki, Atsugi JP
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20150080051 | Security Device and Information Processing Device - To provide a novel security device. To provide a novel information processing device capable of maintaining information useful for confirming the occurrence of a crime. A structure including a switch that is provided so as to be operable with a hand that holds a housing, a light-emitting element that emits pulsed light in accordance with the operation of the switch, an imaging unit that performs imaging in an emission direction of the pulsed light and supplies image information, and a communication unit that transmits the image information to a communication network is provided. With the use of a security device having the structure by a user, the pulsed light can be emitted to a thug or the like, which prevents crimes. Furthermore, information including an image of a crime scene can be transmitted to the communication network. | 03-19-2015 |
Noriyuki Nishimaki, Kawasaki JP
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20100207955 | VIDEO DISPLAY APPARATUS - In a display apparatus such as PDP, in order to obtain well-lighted video while suppressing an increase in power consumption, the luminance level of a specific region of a display panel is decreased in accordance with an average luminance level of the entire display panel. However, when a low-luminance region and a high-luminance region are mixed in display video, even the luminance of the low-luminance region is decreased and gray-scale crush is caused in some cases. An average luminance level for each region is detected, and a shading process is controlled for each region based on the detected region-specific average luminance level and the luminance level of input video. With this control, when the luminance level of the input video signal is higher than a predetermined threshold, the shading process is operated, and when the luminance level is lower than the predetermined threshold, the shading process is stopped. | 08-19-2010 |
Ryo Nishimaki, Tokyo JP
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20120027206 | INFORMATION GENERATION APPARATUS,METHOD, PROGRAM, AND RECORDING MEDIUM THEREFOR - Hierarchical cryptography expressed in a general semiordered structure other than a tree structure is implemented. In information generation, random numbers σ | 02-02-2012 |
20120030464 | SECRET SHARING SYSTEM, SHARING APPARATUS, SHARE MANAGEMENT APPARATUS, ACQUISITION APPARATUS, PROCESSING METHODS THEREOF, SECRET SHARING METHOD, PROGRAM, AND RECORDING MEDIUM - A secure secret sharing system is implemented. Shares SH(α, h(α)) are generated by secret sharing of secret information separately for each subset SUB(α); each of share management apparatuses PA(α, h(α)) generates a shared secret value DSH(α, h(α)) by performing a common operation to a corresponding share SH(α, h(α)) and common information containing a common value σ(α) shared in each subset SUB(α); and an acquisition apparatus generates a reconstructed secret value SUBSK(α) by reconstruction processing for each subset SUB(α), using a plurality of shared secret values DSH(α, h(α)) corresponding to the same subset SUB(α), and generates generation information SK by using the reconstructed secret values SUBSK(α). | 02-02-2012 |
20130114815 | SECRET SHARING SYSTEM, SHARING APPARATUS, SHARE MANAGEMENT APPARATUS, ACQUISITION APPARATUS, SECRET SHARING METHOD, PROGRAM AND RECORDING MEDIUM - A sharing apparatus independently shares a value corresponding to each element θ(ψ, i, β)·g | 05-09-2013 |
Satoru Nishimaki, Shiga JP
Satoru Nishimaki, Ritto-Shi JP
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20140210290 | POWER GENERATION DEVICE, TRANSMISSION DEVICE, SWITCHING DEVICE - A power generation device including a rotation member rotatable by an operation force and a supporting member supporting the rotation member by attracting the rotation member with a magnetic force, the power generation device inducing a current to a coil by a magnetic flux of a magnet caused by rotation of the rotation member, and where, when the operation force is applied in a first state in which the rotation member is supported by the supporting member by being attracted to a first and second portions of the supporting member at respective first and second positions, the rotation member transitions to a second state by rotating with the first position of the supporting member as a first supporting point, and further transitions to a third state by rotating with a position of the supporting member different from the first position as a second supporting point. | 07-31-2014 |
Shinichiro Nishimaki, Nagano JP
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20080311827 | Chamfering apparatus, a grinding wheel, and a chamfering method - A chamfering apparatus for chamfering an outer periphery of a disk-shaped substrate includes a grinding member having a circular hole inside thereof, wherein the hole has a diameter larger than an outer diameter of the substrate. An inner periphery of the grinding member forming the hole is a grinding surface and grinds the outer periphery of the substrate. | 12-18-2008 |
Shizuka Nishimaki, Yokohama JP
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20140149800 | TEST METHOD AND TEST CONTROL APPARATUS - Provided is a method for testing an apparatus including a first to third processors, a first circuit that connects the first and second processors, and a second circuit that connects the second and third processors. The method includes generating a test instruction sequence by prepending an additional instruction sequence to a certain instruction sequence which includes an instruction(s) for controlling the apparatus to execute a process using the first circuit. The additional instruction sequence does not change an operation result of an instruction included in the certain instruction sequence. The test instruction sequence includes an instruction(s) for controlling the apparatus to execute a process using the second circuit. The test method includes judging whether the first and second circuits are faulty, by controlling the apparatus to execute the test instruction sequence from a beginning of the certain instruction sequence, and from a beginning of the additional instruction sequence, respectively. | 05-29-2014 |
Shuhei Nishimaki, Kanagawa JP
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20110137487 | RUNNING CONTROL DEVICE, AND RUNNING CONTROL METHOD - [Object] An object of the present invention is to restrict an unnecessary control intervention at a scene where a vehicle avoids an obstacle etc. ahead of the vehicle by steering. | 06-09-2011 |
20140136015 | VEHICLE DRIVING SUPPORT APPARATUS - A braking/driving force control unit determines whether or not the driver has a intention of lane change on the basis of the detected road shape and the steering amount. The braking/driving force control unit detects an obstacle which is an obstacle present rearward and sideward of the vehicle. The braking/driving force control unit determines whether approach prevention control for preventing an the vehicle from approaching to the obstacle should start, when it is determined that the driver has the intention of lane change and the obstacle is detected, and performs the approach prevention control for supporting prevention of the vehicle from approaching to the obstacle when it is determined that the control should start. At this time, the braking/driving force control unit determines detection accuracy of the road shape ahead of the vehicle and suppresses the determination of the start of the control when the detection accuracy is low. | 05-15-2014 |
Shuhei Nishimaki, Sagamihara-Shi JP
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20100030430 | VEHICLE DRIVING CONTROL APPARATUS AND VEHICLE DRIVING CONTROL METHOD - A vehicle driving control apparatus is provided with a lane detecting device, a future position estimating device and a vehicle control device. The lane detecting device detects a lane marker of a lane. The future position estimating device estimates a future transverse position of a host vehicle after a prescribed amount of time. The vehicle control device executes a vehicle control such that a yaw moment is imparted to the host vehicle toward a middle of the lane. The yaw moment is imparted upon determining that the future transverse position is positioned laterally farther toward an outside of the lane from the middle of the lane than a prescribed widthwise lane position that is determined in advance using the lane marker as a reference. The vehicle control device suppresses an impartation of the yaw moment device when a recognition degree of the lane marker is lower than a prescribed value. | 02-04-2010 |
Tsutomu Nishimaki, Hachioji-Shi JP
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20110299114 | PRINT SERVER, PRINT CONTROL SYSTEM AND PRINT CONTROL METHOD - A print server is linked through a communication network to a client device for sending PDL data, and an image forming apparatus provided with a RIP section for creating raster data by rasterizing the PDL data and a printer section for executing printing according to the raster data. This print server is provided with at least a RIP section for creating raster data by rasterizing the PDL data received from the client device, and a control section that compares the time to be taken before output when the PDL data received from the aforementioned client device is sent to the image forming apparatus with the time to be taken before output when the raster data created by the RIP section of the printer server is sent to the image forming apparatus, whereby the data whose length of time before the output is shorter is sent to the image forming apparatus. | 12-08-2011 |
Yoichi Nishimaki, Kanagawa JP
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20130328928 | OBSTACLE AVOIDANCE APPARATUS AND OBSTACLE AVOIDANCE METHOD - An obstacle detecting unit detects an obstacle for a user wearing a head mounted display from an image of the outside world. A distance calculating unit calculates the distance from a detected obstacle to the user wearing the head mounted display. An obstacle replacing unit replaces the detected obstacle with a virtual object. A virtual object synthesizing unit generates a virtual object at a position within a virtual space displayed on the head mounted display, in which the position is determined according to the distance to the obstacle. | 12-12-2013 |
20140002329 | IMAGE PROCESSING DEVICE, IMAGE PROCESSING METHOD, AND IMAGE PROCESSING SYSTEM | 01-02-2014 |
20150070391 | IMAGE PROCESSING DEVICE, IMAGE PROCESSING METHOD, AND IMAGE PROCESSING SYSTEM - An image acquisition unit acquires an image captured by a first imaging device provided in a HMD for presenting an image observed when a three-dimensional image in a virtual three-dimensional space is projected onto a real-world setting, the first imaging device being configured to visualize an area including a field of view of a user wearing the HMD. A marker detection unit detects a marker included in the image captured by the first imaging device and acquired by the image acquisition unit. The image acquisition unit acquires an image captured by a second imaging device having an angle of view that at least partially overlaps an angle of view of the first imaging device. If the marker is not captured in the image captured by the first imaging device, the marker detection unit detects the marker in an image captured by the second imaging device. | 03-12-2015 |
20150163473 | IMAGE GENERATING DEVICE AND IMAGE GENERATING METHOD - An image generating device configured to provide a cloud service to a head-mounted display via a network is provided. A photographed image receiving section | 06-11-2015 |
20150325053 | IMAGE PROCESSING DEVICE, IMAGE PROCESSING METHOD, AND IMAGE PROCESSING SYSTEM - An image acquisition unit acquires an image captured by a first imaging device provided in a HMD for presenting an image observed when a three-dimensional image in a virtual three-dimensional space is projected onto a real-world setting, the first imaging device being configured to visualize an area including a field of view of a user wearing the HMD. A marker detection unit detects a marker included in the image captured by the first imaging device and acquired by the image acquisition unit. The image acquisition unit acquires an image captured by a second imaging device having an angle of view that at least partially overlaps an angle of view of the first imaging device. If the marker is not captured in the image captured by the first imaging device, the marker detection unit detects the marker in an image captured by the second imaging device. | 11-12-2015 |
Yukinori Nishimaki, Kanagawa JP
Patent application number | Description | Published |
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20080311467 | ELECTRONIC APPLIANCE - An electronic appliance includes a battery mounting portion on which two types of batteries are selectively mounted, wherein the battery mounting portion has: a battery mounting recessed portion; an appliance side connecting terminal; an urging member; and a single manipulating member; while a battery side connecting terminal of one battery is being attached to one appliance side connecting terminal, one engaging member is engaged with the one battery to prevent the one battery from moving in a direction of detaching the battery side connecting terminal from the one appliance side connecting terminal; and while a battery side connecting terminal of the other battery is being attached to the other appliance side connecting terminal, the other engaging member is engaged with the other battery to prevent the other battery from moving in a direction of detaching the battery side connecting terminal from the other appliance side connecting terminal. | 12-18-2008 |