Patent application number | Description | Published |
20100243003 | APPARATUS AND METHOD FOR CLEANING SEMICONDUCTOR SUBSTRATE - A semiconductor substrate cleaning apparatus which cleans a semiconductor substrate with a chemical solution, includes a water concentration detecting device which detects water concentration of the chemical solution, an ultrasonic transducer which applies ultrasonic waves to the chemical solution or the semiconductor substrate to execute ultrasonic cleaning, and a control device which turns on and off the ultrasonic transducer based or changes a cleaning condition for the ultrasonic cleaning based on the water concentration detected by the water concentration detecting device. | 09-30-2010 |
20110067734 | APPARATUS AND METHOD FOR CLEANING SEMICONDUCTOR SUBSTRATE - A method of cleaning a semiconductor substrate includes cleaning a semiconductor substrate with a cleaning liquid, rinsing the semiconductor substrate with rinse water after the semiconductor substrate has been cleaned, and drying the semiconductor substrate after the semiconductor substrate has been rinsed. A temperature of the rinse water is set to 70° C. or above in the rinsing, and the rinse water is set so as to be acidic. | 03-24-2011 |
20120088357 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE - A method of manufacturing a semiconductor device is disclosed. The method forms a semiconductor device including a workpiece structure having a first region and second region located adjacent to the first region formed therein. The first region includes a first pattern and the second region includes a second pattern having at least a greater pattern width or a smaller aspect ratio than the first pattern. The method includes forming the first pattern by providing a first film having a first contact angle at a top portion thereof and the second pattern by providing a second film having a second contact angle less than the first contact angle at a top portion thereof; cleaning the first and the second regions by a chemical liquid; rinsing the cleaned first and the second regions by a rinse liquid; and drying the rinsed first and the second regions. | 04-12-2012 |
20120094493 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICE - A method of manufacturing a semiconductor device in which an insulating film is filled between patterns etched into a workpiece structure is disclosed. The method includes cleaning etch residues residing between the etched patterns by a first chemical liquid; rinsing the workpiece structure cleaned by the first chemical liquid by a rinse liquid; and coating the workpiece structure rinsed by the rinse liquid with a coating liquid for formation of the insulating film. The cleaning to the coating are carried out within the same processing chamber such that a liquid constantly exists between the patterns of the workpiece structure. | 04-19-2012 |
20140014142 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICE - A method of manufacturing a semiconductor device in which an insulating film is filled between patterns etched into a workpiece structure is disclosed. The method includes cleaning etch residues residing between the etched patterns by a first chemical liquid; rinsing the workpiece structure cleaned by the first chemical liquid by a rinse liquid; and coating the workpiece structure rinsed by the rinse liquid with a coating liquid for formation of the insulating film. The cleaning to the coating are carried out within the same processing chamber such that a liquid constantly exists between the patterns of the workpiece structure. | 01-16-2014 |
20140238452 | APPARATUS AND METHOD FOR CLEANING SEMICONDUCTOR SUBSTRATE - A semiconductor substrate cleaning method includes cleaning a semiconductor substrate formed with a line-and-space pattern, supplying rinse water to rinse the substrate, rinsing the substrate, and drying the substrate. The supplying rinse water includes supplying deionized water and hydrochloric acid into a mixing section to mix the deionized water and the hydrochloric acid into a mixture, heating the mixture in the mixing section by a heater, detecting a pH value and a temperature of the mixture by a pH sensor and a temperature sensor respectively, adjusting an amount of hydrochloric acid supplied into the mixing section so that the rinse water has a predetermined pH value indicative of acidity, and energizing or de-energizing the heater so that the temperature of the mixture detected by the temperature sensor reaches a predetermined temperature, thereby producing the rinse water which has a temperature of not less than 70° C. and is acidic. | 08-28-2014 |
Patent application number | Description | Published |
20090186288 | MAGNETIC TONER - The object of the present invention is to provide a magnetic toner enabling an image with high image density and excellent image reproducibility to be obtained, which is excellent in fluidity, charging stability, and charging uniformity, even for long-term use, and also enabling an image whose fogging, ghost, and scattering are suppressed to be obtained. The magnetic toner has at least a binder resin and a magnetic material, where, the magnetic material is an magnetic iron oxide whose dielectric breakdown voltage of the magnetic material is 160 to 1600 V/cm, and the dielectric loss tangent (tan δ) of the magnetic toner at 100 kHz and 40° C. is 2.0×10 | 07-23-2009 |
20090197193 | TONER - To provide a toner which has superior low-temperature fixing performance, high-temperature anti-offsetting properties and developing performance and may cause neither melt sticking of toner to photosensitive member nor turn-up of cleaning blade. The toner contains at least a binder resin, a colorant and a wax, and the wax is characterized by i) being an oxidized hydrocarbon wax, ii) having a hydroxyl value of from 5 mgKOH/g or more to 150 mgKOH/g or less, and iii) having, in molecular weight distribution measured by gel permeation chromatography of tetrahydrofuran-soluble matter, a main peak within the range of molecular weight of from 200 or more to 600 or less, and a component with a molecular weight of 700 or more in a content of 3% by mass or less. | 08-06-2009 |
20100009277 | HYDROPHOBIC INORGANIC FINE PARTICLES AND TONER - Hydrophobic inorganic fine particles are provided which: does not cause melt adhesion of toner to a photosensitive member and contamination of a contact charging member; imparts excellent flowability, charging performance and durability to toner even after the toner is stored in a high-temperature, high-humidity environment over a long time period; and does not cause dripping of toner and contamination with the toner. The hydrophobic inorganic fine particles are obtained by subjecting inorganic fine particles to surface treatment with silicone oil and then with a silane compound and/or a silazane compound, or by subjecting inorganic fine particles to surface treatment with a silane compound and/or a silazane compound in the presence of silicone oil, and further subjecting the inorganic fine particles thus surface-treated to surface treatment with silicone oil. | 01-14-2010 |
20100028793 | TONER - An object of the present invention is to provide a toner excellent in ability to prevent electrostatic offset and fixation tailing. Provided is a toner including toner particles each containing at least a binder resin, a wax, and a magnetic iron oxide, and inorganic fine particles, in which the magnetic iron oxide contains at least a Ti component, an Al component, an Si component, and an Fe component; and the each component has some particular characteristics. | 02-04-2010 |
20100197130 | SEMICONDUCTOR MEMORY DEVICE AND METHOD OF MANUFACTURING THE SAME - A semiconductor memory device manufacturing method includes forming a floating gate electrode above a semiconductor substrate, forming an interelectrode insulating film above the floating gate electrode, forming a first radical nitride film on a surface of the interelectrode insulating film by first radical nitriding, and forming a control gate electrode on the first radical nitride film. | 08-05-2010 |
20100210110 | ETCHING APPARATUS, A METHOD OF CONTROLLING AN ETCHING SOLUTION, AND A METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE - An etching apparatus includes a chamber containing an etching solution including first and second components and water, a concentration of the water in the etching solution is at a specified level or lower; a circulation path circulating the etching solution; a concentration controller sampling the etching liquid from the circulation path and controls concentrations of the etching solution respectively; and a refilling chemical liquid feeder feeding a refilling chemical liquid including the first component having a concentration higher than the first component in the etching solution. | 08-19-2010 |
Patent application number | Description | Published |
20080308739 | RADIATION DETECTING APPARATUS AND RADIOGRAPHING SYSTEM - A radiation detecting apparatus includes: a sensor panel having a substrate and a photoelectric conversion element array arranged on the substrate; a scintillator layer arranged on one surface side of the sensor panel; and a light generator arranged on the sensor panel at the other side in opposition to the one side on which the scintillator layer is arranged, in corresponding to an area in which the photoelectric conversion element array is arranged. The light generator includes a light transmitting electrode layer, a rear electrode layer and a light emitting layer arranged between the light transmitting electrode layer and the rear electrode. The light emitting layer according to a first aspect is formed from light emitting substance, a binder and a black pigment. The light emitting layer according to a second aspect contains a first pigment or dye absorbing a light of the same wavelength of a maximum light emission from the scintillator layer, and a second pigment or dye different from the first pigment or dye. | 12-18-2008 |
20090283685 | RADIATION DETECTION APPARATUS AND RADIATION IMAGING SYSTEM - There is provided a radiation detection apparatus including a sensor panel including a photoelectric conversion unit with a plurality of photoelectric conversion elements over a substrate, a wavelength converter, disposed over the photoelectric conversion unit of the sensor panel, for converting a radiation into light detectable by the photoelectric conversion element, a plane shaped light emitting body for emitting light to the photoelectric conversion unit of the sensor panel, disposed over the wavelength converter, and a protective layer disposed on the plane shaped light emitting body. | 11-19-2009 |
20090289170 | RADIATION DETECTION APPARATUS AND RADIATION DETECTION SYSTEM - A radiation detection apparatus to detect radiation. A substrate ( | 11-26-2009 |
20130322598 | RADIATION DETECTION APPARATUS AND IMAGING SYSTEM - A radiation detection apparatus comprising a sensor panel in which a plurality of sensors for detecting light are arranged, and a scintillator layer containing scintillator particles for converting an incident radiation into light, and an adhesive resin which has an adherence property and bonds the scintillator particles, wherein the scintillator layer is adhered to the sensor panel by the adhesive resin, a modulus of elasticity in tensile of the adhesive resin is higher than 0.7 GPa and lower than 3.5 GPa, and a volume ratio of the adhesive resin to the scintillator particles is not lower than 1% and not higher than 5%. | 12-05-2013 |
Patent application number | Description | Published |
20090021138 | LIGHT EMITTING APPARATUS - A light emitting apparatus can include a base, a light emitting device and a resin portion on one side of the base for covering the light emitting device, a wiring thereof, and the like. The light emitting apparatus can be configured to prevent the exfoliation of the resin portion from the base even when a substantial amount of load is applied thereon by a mounter during the mounting operation onto a mounting board. The ratio of an occupied area of the patterned electrodes on the base within a predetermined area including an area where the resin portion is provided is made large enough to prevent the patterned electrodes from being flexed during mounting operation, and the ratio of an occupied area of the patterned electrodes on the upper and rear surfaces of the base just outside of the predetermined area is made smaller than the predetermined ratio. | 01-22-2009 |
20090038697 | Switching valve - A selector valve, comprising a valve chamber having a first valve seat and a second valve seat facing the first valve seat, a first fluid passage communicating with a first valve port on the periphery of the first valve seat of the valve chamber to flow a first working fluid therein, a second fluid passage communicating with the valve chamber to flow the working fluid therefrom or therein, a third fluid passage communicating with a second valve port on the periphery of the second valve seat of the valve chamber to flow the working fluid therefrom, a valve element disposed in the valve chamber and alternately separating from and coming into contact with the first valve seat and the second valve seat, a stem part connected to the valve element, a guide hole movably guiding the valve stem, a storage chamber for a seal means installed around the guide hole, an auxiliary passage allowing the storage chamber to communicate with the first fluid passage, and a solenoid part connected to the stem part for operating a solenoid rod. A first pressure receiving area formed by the first valve seat and the valve element joined to each other to receive the pressure of the first working fluid is set approximately the same as the third pressure receiving area of the stem part receiving the first working fluid in the storage chamber. | 02-12-2009 |
20090200479 | RADIATION DETECTION APPARATUS AND SCINTILLATOR PANEL - A radiation detection apparatus includes an optical detector disposed on a substrate and having a plurality of photoelectric conversion elements which convert light into an electrical signal, and a scintillator layer disposed on the optical detector and having a columnar crystal structure which converts radiation into light, wherein the concentration of an activator of the scintillator layer is higher at the radiation-incident side opposite the optical detector and is lower at the optical detector side. The scintillator panel includes the substrate and the scintillator layer disposed on the substrate, wherein the concentration of the activator of the scintillator layer is higher at the radiation-incident side and is lower at the light-emission side. | 08-13-2009 |
20090278068 | Seal Structure and Control Valve Using Said Seal Structure - A seal structure sealing a fitted part between the guide surface of a bearing part and a shaft part to prevent a fluid from flowing in a direction from a high-pressure fluid side to a low-pressure fluid side. The seal structure comprises a seal ring storage part having a radial contact surface surrounding the shaft part which is formed on the high-pressure fluid side of the bearing part and a seal ring disposed in the seal ring storage part, allowing its side surface facing the contact surface to come into contact with the contact surface, and allowing its inner peripheral surface to be fitted to the outer peripheral surface of the shaft part. The seal ring is formed in such a relative dimension that, even if elastically deformed by the pressure of the sealed fluid, the elastically deformed expanded portion thereof is not brought into contact with the peripheral surface of the seal ring storage part. | 11-12-2009 |
20090283164 | Capacity control valve - A capacity control valve of the present invention includes a communication path ( | 11-19-2009 |
20140244232 | SIMULATION APPARATUS AND SIMULATION METHOD - A simulation apparatus performs a simulation of a program for executing a plurality of instructions included in an instruction set of a processor. A bus model unit accepts an access request to a memory storing the program, performs arbitration for a bus, and calculates a cycle count of the processor until use of the bus is granted, for each instruction of the program. A cycle count accumulation unit computes a cycle count required for executing the program based on the cycle count for each instruction calculated by the bus model unit. | 08-28-2014 |
Patent application number | Description | Published |
20090250431 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD - A substrate processing method that processes a substrate on which a plurality of patterns adjacent to each other are formed, has: supplying a first processing liquid to a principal surface of the substrate that is dry and has the patterns formed thereon to make the first processing liquid adhere to the principal surface of the substrate; and supplying a second processing liquid having a higher surface tension than the first processing liquid to the principal surface of the substrate in the state where the first processing liquid adheres to the principal surface of the substrate to process the principal surface of the substrate with the second processing liquid. | 10-08-2009 |
20110139192 | SURFACE TREATMENT APPARATUS AND METHOD FOR SEMICONDUCTOR SUBSTRATE - In one embodiment, a surface treatment apparatus for a semiconductor substrate includes a holding unit, a first supply unit, a second supply unit, a third supply unit, a drying treatment unit, and a removal unit. The holding unit holds a semiconductor substrate with a surface having a convex pattern formed thereon. The first supply unit supplies a chemical solution to the surface of the semiconductor substrate, to perform cleaning and oxidation. The second supply unit supplies pure water to the surface of the semiconductor substrate, to rinse the semiconductor substrate. The third supply unit supplies a water repelling agent to the surface of the semiconductor substrate, to form a water repellent protective film on the surface of the convex pattern. The drying treatment unit dries the semiconductor substrate. The removal unit removes the water repellent protective film while making the convex pattern remain. | 06-16-2011 |
20110143541 | APPARATUS AND METHOD OF TREATING SURFACE OF SEMICONDUCTOR SUBSTRATE - In one embodiment, an apparatus of treating a surface of a semiconductor substrate comprises a substrate holding and rotating unit, first to fourth supplying units, and a removing unit. A substrate holding and rotating unit holds a semiconductor substrate, having a convex pattern formed on its surface, and rotates the semiconductor substrate. A first supplying unit supplies a chemical onto the surface of the semiconductor substrate in order to clean the semiconductor substrate. A second supplying unit supplies pure water to the surface of the semiconductor substrate in order to rinse the semiconductor substrate. A third supplying unit supplies a water repellent agent to the surface of the semiconductor substrate in order to form a water repellent protective film onto the surface of the convex pattern. A fourth supplying unit supplies alcohol, which is diluted with pure water, or acid water to the surface of the semiconductor substrate in order to rinse the semiconductor substrate. A removing unit removes the water repellent protective film with the convex pattern being left. | 06-16-2011 |
20110143545 | APPARATUS AND METHOD OF TREATING SURFACE OF SEMICONDUCTOR SUBSTRATE - In one embodiment, an apparatus of treating a surface of a semiconductor substrate comprises a substrate holding and rotating unit which holds a semiconductor substrate with a surface having a convex pattern formed thereon and rotates the semiconductor substrate, a first supply unit which supplies a chemical and/or pure water to the surface of the semiconductor substrate, and a second supply unit which supplies a diluted water repellent to the surface of the semiconductor substrate to form a water-repellent protective film on the surface of the convex pattern. The second supply unit comprises a buffer tank which stores the water repellent, a first supply line which supplies a purge gas to the buffer tank, a second supply line which supplies a diluent, a pump which sends off the water repellent within the buffer tank, a third supply line which supplies the water repellent sent off from the pump, and a mixing valve which mixes the diluent and the water repellent to produce the diluted water repellent. | 06-16-2011 |
20110269313 | SEMICONDUCTOR SUBSTRATE SURFACE TREATMENT METHOD - In one embodiment, a method for treating a surface of a semiconductor substrate is disclosed. The semiconductor substrate has a first pattern covered by a resist and a second pattern not covered by the resist. The method includes supplying a resist-insoluble first chemical solution onto a semiconductor substrate to subject the second pattern to a chemical solution process. The method includes supplying a mixed liquid of a water repellency agent and a resist-soluble second chemical solution onto the semiconductor substrate after the supply of the first chemical solution, to form a water-repellent protective film on a surface of at least the second pattern and to release the resist. In addition, the method can rinse the semiconductor substrate using water after the formation of the water-repellent protective film, and dry the rinsed semiconductor substrate. | 11-03-2011 |
20140206202 | MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE AND SEMICONDUCTOR MANUFACTURING APPARATUS - A manufacturing method of a semiconductor device according to the present invention comprises cleaning a semiconductor substrate. A first chemical liquid for forming a water-repellent protection film and a second chemical liquid coating the first chemical liquid are supplied on a surface of the semiconductor substrate. Alternatively, the semiconductor substrate is immersed in the first chemical liquid coated with the second chemical liquid. The semiconductor substrate is then dried. | 07-24-2014 |
20140213064 | SEMICONDUCTOR MANUFACTURING APPARATUS AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE - A semiconductor manufacturing apparatus according to the present embodiment comprises a chamber. A chemical-agent supply part is configured to supply a water-repellent agent or an organic solvent to a surface of a semiconductor substrate having been cleaned with a cleaning liquid in the chamber. A spray part is configured to spray a water-capture agent capturing water into an atmosphere in the chamber. | 07-31-2014 |